Main page | Journal list | Log-in

Publications by all authors

Journal articles with impact factor: accepted, 2017, 2016, 2015, 2014, 2013, 2012, 2011, 2010, 2009, 2008, 2007, 2006, 2005, 2004, 2003, 2002, 2001, 2000, 1999, 1998, 1996, 1995, 1994, 1993, 1992, 1991, 1990, 1989, 1988, 1987, 1986, 1985, 1984, 1982, 1981, 1980, 1979, 1977, 1976, 1974, 1973, 1972, 1971
Journal articles without impact factor: 2009, 2008, 2007, 2005, 2004, 2003, 2002, 2001, 1999, 1998

Conference proceedings available from ISI Web of Science: 2016, 2015, 2011, 2010, 2009
Conference proceedings not available from ISI Web of Science: 2014, 2010, 2009, 2008, 2007, 2006, 2005, 2004, 2003, 2001, 2000, 1999, 1998, 1997, 1996, 1995

Swap first/last name | Enable/disable linebreaks and numbers | Switch short/long journal names


Articles in journals with impact factor

accepted

300. Skalný J., Stoica A., Országh J., Vlădoiu R., Mason N.,
Positive and negative corona discharges in flowing carbon dioxide,
Journal of Physics D (accepted)

2017

299. Ohlídal I., Franta D., Nečas D.,
Ellipsometric and reflectometric characterization of thin films exhibiting thickness non-uniformity and boundary roughness,
Applied Surface Science 421 (2017) 687-696

298. Vodák J., Nečas D., Pavliňák D., Macák J., Řičica T., Jambor R., Ohlídal M.,
Application of imaging spectroscopic reflectometry for characterization of Au reduction from organometallic compound by means of plasma jet technology,
Applied Surface Science 396 (2017) 284-290

297. Nečas D., Klapetek P.,
Study of user influence in routine SPM data processing,
Measurement Science and Technology 28(3) (2017) 034014

296. Klapetek P., Yacoot A., Grolich P., Valtr M., Nečas D.,
Gwyscan: a library to support non-equidistant Scanning Probe Microscope measurements,
Measurement Science and Technology 28(3) (2017) 034015

295. Manakhov A., Landová M., Medalová J., Michlíček M., Polčák J., Nečas D., Zajíčková L.,
Cyclopropylamine plasma polymers for increased cell adhesion and growth,
Plasma Processes and Polymers 14 (2017) e1600123

294. Franta D., Nečas D., Giglia A., Franta P., Ohlídal I.,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to magnesium fluoride,
Applied Surface Science 421 (2017) 424-429

293. Zajíčková L., Jelínek P., Obrusník A., Vodák J., Nečas D.,
Plasma Enhanced CVD of Functional Coatings in Ar/Maleic Anhydride/C2H2 Homogeneous Dielectric Barrier Discharges at Atmospheric Pressure,
Plasma Phys. Control. Fusion 59(3) (2017) 034003

292. Vodák J., Nečas D., Ohlídal M., Ohlídal I.,
Determination of local thickness values of non-uniform thin films by imaging spectroscopic reflectometer with enhanced spatial resolution,
Measurement Science and Technology 28 (2017) 025205

291. Obrusník A., Jelínek P., Zajíčková L.,
Modelling of the gas flow and plasma co-polymerization of two monomers in an atmospheric-pressure dielectric barrier discharge ,
Surface and Coatings Technology 314 (2017) 139-147

290. Franta D., Kotilainen M., Krumpolec R., Ohlídal I.,
Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry,
Applied Surface Science 421 (2017) 420-423

289. Ondračka P., Holec D., Nečas D., Kedroňová E., Elisabeth S., Goullet A., Zajíčková L.,
Optical properties of TixSi1−xO2 solid solutions,
Physical Review B 95 (2017) 195163

288. Manakhov A., Michlíček M., Felten A., Pireaux J., Nečas D., Zajíčková L.,
XPS depth profiling of derivatized amine and anhydride plasma polymers: Evidence of limitations of the derivatization approach,
Applied Surface Science 394 (2017) 578-585

287. Bannov A., Jašek O., Manakhov A., Márik M., Nečas D., Zajíčková L.,
High performance ammonia gas sensors based on plasma treated carbon nanostructures,
IEEE Sensors J. 17(7) (2017) 1964-1970

286. Franta D., Dubroka A., Wang C., Giglia A., Vohánka J., Franta P., Ohlídal I.,
Temperature-dependent dispersion model of float zone crystalline silicon,
Applied Surface Science 421 (2017) 405-419

285. Bannov A., Prášek J., Jašek O., Zajíčková L.,
Investigation of Pristine Graphite Oxide as Room-Temperature Chemiresistive Ammonia Gas Sensing Material,
Sensors 17(2) (2017) 320

284. Ghosal K., Manakhov A., Zajíčková L., Thomas S.,
Structural and Surface Compatibility Study of Modified Electrospun Poly(ε-caprolactone) (PCL) Composites for Skin Tissue Engineering,
AAPS PharmSciTech 18(1) (2017) 72-81

283. Schäfer J., Fricke K., Mika F., Pokorná Z., Zajíčková L., Foest R.,
Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure,
Thin Solid Films 630 (2017) 71-78

282. Kotilainen M., Krumpolec R., Franta D., Souček P., Homola T., Cameron D., Vuoristo P.,
Hafnium oxide thin films as a barrier against copper diffusion in solar absorbers,
Solar Energy Materials and Solar Cells 166 (2017) 140-146

281. Franta D., Čermák M., Vohánka J., Ohlídal I.,
Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
Thin Solid Films 631 (2017) 12-22

280. Ohlídal I., Vohánka J., Čermák M., Franta D.,
Optical characterization of randomly microrough surfaces covered with very thin overlayers using effective medium approximation and Rayleigh-Rice theory,
Applied Surface Science 419 (2017) 942-956

279. Manakhov A., Kedroňová E., Medalová J., Černochová P., Obrusník A., Michlíček M., Shtansky D., Zajíčková L.,
Carboxyl-anhydride and amine plasma coating of PCL nanofibers to improve their bioactivity,
Materials & Design 132 (2017) 257-265

278. Manakhov A., Čechal J., Michlíček M., Shtansky D.,
Determination of NH2 concentration on 3-aminopropyl tri-ethoxy silane layers and cyclopropylamine plasma polymers by liquid-phase derivatization with 5-iodo 2-furaldehyde,
Applied Surface Science 414 (2017) 390-397

277. Zajíčková L., Tessier P., Chirita V., Kelires P.,
Preface 2016 EMRS Spring Meeting, Symposium EE: Carbon, or Nitrogen-Containing Nanostructured Thin Films,
Thin Solid Films 630 (2017) 1

2016

276. Nečas D., Ohlídal I., Franta D., Ohlídal M., Vodák J.,
Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry,
Journal of Optics 18 (2016) 015401

275. Ondračka P., Holec D., Nečas D., Zajíčková L.,
Accurate prediction of band gaps and optical properties of HfO2,
Journal of Physics D 49 (2016) 395301

274. Makhneva E., Manakhov A., Skládal P., Zajíčková L.,
Development of effective QCM biosensors by cyclopropylamine plasma polymerization and antibody immobilization using cross-linking reactions ,
Surface and Coatings Technology 290 (2016) 116-123

273. Manakhov A., Makhneva E., Skládal P., Nečas D., Čechal J., Kalina L., Eliáš M., Zajíčková L.,
The robust bio-immobilization based on pulsed plasma polymerization of cyclopropylamine and glutaraldehyde coupling chemistry,
Applied Surface Science 360(Part A) (2016) 28-36

272. Hegemann D., Michlíček M., Blanchard N., Schuetz U., Lohmann D., Vandenbossche M., Zajíčková L., Drábik M.,
Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges,
Plasma Processes and Polymers 13 (2016) 279–286

271. Manakhov A., Michlíček M., Nečas D., Polčák J., Makhneva E., Eliáš M., Zajíčková L.,
Carboxyl-rich coatings deposited by atmospheric plasma co-polymerization of maleic anhydride and acetylene,
Surface and Coatings Technology 295 (2016) 37-45

270. Voráč J., Potočňáková L., Synek P., Hnilica J., Kudrle V.,
Gas mixing enhanced by power modulations in atmospheric pressure microwave plasma jet,
Plasma Sources Science and Technology 25(2) (2016) 025018

269. Schäfer J., Hnilica J., Šperka J., Quade A., Kudrle V., Foest R., Vodák J., Zajíčková L.,
Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure,
Surface and Coatings Technology 295 (2016) 112-118

268. Štrbková L., Manakhov A., Zajíčková L., Stoica A., Veselý P., Chmelík R.,
The adhesion of normal human dermal fibroblasts to the cyclopropylamine plasma polymers studied by holographic microscopy,
Surface and Coatings Technology 295 (2016) 70-77

267. Siefke T., Kroker S., Pfeiffer K., Puffky O., Dietrich K., Franta D., Ohlídal I., Szeghalmi A., Kley E., Tünnermann A.,
Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range,
Advanced Optical Materials 4 (2016) 1780-1786

266. Obrusník A., Synek P., Hübner S., van der Mullen J., Zajíčková L., Nijdam S.,
Coherent and incoherent Thomson scattering on an argon/hydrogen microwave plasma torch with transient behaviour,
Plasma Sources Science and Technology 25(5) (2016) 055018

265. Arjunan K., Obrusník A., Jones B., Zajíčková L., Ptasinska S.,
Effect of Additive Oxygen on the Reactive Species Profile and Microbicidal Property of a Helium Atmospheric Pressure Plasma Jet,
Plasma Processes and Polymers 13 (2016) 1089-1105

264. Sobota A., Guaitella O., Sretenović G., Krstić I., Kovačević V., Obrusník A., Nguyen Y., Zajíčková L., Obradovic B., Kuraica M.,
Electric field measurements in a kHz-driven He jet—the influence of the gas flow speed,
Plasma Sources Science and Technology 25(6) (2016) 065026

2015

263. Obrusník A., Bonaventura Z.,
Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D model,
Journal of Physics D 48 (2015) 065201

262. Synek P., Obrusník A., Zajíčková L., Hübner S., Nijdam S.,
On the interplay of gas dynamics and the electromagnetic field in an atmospheric Ar/H2 microwave plasma torch,
Plasma Sources Science and Technology 24 (2015) 025030

261. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
Thin Solid Films 581 (2015) 7-13

260. Nečas D., Vodák J., Ohlídal I., Ohlídal M., Majumdar A., Zajíčková L.,
Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry,
Applied Surface Science 350 (2015) 149-155

259. Pekárek J., Vrba R., Prášek J., Jašek O., Majzlíková P., Pekárková J., Zajíčková L.,
MEMS Carbon Nanotubes Field Emission Pressure Sensor With Simplified Design: Performance and Field Emission Properties Study,
IEEE Sensors J. 15(3) (2015) 1430-1436

258. Majzlíková P., Sedláček J., Prášek J., Pekárek J., Svatoš V., Bannov A., Jašek O., Synek P., Eliáš M., Zajíčková L., Hubálek J.,
Sensing Properties of Multiwalled Carbon Nanotubes Grown in MW Plasma Torch: Electronic and Electrochemical Behavior, Gas Sensing, Field Emission, IR Absorption,
Sensors 15(2) (2015) 2644-2661

257. Eliáš M., Kloc P., Jašek O., Mazánková V., Trunec D., Hrdý R., Zajíčková L.,
Atmospheric pressure barrier discharge at high temperature: Diagnostics and carbon nanotubes deposition,
Journal of Applied Physics 117(10) (2015) 103301

256. Muresan M., Charvátová-Campbell A., Ondračka P., Buršíková V., Peřina V., Polcar T., Reuter S., Hammer M., Valtr M., Zajíčková L.,
Protective double-layer coatings prepared by plasma enhanced chemical vapor deposition on tool steel,
Surface and Coatings Technology 272 (2015) 229-238

255. Stoica A., Manakhov A., Polčák J., Ondračka P., Buršíková V., Zajíčková R., Medalová J., Zajíčková L.,
Cell proliferation on modified DLC thin films prepared by plasma enhanced chemical vapor deposition,
Biointerphases 10 (2015) 029520

254. Kedroňová E., Zajíčková L., Hegemann D., Klíma M., Michlíček M., Manakhov A.,
Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers,
Plasma Processes and Polymers 12 (2015) 1231–1243

253. Franta D., Nečas D., Ohlídal I.,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia,
Applied Optics 54 (2015) 9108-9119 (1× cited)

Cited in

  1. Franta D., Čermák M., Vohánka J., Ohlídal I.,
    Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
    Thin Solid Films 631 (2017) 12-22


2014

252. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Broadening of dielectric response and sum rule conservation,
Thin Solid Films 571 (2014) 496-501

251. Nečas D., Ohlídal I., Franta D., Čudek V., Ohlídal M., Vodák J., Sládková L., Zajíčková L., Eliáš M., Vižďa F.,
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry,
Thin Solid Films 571 (2014) 573-578

250. Klapetek P., Nečas D.,
Independent analysis of mechanical data from atomic force microscopy,
Measurement Science and Technology 25 (2014) 044009

249. Nečas D., Ohlídal I.,
Consolidated series for efficient calculation of the reflection and transmission in rough multilayers,
Optics Express 22(4) (2014) 4499-4515

248. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen,
Thin Solid Films 571 (2014) 490-495

247. Manakhov A., Zajíčková L., Eliáš M., Čechal J., Polčák J., Hnilica J., Bittnerová Š., Nečas D.,
Optimization of Cyclopropylamine Plasma Polymerization Toward Enhanced Layer Stability in Contact with Water,
Plasma Processes and Polymers 11 (2014) 532-544 (1× cited)

Cited in

  1. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
    Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
    Thin Solid Films 581 (2015) 7-13


246. Ohlídal I., Franta D., Nečas D.,
Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
Thin Solid Films 571 (2014) 695-700

245. Synek P., Jašek O., Zajíčková L.,
Study of Microwave Torch Plasmachemical Synthesis of Iron Oxide Nanoparticles Focused on the Analysis of Phase Composition,
Plasma Chem. Plasma Process. 34(2) (2014) 327-341 (1× cited)

Cited in

  1. Majzlíková P., Sedláček J., Prášek J., Pekárek J., Svatoš V., Bannov A., Jašek O., Synek P., Eliáš M., Zajíčková L., Hubálek J.,
    Sensing Properties of Multiwalled Carbon Nanotubes Grown in MW Plasma Torch: Electronic and Electrochemical Behavior, Gas Sensing, Field Emission, IR Absorption,
    Sensors 15 (2015) 2644-2661


244. David B., Pizurova N., Synek P., Kudrle V., Jašek O., Schneeweiss O.,
epsilon-Fe2O3 nanoparticles synthesized in atmospheric-pressure microwave torch,
Materials Letters 116(AA3WI) (2014) 370-373

243. Voráč J., Obrusník A., Procházka V., Dvořák P., Talába M.,
Spatially resolved measurement of hydroxyl radical (OH) concentration in an argon RF plasma jet by planar laser-induced fluorescence,
Plasma Sources Science and Technology 23(2) (2014) 025011

242. Šperka J., Souček P., Loon J., Dowson A., Schwarz C., Krause J., Butenko Y., Kroesen G., Kudrle V.,
Hypergravity synthesis of graphitic carbon nanomaterial in glide arc plasma,
Materials Research Bulletin 54 (2014) 61-65

241. Schäfer J., Šperka J., Gött G., Zajíčková L., Foest R.,
High-Speed Visualization of Filament Instabilities and Self-Organization Effect in RF Argon Plasma Jet at Atmospheric Pressure,
IEEE Transactions on Plasma Science 42 (2014) 2454-2455

240. Potočňáková L., Šperka J., Zikán P., Loon J., Beckers J., Kudrle V.,
Gliding Arc in Noble Gases Under Normal and Hypergravity Conditions,
IEEE Transactions on Plasma Science 42 (2014) 2724-2725

239. Nečas D., Čudek V., Vodák J., Ohlídal M., Klapetek P., Benedikt J., Rügner K., Zajíčková L.,
Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry,
Measurement Science and Technology 25 (2014) 115201

238. Nečas D., Ohlídal I., Franta D., Ohlídal M., Čudek V., Vodák J.,
Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films,
Applied Optics 53 (2014) 5606-5614

237. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Dispersion model of two-phonon absorption: application to c-Si,
Optical Materials Express 4 (2014) 1641-1656

236. David B., Schneeweiss O., Pizurova N., Rek A., Kudrle V., Jašek O.,
Nanocrystalline alpha-Fe Layer Examined by Mossbauer Spectrometry,
Acta Physica Polonica A 126(1) (2014) 94-95

235. Manakhov A., Skládal P., Nečas D., Čechal J., Polčák J., Eliáš M., Zajíčková L.,
Cyclopropylamine plasma polymers deposited onto quartz crystal microbalance for biosensing application,
Physica Status Solidi A 211(12) (2014) 2801-2808

234. Majzlíková P., Prášek J., Eliáš M., Jašek O., Pekárek J., Hubálek J., Zajíčková L.,
Comparison of different modifications of screen-printed working electrodes of electrochemical sensors using carbon nanotubes and plasma treatment,
Physica Status Solidi A 211(12) (2014) 2756–2764

2013

233. Nečas D., Klapetek P.,
One-dimensional autocorrelation and power spectrum density functions of irregular regions,
Ultramicroscopy 124 (2013) 13-19

232. Zajíčková L., Eliáš M., Buršíková V., Studýnková Z., Mazánková V., Michlíček M., Houdková J.,
Low Pressure Plasmachemical Processing of Multi-Walled Carbon Nanotubes for the Production of Polyurethane Composite Films with Improved Mechanical Properties,
Thin Solid Films 538 (2013) 7-15

231. Franta D., Nečas D., Zajíčková L.,
Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
Thin Solid Films 534 (2013) 432-441 (2× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
    Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
    Thin Solid Films 541 (2013) 12-16
  2. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244


230. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
Thin Solid Films 539 (2013) 233-244 (1× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
    Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
    Thin Solid Films 541 (2013) 12-16


229. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
Thin Solid Films 541 (2013) 12-16

228. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
Surface and Interface Analysis 45 (2013) 1188-1192

227. Hnilica J., Schaefer J., Foest R., Zajíčková L., Kudrle V.,
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure,
Journal of Physics D 46(33) (2013) 8 (1× cited)

Cited in


  1. Atmospheric pressure plasma jets: an overview of devices and new directions,
    Plasma Sources Science and Technology 24 (2015) 064002


226. Šperka J., Souček P., Loon J., Dowson A., Schwarz C., Krause J., Kroesen G., Kudrle V.,
Hypergravity effects on glide arc plasma,
European Physical Journal D 67(12) (2013) 1-9

2012

225. Nečas D., Klapetek P.,
Gwyddion: an open-source software for SPM data analysis,
Central European Journal of Physics 10(1) (2012) 181-188

224. David B., Schneeweiss O., Santava E., Jašek O.,
Magnetic Properties of gamma-Fe2O3 Nanopowder Synthesized by Atmospheric Microwave Torch Discharge,
Acta Physica Polonica A 122(1) (2012) 9-11

223. David B., Pizurova N., Schneeweiss O., Santava E., Kudrle V., Jašek O.,
gamma-Fe2O3 Nanopowders Synthesized in Microwave Plasma and Extraordinarily Strong Temperature Influence on Their Mossbauer Spectra,
Journal of Nanoscience and Nanotechnology 12(12) (2012) 9277-9285

222. Mocanu V., Stoica A., Kelar L., Franta D., Buršíková V., Mikšová R., Peřina V.,
Multifunctional transparent protective coatings on polycarbonates prepared using PECVD,
Chemické listy 106 (2012) S1460-S1464

221. Schäfer J., Foest R., Reuter S., Kewitz T., Šperka J., Weltmann D.,
Laser schlieren deflectometry for temperature analysis of filamentary non-thermal atmospheric pressure plasma,
Review of Scientific Instruments 83(10) (2012) 103506

2011

220. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
Thin Solid Films 519 (2011) 2694-2697 (2× cited)

Cited in

  1. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
    Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
    Thin Solid Films 519 (2011) 4299-4308
  2. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244


219. Franta D., Nečas D., Ohlídal I.,
Anisotropy-enhanced depolarization on transparent film/substrate system,
Thin Solid Films 519 (2011) 2637-2640

218. Nečas D., Franta D., Buršíková V., Ohlídal I.,
Ellipsometric characterisation of thin films non-uniform in thickness,
Thin Solid Films 519 (2011) 2715-2717 (1× cited)

Cited in

  1. Nečas D., Ohlídal I., Franta D.,
    Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
    Journal of Optics 13 (2011) 085705


217. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
Thin Solid Films 519 (2011) 2874-2876 (1× cited)

Cited in

  1. Nečas D., Ohlídal I., Franta D.,
    Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
    Journal of Optics 13 (2011) 085705


216. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
Thin Solid Films 519 (2011) 4299-4308 (2× cited)

Cited in

  1. Cekada M., Kahn M., Pelicon P., Siketic Z., Radovic I., Waldhauser W., Paskvale S.,
    Analysis of nitrogen-doped ion-beam-deposited hydrogenated diamond-like carbon films using ERDA/RBS, TOF-ERDA and Raman spectroscopy,
    Surface and Coatings Technology 211 (2012) 72-75
  2. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
    Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
    Thin Solid Films 581 (2015) 7-13


215. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
Optical characterization of HfO2 thin films,
Thin Solid Films 519 (2011) 6085-6091 (1× cited)

Cited in

  1. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192


214. Nečas D., Ohlídal I., Franta D.,
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
Journal of Optics 13(8) (2011) 085705 (2× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
    Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
    Thin Solid Films 541 (2013) 12-16
  2. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
    Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
    Thin Solid Films 581 (2015) 7-13


213. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Majumdar A.,
Measurement of the thickness distribution and optical constants of non-uniform thin films ,
Measurement Science and Technology 22(8) (2011) 085104

212. Klapetek P., Nečas D., Campbellová A., Yacoot A., Koenders L.,
Methods for determining and processing 3D errors and uncertainties for AFM data analysis,
Measurement Science and Technology 22(2) (2011) 025501

211. Klapetek P., Valtr M., Nečas D., Salyk O., Dzik P.,
Atomic force microscopy analysis of nanoparticles in non-ideal conditions,
Nanoscale Research Letters 6 (2011) 514

210. Prášek J., Húska D., Jašek O., Zajíčková L., Trnková L., Adam V., Kizek R., Hubálek J.,
Carbon composite micro- and nano-tubes-based electrodes for detection of nucleic acids,
Nanoscale Research Letters 6 (2011) 385 (2× cited)

Cited in

  1. Prášek J., Trnková L., Gablech I., Businova P., Drbohlavova J., Chomoucka J., Adam V., Kizek R., Hubálek J.,
    Optimization of Planar Three-Electrode Systems for Redox System Detection,
    International Journal of Electrochemical Science 7 (2012) 1785-1801
  2. Businova P., Prášek J., Chomoucka J., Drbohlavova J., Pekárek J., Hrdý R., Hubálek J.,
    Proc.: Voltammetric Sensor for Direct Insulin Detection,
    26TH EUROPEAN CONFERENCE ON SOLID-STATE TRANSDUCERS, EUROSENSOR 2012 (2012) 1235-1238


209. Synek P., Jašek O., Zajíčková L., David B., Kudrle V., Pizurova N.,
Plasmachemical synthesis of maghemite nanoparticles in atmospheric pressure microwave torch,
Materials Letters 65(6) (2011) 982-984 (4× cited)

Cited in

  1. Simkiene I., Treideris M., Niaura G., Szymczak R., Aleshkevych P., Reza A., Bukauskas V., Babonas G.,
    Multifunctional iron and iron oxide nanoparticles in silica,
    Materials Chemistry and Physics 130 (2011) 1026-1032
  2. David B., Schneeweiss O., Santava E., Jašek O.,
    Magnetic Properties of gamma-Fe2O3 Nanopowder Synthesized by Atmospheric Microwave Torch Discharge,
    Acta Physica Polonica A 122 (2012) 9-11
  3. Lei P., Boies A., Calder S., Girshick S.,
    Thermal Plasma Synthesis of Superparamagnetic Iron Oxide Nanoparticles,
    Plasma Chem. Plasma Process. 32 (2012) 519-531
  4. Krystofova O., Sochor J., Zitka O., Babula P., Kudrle V., Adam V., Kizek R.,
    Effect of Magnetic Nanoparticles on Tobacco BY-2 Cell Suspension Culture,
    INT J ENV RES PUB HE 10 (2013) 47-71


208. Sobota J., Grossman J., Buršíková V., Dupak L., Vyskocil J.,
Evaluation of hardness, tribological behaviour and impact load of carbon-based hard composite coatings exposed to the influence of humidity,
Diamond and Related Materials 20(4) (2011) 596-599

207. Vasina P., Souček P., Schmidtova T., Eliáš M., Buršíková V., Jilek M., Jilek J., Schaefer J., Buršík J.,
Depth profile analyses of nc-TiC/a-C:H coating prepared by balanced magnetron sputtering,
Surface and Coatings Technology 205(2) (2011) S53-S56

206. Mikula M., Grancic B., Roch T., Plecenik T., Vavra I., Dobrocka E., Satka A., er e., Buršíková V., Drzik M., Zahoran M., Plecenik A., Kus P.,
The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiB(x) coatings,
Vacuum 85(9) (2011) 866-870

205. Sopousek J., Buršík J., Zalesak J., Buršíková V., Broz P.,
Interaction of Silver Nanopowder with Copper Substrate,
Science of Sintering 43(1) (2011) 33-38

204. Buršík J., Sopousek J., Buršíková V., Styskalik A., Skoda D.,
Characterization of Sintered Ag Nanopowder Joints using Nanoindentation Tests,
Chemické listy 105(S) (2011) S777-S778

203. Buršíková V., Bláhová O., Karásková M., Zajíčková L., Jašek O., Franta D., Klapetek P., Buršík J.,
Mechanical properties of ultrananocrystalline thin films deposited using dual frequency discharges,
Chemické listy 105(2, SI) (2011) S98-S101

202. Buršíková V., Kučerová Z., Zajíčková L., Jašek O., Kudrle V., Matějková J., Synek P.,
MEASUREMENT OF MECHANICAL PROPERTIES OF COMPOSITE MATERIALS,
Chemické listy 105(2) (2011) S171-S174

2010

201. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
Diamond and Related Materials 19 (2010) 114–122 (9× cited)

Cited in

  1. Wang Y., Xia M., Zou B., Wang T., Han W., Zhou S.,
    Current-Voltage Characteristics of in Situ Graphitization of Hydrocarbon Coated on ZnSe Nanowire,
    Journal of Physical Chemistry C 114 (2010) 12839–12849
  2. Franta D., Nečas D., Ohlídal I.,
    Anisotropy-enhanced depolarization on transparent film/substrate system,
    Thin Solid Films 519 (2011) 2637-2640
  3. Fyta M., Mathioudakis C., Remediakis I., Kelires P.,
    Carbon-based nanostructured composite films: Elastic, mechanical and optoelectronic properties derived from computer simulations,
    Surface and Coatings Technology 206 (2011) 696-702
  4. Chen J., Louis E., Wormeester H., Harmsen R., van de Kruijs R., Lee C., van Schaik W., Bijkerk F.,
    Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry,
    Measurement Science and Technology 22 (2011) 105705
  5. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697
  6. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697
  7. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
    Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
    Thin Solid Films 519 (2011) 4299-4308
  8. Bereznai M., Budai J., Hanyecz I., Kopniczky ., Veres ., Koós M., Toth Z.,
    Ellipsometric study of nanostructured carbon films deposited by pulsed laser deposition,
    Thin Solid Films 519 (2011) 2989-2993
  9. Muresan M., Zajíčková L., Buršíková V., Franta D., Nečas D.,
    Proc.: Preparation and Characterization of DLC:N Films,
    NANOCON 2010, 2ND INTERNATIONAL CONFERENCE (2010) 434-440


200. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
Journal of Physics D 43 (2010) 225403 (7× cited)

Cited in

  1. Schäfer J., Horn S., Rüdiger F., Brandemburg R., Vasina P., Weltmann K.,
    Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge,
    Surface and Coatings Technology 205 (2011) S330-S334
  2. Fanelli F., d'Agostino R., Fracassi F.,
    GC-MS Investigation of Hexamethyldisiloxane-Oxygen Fed Cold Plasmas: Low Pressure Versus Atmospheric Pressure Operation,
    Plasma Processes and Polymers 8 (2011) 932-941
  3. Lin Y., Wu S., Tsai T.,
    High-Rate Deposition of Electrochromic Organotungsten Oxide Thin Films for Flexible Electrochromic Devices by Atmospheric Pressure Plasma Jet: The Effect of Substrate Distance,
    Plasma Processes and Polymers 8 (2011) 728-739
  4. Petersen J., Bardon J., Dinia A., Ruch D., Gherardi N.,
    Organosilicon Coatings Deposited in Atmospheric Pressure Townsend Discharge for Gas Barrier Purpose: Effect of Substrate Temperature on Structure and Properties,
    ACS Applied Materials & Interfaces 4 (2012) 5872-5882
  5. Schaefer J., Foest R., Sigeneger F., Loffhagen D., Weltmann K., Martens U., Hippler R.,
    Study of thin Film Formation From Silicon-Containing Precursors Produced by an RF Non-Thermal Plasma Jet at Atmospheric Pressure,
    Contribution to Plasma Physics 52 (2012) 872-880

  6. Tailoring the mechanical properties of SiOxHyCz films deposited by atmospheric pressure microwave plasma torch with a Rechtschaffner design of experiments: A pragmatic statistical approach,
    Computational Materials Science 60 (2012) 32-43
  7. Reuter R., Ruegner K., Ellerweg D., de los Arcos T., von Keudell A., Benedikt J.,
    The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure,
    Plasma Processes and Polymers 9 (2012) 1116-1124


199. Zajíčková L., Jašek O., Eliáš M., Synek P., Lazar L., Schneeweiss O., Hanzlíková R.,
Synthesis of carbon nanotubes by plasma- enhanced chemical vapor deposition in an atmospheric-pressure microwave torch,
Pure and Applied Chemistry 82 (2010) 1259–1272 (2× cited)

Cited in

  1. Prášek J., Húska D., Jašek O., Zajíčková L., Trnková L., Adam V., Kizek R., Hubálek J.,
    Carbon composite micro- and nano-tubes-based electrodes for detection of nucleic acids,
    Nanoscale Research Letters 6 (2011) 385
  2. Synek P., Jašek O., Zajíčková L., David B., Kudrle V., Pizurova N.,
    Plasmachemical synthesis of maghemite nanoparticles in atmospheric pressure microwave torch,
    Materials Letters 65 (2011) 982-984


198. Karásková M., Zajíčková L., Buršíková V., Franta D., Nečas D., Bláhová O., Šperka J.,
Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges,
Surface and Coatings Technology 204 (2010) 1997–2001 (1× cited)

Cited in

  1. Hess P.,
    The mechanical properties of various chemical vapor deposition diamond structures compared to the ideal single crystal,
    Journal of Applied Physics 111 (2012) 15


197. Klapetek P., Valtr M., Poruba A., Nečas D., Ohlídal M.,
Rough surface scattering simulations using graphics cards,
Applied Surface Science 256(18) (2010) 5640-5643

196. Jašek O., Synek P., Zajíčková L., Eliáš M., Kudrle V.,
Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure,
Journal Of Electrical Engineering 61(5) (2010) 311-313 (1× cited)

Cited in

  1. Peng F., Luo T., Qiu L., Yuan Y.,
    Influence of the crystallinity of the iron catalysts on the formation of carbon nanotubes,
    Materials Research Bulletin 46 (2011) 884-887


195. Dvořák P., Vasina P., Buršíková V., Zemlicka R.,
Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage,
Plasma Phys. Control. Fusion 52(12, Part 2) (2010) 124011-124022

194. Campbellová A., Klapetek P., Buršíková V., Valtr M., Buršík J.,
Small-load nanoindentation experiments on metals,
Surface and Interface Analysis 42(6-7, SI) (2010) 766-769

2009

193. Zajíčková L., Synek P., Jašek O., Eliáš M., David B., Buršík J., Pizurova N., Hanzlíková R., Lazar L.,
Synthesis of Carbon Nanotubes and Iron Oxide Nanoparticles in MW Plasma Torch with Fe(CO)5 in Gas Feed,
Applied Surface Science 255 (2009) 5421–5424 (5× cited)

Cited in

  1. Saremi-Yarahmadi S., Vaidhyanathan B., Wijayantha K.,
    Microwave-assisted low temperature fabrication of nanostructured alpha-Fe2O3 electrodes for solar-driven hydrogen generation,
    International Journal of Hydrogen Energy 35 (2010) 10155-10165
  2. Marshall C., Marshall A.,
    Hematite and carbonaceous materials in geological samples: A cautionary tale,
    Spectrochimica Acta Part A 80 (2011) 133-137
  3. David B., Pizurova N., Schneeweiss O., Kudrle V., Jašek O., Synek P.,
    Iron-Based Nanopowders Containing alpha-Fe, Fe(3)C, and gamma-Fe Particles Synthesised in Microwave Torch Plasma and Investigated with Mossbauer Spectroscopy,
    Japanese Journal of Applied Physics 50 (2011) 000
  4. Synek P., Jašek O., Zajíčková L., David B., Kudrle V., Pizurova N.,
    Plasmachemical synthesis of maghemite nanoparticles in atmospheric pressure microwave torch,
    Materials Letters 65 (2011) 982-984
  5. Lei P., Boies A., Calder S., Girshick S.,
    Thermal Plasma Synthesis of Superparamagnetic Iron Oxide Nanoparticles,
    Plasma Chem. Plasma Process. 32 (2012) 519-531


192. Ohlídal I., Nečas D., Franta D., Buršíková V.,
Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
Diamond and Related Materials 18 (2009) 364–367 (5× cited)

Cited in

  1. Nečas D., Franta D., Buršíková V., Ohlídal I.,
    Ellipsometric characterisation of thin films non-uniform in thickness,
    Thin Solid Films 519 (2011) 2715-2717
  2. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
    Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
    Thin Solid Films 519 (2011) 2874-2876
  3. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091
  4. Bakradze G., Jeurgens L., Mittemeijer E.,
    The different initial oxidation kinetics of Zr(0001) and Zr(101̅0) surfaces,
    Journal of Applied Physics 110 (2011) 024904
  5. Nečas D., Ohlídal I., Franta D.,
    Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
    Journal of Optics 13 (2011) 085705


191. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Buršíková V.,
Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
Diamond and Related Materials 18 (2009) 384–387

190. Franta D., Nečas D., Zajíčková L., Buršíková V.,
Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
Diamond and Related Materials 18 (2009) 413–418 (4× cited)

Cited in

  1. Malekfar R., Motahari H., Rohollahnejad J., Sahraiyan F.,
    Raman, Dielectric and Optical Investigations of DLC Thin Films,
    Surface Review and Letters 16 (2009) 731–736
  2. Chen J., Louis E., Wormeester H., Harmsen R., van de Kruijs R., Lee C., van Schaik W., Bijkerk F.,
    Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry,
    Measurement Science and Technology 22 (2011) 105705
  3. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697
  4. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
    Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
    Thin Solid Films 519 (2011) 4299-4308


189. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898 (1× cited)

Cited in

  1. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192


188. Nečas D., Ohlídal I., Franta D.,
The reflectance of non-uniform thin films,
Journal of Optics A: Pure and Applied Optics 11 (2009) 045202 (6× cited)

Cited in

  1. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  2. Nečas D., Franta D., Buršíková V., Ohlídal I.,
    Ellipsometric characterisation of thin films non-uniform in thickness,
    Thin Solid Films 519 (2011) 2715-2717
  3. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
    Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
    Thin Solid Films 519 (2011) 2874-2876
  4. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091
  5. Nečas D., Ohlídal I., Franta D.,
    Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
    Journal of Optics 13 (2011) 085705
  6. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
    Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
    Thin Solid Films 541 (2013) 12-16


187. Kučerová Z., Zajíčková L., Buršíková V., Kudrle V., Eliáš M., Jašek O., Synek P., Matějková J., Buršík J.,
Mechanical and Microwave Absorbing Properties of Carbon-Filled Polyurethane,
Micron 40 (2009) 70–73 (7× cited)

Cited in

  1. Zajíčková L., Kučerová Z., Buršíková V., Eliáš M., Houdková J., Synek P., Maršíková H., Jašek O.,
    Carbon Nanotubes Functionalized in Oxygen and Water Low Pressure Discharges used as Reinforcement of Polyurethane Composites,
    Plasma Processes and Polymers 6 (2009) S864–S869
  2. Raschip I., Moldovan L., Stefan L., Oancea A., Vasile C.,
    Compatibility and cytotoxicity testing of some new biomaterials based on polyurethane and hydroxypropylcellulose blends,
    Optoelectronics and Advanced Materials - Rapid Communications 3 (2009) 1336-1342
  3. Lv Z., Zhang L., Yang Y., Bi X.,
    Preparation and properties of polyurethane/zeolite 13X composites,
    Materials & Design 32 (2011) 3624-3628
  4. Buyukakinci B., Sokmen N., Kucuk H.,
    THERMAL CONDUCTIVITY AND ACOUSTIC PROPERTIES OF NATURAL FIBER MIXED POLYURETHANE COMPOSITES,
    Tekstil ve Konfeksiyon 21 (2011) 124-132
  5. Celebi S., Kucuk H.,
    Acoustic Properties of Tea-Leaf Fiber Mixed Polyurethane Composites,
    Ceramics International 31 (2012) 241-255
  6. Ekici B., Kentli A., Kucuk H.,
    Improving Sound Absorption Property of Polyurethane Foams by Adding Tea-Leaf Fibers,
    Applied Thermal Engineering 37 (2012) 515-520
  7. Zhang L., Shi C., Rhee K., Zhao N.,
    Properties of Co0.5Ni0 5Fe2O4/carbon nanotubes/polyimide nanocomposites for microwave absorption,
    Colloids and Surfaces A 43 (2012) 2241-2248


186. Zajíčková L., Kučerová Z., Buršíková V., Eliáš M., Houdková J., Synek P., Maršíková H., Jašek O.,
Carbon Nanotubes Functionalized in Oxygen and Water Low Pressure Discharges used as Reinforcement of Polyurethane Composites,
Plasma Processes and Polymers 6 (2009) S864–S869 (1× cited)

Cited in

  1. Galakhov V., Buling A., Neumann M., Ovechkina N., Shkvarin A., Semenova A., Uimin M., Yermakov A., Kurmaev E., Vilkov O., Boukhvalov D.,
    Carbon States in Carbon-Encapsulated Nickel Nanoparticles Studied by Means of X-ray Absorption, Emission, and Photoelectron Spectroscopies,
    Journal of Physical Chemistry C 115 (2011) 24615-24620


185. Kolmacka M., Kadlečíková M., Breza J., Lazist\'an F., Zajíčková L., Eliáš M., Jesenak K., Pastorkova K.,
Wireless temperature measurement in the hot filament CVD reactor for deposition of carbon nanotubes,
Journal Of Electrical Engineering 60(6) (2009) 346-349

184. Hartmanova M., Lomonova E., Kubel F., Schneider J., Buršíková V., Jergel M., Navrátil V., Kundracik F.,
Relationship between effective ionic radii, structure and electro-mechanical properties of zirconia stabilized with rare earth oxides M(2)O(3) (M = Yb, Y, Sm),
Journal of Materials Science 44(1) (2009) 234-243

183. Hazdra P., Komarnitskyy V., Buršíková V.,
Hydrogenation of platinum introduced in silicon by radiation enhanced diffusion,
Materials Science and Engineering B 159-60(466BM) (2009) 342-345

2008

182. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
Optical characterization of ultrananocrystalline diamond films,
Diamond and Related Materials 17 (2008) 1278–1282 (11× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  2. Karásková M., Zajíčková L., Buršíková V., Franta D., Nečas D., Bláhová O., Šperka J.,
    Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges,
    Surface and Coatings Technology 204 (2010) 1997–2001
  3. Gao Z., Carabelli V., Carbone E., Colombo E., Demaria F., Dipalo M., Gosso S., Manfredotti C., Pasquarelli A., Rossi S., Xu Y., Vittone E., Kohn E.,
    Transparent diamond microelectrodes for biochemical application,
    Diamond and Related Materials 19 (2010) 1021–1026
  4. Atefi H., Ghoranneviss M., Khalaj Z., Diudea M.,
    EFFECT OF DIFFERENT SUBSTRATE TEMPERATURE ON GROWTH OF NANO CRYSTALLINE DIAMOND BY HFCVD TECHNINQUE,
    Spectrochimica Acta Part B 56 (2011) 133-140
  5. Atefi H., Ghoranneviss M., Khalaj Z., Diudea M.,
    EFFECT OF DIFFRENT SUBSTRATE TEMPERATURE ON GROWTH OF NANO CRYSTALLINE DIAMOND BY HFCVD TECHNINQUE,
    Spectrochimica Acta Part B 56 (2011) 171-178
  6. Khalaj Z., Ghoranneviss M., Nasirilaheghi S., Ghorannevis Z., Hatakeyama R.,
    Growth of Nano Crystalline Diamond on Silicon Substrate Using Different Etching Gases by HFCVD,
    Chinese Journal of Chemical Physics 23 (2011) 689-692
  7. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091
  8. Lohner T., Csíkvári P., Khánh N., Dávid S., Horváth Z., Petrik ., Hárs G.,
    Spectroellipsometric and ion beam analytical investigation of nanocrystalline diamond layers ,
    Thin Solid Films 519 (2011) 2806-2810
  9. Li D., Zhou X., Zuo D., Zou A.,
    Deposition of Nano-Crystalline Diamond Films of Spherical Shell,
    Journal of Cultural Heritage 9 (2012) 1511-1514
  10. Hsiao Y., Fang T., Ji L., Lee Y., Dai B.,
    Nanodiamonds Embedded in P3HT:PCBM for Enhancing Efficiency and Reliability of Hybrid Photovoltaics,
    e-Journal of Surface Science and Nanotechnology 15 (2012) K27-K30
  11. Hsiao Y., Fang T., Ji L., Lee Y., Dai B.,
    Size effect of nanodiamonds on P3HT:PCBM heterojunction solar cells,
    e-Journal of Surface Science and Nanotechnology 18 (2012) 4-7


181. Franta D., Buršíková V., Nečas D., Zajíčková L.,
Modeling of optical constants of diamond-like carbon,
Diamond and Related Materials 17 (2008) 705–708 (9× cited)

Cited in

  1. Kalin M., Velkavrh I., Vižintin J., Ožbolt L.,
    Review of boundary lubrication mechanisms of DLC coatings used in mechanical applications,
    Meccanica 43 (2008) 623–637
  2. Stamm B., Kuezuen B., Filipov O., Reuter S., Erdmann I., Deuerler F., Krix D., Huba K., Nienhaus H., Buck V.,
    Adjustment of wear particle size distribution of DLC coatings for tribological metal-on-metal pairing in artificial hip joints,
    Materialwissenschaft und Werkstofftechnik 40 (2009) 98–100
  3. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  4. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  5. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62
  6. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  7. Patsalas P.,
    Optical properties of amorphous carbons and their applications and perspectives in photonics,
    Thin Solid Films 519 (2011) 3990-3996
  8. Panagiotopoulos N., Karras G., Lidorikis E., Koutsogeorgis D., Kosmidis C., Patsalas P.,
    Photosensitivity and optical performance of hydrogenated amorphous carbon films processed by picosecond laser beams,
    Surface and Coatings Technology 206 (2011) 734-741
  9. Franta D., Nečas D., Frumar M.,
    Proc.: Modeling of dielectric response of Ge(x)Sb(y)Te(z) (GST) materials,
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 1 (2009) S59-S62


180. Ohlídal I., Nečas D., Buršíková V., Franta D., Ohlídal M.,
Optical characterization of diamond-like carbon thin films non-uniform in thickness using spectroscopic reflectometry,
Diamond and Related Materials 17 (2008) 709–712 (1× cited)

Cited in

  1. Said R., Ali N., Ghumman C., Teodoro O., Ahmed W.,
    Characterisation of DLC Films Deposited Using Titanium Isopropoxide (TIPOT) at Different Flow Rates,
    Journal of Nanoscience and Nanotechnology 9 (2009) 4298–4304


179. Lazar L., Synek P., Karásková M., Eliáš M., Jašek O., Kelar L., Konupčík P., Zajíčková L.,
Comparison of Various Plasmachemical Processes with Respect to the Gas Temperature,
Chemické listy 102 (2008) 1158–1161

178. Valtr M., Klapetek P., Buršíková V., Ohlídal I., Franta D.,
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge,
Chemické listy 102 (2008) s1529–s1532

177. Ohlídal I., Nečas D.,
Influence of shadowing on ellipsometric quantities of randomly rough surfaces and thin films,
Journal of Modern Optics 55 (2008) 1077–1099

176. Brzobohatý O., Buršíková V., Nečas D., Valtr M., Trunec D.,
Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation,
Journal of Physics D 41 (2008) 035213

175. Franta D., Ohlídal I., Nečas D.,
Influence of cross-correlation effects on the optical quantities of rough films,
Optics Express 16 (2008) 7789–7803 (6× cited)

Cited in

  1. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  2. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091
  3. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
    Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
    Thin Solid Films 541 (2013) 12-16
  4. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244
  5. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192
  6. Vižďa F., Ohlídal I., Hrubý V.,
    Proc.: Influence of Cross-Correlation of Rough Boundaries on Reflectance of Thin Films on GaAs and Si Substrates,
    Physics of Semiconductors (2009) 19-20


174. Sťahel P., Buršíková V., Buršík J., Čech J., Janča J., Cernak M.,
Hydrophylisation of non-woven polypropylene textiles using atmospheric pressure surface barrier discharge,
Journal of Optoelectronics and Advanced Materials 10(1) (2008) 213-218

173. Šíra M., Trunec D., Sťahel P., Buršíková V., Navrátil Z.,
Surface modification of polycarbonate in homogeneous atmospheric pressure discharge,
Journal of Physics D 41(1) (2008) 015205

172. Hartmanova M., Kubel F., Buršíková V., Lomonova E., Holgado J., Navrátil V., Navrátil K., Kundracik F.,
Phase composition-dependent physical and mechanical properties of YbxZr1-xO2-x/2 solid solutions,
Journal of Physics and Chemistry of Solids 69(4) (2008) 805-814

171. Buršíková V., Sobota J., Fort T., Grossman J., Stoica A., Buršík J., Klapetek P., Peřina V.,
Optimisation of mechanical properties of plasma deposited graded multilayer diamond-like carbon coatings,
Journal of Optoelectronics and Advanced Materials 10(12) (2008) 3229-3232

2007

170. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
Diamond and Related Materials 16 (2007) 1331–1335 (6× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  2. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  3. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  4. Zou Y., Wu Y., Huang R., Sun C., Wen L.,
    Mechanical properties and thermal stability of nitrogen incorporated diamond-like carbon films,
    Vacuum 83 (2009) 1406–1410
  5. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  6. Er K., So M.,
    Thermal annealing behavior of Si-doped diamond like-carbon films deposited by reactive sputtering,
    Journal of Ceramic Processing Research 11 (2010) 760-764


169. Zajíčková L., Buršíková V., Kučerová Z., Franclová J., Sťahel P., Peřina V., Macková A.,
Organosilicon Thin Films Deposited by Plasma Enhanced CVD: Thermal Changes of Chemical Structure and Mechanical Properties,
Journal of Physics and Chemistry of Solids 68 (2007) 1255–1259 (13× cited)

Cited in

  1. Sentek J., Rzanek-Boroch Z., Brykala M., Schmidt-Szalowski K.,
    DEPOSITION OF GAS - TIGHT COATINGS ON PLASTIC FILMS BY PULSED DIELECTRIC-BARRIER DISCHARGES,
    Chemické listy 102 (2008) S1502-S1505
  2. Morent R., De Geyter N., Van Vlierberghe S., Dubruel P., Leys C., Gengembre L., Schacht E., Payen E.,
    Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge,
    Progress in organic coatings 64 (2009) 304-310
  3. Morent R., De Geyter N., Van Vlierberghe S., Dubruel P., Leys C., Schacht E.,
    Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure,
    Surface and Coatings Technology 203 (2009) 1366-1372
  4. Morent R., De Geyter N., Jacobs T., Van Vlierberghe S., ra r., Dubruel P., Leys C., Schacht E.,
    Plasma-Polymerization of HMDSO Using an Atmospheric Pressure Dielectric Barrier Discharge,
    Plasma Processes and Polymers 6 (2009) S537-S542
  5. Shearer J., Fisher M., Hoogeland D., Fisher E.,
    Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition,
    Applied Surface Science 256 (2010) 2081–2091
  6. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
    Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
    Journal of Physics D 43 (2010) 225403
  7. Fukaya Y., Yanase T., Kubota Y., Imai S., Matsumoto T., Kobayashi H.,
    Low temperature fabrication of 5-10 nm SiO2/Si structure using advanced nitric acid oxidation of silicon (NAOS) method,
    Applied Surface Science 256 (2010) 5610-5613
  8. Kobayashi H., Imamura K., Kim W., Im S., Asuha A.,
    Nitric acid oxidation of Si (NAOS) method for low temperature fabrication of SiO2/Si and SiO2/SiC structures,
    Applied Surface Science 256 (2010) 5744-5756
  9. Imamura K., Takahashi M., Asuha A., Hirayama Y., Imai S., Kobayashi H.,
    Nitric acid oxidation of Si method at 120 degrees C: HNO3 concentration dependence,
    Journal of Applied Physics 107 (2010) 54503
  10. Sentek J., Rzanek-Boroch Z., Brykala M., Schmidt-Szalowski K.,
    Organo-silicon coating deposition on polyethylene films by pulsed dielectric-barrier discharges,
    Polimeri 55 (2010) 127-134
  11. Lasorsa C., Perillo P., Morando P.,
    Protective SixOyCz coatings on steel prepared by plasma activated chemical vapour deposition,
    Surface and Coatings Technology 204 (2010) 2813-2816
  12. Wen B., Liu T.,
    Flexible-characteristics inspection system for flexible substrates by using image feedback control,
    Diamond and Related Materials 32 (2011) 296-307
  13. Zbib M., Norton M., Bahr D.,
    Effect of solute hydrogen on toughness of feedstock polycrystalline silicon for solar cell applications,
    Small 67 (2012) 756-759


168. Jašek O., Eliáš M., Zajíčková L., Kučerová Z., Matějková J., Rek A., Buršík J.,
Discussion of Important Factors in Deposition of Carbon Nanotubes by Atmospheric Pressure Microwave Plasma Torch,
Journal of Physics and Chemistry of Solids 68 (2007) 738–743 (6× cited)

Cited in

  1. Patil K., Solanki C.,
    Aspect ratio evaluation of carbon nanotubes grown on calcium carbonate substrate for different temperatures and precursor flow times,
    Journal of Nano Research 4 (2008) 127-133
  2. Zajíčková L., Synek P., Jašek O., Eliáš M., David B., Buršík J., Pizurova N., Hanzlíková R., Lazar L.,
    Synthesis of carbon nanotubes and iron oxide nanoparticles in MW plasma torch with Fe(CO)(5) in gas feed,
    Applied Surface Science 255 (2009) 5421-5424
  3. Zajíčková L., Jašek O., Eliáš M., Synek P., Lazar L., Schneeweiss O., Hanzlíková R.,
    Synthesis of carbon nanotubes by plasma- enhanced chemical vapor deposition in an atmospheric-pressure microwave torch,
    Pure and Applied Chemistry 82 (2010) 1259–1272
  4. Belmonte T., Arnoult G., Henrion G., Gries T.,
    Nanoscience with non-equilibrium plasmas at atmospheric pressure,
    Journal of Physics D 44 (2011) 333
  5. Zajíčková L., Jašek O., Synek P., Eliáš M., Kudrle V., Kadlečíková M., Breza J., Hanzlíková R.,
    Proc.: SYNTHESIS OF CARBON NANOTUBES IN MW PLASMA TORCH WITH DIFFERENT METHODS OF CATALYST LAYER PREPARATION AND THEIR APPLICATIONS,
    NANOCON 2009, CONFERENCE PROCEEDINGS (2009) 149-155
  6. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,
    Proc.: Mossbauer Effect Study of Iron Thin Films on Si/SiO(x) Substrate and Iron Phases at Deposited Carbon Nanotubes,
    MOSSBAUER SPECTROSCOPY IN MATERIALS SCIENCE - 2010 (2010) 90-95


167. Klapetek P., Ohlídal I., Buršík J.,
Atomic force microscopy studies of cross-sections of columnar thin films,
Measurement Science and Technology 18 (2007) 528–531

166. Franta D., Nečas D., Zajíčková L.,
Models of dielectric response in disordered solids,
Optics Express 15 (2007) 16230–16244 (30× cited)

Cited in

  1. Eliáš M., Souček P., Vasina P.,
    INFLUENCE OF N-2 AND CH4 ON DEPOSITON RATE OF BORON BASED THIN FILMS PREPARED BY MAGNETRON SPUTTERING,
    Chemické listy 102 (2008) S1506-S1509
  2. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
    Optical characterization of ultrananocrystalline diamond films,
    Diamond and Related Materials 17 (2008) 1278–1282
  3. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Buršíková V.,
    Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
    Diamond and Related Materials 18 (2009) 384–387
  4. Ohlídal I., Nečas D., Franta D., Buršíková V.,
    Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
    Diamond and Related Materials 18 (2009) 364–367
  5. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  6. Malainho E., Vasilevskiy M., Alpuim P., Filonovich S.,
    Dielectric function of hydrogenated amorphous silicon near the optical absorption edge,
    Journal of Applied Physics 106 (2009) 073110
  7. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  8. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62
  9. Nečas D., Ohlídal I., Franta D.,
    The reflectance of non-uniform thin films,
    Journal of Optics A: Pure and Applied Optics 11 (2009) 045202
  10. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  11. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
    Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
    Journal of Physics D 43 (2010) 225403
  12. Karásková M., Zajíčková L., Buršíková V., Franta D., Nečas D., Bláhová O., Šperka J.,
    Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges,
    Surface and Coatings Technology 204 (2010) 1997–2001
  13. Ding Q., Wang L., Hu L., Hu T., Wang ., Zhang .,
    An explanation for laser-induced spallation effect in a-C:H films: Altered phase evolution route caused by hydrogen doping,
    Journal of Applied Physics 109 (2011) 013501
  14. Franta D., Nečas D., Ohlídal I.,
    Anisotropy-enhanced depolarization on transparent film/substrate system,
    Thin Solid Films 519 (2011) 2637-2640
  15. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697
  16. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
    Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
    Thin Solid Films 519 (2011) 4299-4308
  17. Siraj K., Khaleeq-ur-Rahman M., Rafique M., Nawaz .,
    Effect of 4 MeV electron beam irradiation on carbon films,
    Nuclear Instruments and Methods in Physics Research Section B 269 (2011) 53-56
  18. Nečas D., Franta D., Buršíková V., Ohlídal I.,
    Ellipsometric characterisation of thin films non-uniform in thickness,
    Thin Solid Films 519 (2011) 2715-2717
  19. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Majumdar A.,
    Measurement of the thickness distribution and optical constants of non-uniform thin films ,
    Measurement Science and Technology 22 (2011) 085104
  20. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
    Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
    Thin Solid Films 519 (2011) 2874-2876
  21. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091
  22. Torrell M., Kabir R., Cunha L., Vasilevskiy M., Vaz F., Cavaleiro A., Alves E., Barradas N.,
    Tuning of the surface plasmon resonance in TiO2/Au thin films grown by magnetron sputtering: The effect of thermal annealing,
    Journal of Applied Physics 109 (2011) 074310
  23. Nečas D., Ohlídal I., Franta D.,
    Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
    Journal of Optics 13 (2011) 085705
  24. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244
  25. Franta D., Nečas D., Zajíčková L.,
    Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
    Thin Solid Films 534 (2013) 432-441
  26. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192
  27. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
    Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
    Thin Solid Films 581 (2015) 7-13
  28. Franta D., Nečas D., Frumar M.,
    Proc.: Modeling of dielectric response of Ge(x)Sb(y)Te(z) (GST) materials,
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 1 (2009) S59-S62
  29. Ohlídal M., Ohlídal I., Klapetek P., Nečas D.,
    Proc.: PRECISE MEASUREMENT OF THICKNESS DISTRIBUTION OF NONUNIFORM THIN FILMS BY IMAGING SPECTROSCOPIC REFLECTOMETRY,
    XIX IMEKO WORLD CONGRESS: FUNDAMENTAL AND APPLIED METROLOGY, PROCEEDINGS (2009) 100-105
  30. Muresan M., Zajíčková L., Buršíková V., Franta D., Nečas D.,
    Proc.: Preparation and Characterization of DLC:N Films,
    NANOCON 2010, 2ND INTERNATIONAL CONFERENCE (2010) 434-440


165. Zajíčková L., Eliáš M., Jašek O., Kučerová Z., Synek P., Matějková J., Kadlečíková M., Klementová M., Buršík J., Vojačková A.,
Characterization of Carbon Nanotubes Deposited in Microwave Torch at Atmospheric Pressure,
Plasma Processes and Polymers 4 (2007) S245–S249 (7× cited)

Cited in

  1. Jašek O., Eliáš M., Zajíčková L., Kučerová Z., Matějková J., Rek A., Buršík J.,
    Discussion of Important Factors in Deposition of Carbon Nanotubes by Atmospheric Pressure Microwave Plasma Torch,
    Journal of Physics and Chemistry of Solids 68 (2007) 738–743
  2. Zajíčková L., Synek P., Jašek O., Eliáš M., David B., Buršík J., Pizurova N., Hanzlíková R., Lazar L.,
    Synthesis of carbon nanotubes and iron oxide nanoparticles in MW plasma torch with Fe(CO)(5) in gas feed,
    Applied Surface Science 255 (2009) 5421-5424
  3. Zajíčková L., Jašek O., Eliáš M., Synek P., Lazar L., Schneeweiss O., Hanzlíková R.,
    Synthesis of carbon nanotubes by plasma- enhanced chemical vapor deposition in an atmospheric-pressure microwave torch,
    Pure and Applied Chemistry 82 (2010) 1259–1272
  4. Passoni M., Russo V., Dellasega D., Causa F., Ghezzi F., Wolverson D., Bottani C.,
    Raman spectroscopy of nonstacked graphene flakes produced by plasma microjet deposition,
    Journal of Polymer Science B 43 (2012) 884-888
  5. Zhang X., Liu Z.,
    Recent advances in microwave initiated synthesis of nanocarbon materials,
    Nanoscale Research Letters 4 (2012) 707-714
  6. Zajíčková L., Jašek O., Synek P., Eliáš M., Kudrle V., Kadlečíková M., Breza J., Hanzlíková R.,
    Proc.: SYNTHESIS OF CARBON NANOTUBES IN MW PLASMA TORCH WITH DIFFERENT METHODS OF CATALYST LAYER PREPARATION AND THEIR APPLICATIONS,
    NANOCON 2009, CONFERENCE PROCEEDINGS (2009) 149-155
  7. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,
    Proc.: Mossbauer Effect Study of Iron Thin Films on Si/SiO(x) Substrate and Iron Phases at Deposited Carbon Nanotubes,
    MOSSBAUER SPECTROSCOPY IN MATERIALS SCIENCE - 2010 (2010) 90-95


164. Zajíčková L., Buršíková V., Franta D., Bousquet A., Granier A., Goullet A., Buršík J.,
Comparative study of films deposited from HMDSO/O2 in continuous wave and pulsed rf discharges,
Plasma Processes and Polymers 4 (2007) S287–S293 (3× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  2. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
    Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
    Journal of Physics D 43 (2010) 225403
  3. Lin T., Lee C.,
    Organosilicon function of gas barrier films purely deposited by inductively coupled plasma chemical vapor deposition system,
    Journal of Alloys and Compounds 542 (2012) 11-16


163. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
Deposition of protective coatings in RF organosilicon discharges,
Plasma Sources Science and Technology 16 (2007) S123–S132 (20× cited)

Cited in

  1. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  2. Mandlik P., Gartside J., Han L., Cheng I., Wagner S., Silvernail J., Ma R., Hack M., Brown J.,
    A single-layer permeation barrier for organic light-emitting displays,
    Applied Physics Letters 92 (2008) 103309
  3. Brzobohatý O., Buršíková V., Nečas D., Valtr M., Trunec D.,
    Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation,
    Journal of Physics D 41 (2008) 035213
  4. Saloum S., Akel M., Alkhaled B.,
    Effect of electron energy probability function on plasma CVD/modification in a 13.56 MHz hollow cathode discharge,
    Journal of Physics D 42 (2009) 085201
  5. Morent R., De Geyter N., Van Vlierberghe S., Dubruel P., Leys C., Schacht E.,
    Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure,
    Surface and Coatings Technology 203 (2009) 1366-1372
  6. Dai X., Church J., Huson M.,
    Pulsed Plasma Polymerization of Hexamethyldisiloxane onto Wool: Control of Moisture Vapor Transmission Rate and Surface Adhesion,
    Plasma Processes and Polymers 6 (2009) 139–147
  7. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  8. Shearer J., Fisher M., Hoogeland D., Fisher E.,
    Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition,
    Applied Surface Science 256 (2010) 2081–2091
  9. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
    Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
    Journal of Physics D 43 (2010) 225403
  10. Saloum S., Alkhaled B.,
    Growth Rate and Sensing Properties of Plasma Deposited Silicon Organic Thin Films from Hexamethyldisilazane Compound,
    Acta Physica Polonica A 117 (2010) 484–489
  11. Zhang Y., Arfsten J., Pihan S., Kaule T., Foerch R., Berger R.,
    Interface roughness of plasma deposited polymer layers,
    Journal of Colloid and Interface Science 351 (2010) 532-536
  12. Choudhury A., Chutia J., Kakati H., Barve S., Pal A., Sen Sarma N., Chowdhury D., Patil D.,
    Studies of radiofrequency plasma deposition of hexamethyldisiloxane films and their thermal stability and corrosion resistance behavior,
    Vacuum 84 (2010) 1327–1333
  13. Palaskar S., Kale K., Nadiger G., Desai A.,
    Dielectric Barrier Discharge Plasma Induced Surface Modification of Polyester/Cotton Blended Fabrics to Impart Water Repellency Using HMDSO,
    Journal of Applied Polymer Science 122 (2011) 1092-1100
  14. Choudhury A., Barve S., Chutia J., Kakati H., Pal A., Jagannath J., Mithal N., Kishore R., Pandey M., Patil D.,
    Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process,
    Thin Solid Films 519 (2011) 7864-7870
  15. De Geyter N., Morent R., Van Vlierberghe S., Dubruel P., Leys C., Schacht E.,
    Plasma polymerisation of siloxanes at atmospheric pressure,
    Surface Engineering 27 (2011) 627-633
  16. Choudhury A., Barve S., Chutia J., Pal A., Kishore R., Jagannath J., Pande M., Patil D.,
    RF-PACVD of water repellent and protective HMDSO coatings on bell metal surfaces: Correlation between discharge parameters and film properties,
    Applied Surface Science 257 (2011) 8469-8477
  17. Zhou L., Lv G., Pang H., Zhang G., Yang S.,
    Comparing deposition of organic and inorganic siloxane films by the atmospheric pressure glow discharge,
    Surface and Coatings Technology 206 (2012) 2552-2557
  18. Schaefer J., Foest R., Sigeneger F., Loffhagen D., Weltmann K., Martens U., Hippler R.,
    Study of thin Film Formation From Silicon-Containing Precursors Produced by an RF Non-Thermal Plasma Jet at Atmospheric Pressure,
    Contribution to Plasma Physics 52 (2012) 872-880
  19. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
    Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
    Thin Solid Films 581 (2015) 7-13
  20. Zajíčková L., Kučerová Z., Franta D., Buršíková V., Peřina V., Macková A.,
    Proc.: Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane,
    Proceedings of Organic/Inorganic Hybrid Materials, MRS (2008) 159-164


162. Vladoiu R., Lungu C., Mustata I., Buršíková V., Buršík J.,
Characterization by nanoindentation and Scanning Electron Microscopy of the spin valves structures prepared by Thermionic Vacuum Arc (TVA) method,
Journal of Optoelectronics and Advanced Materials 9(4) (2007) 1087-1090

161. Vladoiu R., Ciupina V., Surdu-Bob C., Lungu C., Janik J., Skalny J., Buršíková V., Buršík J., Musa G.,
Properties of the carbon thin films deposited by thermionic vacuum arc,
Journal of Optoelectronics and Advanced Materials 9(4) (2007) 862-866

160. Buršíková V., Rehulka P., Chmelik J., Alberti M., Spalt Z., Janča J., Havel J.,
Laser ablation time-of-flight mass spectrometry (LA-TOF-MS) of "nitrogen doped diamond-like carbon (DLN) nano-layers",
Journal of Physics and Chemistry of Solids 68(5-6, SI) (2007) 701-706

159. Mikula M., Grancic B., Buršíková V., Csuba A., Drzik M., Kavecky S., Plecenik A., Kus P.,
Mechanical properties of superhard TiB2 coatings prepared by DC magnetron sputtering,
Vacuum 82(2) (2007) 278-281

2006

158. Polcar J., Topinka M., Nečas D., Hudec R., Hudcová V., Hroch F., Masetti N., Pizzichini G., Palazzi E.,
Search for correlations between BATSE gamma-ray bursts and supernovae,
Astronomy and Astrophysics 452 (2006) 439–449 (1× cited)

Cited in

  1. Chapman R., Tanvir N., Priddey R., Levan A.,
    How common are long gamma-ray bursts in the local Universe?,
    Monthly Notices of the Royal Astronomical Society 382 (2007) L21–L25


157. Šmíd R., Granier A., Bousquet A., Cartry G., Zajíčková L.,
Study of Magnetic Field Influence on Charged Species in a Low Pressure Helicon Reactor,
Czechoslovak Journal of Physics 56 (2006) B1091–B1096

156. Valtr M., Ohlídal I., Franta D.,
Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
Czechoslovak Journal of Physics 56 (2006) B1103–B1109

155. Frgala Z., Jašek O., Karásková M., Zajíčková L., Buršíková V., Franta D., Matějková J., Rek A., Klapetek P., Buršík J.,
Microwave PECVD of nanocrystalline diamond with RF induced bias nucleation,
Czechoslovak Journal of Physics 56 (2006) B1218–B1223 (3× cited)

Cited in

  1. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
    Optical characterization of ultrananocrystalline diamond films,
    Diamond and Related Materials 17 (2008) 1278–1282
  2. Karásková M., Zajíčková L., Buršíková V., Franta D., Nečas D., Bláhová O., Šperka J.,
    Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges,
    Surface and Coatings Technology 204 (2010) 1997–2001
  3. Srikanth V.,
    Review of advances in diamond thin film synthesis,
    Japanese Journal of Applied Physics 226 (2012) 303-318


154. Kučerová Z., Zajíčková L., Jašek O., Eliáš M., Ficek R., Vrba R., Matějka F., Matějková J., Buršík J.,
Carbon Nanotubes Synthesized by Plasma Enhanced CVD: Preparation for Measurements of Their Electrical Properties,
Czechoslovak Journal of Physics 56 (2006) B1244–B1249 (1× cited)

Cited in

  1. Vinduska P., Janik J., Buc D.,
    Investigation of conditions for preparation of oriented nanotubes at department of microelectronics in a modified plasma-enhanced hot filament chemical vapor deposition reactor,
    Physica E 40 (2008) 2247-2251


153. Šíra M., Trunec D., Sťahel P., Buršíková V., Franta D.,
Deposition of organic polymers at higher substrate temperatures in atmospheric pressure glow discharge,
Czechoslovak Journal of Physics 56 (2006) B1377–B1382

152. Buršíková V., Zajíčková L., Dvořák P., Valtr M., Buršík J., Bláhová O., Peřina V., Janča J.,
Influence of Silicon, Oxygen and Nitrogen Admixtures Upon the Properties of Plasma Deposited Amorphous Diamond-Like Carbon Coatings,
Journal of Advanced Oxidation Technologies 9 (2006) 232–236 (3× cited)

Cited in

  1. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  2. Buršíková V., Rehulka P., Chmelik J., Alberti M., Spalt Z., Janča J., Havel J.,
    Laser ablation time-of-flight mass spectrometry (LA-TOF-MS) of ``nitrogen doped diamond-like carbon (DLN) nano-layers,
    Journal of Physics and Chemistry of Solids 68 (2007) 701-706
  3. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402


151. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
Journal of Non-Crystalline Solids 352 (2006) 5633–5641 (4× cited)

Cited in

  1. Laidani N., Bartali R., Gottardi G., Anderle M., Cheyssac P.,
    Optical absorption parameters of amorphous carbon films from Forouhi–Bloomer and Tauc–Lorentz models: a comparative study,
    Journal of Physics 20 (2008) 015216
  2. Sancho-Parramon J., Modreanu M., Bosch S., Stchakovsky M.,
    Optical characterization of HfO2 by spectroscopic ellipsometry: Dispersion models and direct data inversion,
    Thin Solid Films 516 (2008) 7990–7995
  3. Chvostová D., Pajasová L., Železný V.,
    Optical properties of PZT thin films by spectroscopic ellipsometry and optical reflectivity,
    Physica Status Solidi C 5 (2008) 1362–1365
  4. Santagneli S., Messaddeq S., Lima Ribeiro S., Messaddeq Y.,
    Photoinduced effects in As-S-P glasses,
    Physica Status Solidi B 246 (2009) 1866–1870


150. Franta D., Ohlídal I.,
Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774 (13× cited)

Cited in

  1. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803
  2. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
    Optical characterization of non-stoichiometric silicon nitride films,
    Physica Status Solidi C 5 (2008) 1320–1323
  3. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  4. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
    Optical characterization of ultrananocrystalline diamond films,
    Diamond and Related Materials 17 (2008) 1278–1282
  5. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  6. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  7. Remeš Z., Kromka A., Vaněček M.,
    Towards optical-quality nanocrystalline diamond with reduced non-diamond content,
    Physica Status Solidi A 206 (2009) 2004–2008
  8. Holovský J., Dagkaldiran Ű., Remeš Z., Purkrt A., Ižák T., Poruba A., Vaněček M.,
    Fourier transform photocurrent measurement of thin silicon films on rough, conductive and opaque substrates,
    Physica Status Solidi A 207 (2010) 578–581
  9. Remeš Z., Holovský J., Purkrt A., Ižák T., Poruba A., Vaněček M., Dagkaldiran Ű., Yates H., Evans P., Sheel D.,
    Optical absorption losses in metal layers used in thin film solar cells,
    Physica Status Solidi A 207 (2010) 2170–2173
  10. Remeš Z., Kromka A., Vaněček M., Babcenko O., Stuchlíková T., Červenka J., Hruška K., Trung T.,
    The optical absorption of metal nanoparticles deposited on ZnO films,
    Physica Status Solidi A 207 (2010) 1722–1725
  11. Niu Y., Guin J., Abdelouas A., Rouxel T., Troles J.,
    Durability of an As2S3 chalcogenide glass: Optical properties and dissolution kinetics,
    Journal of Non-Crystalline Solids 357 (2011) 932-938
  12. Pop-Georgievski O., Štěpán P., Houska M., Chvostová D., Proks V., Rypáček F.,
    Poly(ethylene oxide) Layers Grafted to Dopamine-melanin Anchoring Layer: Stability and Resistance to Protein Adsorption,
    Biomacromolecules 12 (2011) 3232-3242
  13. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192


149. Trunec D., Bonaventura Z., Nečas D.,
Solution of time-dependent Boltzmann equation for electrons in non-thermal plasma,
Journal of Physics D 39 (2006) 2544–2552 (1× cited)

Cited in

  1. White R., Dujko S., Ness K., Robson R., Raspopovic Z., Petrovic Z.,
    On the existence of transiently negative diffusion coefficients for electrons in gases in E x B fields,
    Journal of Physics D 41 (2008) 025206


148. Jašek O., Eliáš M., Zajíčková L., Kudrle V., Bublan M., Matějková J., Rek A., Buršík J., Kadlečíková M.,
Carbon Nanotubes Synthesis in Microwave Plasma Torch at Atmospheric Pressure,
Materials Science and Engineering C 26 (2006) 1189–1193 (9× cited)

Cited in

  1. Zajíčková L., Eliáš M., Jašek O., Kučerová Z., Synek P., Matějková J., Kadlečíková M., Klementová M., Buršík J., Vojačková A.,
    Characterization of Carbon Nanotubes Deposited in Microwave Torch at Atmospheric Pressure,
    Plasma Processes and Polymers 4 (2007) S245–S249
  2. Jašek O., Eliáš M., Zajíčková L., Kučerová Z., Matějková J., Rek A., Buršík J.,
    Discussion of Important Factors in Deposition of Carbon Nanotubes by Atmospheric Pressure Microwave Plasma Torch,
    Journal of Physics and Chemistry of Solids 68 (2007) 738–743
  3. Nozaki T., Okazaki K.,
    Carbon nanotube synthesis pressure glow discharge: A review,
    Plasma Processes and Polymers 5 (2008) 301-321
  4. Burt D., Whyte W., Weaver J., Glidle A., Edgeworth J., Macpherson J., Dobson P.,
    Effects of Metal Underlayer Grain Size on Carbon Nanotube Growth,
    Journal of Physical Chemistry C 113 (2009) 15133-15139
  5. Jašek O., Synek P., Zajíčková L., Eliáš M., Kudrle V.,
    Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure,
    Journal Of Electrical Engineering 61 (2010) 311-313
  6. Belmonte T., Arnoult G., Henrion G., Gries T.,
    Nanoscience with non-equilibrium plasmas at atmospheric pressure,
    Journal of Physics D 44 (2011) 333
  7. Ficek R., Vrba R., Kim B., Goodnick S., Milicic S., Kučerová Z., Zajíčková L., Eliáš M.,
    Proc.: Carbon nanotubes synthesized by plasma enhanced CVD: Preparation for measurements of their electrical properties for application in pressure sensor,
    2006 International Symposium on Communications and Information Technologies,Vols 1-3 (2006) 42-45
  8. Zajíčková L., Jašek O., Synek P., Eliáš M., Kudrle V., Kadlečíková M., Breza J., Hanzlíková R.,
    Proc.: SYNTHESIS OF CARBON NANOTUBES IN MW PLASMA TORCH WITH DIFFERENT METHODS OF CATALYST LAYER PREPARATION AND THEIR APPLICATIONS,
    NANOCON 2009, CONFERENCE PROCEEDINGS (2009) 149-155
  9. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,
    Proc.: Mossbauer Effect Study of Iron Thin Films on Si/SiO(x) Substrate and Iron Phases at Deposited Carbon Nanotubes,
    MOSSBAUER SPECTROSCOPY IN MATERIALS SCIENCE - 2010 (2010) 90-95


147. Bousquet A., Buršíková V., Goullet A., Djouadi A., Zajíčková L., Granier A.,
Comparison of Structure and Mechanical Properties of SiO2-Like Films Deposited in O-2/HMDSO Pulsed and Continuous Plasmas,
Surface and Coatings Technology 200 (2006) 6517–6521 (14× cited)

Cited in

  1. Barreca D., Gasparotto A., Maccato C., Tondello E., Rossetto G.,
    A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films,
    Thin Solid Films 516 (2008) 7393-7399
  2. Bousquet A., Goullet A., Leteinturier C., Coulon N., Granier A.,
    Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes,
    European Physical Journal-Applied Physics 42 (2008) 3-8
  3. Bousquet A., Granier A., Cartry G., Goullet A.,
    Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas,
    Journal of Optoelectronics and Advanced Materials 10 (2008) 1999-2002
  4. Deilmann M., Theiss S., Awakowicz P.,
    Pulsed microwave plasma polymerization of silicon oxide films: Application of efficient permeation barriers on polyethylene terephthalate,
    Surface and Coatings Technology 202 (2008) 1911-1917
  5. Takemori M.,
    Crack formation, exfoliation, and ridge formation in 500 degrees C annealed sol-gel silica coatings on stainless steel SUS304: Part I. Microscopic observations and elemental analyses,
    Ceramics International 35 (2009) 1731-1746
  6. Pihan S., Tsukruk T., Foerch R.,
    Plasma polymerized hexamethyl disiloxane in adhesion applications,
    Surface and Coatings Technology 203 (2009) 1856-1862
  7. Francescangeli A., Palumbo F., d\'Agostino R., Defranoux C.,
    Pulsed Plasma Deposition from Vinyltrimethylsilane/Oxygen Mixtures,
    Plasma Processes and Polymers 6 (2009) 132-138
  8. Boscher N., Choquet P., Duday D., Verdier S.,
    Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge,
    Plasma Processes and Polymers 7 (2010) 163-171
  9. Boscher N., Choquet P., Duday D., Verdier S.,
    Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour,
    Surface and Coatings Technology 205 (2010) 2438-2448
  10. Boscher N., Choquet P., Duday D., Verdier S.,
    Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour,
    Surface and Coatings Technology 205 (2010) 2438-2448
  11. Coclite A., Milella A., Palumbo F., Le Pen C., d\'Agostino R.,
    Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection,
    Plasma Processes and Polymers 7 (2010) 802-812
  12. Boscher N., Choquet P., Duday D., Verdier S.,
    Influence of cyclic organosilicon precursors on the corrosion of aluminium coated sheet by atmospheric pressure dielectric barrier discharge,
    Surface and Coatings Technology 205 (2011) 5350-5357
  13. Massines F., Sarra-Bournet C., Fanelli F., Naude N., Gherardi N.,
    Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition,
    Plasma Processes and Polymers 9 (2012) 1041-1073
  14. Palumbo F., d'Agostino R.,
    Comment on Ion-Assisted Processes of Polymerization in Low-Pressure Plasmas,
    Plasma Processes and Polymers 9 (2012) 844-849


146. Klapetek P., Ohlídal I., Buršík J.,
Applications of scanning thermal microscopy in the analysis of the geometry of patterned structures,
Surface and Interface Analysis 38 (2006) 383–387

145. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 38 (2006) 842–846 (1× cited)

Cited in

  1. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62


144. Vladoiu R., Ciupina V., Lungu C., Buršíková V., Musa G.,
Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization,
Journal of Optoelectronics and Advanced Materials 8(1) (2006) 71-73

143. Buršíková V., Sládek P., Sťahel P., Buršík J.,
Complex study of mechanical properties of a-Si : H and a-SiC : H boron doped films,
Journal of Non-Crystalline Solids 352(9-20) (2006) 1238-1241

142. Buršíková V., Sládek P., Sťahel P., Buršík J.,
Mechanical properties of thin silicon films deposited on glass and plastic substrates studied by depth sensing indentation technique,
Journal of Non-Crystalline Solids 352(9-20) (2006) 1242-1245

141. Sťahel P., Buršíková V., Šíra M., Navrátil Z., Kloc P., Janča J.,
Modification of polymer surfaces using atmospheric pressure barrier discharges,
Journal of Advanced Oxidation Technologies 9(2) (2006) 228-231

140. Kloc P., Sťahel P., Buršíková V., Brablec A., Navrátil Z., Šíra M., Janča J.,
Deposition of teflon-like protective layers in surface discharge at atmospheric pressure,
Czechoslovak Journal of Physics 56(Part 7, B) (2006) B1345-B1350

139. Franclová J., Buršíková V.,
Poole-Frenkel conductivity in SiOxHyCz coatings prepared by PECVD,
Czechoslovak Journal of Physics 56(Part 6, B) (2006) B1146-BA1149

138. Hajkova P., Louda P., Spatenka P., Kolouch A., Spatenka P., Bláhová O., Buršíková V.,
Comparison of evaluating methods of thin films nanohardness,
Czechoslovak Journal of Physics 56(Part 6, B) (2006) B1162-B1168

2005

137. Ohlídal I., Franta D., Klapetek P.,
Combination of optical methods and atomic force microscopy at characterization of thin film systems,
Acta Physica Slovaca 55 (2005) 271–294 (1× cited)

Cited in

  1. Post J., Bhattacharyya A., Imran M.,
    Experimental results and a user-friendly model of heat transfer from a thin film resistance temperature detector,
    Applied Thermal Engineering 29 (2009) 116–130


136. Klapetek P., Ohlídal I.,
Applications of the wavelet transform in AFM data analysis,
Acta Physica Slovaca 55 (2005) 295–303

135. Dvořák P., Jánský J., Zajíčková L., Janča J.,
Energy Distribution of Hydrogen Ions in Capacitively Coupled Low Pressure Discharge,
Acta Physica Slovaca 55 (2005) 441–446

134. Antoš R., Ohlídal I., Franta D., Klapetek P., Mistrík J., Yamaguchi T., Višňovský Š.,
Spectroscopic ellipsometry of sinusoidal surface-relief gratings,
Applied Surface Science 244 (2005) 221–224 (2× cited)

Cited in

  1. Li J., La B.,
    A comparative study of propagation properties of Hermite-Gaussian beams through gratings with, sinusoidal and rectangular reliefs,
    Review of Scientific Instruments 56 (2007) 5772–5777
  2. Petrik P.,
    Ellipsometric models for vertically inhomogeneous composite structures,
    Physica Status Solidi A 205 (2008) 732–738


133. Antoš R., Ohlídal I., Mistrík J., Murakami K., Yamaguchi T., Pištora J., Horie M., Višňovský Š.,
Spectroscopic ellipsometry on lamellar gratings,
Applied Surface Science 244 (2005) 225–229 (1× cited)

Cited in

  1. Petrik P.,
    Ellipsometric models for vertically inhomogeneous composite structures,
    Physica Status Solidi A 205 (2008) 732–738


132. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
Applied Surface Science 244 (2005) 338–342 (3× cited)

Cited in

  1. Jiang Y., Tang X., Liu Q., Li Q., Ding A.,
    Optical properties of Pb(Zr0.53Ti0.47)O3 thin films on Pt-coated Si substrates measured by spectroscopic ellipsometry in the UV-vis-NIR,
    Materials Science and Engineering B 137 (2007) 304–309
  2. Chvostová D., Pajasová L., Železný V.,
    Optical properties of PZT thin films by spectroscopic ellipsometry and optical reflectivity,
    Physica Status Solidi C 5 (2008) 1362–1365
  3. Galca A., Stancu V., Husanu M., Dragoi C., Gheorghe N., Trupina L., Enculescu M., Vasile E.,
    Substrate-target distance dependence of structural and optical properties in case of Pb(Zr,Ti)O-3 films obtained by pulsed laser deposition,
    Applied Surface Science 257 (2011) 5938-5943


131. Franta D., Negulescu B., Thomas L., Dahoo P., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
Optical properties of NiO thin films prepared by pulsed laser deposition technique,
Applied Surface Science 244 (2005) 426–430 (19× cited)

Cited in

  1. Liu Z., Fan T., Zhang D.,
    Synthesis of biomorphous nickel oxide from a pinewood template and investigation on a hierarchical porous structure,
    Journal of the American Ceramic Society 89 (2006) 662–665
  2. Campbell I., Crone B.,
    Energy barriers from ferromagnetic contacts to semiconducting polymers,
    Applied Physics Letters 90 (2007) 242107
  3. Malandrino G., Perdicaro L., Fragala I., Lo Nigro R., Losurdo M., Bruno G.,
    MOCVD Template Approach to the Fabrication of Free-Standing Nickel(II) Oxide Nanotube Arrays: Structural, Morphological, and Optical Properties Characterization,
    Journal of Physical Chemistry C 111 (2007) 3211–3215
  4. Kang T., Lee H., Lee H.,
    Optical properties of black NiO and CoO single crystals studied with spectroscopic ellipsometry,
    Journal of the Korean Physical Society 50 (2007) 632–637
  5. Ghodsi F., Khayatiyan S.,
    Preparation and determination of optical properties of NiO thin films deposited by dip coating technique,
    Surface Review and Letters 14 (2007) 219–224
  6. Park J., Choi K., Baek S., Chung K., Lee H.,
    Optical properties of NiO thin films grown by using sputtering deposition and studied with spectroscopic ellipsometry,
    Journal of the Korean Physical Society 52 (2008) 1868–1876
  7. Lu H., Scarel G., Alia M., Fanciulli M., Ding S., Zhang D.,
    Spectroscopic ellipsometry study of thin NiO films grown on Si (100) by atomic layer deposition,
    Applied Physics Letters 92 (2008) 222907
  8. Venter A., Botha J., Swart H., Naidoo S., Olivier E.,
    An investigation of the oxidized Ni/InAs interface,
    Physica B 404 (2009) 4452–4456
  9. Wang X., Li Y., Wang G., Xiang R., Jiang D., Fu S., Wu K., Yang X., DuanMu Q., Tian J., Fu L.,
    Characterization of NiO thin film grown by two-step processes,
    Physica B 404 (2009) 1058–1060
  10. Li X., Tang X.,
    Effects of sputtering parameters on optical constant of NiOx thin films,
    Guangzi Xuebao/Acta Photonica Sinica 38 (2009) 302–305
  11. Boshta M., Gad S., Abo El-Soud A., Mostafa M.,
    Some Characteristic Physical Properties of Nickel Oxide Powder,
    Fizika A 18 (2009) 173–184
  12. Boshta M., Gad S., Abo El-Soud A., Mostafa M.,
    Some Characteristic Physical Properties of Nickel Oxide Powder,
    Fizika A 18 (2009) 173–184
  13. Valyukh I., Green S., Arwin H., Niklasson G., Wäckelgård E., Granqvist C.,
    Spectroscopic ellipsometry characterization of electrochromic tungsten oxide and nickel oxide thin films made by sputter deposition,
    Solar Energy Materials and Solar Cells 94 (2010) 724–732
  14. Scarlat C., Mok K., Zhou S., Vinnichenko M., Lorenz M., Grundmann M., Helm M., Schubert M., Schmidt H.,
    Voigt effect measurement on PLD grown NiO thin films,
    Physica Status Solidi C 7 (2010) 334-337
  15. Ding Q., Wang L., Hu L., Hu T., Wang ., Zhang .,
    An explanation for laser-induced spallation effect in a-C:H films: Altered phase evolution route caused by hydrogen doping,
    Journal of Applied Physics 109 (2011) 013501
  16. Peng T., Xiao X., Han X., Zhou X., Wu W., Ren F., Jiang C.,
    Characterization of DC reactive magnetron sputtered NiO films using spectroscopic ellipsometry,
    Applied Surface Science 257 (2011) 5908-5912
  17. Juybari H., Bagheri-Mohagheghi M., Shokooh-Saremi M.,
    Nickel-lithium oxide alloy transparent conducting films deposited by spray pyrolysis technique,
    Journal of Alloys and Compounds 509 (2011) 2770-2775
  18. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091
  19. Franta D., Nečas D., Zajíčková L.,
    Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
    Thin Solid Films 534 (2013) 432-441


130. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
Applied Surface Science 244 (2005) 431–434 (10× cited)

Cited in

  1. Mykhaylyk T., Dmitruk N., Evans S., Hamley I., Henderson J.,
    Comparative characterisation by atomic force microscopy and ellipsometry of soft and solid thin films,
    Surface and Interface Analysis 39 (2007) 575–581
  2. Noun W., Berini B., Dumont Y., Dahoo P., Keller N.,
    Correlation between electrical and ellipsometric properties on high-quality epitaxial thin films of the conductive oxide LaNiO3 on STO,
    Journal of Applied Physics 102 (2007) 063709
  3. Berini B., Noun W., Dumont Y., Popova E., Keller N.,
    High temperature ellipsometry of the conductive oxide LaNiO3,
    Journal of Applied Physics 101 (2007) 023529
  4. Su W., Li B., Liu D., Zhang F.,
    Structure and infrared optical properties of evaporated erbium fluoride films,
    Physica Status Solidi A 204 (2007) 569–575
  5. Su W., Li B., Liu D., Zhang F.,
    Texture evolution and infrared optical properties of praseodymium fluoride films,
    Optical Materials 30 (2007) 273–278
  6. Su W., Li B., Liu D., Zhang F.,
    The relation between crystal structure and infrared optical properties of ErF3 film,
    Review of Scientific Instruments 56 (2007) 2541–2546
  7. Bharadwaja S., Dechakupt T., Trolier-McKinstry S., Beratan H.,
    Excimer laser crystallized (Pb,La)(Zr,Ti)O-3 thin films,
    Journal of the American Ceramic Society 91 (2008) 1580–1585
  8. Hu Z., Li Y., Zhu M., Zhu Z., Chu J.,
    Structure and optical properties of ferroelectric PbZr0.40Ti0.60O3 films grown on LaNiO3-coated platinized silicon determined by infrared spectroscopic ellipsometry,
    Journal of Physical Chemistry C 112 (2008) 9737–9743
  9. Guan L., Liu B., Jin L., Guo J., Zhao Q., Wang Y., Fu G.,
    Electronic structure and optical properties of LaNiO3: First-principles calculations,
    Solid State Communications 150 (2010) 2011–2014
  10. Yu T., Qin Y., Liu D., Zhang F.,
    Physical and infrared optical properties of mixed SrF2-CaF2 thin films,
    Review of Scientific Instruments 59 (2010) 2546–2550


129. Mistrík J., Ohlídal I., Antoš R., Aoyama M., Yamaguchi T.,
Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films,
Applied Surface Science 244 (2005) 51–54 (1× cited)

Cited in

  1. Pech D., Steyer P., Loir A., Sanchez-Lopez J., Millet J.,
    Analysis of the corrosion protective ability of PACVD silica-based coatings deposited on steel,
    Surface and Coatings Technology 201 (2006) 347–352


128. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
Diamond and Related Materials 14 (2005) 1795–1798 (10× cited)

Cited in

  1. Tai F., Lee S., Wei C., Tyan S.,
    Correlation between ID/IG ratio from visible Raman spectra and sp2/sp3 ratio from XPS spectra of annealed hydrogenated DLC film,
    Materials Transactions 47 (2006) 1847–1852
  2. Lee S., Tai F., Wei C.,
    Correlation between sp2/sp3 ratio or hydrogen content and water contact angle in hydrogenated DLC film,
    Materials Transactions 48 (2007) 2534–2538
  3. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  4. Buršíková V., Rehulka P., Chmelik J., Alberti M., Spalt Z., Janča J., Havel J.,
    Laser ablation time-of-flight mass spectrometry (LA-TOF-MS) of ``nitrogen doped diamond-like carbon (DLN) nano-layers'',
    Journal of Physics and Chemistry of Solids 68 (2007) 701-706
  5. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  6. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  7. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  8. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  9. Jelínek M., Smetana K., Kocourek T., Dvořáková B., Zemek J., Remsa J., Luxbacher T.,
    Biocompatibility and sp3/sp2 ratio of laser created DLC films,
    Materials Science and Engineering B 169 (2010) 89–93
  10. Li F., Zhang S., Kong J., Zhang Y., Zhang W.,
    Multilayer DLC coatings via alternating bias during magnetron sputtering,
    Thin Solid Films 519 (2011) 4910-4916


127. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Páleníková K.,
Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
Diamond and Related Materials 14 (2005) 1835–1838 (5× cited)

Cited in

  1. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  2. Holá M., Konečná V., Mikuska P., Kaiser J., Páleníková K., Průša S., Hanzlíková R., Kanicky V.,
    Study of aerosols generated by 213 nm laser ablation of cobalt-cemented hard metals,
    Journal of Analytical Atomic Spectrometry 23 (2008) 1341–1349
  3. Šniurevičiūtė M., Laurikaitienė J., Adlienė D., Augulis L., Rutkūnienė Ž., Jotautis A.,
    Stress and strain in DLC films induced by electron bombardment,
    Vacuum 83 (2009) S159–S161
  4. Holá M., Konečná V., Mikuska P., Kaiser J., Kanicky V.,
    Influence of physical properties and chemical composition of sample on formation of aerosol particles generated by nanosecond laser ablation at 213 nm,
    Spectrochimica Acta Part B 65 (2010) 51–60
  5. Galiová M., Kaiser J., Fortes F., Novotný K., Malina R., Prokeš L., Hrdlička A., Vaculovič T., Nývltová Fišáková M., Svoboda J., Kanicky V., Laserna J.,
    Multielemental analysis of prehistoric animal teeth by laser-induced breakdown spectroscopy and laser ablation inductively coupled plasma mass spectrometry,
    Applied Optics 49 (2010) C191–C199


126. Kučerová Z., Buršíková V., Zajíčková L., Franclová J., Peřina V.,
Thermal Stability of SiOxCyHz Films Prepared by PECVD,
Chemické listy 99 (2005) 465–467

125. Antoš R., Pištora J., Ohlídal I., Postava K., Mistrík J., Yamaguchi T., Višňovský Š., Horie M.,
Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate,
Journal of Applied Physics 97 (2005) 053107

124. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
Journal of Modern Optics 52 (2005) 583–602 (1× cited)

Cited in

  1. Ng T., Tay A., Ong C.,
    Simple tilt and height location monitoring of wafers,
    Optical Engineering 45 (2006) 053603


123. Franta D., Ohlídal I.,
Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
Optics Communications 248 (2005) 459–467 (31× cited)

Cited in

  1. Franta D., Ohlídal I., Petrýdes D.,
    Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
    Vacuum 80 (2005) 159–162
  2. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
    Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 38 (2006) 842–846
  3. Garcia-Valenzuela A., Sandoval-Romero G., Sanchez-Perez C., Castaneda L., Guadarrama-Santana A.,
    Dynamic angle-scanning reflectometer device,
    Review of Scientific Instruments 77 (2006) 065102
  4. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  5. Frgala Z., Jašek O., Karásková M., Zajíčková L., Buršíková V., Franta D., Matějková J., Rek A., Klapetek P., Buršík J.,
    Microwave PECVD of nanocrystalline diamond with RF induced bias nucleation,
    Czechoslovak Journal of Physics 56 (2006) B1218–B1223
  6. Mykhaylyk T., Dmitruk N., Evans S., Hamley I., Henderson J.,
    Comparative characterisation by atomic force microscopy and ellipsometry of soft and solid thin films,
    Surface and Interface Analysis 39 (2007) 575–581
  7. Sperling B., Abelson J.,
    Kinetic roughening of amorphous silicon during hot-wire chemical vapor deposition at low temperature,
    Journal of Applied Physics 101 (2007) 024915
  8. Wong W., Wang X., He Z., Djurisic A., Yip C., Cheung K., Wang H., Mak C., Chan W.,
    On the efficiency of polymer solar cells - Response,
    Nature Materials 6 (2007) 704–705
  9. Badano G., Baudry X., Ballet P., Duvaut P., Million A., Micoud E., Kaismoune S., Fougeres P., Mibord S., Tran-Van P., Etcheberry A.,
    Anisotropic surface roughness in molecular-beam epitaxy CdTe (211)B/Ge(211),
    Journal of Electrinic Materials 37 (2008) 1369–1375
  10. Sancho-Parramon J., Janicki V.,
    Effective medium theories for composite optical materials in spectral ranges of weak absorption: the case of Nb2O5–SiO2 mixtures,
    Journal of Physics D 41 (2008) 215304
  11. Petrik P.,
    Ellipsometric models for vertically inhomogeneous composite structures,
    Physica Status Solidi A 205 (2008) 732–738
  12. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803
  13. Everts F., Wormeester H., Poelsema B.,
    Optical anisotropy induced by ion bombardment of Ag(001),
    Physical Review B 78 (2008) 155419
  14. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  15. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
    Optical characterization of ultrananocrystalline diamond films,
    Diamond and Related Materials 17 (2008) 1278–1282
  16. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  17. Kokkoris G., Vourdas N., Gogolides E.,
    Plasma Etching and Roughening of Thin Polymeric Films: A Fast, Accurate, in situ Method of Surface Roughness Measurement,
    Plasma Processes and Polymers 5 (2008) 825–833
  18. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  19. Merano M., Goette J., Aiello A., van Exter M., Woerdman J.,
    Goos-Hanchen shift for a rough metallic mirror,
    Optics Express 17 (2009) 10864–10870
  20. Badano G., Baudry X., Robin I.,
    In Situ Spectroscopic Ellipsometry of Rough Surfaces: Application to CdTe(211)B/Ge(211) Grown by Molecular-Beam Epitaxy,
    Journal of Electrinic Materials 38 (2009) 1652–1660
  21. Fortes L., Goncalves M., Almeida R.,
    Processing optimization and optical properties of 3-D photonic crystals,
    Journal of Non-Crystalline Solids 355 (2009) 1189–1192
  22. Ng A., Li C., Fung M., Djurisic A., Zapien J., Chan W., Cheung K., Wong W.,
    Accurate Determination of the Index of Refraction of Polymer Blend Films by Spectroscopic Ellipsometry,
    Journal of Physical Chemistry C 114 (2010) 15094-15101
  23. Stetsyshyn Y., Kostruba A., Jaczewska J., Zaichenko A., Mitina N., Budkowski A., Kuzyk P., Voloshinovskii A.,
    Formation, structure and wettability of fluorescent nanolayers of oligoperoxide europium complexes adsorbed to glass surface,
    Thin Solid Films 518 (2010) 4318–4321
  24. Bereznai M., Budai J., Hanyecz I., Kopniczky ., Veres ., Koós M., Toth Z.,
    Ellipsometric study of nanostructured carbon films deposited by pulsed laser deposition,
    Thin Solid Films 519 (2011) 2989-2993
  25. Buršíková V., Bláhová O., Karásková M., Zajíčková L., Jašek O., Franta D., Klapetek P., Buršík J.,
    Mechanical properties of ultrananocrystalline thin films deposited using dual frequency discharges,
    Chemické listy 105 (2011) S98-S101
  26. Everts F., Wormeester H., Poelsema B.,
    Optical characterization of the evolution of ion-induced anisotropic nanopatterns on Ag(001),
    Physical Review B 84 (2011) 035403
  27. Wormeester H., Everts ., Poelsema B.,
    Plasmon resonance shift during grazing incidence ion sputtering on Ag(001),
    Thin Solid Films 519 (2011) 2664-2667
  28. Pop-Georgievski O., Štěpán P., Houska M., Chvostová D., Proks V., Rypáček F.,
    Poly(ethylene oxide) Layers Grafted to Dopamine-melanin Anchoring Layer: Stability and Resistance to Protein Adsorption,
    Biomacromolecules 12 (2011) 3232-3242
  29. Jin S., Choi Y., Choi I., Han J.,
    Surface energy modification of SiOxCyHz film using PECVD by controlling the plasma processes for OMCTS (Si4O4C8H24) precursor,
    Thin Solid Films 519 (2011) 6763-6768
  30. Yanguas-Gil A., Sperling B., Abelson J.,
    Theory of light scattering from self-affine surfaces: Relationship between surface morphology and effective medium roughness,
    Physical Review B 84 (2011) 085402
  31. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192


122. Zajíčková L., Eliáš M., Jašek O., Kudrle V., Frgala Z., Matějková J., Buršík J., Kadlečíková M.,
Atmospheric Pressure Microwave Torch for Synthesis of Carbon Nanotubes,
Plasma Phys. Control. Fusion 47 (2005) B655–B666 (14× cited)

Cited in

  1. Zajíčková L., Eliáš M., Jašek O., Kučerová Z., Synek P., Matějková J., Kadlečíková M., Klementová M., Buršík J., Vojačková A.,
    Characterization of Carbon Nanotubes Deposited in Microwave Torch at Atmospheric Pressure,
    Plasma Processes and Polymers 4 (2007) S245–S249
  2. Jašek O., Eliáš M., Zajíčková L., Kučerová Z., Matějková J., Rek A., Buršík J.,
    Discussion of Important Factors in Deposition of Carbon Nanotubes by Atmospheric Pressure Microwave Plasma Torch,
    Journal of Physics and Chemistry of Solids 68 (2007) 738–743
  3. Denysenko I., Ostrikov K., Cvelbar U., Mozetic M., Azarenkov N.,
    Carbon nanofiber growth in plasma-enhanced chemical vapor deposition,
    Journal of Applied Physics 104 (2008) 000
  4. Denysenko I., Ostrikov K., Cvelbar U., Mozetic M., Azarenkov N.,
    Carbon nanofiber growth in plasma-enhanced chemical vapor deposition,
    Journal of Applied Physics 104 (2008) 000
  5. Bhuyan H., Favre M., Valderrama E., Avaria G., Wyndham E., Chuaqui H., Baier J., Kelly H., Grondona D., Marquez A.,
    Formation of sub-micron size carbon structures by plasma jets emitted from a pulsed capillary discharge,
    Applied Surface Science 255 (2009) 3558-3562
  6. Zajíčková L., Synek P., Jašek O., Eliáš M., David B., Buršík J., Pizurova N., Hanzlíková R., Lazar L.,
    Synthesis of carbon nanotubes and iron oxide nanoparticles in MW plasma torch with Fe(CO)(5) in gas feed,
    Applied Surface Science 255 (2009) 5421-5424
  7. Jašek O., Synek P., Zajíčková L., Eliáš M., Kudrle V.,
    Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure,
    Journal Of Electrical Engineering 61 (2010) 311-313
  8. Zajíčková L., Jašek O., Eliáš M., Synek P., Lazar L., Schneeweiss O., Hanzlíková R.,
    Synthesis of carbon nanotubes by plasma- enhanced chemical vapor deposition in an atmospheric-pressure microwave torch,
    Pure and Applied Chemistry 82 (2010) 1259–1272
  9. Nozaki T., Yoshida S., Karatsu T., Okazaki K.,
    Atmospheric-pressure plasma synthesis of carbon nanotubes,
    Journal of Physics D 44 (2011) 111
  10. Lestinska L., Martisovits V., Machala Z.,
    Corona discharge as a temperature probe of atmospheric air microwave plasma jet,
    Journal of Polymer Science B 112 (2011) 2779-2786
  11. David B., Pizurova N., Schneeweiss O., Kudrle V., Jašek O., Synek P.,
    Iron-Based Nanopowders Containing alpha-Fe, Fe3C, and gamma-Fe Particles Synthesised in Microwave Torch Plasma and Investigated with Mossbauer Spectroscopy,
    Japanese Journal of Applied Physics 50 (2011) 0000
  12. Prášek J., Drbohlavova J., Chomoucka J., Hubálek J., Jašek O., Adam V., Kizek R.,
    Methods for carbon nanotubes synthesis-review,
    Journal of Materials Science 21 (2011) 15872-15884
  13. Pipa A., Andrasch M., Rackow K., Ehlbeck J., Weltmann K.,
    Observation of microwave volume plasma ignition in ambient air,
    Plasma Sources Science and Technology 21 (2012) 2-5
  14. Pekárek J., Ficek R., Vrba R., Magat M.,
    Proc.: Electrodes Modified by Carbon Nanotubes for Pressure Measuring,
    2009 32ND INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY (2009) 629-633


121. Přikryl R., Čech V., Zajíčková L., Vaněk J., Behzadi S., Jones R.,
Mechanical and Optical Properties of Plasma-Polymerized Vinyltriethoxysilane,
Surface and Coatings Technology 200 (2005) 468–471 (11× cited)

Cited in

  1. Přikryl R., Čech V., Studýnka J.,
    Burning conditions of non-thermal Ar-plasma at continuous and pulsed mode,
    Czechoslovak Journal of Physics 56 (2006) B1320-B1325
  2. Kondyurin A., Volodin P., Weber J.,
    Plasma immersion ion implantation of Pebax polymer,
    Nuclear Instruments and Methods in Physics Research Section B 251 (2006) 407-412
  3. Čech V., Zemek J., Peřina V.,
    Chemistry of Plasma-Polymerized Vinyltriethoxysilane Controlled by Deposition Conditions,
    Plasma Processes and Polymers 5 (2008) 745-752
  4. Ballarre J., Lopez D., Cavalieri A.,
    Nano-indentation of hybrid silica coatings on surgical grade stainless steel,
    Thin Solid Films 516 (2008) 1082-1087
  5. Ballarre J., Lopez D., Cavalieri A.,
    Frictional and adhesive behavior of organic-inorganic hybrid coatings on surgical grade stainless steel using nano-scratching technique,
    Wear 266 (2009) 1165-1170
  6. Ballarre J., Jimenez-Pique E., Anglada M., Pellice S., Cavalieri A.,
    Mechanical characterization of nano-reinforced silica based sol-gel hybrid coatings on AISI 316L stainless steel using nanoindentation techniques,
    Surface and Coatings Technology 203 (2009) 3325-3331
  7. Mistrík J., Čechalová B., Studýnka J., Čech V.,
    Spectroscopic ellipsometry study of plasma-polymerised vinyltriethoxysilane films,
    Journal of Materials Science 20 (2009) 451–455
  8. Denis L., Cossement D., Godfroid T., Renaux F., Bittencourt C., Snyders R., Hecq M.,
    Synthesis of Allylamine Plasma Polymer Films: Correlation between Plasma Diagnostic and Film Characteristics,
    Plasma Processes and Polymers 6 (2009) 199-208
  9. Denis L., Marsal P., Olivier Y., Godfroid T., Lazzaroni R., Hecq M., Cornil J., Snyders R.,
    Deposition of Functional Organic Thin Films by Pulsed Plasma Polymerization: A Joint Theoretical and Experimental Study,
    Plasma Processes and Polymers 7 (2010) 172-181
  10. Fahmy A., Mix R., Schoenhals A., Friedrich J.,
    Structure of Plasma-Deposited Poly(acrylic acid) Films,
    Plasma Processes and Polymers 8 (2011) 147-159
  11. Denis L., Thiry D., Cossement D., Gerbaux P., Brusciotti F., Van de Keere I., Goossens V., Terryn H., Hecq M., Snyders R.,
    Towards the understanding of plasma polymer film behaviour in ethanol: A multi-technique investigation,
    Progress in organic coatings 70 (2011) 134-141


120. Franta D., Ohlídal I., Petrýdes D.,
Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
Vacuum 80 (2005) 159–162 (12× cited)

Cited in

  1. Ye Q., Liu P., Tang Z., Zhai L.,
    Hydrophilic properties of nano-TiO2 thin films deposited by RF magnetron sputtering,
    Vacuum 81 (2007) 627–631
  2. Ye C., Pan S., Teng X., Li G.,
    Optical properties of MgO-TiO2 amorphous composite films,
    Journal of Applied Physics 102 (2007) 013520
  3. King D., Liang X., Zhou Y., Carney C., Hakim L., Li P., Weimer A.,
    Atomic layer deposition of TiO2 films on particles in a fluidized bed reactor,
    Powder Technology 183 (2008) 356–363
  4. Kopac T., Bozgeyik K., Yener J.,
    Effect of pH and temperature on the adsorption of bovine serum albumin onto titanium dioxide,
    Colloids and Surfaces A 322 (2008) 19–28
  5. Sasani Ghamsari M., Bahramian A.,
    High transparent sol-gel derived nanostructured TiO2 thin film,
    Materials Leters 62 (2008) 361–364
  6. Ye C., Pan S., Teng X., Fan H., Li G.,
    Preparation and optical properties of nanocrystalline thin films in the ZnO-TiO2 system,
    Applied Physics A 90 (2008) 375–378
  7. Eiamchai P., Chindaudom P., Pokaipisit A., Limsuwan P.,
    A spectroscopic ellipsometry study of TiO2 thin films prepared by ion-assisted electron-beam evaporation,
    Current Applied Physics 9 (2009) 707–712
  8. Yang S., Liu Y., Zhang Y., Mo D.,
    Determination of optical constants of sol-gel derived Zn0.9Mg0.1O films by spectroscopic ellipsometry with various models,
    Surface and Interface Analysis 41 (2009) 502–507
  9. King D., Zhou Y., Hakim L., Liang X., Li P., Weimer A.,
    In situ synthesis of TiO2-functionalized metal nanoparticles,
    Industrial and Engineering Chemistry Research 48 (2009) 352–360
  10. Boulouz A., En Nacri A., Pascal-Delannoy F., Sorli B., Koutti L.,
    Spectroscopic ellipsometry study of xPbO-(1-x)TiO2 thin films elaborated by mixed reactive thermal co-evaporation,
    Journal of Physics D 42 (2009) 245304
  11. Yang W., Yu H., Tang J., Su Y., Wan Q., Wang Y.,
    Omnidirectional light absorption in thin film silicon solar cell with dual anti-reflection coatings,
    Solar Energy 85 (2011) 2551-2559
  12. Xu W., Luo M., Wei L., Liu Y., Lin H.,
    Proc.: Photocatalysis and Hydrophilicity of Y3+ Doped TiO2 Thin Films,
    Chinese Ceramics Communications (2010) 481-484


119. Klapetek P., Ohlídal I., Montaigne-Ramil A., Bonanni A., Sitter H.,
Atomic force microscopy analysis of morphology of the upper boundaries of GaN thin films prepared by MOCVD,
Vacuum 80 (2005) 53–57 (2× cited)

Cited in

  1. Bae M., Shin D., Yi S., Doh S., Na J., Lee K., Taylor R., Park S.,
    Roughness analysis of GaN surfaces at different annealing temperatures for an AlN buffer layer,
    Journal of the Korean Physical Society 51 (2007) 209–213
  2. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402


118. Šíra M., Trunec D., Sťahel P., Buršíková V., Navrátil Z., Buršík J.,
Surface modification of polyethylene and polypropylene in atmospheric pressure glow discharge,
Journal of Physics D 38(4) (2005) 621-627

2004

117. Šmíd R., Zajíčková L., Janča J.,
Spatially Resolved Measurements in RF Capacitive Discharges in Argon and Nitrogen,
Czechoslovak Journal of Physics 54 (2004) C592–C598

116. Franclová J., Kučerová Z., Buršíková V., Zajíčková L., Peřina V.,
Structural Changes of Plasma Deposited SiOxCyHz Thin Films Attained by Thermal Annealing,
Czechoslovak Journal of Physics 54 (2004) C847–C852

115. Trunec D., Navrátil Z., Sťahel P., Zajíčková L., Buršíková V.,
Deposition of Thin Organosilicon Polymer Films in Atmospheric Pressure Glow Discharge,
Journal of Physics D 37 (2004) 2112–2120 (65× cited)

Cited in

  1. Zhu X., Arefi-Khonsari F., Petit-Etienne C., Tatoulian M.,
    Open air deposition of SiO2 films by an atmospheric pressure line-shaped plasma,
    Plasma Processes and Polymers 2 (2005) 407-413
  2. Šíra M., Trunec D., Sťahel P., Buršíková V., Navrátil Z., Buršík J.,
    Surface modification of polyethylene and polypropylene in atmospheric pressure glow discharge,
    Journal of Physics D 38 (2005) 621-627
  3. Navrátil Z., Trunec D., Šmíd R., Lazar L.,
    A software for optical emission spectroscopy - problem formulation and application to plasma diagnostics,
    Czechoslovak Journal of Physics 56 (2006) B944-B951
  4. Lehocky M., Amaral P., Coelho M., Sťahel P., Barros-Timmons A., Coutinho J.,
    Attachment/detachment of Saccharomyces cerevisiae on plasma deposited organosilicon thin films,
    Czechoslovak Journal of Physics 56 (2006) B1256-B1262
  5. Šíra M., Trunec D., Sťahel P., Buršíková V., Franta D.,
    Deposition of organic polymers at higher substrate temperatures in atmospheric pressure glow discharge,
    Czechoslovak Journal of Physics 56 (2006) B1377–B1382
  6. Supiot P., Vivien C., Granier A., Bousquet A., Macková A., Escaich D., Clergereaux R., Raynaud P., Stryhal Z., Pavlik J.,
    Growth and modification of organosilicon films in PECVD and remote afterglow reactors,
    Plasma Processes and Polymers 3 (2006) 100-109
  7. Borra J.,
    Nucleation and aerosol processing in atmospheric pressure electrical discharges: powders production, coatings and filtration,
    Journal of Physics D 39 (2006) R19-R54
  8. Starikovskaia S.,
    Plasma assisted ignition and combustion,
    Journal of Physics D 39 (2006) R265-R299
  9. Starostine S., Aldea E., de Vries H., Creatore M., van de Sanden M.,
    Atmospheric Pressure Barrier Discharge Deposition of Silica-Like Films on Polymeric Substrates,
    Plasma Processes and Polymers 4 (2007) S440-S444
  10. Simor M., Fiala A., Kovacik D., Hlidek P., Wypkema A., Kuipers R.,
    Corrosion protection of a thin aluminium layer deposited on polyester,
    Surface and Coatings Technology 201 (2007) 7802-7812
  11. Haehnel M., Brueser V., Kersten H.,
    Diagnostics of SiOx-containing layers deposited on powder particles by dielectric barrier discharge,
    Plasma Processes and Polymers 4 (2007) 629-637
  12. Matsushita Y., Tochikubo F., Uchida S., Watanabe T.,
    Influence of Penning ionization on glowlike dielectric barrier discharge formation in medium-pressure Ar,
    Japanese Journal of Applied Physics 46 (2007) 6817-6821
  13. Lehocky M., Fonseca Amaral P., St\'ahel P., Zarur Coelho M., Barros-Timmons A., Pereira Coutinho J.,
    Preparation and characterization of organosilicon thin films for selective adhesion of Yarrowia lipolytica yeast cells,
    Journal of Ceramic Processing Research 82 (2007) 360-366
  14. Studnička F., Trunec D., Sťahel P., Buršíková V., Kelar L.,
    DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE GLOW DISCHARGE IN N-2 + HMDSO + O-2 ATMOSPHERE,
    Chemické listy 102 (2008) S1510-S1514
  15. Studnička F., Trunec D., Sťahel P., Buršíková V., Kelar L.,
    DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N-2 + HMDSO + O-2 ATMOSPHERE,
    Chemické listy 102 (2008) S1519-S1523
  16. Leroux F., Campagne C., Perwuelz A., Gengembre L.,
    Fluorocarbon nano-coating of polyester fabrics by atmospheric air plasma with aerosol,
    Applied Surface Science 254 (2008) 3902-3908
  17. Kim Y., Lee J., Pham T., Lim J., Yeom G.,
    Plasma-enhanced chemical vapor deposition of SiO2 thin films at atmospheric pressure by using HMDS/Ar/O-2,
    Journal of the Korean Physical Society 53 (2008) 892-896
  18. Mille V., Bourzgui N., Vivien C., Supiot P., Bocquet B., D.,
    ppTMDS as a new polymer technology for a high throughput bio-MEMS design,
    Journal of Micromechanics and Microengineering 18 (2008) 000
  19. Rohani V., Bauville G., Lacour B., Puech V., Duminica F., Silberberg E.,
    Study of the treatment's homogeneity in plasma assisted chemical vapour deposition by atmospheric pressure dielectric barrier discharge,
    Surface and Coatings Technology 203 (2008) 862-867
  20. Šíra M., Trunec D., Sťahel P., Buršíková V., Navrátil Z.,
    Surface modification of polycarbonate in homogeneous atmospheric pressure discharge,
    Journal of Physics D 41 (2008) 015205
  21. Lehocky M., St\'ahel P., Koutny M., Čech J., Institoris J., Mracek A.,
    Adhesion of Rhodococcus sp S3E2 and Rhodococcus sp S3E3 to plasma prepared Teflon-like and organosilicon surfaces,
    Journal of Materials Science 209 (2009) 2871-2875
  22. Kim Y., Lee J., Lim J., Park J., Yeom G.,
    Atmospheric pressure PECVD of SiO(2) thin film at a low temperature using HMDS/O(2)/He/Ar,
    Thin Solid Films 517 (2009) 4065-4069
  23. Lee J., Kim Y., Oh J., Kyung S., Lim J., Yeom G.,
    Characteristics of SiO(x) Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition Using PDMS/O(2)/He,
    Journal of the Electrochemical Society 156 (2009) D248-D252
  24. Fang Z., Xie X., Li J., Yang H., Qiu Y., Kuffel E.,
    Comparison of surface modification of polypropylene film by filamentary DBD at atmospheric pressure and homogeneous DBD at medium pressure in air,
    Journal of Physics D 42 (2009) 999
  25. de Larclause I., Paulmier T., Enache I., Caquineau H., Raynaud P., Massines F., Gherardi N.,
    Conformity of Silica-like Thin Films Deposited by Atmospheric Pressure Townsend Discharge and Transport Mechanisms,
    IEEE Transactions on Plasma Science 37 (2009) 970-978
  26. Morent R., De Geyter N., Van Vlierberghe S., Dubruel P., Leys C., Gengembre L., Schacht E., Payen E.,
    Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge,
    Progress in organic coatings 64 (2009) 304-310
  27. Morent R., De Geyter N., Van Vlierberghe S., ra r., V V., erleyden E., Dubruel P., Leys C., Schacht E.,
    Deposition of Polyacrylic Acid Films by Means of an Atmospheric Pressure Dielectric Barrier Discharge,
    Plasma Chem. Plasma Process. 29 (2009) 103-117
  28. De Geyter N., Morent R., Van Vlierberghe S., Dubruel P., Leys C., Gengembre L., Schacht E., Payen E.,
    Deposition of polymethyl methacrylate on polypropylene substrates using an atmospheric pressure dielectric barrier discharge,
    Progress in organic coatings 64 (2009) 230-237
  29. Hsu C., Wu C.,
    Electrical characterization of the glow-to-arc transition of an atmospheric pressure pulsed arc jet,
    Journal of Physics D 42 (2009) 555
  30. Fang Z., Lin J., Xie X., Qiu Y., Kuffel E.,
    Experimental study on the transition of the discharge modes in air dielectric barrier discharge,
    Journal of Physics D 42 (2009) 888
  31. Petrovic D., Martens T., van Dijk J., Brok W., Bogaerts A.,
    Fluid modelling of an atmospheric pressure dielectric barrier discharge in cylindrical geometry,
    Journal of Physics D 42 (2009) 666
  32. Caquineau H., Enache I., Gherardi N., Naude N., Massines F.,
    Influence of gas flow dynamics on discharge stability and on the uniformity of atmospheric pressure PECVD thin film,
    Journal of Physics D 42 (2009) 777
  33. Huang C., Liu C., Su C., Hsu W., Wu S.,
    Investigation of atmospheric-pressure plasma deposited SiOx films on polymeric substrates,
    Thin Solid Films 517 (2009) 5141-5145
  34. Ivkovic S., Obradovic B., Cvetanovic N., Kuraica M., Puric J.,
    Measurement of electric field development in dielectric barrier discharge in helium,
    Journal of Physics D 42 (2009) 444
  35. Hsu C., Wu C., Chen C., Cheng W.,
    Mode Transition of an Atmospheric Pressure Arc Plasma Jet Sustained by Pulsed DC Power,
    Japanese Journal of Applied Physics 48 (2009) 000
  36. Starostin S., Premkumar P., Creatore M., van Veldhuizen E., de Vries H., Paffen R., S v., en M.,
    On the formation mechanisms of the diffuse atmospheric pressure dielectric barrier discharge in CVD processes of thin silica-like films,
    Plasma Sources Science and Technology 18 (2009) 000
  37. Morent R., De Geyter N., Van Vlierberghe S., Dubruel P., Leys C., Schacht E.,
    Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure,
    Surface and Coatings Technology 203 (2009) 1366-1372
  38. Morent R., De Geyter N., Jacobs T., Van Vlierberghe S., ra r., Dubruel P., Leys C., Schacht E.,
    Plasma-Polymerization of HMDSO Using an Atmospheric Pressure Dielectric Barrier Discharge,
    Plasma Processes and Polymers 6 (2009) S537-S542
  39. Fang Z., Hao L., Yang H., Xie X., Qiu Y., Edmund K.,
    Polytetrafluoroethylene surface modification by filamentary and homogeneous dielectric barrier discharges in air,
    Applied Surface Science 255 (2009) 7279-7285
  40. Topala I., Dumitrascu N., Popa G.,
    Properties of the acrylic acid polymers obtained by atmospheric pressure plasma polymerization,
    Nuclear Instruments and Methods in Physics Research Section B 267 (2009) 442-445
  41. Massines F., Gherardi N., Naude N., Segur P.,
    Recent advances in the understanding of homogeneous dielectric barrier discharges,
    European Physical Journal-Applied Physics 47 (2009) 000
  42. Huang C., Liu C., Wu S.,
    Surface characterization of the SiO(x) films prepared by a remote atmospheric pressure plasma jet,
    Surface and Interface Analysis 41 (2009) 44-48
  43. Br B., enburg R., Navrátil Z., Jánský J., St\'ahel P., Trunec D., Wagner H.,
    The transition between different modes of barrier discharges at atmospheric pressure,
    Journal of Physics D 42 (2009) 22-3727
  44. Boscher N., Choquet P., Duday D., Verdier S.,
    Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge,
    Plasma Processes and Polymers 7 (2010) 163-171
  45. Boscher N., Choquet P., Duday D., Verdier S.,
    Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour,
    Surface and Coatings Technology 205 (2010) 2438-2448
  46. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
    Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
    Journal of Physics D 43 (2010) 225403
  47. Sarra-Bournet C., Gherardi N., Glenat H., Laroche G., Massines F.,
    Effect of C(2)H(4)/N(2) Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H),
    Plasma Chem. Plasma Process. 30 (2010) 213-239
  48. Jacobs T., Morent R., De Geyter N., Desmet T., Dubruel P., Leys C.,
    Effect of humid air exposure between successive helium plasma treatments on PET foils,
    Surface and Coatings Technology 205 (2010) 2256-2261
  49. Morent R., De Geyter N., Trentesaux M., Gengembre L., Dubruel P., Leys C., Payen E.,
    Influence of Discharge Atmosphere on the Ageing Behaviour of Plasma-Treated Polylactic Acid,
    Plasma Chem. Plasma Process. 30 (2010) 525-536
  50. O\'Neill L., Herbert P., Stallard C., Dowling D.,
    Investigation of the Effects of Gas versus Liquid Deposition in an Aerosol-Assisted Corona Deposition Process,
    Plasma Processes and Polymers 7 (2010) 43-50
  51. Premkumar P., Starostin S., Creatore M., de Vries H., Paffen R., Koenraad P., S v., en M.,
    Smooth and Self-Similar SiO(2)-like Films on Polymers Synthesized in Roll-to-Roll Atmospheric Pressure-PECVD for Gas Diffusion Barrier Applications,
    Plasma Processes and Polymers 7 (2010) 635-639
  52. Morent R., De Geyter N., Trentesaux M., Gengembre L., Dubruel P., Leys C., Payen E.,
    Stability study of polyacrylic acid films plasma-polymerized on polypropylene substrates at medium pressure,
    Applied Surface Science 257 (2010) 372-380
  53. Silipr S., i R., Zanini S., Grimoldi E., Fumagalli F., Barni R., Riccardi C.,
    Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process,
    Plasma Chem. Plasma Process. 31 (2011) 353-372
  54. De Geyter N., Morent R., Van Vlierberghe S., Frere-Trentesaux M., Dubruel P., Payen E.,
    Effect of electrode geometry on the uniformity of plasma-polymerized methyl methacrylate coatings,
    Progress in organic coatings 70 (2011) 293-299
  55. Fanelli F., d'Agostino R., Fracassi F.,
    GC-MS Investigation of Hexamethyldisiloxane-Oxygen Fed Cold Plasmas: Low Pressure Versus Atmospheric Pressure Operation,
    Plasma Processes and Polymers 8 (2011) 932-941
  56. Gil E., Park J., Oh J., Jhon M., Yeom G.,
    Ion Bombardment during the Deposition of SiO(X) by AC-Biasing in a Remote-Type Atmospheric Pressure Plasma System,
    Journal of the Electrochemical Society 158 (2011) G58-G62
  57. Tranchida D., Pihan S., Zhang Y., Schoenherr H., Berger R.,
    Nanomechanical Properties of Advanced Plasma Polymerized Coatings for Mechanical Data Storage,
    Journal of Physical Chemistry B 115 (2011) 3385-3391
  58. De Geyter N., Morent R., Van Vlierberghe S., Dubruel P., Leys C., Schacht E.,
    Plasma polymerisation of siloxanes at atmospheric pressure,
    Surface Engineering 27 (2011) 627-633
  59. Massines F., Sarra-Bournet C., Fanelli F., Naude N., Gherardi N.,
    Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition,
    Plasma Processes and Polymers 9 (2012) 1041-1073
  60. Wu Y., Ye Q., Li X., Tan D.,
    Classification of Dielectric Barrier Discharges Using Digital Image Processing Technology,
    IEEE Transactions on Plasma Science 40 (2012) 1371-1379
  61. Fanelli F., Lovascio S., d\'Agostino R., Fracassi F.,
    Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors,
    Plasma Processes and Polymers 9 (2012) 1132-1143
  62. Maurau R., Boscher N., Guillot J., Choquet P.,
    Nitrogen Introduction in pp-HMDSO Thin Films Deposited by Atmospheric Pressure Dielectric Barrier Discharge: An XPS Study,
    Plasma Processes and Polymers 9 (2012) 316-323
  63. Noborisaka M., Hirako T., Shirakura A., Watanabe T., Morikawa M., Seki M., Suzuki T.,
    Synthesis of Diamond-Like Carbon Films on Planar and Non-Planar Geometries by the Atmospheric Pressure Plasma Chemical Vapor Deposition Method,
    Japanese Journal of Applied Physics 51 (2012) 0000
  64. Duan X., He F., Ouyang J.,
    Uniformity of a dielectric barrier glow discharge: experiments and two-dimensional modeling,
    Plasma Sources Science and Technology 21 (2012) 0000
  65. Wu Y., Ye Q., Li X., Tan D., Shao G.,
    Applications of autocorrelation function method for spatial characteristics analysis of dielectric barrier discharge,
    Vacuum 91 (2013) 28-34


114. Klapetek P., Ohlídal I., Navrátil K.,
Atomic force microscopy analysis of statistical roughness of GaAs surfaces originated by thermal oxidation,
Microchimica Acta 147 (2004) 175–180 (5× cited)

Cited in

  1. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  2. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
    Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
    Applied Surface Science 244 (2005) 338–342
  3. Gutierrez A., Munuera C., Lopez M., Jimenez J., Morant C., Matzelle T., Kruse N., Ocal C.,
    Surface microstructure of the oxide protective layers grown on vanadium-free Ti alloys for use in biomedical applications,
    Surface Science 600 (2006) 3780–3784
  4. Tian G., Lu R., Gledhill D.,
    Surface measurement using active vision and light scattering,
    Optics and Lasers in Engineering 45 (2007) 131–139
  5. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


113. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
Surface and Interface Analysis 36 (2004) 1203–1206 (3× cited)

Cited in

  1. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  2. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  3. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402


112. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 393–398 (20× cited)

Cited in

  1. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Páleníková K.,
    Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
    Diamond and Related Materials 14 (2005) 1835–1838
  2. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
    Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
    Diamond and Related Materials 14 (2005) 1795–1798
  3. Buršíková V., Zajíčková L., Dvořák P., Valtr M., Buršík J., Bláhová O., Peřina V., Janča J.,
    Influence of Silicon, Oxygen and Nitrogen Admixtures Upon the Properties of Plasma Deposited Amorphous Diamond-Like Carbon Coatings,
    Journal of Advanced Oxidation Technologies 9 (2006) 232–236
  4. Meškinis Š., Kopustinskas V., Šlapikas K., Tamulevičius S., Guobienë A., Gudaitis R., Grigaliūnas V.,
    Ion beam synthesis of the diamond like carbon films for nanoimprint lithography applications,
    Thin Solid Films 515 (2006) 636–639
  5. Meškinis Š., Kopustinskas V., Šlapikas K., Tamulevičius S., Guobienë A., Gudaitis R., Grigaliūnas V.,
    Ion beam synthesis of the diamond like carbon films for nanoimprint lithography applications,
    Thin Solid Films 515 (2006) 636–639
  6. Frgala Z., Jašek O., Karásková M., Zajíčková L., Buršíková V., Franta D., Matějková J., Rek A., Klapetek P., Buršík J.,
    Microwave PECVD of nanocrystalline diamond with RF induced bias nucleation,
    Czechoslovak Journal of Physics 56 (2006) B1218–B1223
  7. Kopustinskas V., Meškinis Š., Tamulevičius S., Andrulevičius M., Čižiūtė B., Niaura G.,
    Synthesis of the silicon and silicon oxide doped a-C:H films from hexamethyldisiloxane vapor by DC ion beam,
    Surface and Coatings Technology 200 (2006) 6240–6244
  8. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  9. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Sobota J., Klapetek P., Bláhová O., Peřina V.,
    Deposition and characterisation of nanostructured silicon-oxide containing diamond-like carbon coatings,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 491–495
  10. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  11. Hertwig A., Krueger J., Weise M., Beck U.,
    Hydrogen-Containing Amorphous Carbon Layers as Optical Materials in the Near-IR Spectral Range,
    Plasma Processes and Polymers 4 (2007) S76-S82
  12. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  13. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  14. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  15. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  16. Buršíková V., Bláhová O., Karásková M., Zajíčková L., Jašek O., Franta D., Klapetek P., Buršík J.,
    Mechanical properties of ultrananocrystalline thin films deposited using dual frequency discharges,
    Chemické listy 105 (2011) S98-S101
  17. Zhao J., Yang P.,
    A method for determining ultrathin DLC film thickness by spectroscopic ellipsometry,
    Microchimica Acta 18 (2012) 1455-1461
  18. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
    Proc.: Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
    Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147
  19. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
    Proc.: Optical measurement of mechanical stresses in diamond-like carbon films,
    Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728
  20. Meškinis Š., Kopustinskas V., Šlapikas K., Gudaitis R., Tamulevičius S., Niaura G., Rinnerbauer V., Hingerl K.,
    Proc.: Optical properties of the undoped and SiOx doped DLC films - art. no. 65961L,
    Advanced Optical Materials, Technologies, and Devices (2007) L5961


111. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 399–403 (12× cited)

Cited in

  1. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  2. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  3. Agarwal P., Srivastava A., Deva D.,
    Changes in surface topography of amorphous silicon germanium films after light soaking,
    Journal of Applied Physics 101 (2007) 083504
  4. Mykhaylyk T., Dmitruk N., Evans S., Hamley I., Henderson J.,
    Comparative characterisation by atomic force microscopy and ellipsometry of soft and solid thin films,
    Surface and Interface Analysis 39 (2007) 575–581
  5. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  6. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  7. Malainho E., Vasilevskiy M., Alpuim P., Filonovich S.,
    Dielectric function of hydrogenated amorphous silicon near the optical absorption edge,
    Journal of Applied Physics 106 (2009) 073110
  8. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  9. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62
  10. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  11. Alvarez-Macias C., Santoyo-Salazar J., Monroy B., Garcia-Sanchez M., Picquart M., Ponce A., Contreras-Puente G., Santana G.,
    Structure and morphology of films of pm-Si:H grown by PECVD varying dichlorosilane with hydrogen dilution and working pressure,
    Revista Mexicana de Fisica 57 (2011) 224-231
  12. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244


110. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical properties of ZnTe films prepared by molecular beam epitaxy,
Thin Solid Films 468 (2004) 193–202 (11× cited)

Cited in

  1. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  2. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  3. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602
  4. Heo P., Ichino R., Okido M.,
    ZnTe electrodeposition from organic solvents,
    Electrochimica Acta 51 (2006) 6325–6330
  5. Kotlyarchuk B., Savchuk V.,
    Investigation of ZnTe thin films grown by Pulsed Laser Deposition method,
    Physica Status Solidi B 244 (2007) 1714–1719
  6. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402
  7. Ahmed F., Naciri A., Grob J., Stchakovsky M., Johann L.,
    Dielectric function of ZnTe nanocrystals by spectroscopic ellipsometry,
    Nanotechnology 20 (2009) 305702
  8. Xu S., Wang C., Cui Y.,
    Influence of ligand and solvent on characters of ZnTe clusters,
    Journal of Molecular Structure 938 (2009) 133–136
  9. Gandhi T., Raja K., Misra M.,
    Synthesis of ZnTe nanowires onto TiO2 nanotubular arrays by pulse-reverse electrodeposition,
    Thin Solid Films 517 (2009) 4527–4533
  10. Mahalingam T., Dhanasekaran V., Sundaram ., Kathalingam A., Rhee J.,
    Characterization of electroplated ZnTe Coatings,
    Ionics 18 (2012) 299-306
  11. Diso D., Fauzi F., Echendu O., Weerasinghe A., Dharmadasa I.,
    Proc.: Electrodeposition and characterisation of ZnTe layers for application in CdTe based multi-layer graded bandgap solar cells,
    Condensed Matter and Materials Physics Conference (CMMP10) (2011) 012040


109. Klapetek P., Ohlídal I., Bílek J.,
Influence of the atomic force microscope tip on the multifractal analysis of rough surfaces,
Ultramicroscopy 102 (2004) 51–59 (1× cited)

Cited in

  1. Sperling B., Abelson J.,
    Kinetic roughening of amorphous silicon during hot-wire chemical vapor deposition at low temperature,
    Journal of Applied Physics 101 (2007) 024915


108. Čech J., Sťahel P., Šíra M., Buršíková V., Navrátil Z., Trunec D., Brablec A.,
Thermal stability of coatings prepared in atmospheric pressure glow discharge,
Czechoslovak Journal of Physics 54(Part 5) (2004) C872-C876

107. Brzobohatý O., Buršíková V., Trunec D.,
Mirror effect in PECVD reactor and its explanation via MC-PIC computer simulation,
Czechoslovak Journal of Physics 54(Part 4) (2004) C527-C532

106. Slavíček P., Buršíková V., Brablec A., Kapicka V., Klíma M.,
Deposition of polymer films by rf discharge at atmospheric pressure,
Czechoslovak Journal of Physics 54(Part 4) (2004) C586-C591

105. Navrátil Z., Buršíková V., Sťahel P., Šíra M., Zverina P.,
On the analysis of surface free energy of DLC coatings deposited in low pressure RF discharge,
Czechoslovak Journal of Physics 54(Part 5) (2004) C877-C882

104. Sťahel P., Buršíková V., Šíra M., Navrátil Z., Delgado M., Janča J.,
Deposition of teflon like coatings in surface barrier discharge,
Czechoslovak Journal of Physics 54(Part 5) (2004) C866-C871

103. Šíra M., Sťahel P., Buršíková V., Vohánka J., Trunec D.,
Activation of polyethylene and polypropylene in atmospheric pressure glow discharge,
Czechoslovak Journal of Physics 54(Part 5) (2004) C835-C839

2003

102. Klapetek P., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Atomic force microscopy characterization of ZnTe epitaxial films,
Acta Physica Slovaca 53 (2003) 223–230 (5× cited)

Cited in

  1. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  2. Antoš R., Mistrík J., Yamaguchi T., Višňovský Š., Demokritov S., Hillebrands B.,
    Evaluation of the quality of Permalloy gratings by diffracted magneto-optical spectroscopy,
    Optics Express 13 (2005) 4651–4656
  3. Haško D., Bruncko J.,
    AFM surface analysis of ZnO layers prepared by pulsed laser deposition at different oxygen pressures,
    Vacuum 84 (2009) 166–16
  4. Gentry K., Gredig T., Schuller I.,
    Asymmetric grain distribution in phthalocyanine thin films,
    Physical Review B 80 (2009) 174118
  5. Koestenbauer H., Fontalvo G., Mitterer C., Hlawacek G., Teichert C., Keckes J.,
    Structure, Stresses and Stress Relaxation of TiN/Ag Nanocomposite Films,
    Journal of Nanoscience and Nanotechnology 9 (2009) 3606–3610


101. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
New dispersion model of the optical constants of the DLC films,
Acta Physica Slovaca 53 (2003) 373–384 (13× cited)

Cited in

  1. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Páleníková K.,
    Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
    Diamond and Related Materials 14 (2005) 1835–1838
  2. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
    Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
    Diamond and Related Materials 14 (2005) 1795–1798
  3. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  4. Hertwig A., Krueger J., Weise M., Beck U.,
    Hydrogen-Containing Amorphous Carbon Layers as Optical Materials in the Near-IR Spectral Range,
    Plasma Processes and Polymers 4 (2007) S76-S82
  5. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  6. Brzobohatý O., Buršíková V., Nečas D., Valtr M., Trunec D.,
    Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation,
    Journal of Physics D 41 (2008) 035213
  7. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  8. Ohlídal I., Nečas D., Buršíková V., Franta D., Ohlídal M.,
    Optical characterization of diamond-like carbon thin films non-uniform in thickness using spectroscopic reflectometry,
    Diamond and Related Materials 17 (2008) 709–712
  9. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
    Optical characterization of non-stoichiometric silicon nitride films,
    Physica Status Solidi C 5 (2008) 1320–1323
  10. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  11. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  12. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
    Proc.: Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
    Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147
  13. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
    Proc.: Optical measurement of mechanical stresses in diamond-like carbon films,
    Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728


100. Zajíčková L., Subedi D., Buršíková V., Veltruská K.,
Study of Argon Plasma Treatment of Polycarbonate Substrate and its Effect on Film Deposition,
Acta Physica Slovaca 53 (2003) 489–504 (11× cited)

Cited in

  1. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  2. Zajíčková L., Buršíková V., Kučerová Z., Franclová J., Sťahel P., Peřina V., Macková A.,
    Organosilicon Thin Films Deposited by Plasma Enhanced CVD: Thermal Changes of Chemical Structure and Mechanical Properties,
    Journal of Physics and Chemistry of Solids 68 (2007) 1255–1259
  3. Panwar A., Barthwal S., Ray S.,
    Variation of lap shear tensile strength of polycarbonate-mild steel adhesive joints with DC glow discharge modified polycarbonate,
    Metallurgical and Materials Transactions A-Physical Metallurgy and Materials Science 38A (2007) 197-202
  4. Panwar A., Barthwal S., Shivaprasad S., Ray S.,
    Physico-chemical characterization of a polycarbonate (PC) surface modified by exposure to dc glow discharge in air,
    Journal of Physics D 41 (2008) 001
  5. Subedi D., Madhup D., Adhikari K., Joshi U.,
    Plasma treatment at low pressure for the enhancement of wettability of polycarbonate,
    Indian Journal of Pure & Applied Physics 46 (2008) 540-544
  6. Šíra M., Trunec D., Sťahel P., Buršíková V., Navrátil Z.,
    Surface modification of polycarbonate in homogeneous atmospheric pressure discharge,
    Journal of Physics D 41 (2008) 015205
  7. Panwar A., Barthwal S., Ray S.,
    Aging and Annealing Behavior of Polycarbonate Surfaces Modified by Direct-Current Glow Discharge in Air,
    Journal of Applied Polymer Science 112 (2009) 700-708
  8. Gomathi N., Eswaraiah C., Neogi S.,
    Surface Modification of Polycarbonate by Radio-Frequency Plasma and Optimization of the Process Variables with Response Surface Methodology,
    Journal of Applied Polymer Science 114 (2009) 1557-1566
  9. Gomathi N., Neogi S.,
    Surface modification of polypropylene using argon plasma: Statistical optimization of the process variables,
    Applied Surface Science 255 (2009) 7590-7600
  10. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697
  11. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
    Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
    Thin Solid Films 519 (2011) 4299-4308


99. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical constants of ZnTe and ZnSe epitaxial thin films,
Acta Physica Slovaca 53 (2003) 95–104 (2× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  2. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602


98. Franta D., Ohlídal I., Frumar M., Jedelský J.,
Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
Applied Surface Science 212–213 (2003) 116–121 (23× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
    Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
    Surface and Interface Analysis 36 (2004) 1203–1206
  2. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  3. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
    Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
    Chalcogenide Letters 1 (2004) 1–10
  4. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 393–398
  5. Tanemura S., Miao L., Koide S., Mori Y., Jin P., Terai A., Nabatova-Gabain N.,
    Optical properties of metal and semiconductor SmS thin films fabricated by rf/dc dual magnetron sputtering,
    Applied Surface Science 238 (2004) 360–366
  6. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  7. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
    Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 38 (2006) 842–846
  8. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
    Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
    Journal of Non-Crystalline Solids 352 (2006) 5633–5641
  9. Valtr M., Ohlídal I., Franta D.,
    Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
    Czechoslovak Journal of Physics 56 (2006) B1103–B1109
  10. Zajíčková L., Buršíková V., Franta D., Bousquet A., Granier A., Goullet A., Buršík J.,
    Comparative study of films deposited from HMDSO/O2 in continuous wave and pulsed rf discharges,
    Plasma Processes and Polymers 4 (2007) S287–S293
  11. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  12. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  13. Valtr M., Klapetek P., Ohlídal I., Franta D.,
    UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624
  14. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
    Optical characterization of non-stoichiometric silicon nitride films,
    Physica Status Solidi C 5 (2008) 1320–1323
  15. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  16. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  17. Ohlídal I., Nečas D., Franta D., Buršíková V.,
    Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
    Diamond and Related Materials 18 (2009) 364–367
  18. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  19. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  20. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62
  21. Nečas D., Ohlídal I., Franta D.,
    The reflectance of non-uniform thin films,
    Journal of Optics A: Pure and Applied Optics 11 (2009) 045202
  22. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  23. Zajíčková L., Kučerová Z., Franta D., Buršíková V., Peřina V., Macková A.,
    Proc.: Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane,
    Proceedings of Organic/Inorganic Hybrid Materials, MRS (2008) 159-164


97. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx,
Diamond and Related Materials 12 (2003) 1532–1538 (16× cited)

Cited in

  1. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Páleníková K.,
    Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
    Diamond and Related Materials 14 (2005) 1835–1838
  2. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  3. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Sobota J., Klapetek P., Bláhová O., Peřina V.,
    Deposition and characterisation of nanostructured silicon-oxide containing diamond-like carbon coatings,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 491–495
  4. Hertwig A., Krueger J., Weise M., Beck U.,
    Hydrogen-Containing Amorphous Carbon Layers as Optical Materials in the Near-IR Spectral Range,
    Plasma Processes and Polymers 4 (2007) S76-S82
  5. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  6. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  7. Ohlídal I., Nečas D., Buršíková V., Franta D., Ohlídal M.,
    Optical characterization of diamond-like carbon thin films non-uniform in thickness using spectroscopic reflectometry,
    Diamond and Related Materials 17 (2008) 709–712
  8. Zhang Z., Zhou H., Guo D., Gao H., Kang R.,
    Optical characterization of hydrogen-free CeO2 doped DLC films deposited by unbalanced magnetron sputtering,
    Applied Surface Science 255 (2008) 2655–2659
  9. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
    Optical characterization of non-stoichiometric silicon nitride films,
    Physica Status Solidi C 5 (2008) 1320–1323
  10. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  11. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  12. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62
  13. Bereznai M., Budai J., Hanyecz I., Kopniczky ., Veres ., Koós M., Toth Z.,
    Ellipsometric study of nanostructured carbon films deposited by pulsed laser deposition,
    Thin Solid Films 519 (2011) 2989-2993
  14. Tamuleviciene A., Meškinis Š., Kopustinskas V., Tamulevičius S.,
    Multilayer amorphous hydrogenated carbon (a-C:H) and SiOx doped a-C:H films for optical applications,
    Thin Solid Films 519 (2011) 4004-4007
  15. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
    Proc.: Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
    Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147
  16. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
    Proc.: Optical measurement of mechanical stresses in diamond-like carbon films,
    Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728


96. Klapetek P., Ohlídal I., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Atomic force microscopy characterization of ZnTe epitaxial thin films,
Japanese Journal of Applied Physics 42 (2003) 4706–4709 (1× cited)

Cited in

  1. Palacios-Lidon E., Guanter L., Zuniga-Perez J., Munoz-Sanjose V., Colchero J.,
    Nanogoniometry with scanning force microscopy: A model study of CdTe thin films,
    Small 3 (2007) 474–480


95. Ohlídal M., Ohlídal I., Klapetek P., Jákl M., Čudek V., Eliáš M.,
New method for the complete optical analysis of thin films nonuniform in optical parameters,
Japanese Journal of Applied Physics 42 (2003) 4760–4763 (1× cited)

Cited in

  1. Henrie J., Parsons E., Hawkins A., Schultz S.,
    Spectrum sampling reflectometer,
    Surface and Interface Analysis 37 (2005) 568–572


94. Zajíčková L., Buršíková V., Peřina V., Macková A., Janča J.,
Correlation Between SiOx Content and Properties of DLC : SiOx Films Prepared by PECVD,
Surface and Coatings Technology 174 (2003) 281–285 (22× cited)

Cited in

  1. Zsidai L., Samyn P., Vercammen K., Van Acker K., Kozma M., Kalacska G., De Baets P.,
    Friction and thermal effects of engineering plastics sliding against steel and DLN-coated counterfaces,
    Tribology Letters 17 (2004) 269-288
  2. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 393–398
  3. Toth A., Mohai M., Ujvari T., Bertoti I.,
    Chemical structure of silicon-, oxygen- and nitrogen-containing a-C : H films prepared by RF plasma beam CVD,
    Thin Solid Films 482 (2005) 183-187
  4. Toth A., Mohai M., Ujvari T., Bertoti I.,
    Nanomechanical properties of silicon-, oxygen- and nitrogen-containing a-C : H films prepared by RF plasma beam CVD,
    Thin Solid Films 482 (2005) 188-191
  5. Toth A., Mohai M., Ujvari T., Bertoti I.,
    Surface and nanomechanical properties of Si : C : H films prepared by RF plasma beam CVD,
    Diamond and Related Materials 14 (2005) 954-958
  6. Toth A., Mohai A., Ujvari T., Bertoti I.,
    Composition, structure and nanomechanical properties of C-Si-N thin films deposited by ion implantation assisted plasma beam CVD,
    Surface and Coatings Technology 200 (2006) 6420-6424
  7. Samyn P., Schoukens G., Quintelier J., De Baets P.,
    Friction, wear and material transfer of sintered polyimides sliding against various steel and diamond-like carbon coated surfaces,
    Tribology International 39 (2006) 575-589
  8. Buršíková V., Zajíčková L., Dvořák P., Valtr M., Buršík J., Bláhová O., Peřina V., Janča J.,
    Influence of Silicon, Oxygen and Nitrogen Admixtures Upon the Properties of Plasma Deposited Amorphous Diamond-Like Carbon Coatings,
    Journal of Advanced Oxidation Technologies 9 (2006) 232–236
  9. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Sobota J., Klapetek P., Bláhová O., Peřina V.,
    Deposition and characterisation of nanostructured silicon-oxide containing diamond-like carbon coatings,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 491–495
  10. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  11. Meškinis Š., Tamulevičius S., Kopustinskas V., Andrulevicius A., Guobienë A., Guldaitis R., Liutviniene I.,
    Hydrophobic properties of the ion beam deposited DLC films containing SiOx,
    Thin Solid Films 515 (2007) 7615-7618
  12. Ren F., Case E., Timm E., Schock H.,
    Hardness as a function of composition for n-type LAST thermoelectric material,
    Journal of Alloys and Compounds 455 (2008) 340-345
  13. Brzobohatý O., Buršíková V., Nečas D., Valtr M., Trunec D.,
    Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation,
    Journal of Physics D 41 (2008) 035213
  14. Kelar L., Buršíková V., Sťahel P., Bochnicek Z., Peřina V., Buršík J.,
    PREPARATION AND CHARACTERISATION OF CARBON FILMS PREPARED FROM HMDSZ/METHANE/NITROGEN OR HYDROGEN MIXTURE USING PECVD,
    Chemické listy 102 (2008) S1478-S1481
  15. Ryoo H., Nikiforov S., Rim G., Shenderey S., Oh H., Chung S.,
    DLC Coatings by PI(3)D: Low-Voltage versus High-Voltage Biasing,
    Acta Physica Polonica A 115 (2009) 1146-1148
  16. Randeniya L., Bendavid A., Martin P., Amin M., Preston E.,
    Molecular structure of SiO(x)-incorporated diamond-like carbon films; evidence for phase segregation,
    Diamond and Related Materials 18 (2009) 1167-1173
  17. Choudhury A., Chutia J., Kakati H., Barve S., Pal A., Sen Sarma N., Chowdhury D., Patil D.,
    Studies of radiofrequency plasma deposition of hexamethyldisiloxane films and their thermal stability and corrosion resistance behavior,
    Vacuum 84 (2010) 1327–1333
  18. Bertoti I., Toth A., Mohai M., Szepvoelgyi J.,
    Chemical structure and mechanical properties of Si-containing a-C:H and a-C thin films and their Cr- and W-containing derivatives,
    Surface and Coatings Technology 206 (2011) 630-639
  19. Tamuleviciene A., Meškinis Š., Kopustinskas V., Tamulevičius S.,
    Multilayer amorphous hydrogenated carbon (a-C:H) and SiOx doped a-C:H films for optical applications,
    Thin Solid Films 519 (2011) 4004-4007
  20. Meškinis Š., Tamuleviciene A.,
    Structure, Properties and Applications of Diamond Like Nanocomposite (SiO(x) Containing DLC) Films: A Review,
    Materials Science-Medziagotyra 17 (2011) 358-370
  21. Meškinis Š., Kopustinskas V., Šlapikas K., Gudaitis R., Tamulevičius S., Niaura G., Rinnerbauer V., Hingerl K.,
    Proc.: Optical properties of the undoped and SiOx doped DLC films - art. no. 65961L,
    Advanced Optical Materials, Technologies, and Devices (2007) L5961
  22. Nikiforov S., Ryoo H., Oh H., Rim G.,
    Proc.: (PID)-D-3 processing of DLC coatings for different applications,
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 4 (2008) 968-972


93. Zajíčková L., Rudakowski S., Becker H., Meyer D., Valtr M., Wiesemann K.,
Study of Plasma Polymerization from Acetylene in Pulsed RF Discharges,
Thin Solid Films 425 (2003) 72–84 (12× cited)

Cited in

  1. Matsuura H., Tanikawa T., Takaba H., Fujiwara Y.,
    Alcohol polymerization using electron emission,
    Applied Surface Science 227 (2004) 215-218
  2. Matsuura H., Tanikawa T., Takaba H., Fujiwara Y.,
    Fixing atmospheric nitrogen in alcohol during plasma-induced alcohol polymerization,
    Journal of Physical Chemistry B 108 (2004) 17748-17750
  3. Matsuura H., Tanikawa T., Takaba H., Fujiwara Y.,
    Production of an alcohol-based hydrogen storing polymer,
    Journal of Physical Chemistry A 108 (2004) 3235-3237
  4. Stahr F., Schade K., Kuske J., Rohlecke S., Steinke O.,
    Large area VHF plasma polymerisation electrode system,
    Surface and Coatings Technology 200 (2005) 490-493
  5. Kutasi K., Bibinov N., von Keudell A., Wiesemann K.,
    Wettabilities of plasma deposited polymer films,
    Journal of Optoelectronics and Advanced Materials 7 (2005) 2549-2556
  6. Myung S., Choi H.,
    Chemical structure and surface morphology of plasma polymerized-allylamine film,
    Korean Journal of Chemical Engineering 23 (2006) 505-511
  7. Louh S., Wong C., Hon M.,
    Effects of acetylene on property of plasma amorphous carbon films,
    Thin Solid Films 498 (2006) 235-239
  8. Buck V.,
    Evidence for charged or polar precursors in diamond nucleation,
    Journal of Optoelectronics and Advanced Materials 10 (2008) 85-90
  9. Deilmann M., Grabowski M., Theiss S., Bibinov N., Awakowicz P.,
    Permeation mechanisms of pulsed microwave plasma deposited silicon oxide films for food packaging applications,
    Journal of Physics D 41 (2008) 111
  10. Chuang T., Chen M., Lin F.,
    Preparation and surface characterization of HMDI-activated 316L stainless steel for coronary artery stents,
    Journal of Biomedical Materials Research Part A 85A (2008) 722-730
  11. Cruz G., Olayo M., Fern F., ez G., Vasquez-Ortega M., Morales-Corona J., Olayo R.,
    Micro- and Mesostructures in Plasma Polymers of Trichloroethylene,
    IEEE Transactions on Plasma Science 37 (2009) 1675-1682
  12. Rangel E., de Souza E., de Moraes F., Marins N., Schreiner W., Cruz N.,
    Development of amorphous carbon protective coatings on poly(vinyl)chloride,
    Thin Solid Films 518 (2010) 2750-2756


92. Klapetek P., Ohlídal I.,
Theoretical analysis of the atomic force microscopy characterization of columnar thin films,
Ultramicroscopy 94 (2003) 19–29 (9× cited)

Cited in

  1. Smith J., Breakspear S., Campbell S.,
    AFM in surface finishing: Part II. Surface roughness,
    Transactions of the Institute of Metal Finishing 81 (2003) B55–B58
  2. Gutierrez H., Nakabayashi D., Silva P., Bortoleto J., Rodrigues V., Clerici J., Cotta M., Ugarte D.,
    Carbon nanotube probe resolution: a quantitative analysis using Fourier Transform,
    Physica Status Solidi A 201 (2004) 888–893
  3. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  4. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  5. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  6. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602
  7. Danzebrink H., Koenders L., Wilkening G., Yacoot A., Kunzmann H.,
    Advances in scanning force microscopy for dimensional metrology,
    CIRP Annals: Manufacturing Technology 55 (2006) 841–878
  8. Bronsveld P., Rath J., Schropp R., Mates T., Fejfar A., Rezek B., Kočka J.,
    Internal structure of mixed phase hydrogenated silicon thin films made at 39 degrees C,
    Applied Physics Letters 89 (2006) 051922
  9. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


91. Drnovska H., Lapcik L., Buršíková V., Zemek J., Barros-Timmons A.,
Surface properties of polyethylene after low-temperature plasma treatment,
Colloid and Polymer Science 281(11) (2003) 1025-1033

2002

90. Zajíčková L., Dvořák P., Kudrle V., Šmíd R.,
Study of Mode Transition in Low Pressure Capacitive RF Discharges in Nitrogen,
Czechoslovak Journal of Physics 52 (2002) 427–432

89. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
Diamond and Related Materials 11 (2002) 105–117 (21× cited)

Cited in

  1. Zajíčková L., Buršíková V., Peřina V., Macková A., Janča J.,
    Correlation Between SiOx Content and Properties of DLC : SiOx Films Prepared by PECVD,
    Surface and Coatings Technology 174 (2003) 281–285
  2. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  3. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  4. Zajíčková L., Rudakowski S., Becker H., Meyer D., Valtr M., Wiesemann K.,
    Study of plasma polymerization from acetylene in pulsed r.f. discharges,
    Thin Solid Films 425 (2003) 72-84
  5. Akaoglu B., Atilgan I., Katircioglu B.,
    Thickness and optical constant distributions of PECVD a-SiCx:H thin films along electrode radial direction,
    Thin Solid Films 437 (2003) 257–265
  6. Zapien J., Collins R.,
    Determination of the optical functions of carbon-based materials using transmittance, reflectance and spectroscopic ellipsometry – A critical review,
    New Diamond and Frontier Carbon Technology 14 (2004) 129–145
  7. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
    Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
    Applied Surface Science 244 (2005) 338–342
  8. Franta D., Negulescu B., Thomas L., Dahoo P., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
    Optical properties of NiO thin films prepared by pulsed laser deposition technique,
    Applied Surface Science 244 (2005) 426–430
  9. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
    Optical properties of rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 244 (2005) 431-434
  10. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
    Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 244 (2005) 431–434
  11. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
    Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
    Diamond and Related Materials 14 (2005) 1795–1798
  12. Singha A., Ghosh A., Roy A., Ray N.,
    Quantitative analysis of hydrogenated diamondlike carbon films by visible Raman spectroscopy,
    Journal of Applied Physics 100 (2006) 044910
  13. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  14. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  15. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402
  16. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Buršíková V.,
    Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
    Diamond and Related Materials 18 (2009) 384–387
  17. Smietana M., Korwin-Pawlowski M., Grabarczyk J., Szmidt J.,
    Correlation between thickness and optical properties of thin diamond-like carbon films deposited with RF PACVD method,
    Materials Science and Engineering B 165 (2009) 132–134
  18. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  19. Zhou Y., Wu G., Dai W., Li H., Wang A.,
    Accurate determination of optical constants and thickness of absorbing thin films by a combined ellipsometry and spectrophotometry approach,
    Review of Scientific Instruments 59 (2010) 2356–2363
  20. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  21. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
    Proc.: Optical measurement of mechanical stresses in diamond-like carbon films,
    Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728


88. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Influence of overlayers on determination of the optical constants of ZnSe thin films,
Journal of Applied Physics 92 (2002) 1873–1880 (7× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  2. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  3. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  4. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  5. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602
  6. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
    Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
    Applied Surface Science 244 (2005) 338–342
  7. Henrie J., Parsons E., Hawkins A., Schultz S.,
    Spectrum sampling reflectometer,
    Surface and Interface Analysis 37 (2005) 568–572


87. Buršíková V., Sládek P., Sťahel P., Zajíčková L.,
Improvement of the Efficiency of the Silicon Solar Cells by Silicon Incorporated Diamond-Like Carbon Antireflective Coatings,
Journal of Non-Crystalline Solids 299 (2002) 1147–1151 (12× cited)

Cited in

  1. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  2. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx,
    Diamond and Related Materials 12 (2003) 1532–1538
  3. Alberti M., Spalt Z., Pena-Mendez E., Ramirez-Galicia G., Havel J.,
    Laser ablation synthesis of selenium superoxide anion SeO((4))over-bar via selenium trioxide photolysis. Time-of-flight mass spectrometry and ab initio calculations,
    Rapid Communications in Mass Spectrometry 19 (2005) 3405-3410
  4. Valtr M., Ohlídal I., Franta D.,
    Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
    Czechoslovak Journal of Physics 56 (2006) B1103–B1109
  5. Valtr M., Klapetek P., Ohlídal I., Franta D.,
    UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624
  6. Tamuleviciene A., Meškinis Š., Kopustinskas V., Tamulevičius S.,
    Diamond like Carbon Film as Potential Antireflective Coating for Silicon Solar Cells,
    Materials Science-Medziagotyra 16 (2010) 103-107
  7. da Silva D., Cortes A., Oliveira J., Motta E., Viana G., Mei P., Marques F.,
    Application of amorphous carbon based materials as antireflective coatings on crystalline silicon solar cells,
    Journal of Applied Physics 110 (2011) 000
  8. Tamuleviciene A., Meškinis Š., Kopustinskas V., Tamulevičius S.,
    Multilayer amorphous hydrogenated carbon (a-C:H) and SiOx doped a-C:H films for optical applications,
    Thin Solid Films 519 (2011) 4004-4007
  9. Meškinis Š., Tamuleviciene A.,
    Structure, Properties and Applications of Diamond Like Nanocomposite (SiO(x) Containing DLC) Films: A Review,
    Materials Science-Medziagotyra 17 (2011) 358-370
  10. Ahmed S., Banerjee D., Mitra M., Chattopadhyay K.,
    Visible photoluminescence from silicon-incorporated diamond like carbon films synthesized via direct current PECVD technique,
    Journal of Luminescence 131 (2011) 2352-2358
  11. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
    Proc.: Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
    Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147
  12. Ciuciulkaite A., Tamuleviciene A., Kopustinskas V., Meškinis Š., Tamulevičius S.,
    Proc.: INVESTIGATION OF THE OPTICAL AND WETTING PROPERTIES OF SiOx DOPED DLC FILMS,
    RADIATION INTERACTION WITH MATERIAL AND ITS USE IN TECHNOLOGIES 2012 (2012) 403-406


86. Buršíková V., Navrátil V., Zajíčková L., Janča J.,
Temperature Dependence of Mechanical Properties of DLC/Si Protective Coatings Prepared by PECVD,
Materials Science and Engineering A 324 (2002) 251–254 (35× cited)

Cited in

  1. Zajíčková L., Buršíková V., Peřina V., Macková A., Janča J.,
    Correlation Between SiOx Content and Properties of DLC : SiOx Films Prepared by PECVD,
    Surface and Coatings Technology 174 (2003) 281–285
  2. Zajíčková L., Buršíková V., Peřina V., Macková A., Janča J.,
    Correlation Between SiOx Content and Properties of DLC : SiOx Films Prepared by PECVD,
    Surface and Coatings Technology 174 (2003) 281–285
  3. Leng Y., Chen J., Yang P., Sun H., Wan G., Huang N.,
    Mechanical properties and thermomechanical stability of diamond-like carbon films synthesized by pulsed vacuum arc plasma deposition,
    Surface and Coatings Technology 173 (2003) 67-73
  4. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  5. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx,
    Diamond and Related Materials 12 (2003) 1532–1538
  6. Navrátil Z., Buršíková V., Sťahel P., Šíra M., Zverina P.,
    On the analysis of surface free energy of DLC coatings deposited in low pressure RF discharge,
    Czechoslovak Journal of Physics 54 (2004) C877-C882
  7. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 393–398
  8. Rašková Z., Brandejs K., Vaněk J., Krčma F.,
    Plasma diagnostics during deposition processes of silane based thin films,
    Czechoslovak Journal of Physics 54 (2004) C1036–C1041
  9. Capote G., Bonetti L., Santos L., Trava-Airoldi V., Corat E.,
    Adherent diamond-like carbon coatings on metals via PECVD and IBAD,
    Brazilian Journal of Physics 36 (2006) 986-989
  10. Chung C., Wu B.,
    Effect of amorphous Si layer on the reaction of carbon and silicon in the C/Si multilayer by high vacuum annealing,
    Thin Solid Films 515 (2006) 1985-1991
  11. Kopustinskas V., Meškinis Š., Tamulevičius S., Andrulevičius M., Čižiūtė B., Niaura G.,
    Synthesis of the silicon and silicon oxide doped a-C:H films from hexamethyldisiloxane vapor by DC ion beam,
    Surface and Coatings Technology 200 (2006) 6240–6244
  12. Lee K., Wei R.,
    Tribological characteristics of DLC-coated alumina at high temperatures,
    Journal of Tribology-Transactions of the ASME 128 (2006) 711-717
  13. Trava-Airoldi V., Bonetti L., Capote G., Santos L., Corat E.,
    A comparison of DLC film properties obtained by r.f. PACVD, IBAD, and enhanced pulsed-DC PACVD,
    Surface and Coatings Technology 202 (2007) 549-554
  14. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Sobota J., Klapetek P., Bláhová O., Peřina V.,
    Deposition and characterisation of nanostructured silicon-oxide containing diamond-like carbon coatings,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 491–495
  15. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  16. Hainsworth S., Uhure N.,
    Diamond like carbon coatings for tribology: production techniques, characterisation methods and applications,
    International Materials Reviews 52 (2007) 153-174
  17. Meškinis Š., Tamulevičius S., Kopustinskas V., Andrulevicius A., Guobienë A., Guldaitis R., Liutviniene I.,
    Hydrophobic properties of the ion beam deposited DLC films containing SiOx,
    Thin Solid Films 515 (2007) 7615-7618
  18. Martinez L., Alvarez L., Huttel Y., Mendez J., Roman E., Vanhulsel A., Verheyde B., Jacobs R.,
    Surface analysis of NBR and HNBR elastomers modified with different plasma treatments,
    Vacuum 81 (2007) 1489-1492
  19. Trava-Airoldi V., Santos L., Bonetti L., Capote G., Radi P., Corat E.,
    Tribological and mechanical properties of DLC film obtained on metal surface by an enhanced and low-cost pulsed-DC discharge,
    International Journal of Surface Science and Engineering 1 (2007) 417-428
  20. Jeon Y., Park Y., Kim H., Hong B., Choi W.,
    Tribological properties of ultrathin DLC films with and without metal interlayers,
    Journal of the Korean Physical Society 51 (2007) 1124-1128
  21. Capote G., Bonetti L., Santos L., Trava-Airoldi V., Corat E.,
    Adherent amorphous hydrogenated carbon films on metals deposited by plasma enhanced chemical vapor deposition,
    Thin Solid Films 516 (2008) 4011-4017
  22. Meškinis Š., Gudaitis R., Šlapikas K., Tamulevičius S., Andrulevičius M., Guobienë A., Puiso J., Niaura G.,
    Ion beam energy effects on structure and properties of SiO(x) doped diamond-like carbon films,
    Surface and Coatings Technology 202 (2008) 2328-2331
  23. Adlienė D., Laurikaitienė J., Andrulevičius M., Guobienë A., Meskinis M., Cibulskaite I., Tamulevičius S.,
    Mechanical properties of the X-ray irradiated DLC films containing SiOx as a constructive element for radiation detectors,
    Nuclear Instruments & Methods in Physics Reserch Section A 591 (2008) 188-191
  24. Chung C., Lai C., Peng C., Wu B.,
    Raman inspection for the annealing induced evolution of sp(2) and sp(3) bonding behavior in sandwiched Si/C/Si multilayer,
    Thin Solid Films 517 (2008) 1101-1105
  25. Meškinis Š., Šlapikas K., Gudaitis R., Tamulevičius S., Kopustinskas V., Guobienë A., Niaura G.,
    Sio(x)-doped DLC films: Charge transport, dielectric properties and structure,
    Vacuum 82 (2008) 617-622
  26. Sedlacek M., Podornik B., Vižintin J.,
    Tribological properties of DLC coatings and comparison with test results: Development of a database,
    Materials Characterization 59 (2008) 151-161
  27. Trava-Airoldi V., Capote G., Bonetti L., Fern F., es J., Bl B., o E., Huebler R., Radi P., Santos L., Corat E.,
    Deposition of Hard and Adherent Diamond-Like Carbon Films Inside Steel Tubes Using a Pulsed-DC Discharge,
    Journal of Nanoscience and Nanotechnology 9 (2009) 3891-3897
  28. Meškinis Š., Gudaitis R., Tamulevičius S., Kopustinskas V., Andrulevičius M.,
    Dielectric Properties of the Ion Beam Deposited SiO(x) Doped DLC Films,
    Materials Science-Medziagotyra 15 (2009) 3-6
  29. Meškinis Š., Tamulevičius S., Kopustinskas V., Gudonyte A., Grigaliūnas V., Jankauskas J., Gudaitis R.,
    Micromachining of Diamond-like Carbon Deposited by Closed Drift Ion Source for Cantilevers and Membranes,
    Materials Science-Medziagotyra 15 (2009) 201-206
  30. Šniurevičiūtė M., Laurikaitienė J., Adlienė D., Augulis L., Rutkūnienė Ž., Jotautis A.,
    Stress and strain in DLC films induced by electron bombardment,
    Vacuum 83 (2009) S159–S161
  31. Adlienė D., Cibulskaite I., Meškinis Š.,
    Low energy X-ray radiation impact on coated Si constructions,
    Radiation Physics and Chemistry 79 (2010) 1031-1038
  32. Chen J., Bell G., Beake B., Dong H.,
    Low Temperature Nano-Tribological Study on a Functionally Graded Tribological Coating Using Nanoscratch Tests,
    Tribology Letters 43 (2011) 351-360
  33. Meškinis Š., Tamuleviciene A.,
    Structure, Properties and Applications of Diamond Like Nanocomposite (SiO(x) Containing DLC) Films: A Review,
    Materials Science-Medziagotyra 17 (2011) 358-370
  34. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
    Proc.: Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
    Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147
  35. Laurikaitienė J., Adlienė D., Mekinis S., Tamulevičius S., Sileikaite A., Kopustinskas V., Cibulskaite I., Šlapikas K.,
    Proc.: Optical properties of diamond-like carbon films irradiated by X-ray photons,
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 10 (2008) 3414-3416


85. Choukourov A., Pihosh Y., Stelmashuk V., Biederman H., Slavínská D., Kormunda M., Zajíčková L.,
RF Sputtering of Composite SiOx/Plasma Polymer Films and Their Basic Properties,
Surface and Coatings Technology 151 (2002) 214–217 (16× cited)

Cited in

  1. Biederman H., Stelmashuk V., Kholodkov I., Choukourov A., Slavínská D.,
    RF sputtering of hydrocaarbon polymers and their derivatives,
    Surface and Coatings Technology 174 (2003) 27-32
  2. Carpentier J., Grundmeier G.,
    Chemical structure and morphology of thin bilayer and composite organosilicon and fluorocarbon microwave plasma polymer films,
    Surface and Coatings Technology 192 (2005) 189-198
  3. Bodas D., Mandale A., Gangal S.,
    Deposition of PTFE thin films by RF plasma sputtering on < 100 > silicon substrates,
    Applied Surface Science 245 (2005) 202-207
  4. Pihosh Y., Biederman H., Slavinska D., Kousal J., Choukourov A., Trchova M., Mackova A., Boldyryeva A.,
    Composite SiOx/fluorocarbon plasma polymer films prepared by r.f. magnetron sputtering of SiO2 and PTFE,
    Vacuum 81 (2006) 38-44
  5. Pihosh Y., Biederman H., Slavínská D., Kousal J., Choukourov A., Trchova M., Macková A., Boldyreva A.,
    Composite SiOx/hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO2 and polyethylene or polypropylene,
    Vacuum 81 (2006) 32-37
  6. Drabik M., Kousal J., Pihosh Y., Choukourov A., Biederman H., Slavínská D., Macková A., Boldyreva A., Pesicka J.,
    Composite SiOx/hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO2 and polyimide,
    Vacuum 81 (2007) 920-927
  7. Satyaprasad A., Jain V., Nema S.,
    Deposition of superhydrophobic nanostructured Teflon-like coating using expanding plasma arc,
    Applied Surface Science 253 (2007) 5462-5466
  8. Zhang Y., Qi H.,
    Composite fluorocarbon/ZnO films prepared by RF magnetron sputtering of Zn and PTFE,
    Surface and Coatings Technology 202 (2008) 2612-2615
  9. Khudhayer W., Sharma R., Karabacak T.,
    Hydrophobic metallic nanorods with Teflon nanopatches,
    Nanotechnology 20 (2009) 000
  10. Zhang Y., Ji Q., Liu R., Liu Z., Qi H.,
    Structure and washing fastness of composite fluorocarbon/ZnO films prepared by RF sputtering,
    Surface and Coatings Technology 203 (2009) 3405-3409
  11. Lee C., Pai Y., Shieu F.,
    Ultrahydrophobic and Microporous Electrodes Fabricated by Fluorocarbon Plasma Etching of Carbon Fiber,
    Journal of the Electrochemical Society 156 (2009) B923-B926
  12. Satyaprasad A., Nema S., Sinha N., Raj B.,
    Deposition of thick and adherent Teflon-like coating on industrial scale stainless steel shell using pulsed dc and RF PECVD,
    Applied Surface Science 256 (2010) 4334-4338
  13. Lee C., Pai Y., Lin G., Shieu F.,
    Teflon-Coated Carbon Fiber Core/Shell Structure Based Hydrophobic Gas-Diffusion Electrode for Proton Exchange Membrane Fuel Cells,
    Journal of the Electrochemical Society 157 (2010) B256-B259
  14. Biederman H., Kylian O., Drabik M., Choukourov A., Polonskyi O., R R., Solar P.,
    Nanocomposite and nanostructured films with plasma polymer matrix,
    Surface and Coatings Technology 211 (2012) 127-137
  15. Shen Y., Wang G., Huang X., Zhang Q., Wu J., Tang C., Yu Q., Liu X.,
    Surface wettability of plasma SiOx:H nanocoating-induced endothelial cells' migration and the associated FAK-Rho GTPases signalling pathways,
    Journal of the Optical Society of America 9 (2012) 313-327
  16. Liu Z., Sun Z., Ma X., Yang C.,
    Characterization of Composite SiOx/Polymer Barrier Films,
    Physica B 26 (2013) 70-79


84. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
Surface and Interface Analysis 33 (2002) 559–564 (2× cited)

Cited in

  1. Antoš R., Mistrík J., Yamaguchi T., Višňovský Š., Demokritov S., Hillebrands B.,
    Evaluation of the quality of Permalloy gratings by diffracted magneto-optical spectroscopy,
    Optics Express 13 (2005) 4651–4656
  2. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


83. Ohlídal M., Ohlídal I., Franta D., Králík T., Jákl M., Eliáš M.,
Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
Surface and Interface Analysis 34 (2002) 660–663 (2× cited)

Cited in

  1. Henrie J., Parsons E., Hawkins A., Schultz S.,
    Spectrum sampling reflectometer,
    Surface and Interface Analysis 37 (2005) 568–572
  2. Valtr M., Klapetek P., Ohlídal I., Franta D.,
    UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624


82. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
Surface and Interface Analysis 34 (2002) 759–762 (11× cited)

Cited in

  1. Klapetek P., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Atomic force microscopy characterization of ZnTe epitaxial films,
    Acta Physica Slovaca 53 (2003) 223–230
  2. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
    Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
    Surface and Interface Analysis 36 (2004) 1203–1206
  3. Roberson L., Poggi M., Kowalik J., Smestad G., Bottomley L., Tolbert L.,
    Correlation of morphology and device performance in inorganic-organic TiO2-polythiophene hybrid solid-state solar cells,
    Coordination Chemistry Reviews 248 (2004) 1491–1499
  4. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  5. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  6. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  7. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
    Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
    Applied Surface Science 244 (2005) 338–342
  8. Franta D., Ohlídal I., Petrýdes D.,
    Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
    Vacuum 80 (2005) 159–162
  9. Volintiru I., Creatore M., van de Sanden M.,
    In situ spectroscopic ellipsometry growth studies on the Al-doped ZnO films deposited by remote plasma-enhanced metalorganic chemical vapor deposition,
    Journal of Applied Physics 103 (2008) 033704
  10. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  11. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


81. Buršíková V., Buršík J., Navrátil V., Milicka K.,
Creep behaviour of leaded brass,
Materials Science and Engineering A 324(1-2, SI) (2002) 235-238

80. Buršíková V., Janča J., Sťahel P.,
Enhancement of the material surface properties by plasma deposition of thin films at atmospheric pressure,
Czechoslovak Journal of Physics 52(D) (2002) 866-871

2001

79. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
Applied Optics 40 (2001) 5711–5717 (4× cited)

Cited in

  1. Fan H., Reid S.,
    Phase transformations in pulsed laser deposited nanocrystalline tin oxide thin films,
    Chemistry of Materials 15 (2003) 564–567
  2. Filippov V.,
    Method of envelopes for studying a two-film system on a reflecting substrate,
    Optics and Spectroscopy 101 (2006) 458–462
  3. Lunáček J., Hlubina P., Lunáčková M.,
    Simple method for determination of the thickness of a nonabsorbing thin film using spectral reflectance measurement,
    Applied Optics 48 (2009) 985–989
  4. Hlubina P., Lunáček J., Ciprian D.,
    Maxima of the spectral reflectance ratio of polarized waves used to measure the thickness of a nonabsorbing thin film,
    Optics and Lasers in Engineering 48 (2010) 786–791


78. Franta D., Ohlídal I., Frumar M., Jedelský J.,
Optical characterization of chalcogenide thin films,
Applied Surface Science 175–176 (2001) 555–561 (15× cited)

Cited in

  1. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
    Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
    Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878
  2. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  3. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
    Applied Surface Science 212–213 (2003) 116–121
  4. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx,
    Diamond and Related Materials 12 (2003) 1532–1538
  5. Akaoglu B., Atilgan I., Katircioglu B.,
    Thickness and optical constant distributions of PECVD a-SiCx:H thin films along electrode radial direction,
    Thin Solid Films 437 (2003) 257–265
  6. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
    Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
    Chalcogenide Letters 1 (2004) 1–10
  7. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  8. Baník I.,
    An explanation of optical phenomena in non-crystalline semiconductors,
    Central European Journal of Physics 3 (2005) 270–302
  9. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
    Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
    Journal of Non-Crystalline Solids 352 (2006) 5633–5641
  10. Serényi M., Lohner T., Zolnai Z., Petrik P., Nemcsics Á., Khánh N., Turmezei P.,
    Studies on the RF sputtered amorphous SiGe thin films,
    Inorganic Materials 42 (2006) 3–6
  11. Serényi M., Lohner T., Petrik P., Frigeri C.,
    Comparative analysis of amorphous silicon and silicon nitride multilayer by spectroscopic ellipsometry and transmission electron microscopy,
    Thin Solid Films 515 (2007) 3559–3562.
  12. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  13. Šantić B.,
    Measurement of the refractive index and thickness of a transparent film from the shift of the interference pattern due to the sample rotation,
    Thin Solid Films 518 (2010) 3619–3624
  14. Todorov R., Paneva A., Petkov K.,
    Optical characterization of thin chalcogenide films by multiple-angle-of-incidence ellipsometry,
    Thin Solid Films 518 (2010) 3280–3288
  15. Solieman A., Abu-sehly A.,
    Determination of the optical constants of amorphous As(x)S(100-x) films using effective-medium approximation and OJL model,
    Materials Chemistry and Physics 129 (2011) 1000-1005


77. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878 (4× cited)

Cited in

  1. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
    Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
    Chalcogenide Letters 1 (2004) 1–10
  2. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
    Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
    Journal of Non-Crystalline Solids 352 (2006) 5633–5641
  3. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  4. Solieman A., Abu-sehly A.,
    Determination of the optical constants of amorphous As(x)S(100-x) films using effective-medium approximation and OJL model,
    Materials Chemistry and Physics 129 (2011) 1000-1005


76. Janča J., Zajíčková L., Klíma M., Slavíček P.,
Diagnostics and Application of the High Frequency Plasma Pencil,
Plasma Chem. Plasma Process. 21 (2001) 565–579 (10× cited)

Cited in

  1. Stoffels E.,
    Biomedical applications of electric gas discharges,
    High Temperature Material Processes 6 (2002) 191-202
  2. Stoffels E., Flikweert A., Stoffels W., Kroesen G.,
    Plasma needle: a non-destructive atmospheric plasma source for fine surface treatment of (bio)materials,
    Plasma Sources Science and Technology 11 (2002) 383-388
  3. Kim Y., Teslow H., Park J., Rosocha L., Herrmann H.,
    CF4/O-2/He reaction chemistry in an atmospheric pressure plasma jet,
    Journal of Advanced Oxidation Technologies 8 (2005) 182-187
  4. Kuwabara A., Kuroda S., Kubota H.,
    Effects of electrode positioning on the atmospheric-pressure DBD plasma torch,
    Plasma Processes and Polymers 2 (2005) 305-309
  5. Slavíček P., Brablec A., Kapicka V., Klíma M., Šíra M.,
    Longitudinal emission diagnostics of plasma channel in rf barrier torch discharge,
    Acta Physica Slovaca 55 (2005) 573-576
  6. Anghel S., Simon A.,
    An alternative source for generating atmospheric pressure non-thermal plasmas,
    Plasma Sources Science and Technology 16 (2007) B1-B4
  7. Anghel S., Simon A.,
    Measurement of electrical characteristics of atmospheric pressure non-thermal He plasma,
    Measurement Science and Technology 18 (2007) 2642-2648
  8. Soderstrom D., Barankova H., Bardos L.,
    On dimensions of atmospheric-pressure hollow cathodes,
    IEEE Transactions on Plasma Science 35 (2007) 522-526
  9. Soderstrom D., Barankova H., Bardos L.,
    On dimensions of atmospheric-pressure hollow cathodes,
    IEEE Transactions on Plasma Science 35 (2007) 522-526
  10. Wal R., Fujiyama-Novak J., Gaddam C., Das D., Hariharan A., Ward B.,
    Atmospheric Microplasma Jet: Spectroscopic Database Development and Analytical Results,
    Applied Spectroscopy 65 (2011) 1073-1082


75. Zajíčková L., Buršíková V., Peřina V., Macková A., Subedi D., Janča J.,
Plasma Modification of Polycarbonates,
Surface and Coatings Technology 142 (2001) 449–454 (36× cited)

Cited in

  1. Hozumi A., Wu Y., Hayashi K., Sugimura H., Takai O., Yokogawa Y., Kameyama T.,
    Micro-wear resistance of ultrathin silicon oxide film-covered polymer substrate,
    Surface Science 532 (2003) 1056-1060
  2. Biederman H., Stelmashuk V., Kholodkov I., Choukourov A., Slavínská D.,
    RF sputtering of hydrocaarbon polymers and their derivatives,
    Surface and Coatings Technology 174 (2003) 27-32
  3. Barranco A., Cotrino J., Yubero F., Girardeau T., Camelio S., Gonzalez-Elipe A.,
    A structural study of organo-silicon polymeric thin films deposited by remote microwave plasma enhanced chemical vapour deposition,
    Surface and Coatings Technology 180 (2004) 244-249
  4. Opalinska T., Ulejczyk B., Karpinski L., Schmidt-Szalowski K.,
    Deposition of thin films based on silica on polycarbonates by pulsed dielectric barrier discharge,
    Polimery 49 (2004) 257-263
  5. Trunec D., Navrátil Z., Sťahel P., Zajíčková L., Buršíková V.,
    Deposition of Thin Organosilicon Polymer Films in Atmospheric Pressure Glow Discharge,
    Journal of Physics D 37 (2004) 2112–2120
  6. Lim K., Lee D.,
    Surface modification of glass and glass fibres by plasma surface treatment,
    Surface and Interface Analysis 36 (2004) 254-258
  7. Přikryl R., Čech V., Zajíčková L., Vaněk J., Behzadi S., Jones R.,
    Mechanical and Optical Properties of Plasma-Polymerized Vinyltriethoxysilane,
    Surface and Coatings Technology 200 (2005) 468–471
  8. Jašek O., Eliáš M., Zajíčková L., Kudrle V., Bublan M., Matějková J., Rek A., Buršík J., Kadlečíková M.,
    Carbon Nanotubes Synthesis in Microwave Plasma Torch at Atmospheric Pressure,
    Materials Science and Engineering C 26 (2006) 1189–1193
  9. Bousquet A., Buršíková V., Goullet A., Djouadi A., Zajíčková L., Granier A.,
    Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas,
    Surface and Coatings Technology 200 (2006) 6517-6521
  10. Ulejczyk B., Karpinski L., Scholz M., Ekwinska M., Rymuza Z., Opalinska T., Zukowska E., Schmidt-Szalowski K.,
    Deposition of silicon oxide film from tetraethoxysilane using a pulsed dielectric barrier discharge,
    Czechoslovak Journal of Physics 56 (2006) B1383-B1390
  11. Ulejczyk B., Karpinski L., Scholz M., Ekwinska M., Rymuza Z., Opalinska T., Zukowska E., Schmidt-Szalowski K.,
    Deposition of silicon oxide film from tetraethoxysilane using a pulsed dielectric barrier discharge,
    Czechoslovak Journal of Physics 56 (2006) B1383-B1390
  12. Sentek J., Kus M., Schmidt-Szalowski K.,
    Deposition of thin coatings on polyethylene films under conditions of pulsed dielectric harrier discharges (PDBD),
    Przemysl Chemiczny 85 (2006) 258-265
  13. Bousquet A., Granier A., Goullet A., Landesman J.,
    Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas,
    Thin Solid Films 514 (2006) 45-51
  14. Wang X., Grundmeier G.,
    Morphology and patterning processes of thin organosilicon and perfluorinated bi-layer plasma polymer films,
    Plasma Processes and Polymers 3 (2006) 39-47
  15. Simor M., Fiala A., Kovacik D., Hlidek P., Wypkema A., Kuipers R.,
    Corrosion protection of a thin aluminium layer deposited on polyester,
    Surface and Coatings Technology 201 (2007) 7802-7812
  16. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  17. Begou T., Beche B., Goullet A., Granier A., Cardinaud C., Gaviot E., Camberlein L., Grossard N., Jezequel G., Zyss J., Landesman J.,
    First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides,
    Optical Materials 30 (2007) 657-661
  18. Saloum S., Naddaf M.,
    Optical constants of silicone-like (Si : O-x : C-y : H-z) thin films deposited on quartz using hexamethyldisiloxane in a remote RF hollow cathode discharge plasma,
    Vacuum 82 (2007) 50-55
  19. Garcia-Luis A., Corengia P., Gonzalez-Santamaria D., Brizuela M., Braceras I., Briz N., Azpiroz P., Bellido-Gonzalez V., Powell S.,
    Synthesis and Characterization of Plasma-Polymerized HMDSO Films Using an Ion Gun Inverse Magnetron Source,
    Plasma Processes and Polymers 4 (2007) S766-S770
  20. Guo C.,
    Diamond-like carbon films deposited on polycarbonates by plasma-enhanced chemical vapor deposition,
    Thin Solid Films 516 (2008) 4053-4058
  21. Bousquet A., Goullet A., Leteinturier C., Coulon N., Granier A.,
    Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes,
    European Physical Journal-Applied Physics 42 (2008) 3-8
  22. Panwar A., Barthwal S., Shivaprasad S., Ray S.,
    Physico-chemical characterization of a polycarbonate (PC) surface modified by exposure to dc glow discharge in air,
    Journal of Physics D 41 (2008) 001
  23. Subedi D., Madhup D., Adhikari K., Joshi U.,
    Plasma treatment at low pressure for the enhancement of wettability of polycarbonate,
    Indian Journal of Pure & Applied Physics 46 (2008) 540-544
  24. Panwar A., Barthwal S., Ray S.,
    Aging and Annealing Behavior of Polycarbonate Surfaces Modified by Direct-Current Glow Discharge in Air,
    Journal of Applied Polymer Science 112 (2009) 700-708
  25. Gomathi N., Eswaraiah C., Neogi S.,
    Surface Modification of Polycarbonate by Radio-Frequency Plasma and Optimization of the Process Variables with Response Surface Methodology,
    Journal of Applied Polymer Science 114 (2009) 1557-1566
  26. Fanelli F., Lovascio S., d\'Agostino R., Arefi-Khonsari F., Fracassi F.,
    Ar/HMDSO/O(2) Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products,
    Plasma Processes and Polymers 7 (2010) 535-543
  27. Laskarakis A., Kassavetis S., Gravalidis C., Logothetidis S.,
    In situ and real-time optical investigation of nitrogen plasma treatment of polycarbonate,
    Nuclear Instruments and Methods in Physics Research Section B 268 (2010) 460-465
  28. Landreau X., Dublanche-Tixier C., Jaoul C., Le Niniven C., Lory N., Tristant P.,
    Effects of the substrate temperature on the deposition of thin SiO(x) films by atmospheric pressure microwave plasma torch (TIA),
    Surface and Coatings Technology 205 (2011) S335-S341
  29. Lin Y., Weng M., Chung T., Huang C.,
    Enhanced surface hardness of flexible polycarbonate substrates using plasma-polymerized organosilicon oxynitride films by air plasma jet under atmospheric pressure,
    Surface and Coatings Technology 205 (2011) 3856-3864
  30. Cheng D., Yagihashi M., Hozumi A.,
    Lamination of Alumina Membranes to Polymer Surfaces: Thick, Hard, Transparent, Crack-Free Alumina Films on Polymers with Excellent Adhesion,
    ACS Applied Materials & Interfaces 3 (2011) 2224-2227
  31. Tamuleviciene A., Meškinis Š., Kopustinskas V., Tamulevičius S.,
    Multilayer amorphous hydrogenated carbon (a-C:H) and SiOx doped a-C:H films for optical applications,
    Thin Solid Films 519 (2011) 4004-4007
  32. Hall C., Murphy P., Griesser H.,
    Etching and Deposition Mechanism of an Alcohol Plasma on Polycarbonate and Poly(Methyl Methacrylate): An Adhesion Promotion Mechanism for Plasma Deposited a:SiOxCyHz Coating,
    Plasma Processes and Polymers 9 (2012) 855-865
  33. Kakiuchi H., Ohmi H., Yamada T., Yokoyama K., Okamura K., Yasutake K.,
    Silicon Oxide Coatings with Very High Rates (> 10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode,
    Plasma Chem. Plasma Process. 32 (2012) 533-545

  34. Tailoring the mechanical properties of SiOxHyCz films deposited by atmospheric pressure microwave plasma torch with a Rechtschaffner design of experiments: A pragmatic statistical approach,
    Computational Materials Science 60 (2012) 32-43
  35. Zeytuncu B., Kahraman M., Yucel O.,
    Preparation and performance on polycarbonate of B/F/Si-containing hybrid coatings,
    Journal of Vacuum Science & Technology B 19 (2013) 39-46
  36. Manakhov A., Nečas D., Čechal J., Pavliňák D., Eliáš M., Zajíčková L.,
    Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
    Thin Solid Films 581 (2015) 7-13


74. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 32 (2001) 91–94 (3× cited)

Cited in

  1. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  2. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  3. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294


73. Zajíčková L., Veltruská K., Tsud N., Franta D.,
XPS and ellipsometric study of DLC/silicon Interface,
Vacuum 61 (2001) 269–273 (12× cited)

Cited in

  1. Park C., Chang S., Uhm H., Seo S., Park J.,
    XPS and XRR studies on microstructures and interfaces of DLC films deposited by FCVA method,
    Thin Solid Films 420 (2002) 235–240
  2. Ferro S., Dal Colle M., De Battisti A.,
    Chemical surface characterization of electrochemically and thermally oxidized boron-doped diamond film,
    Carbon 43 (2005) 1191–1203
  3. Yang W., Fan S., Zhang G., Ma P., Zhang S., Du J.,
    Investigation of diamond-like-carbon films prepared by unbalanced magnetron sputtering,
    Review of Scientific Instruments 54 (2005) 4944–4948
  4. Meškinis Š., Andrulevičius M., Tamulevičius S., Kopustinskas V., Šlapikas K., Jankauskas J., Čižiūtė B.,
    XPS study of the a-C:H/Ti and a-C:H/a-Si interfaces,
    Vacuum 80 (2006) 1007–1011
  5. Zhao Q., Liu Y., Wang C., Wang S.,
    Bacterial adhesion on silicon-doped diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1682–1687
  6. Macák J., Pazderová M., Jiříček I., Malý P., Olysar K., Cvrček L., Vosta J.,
    Corrosion properties of physically deposited thin coatings (PVD coatings),
    Chemické listy 101 (2007) 713–721
  7. Zhao Q., Su X., Wang S., Zhang X., Navabpour P., Teer D.,
    Bacterial attachment and removal properties of silicon- and nitrogen-doped diamond-like carbon coatings,
    Biofouling 25 (2009) 377–385
  8. Zhao F., Li H., Ji L., Mo Y., Quan W., Zhou H., Chen J.,
    Structural, mechanical and tribological characterizations of a-C:H:Si films prepared by a hybrid PECVD and sputtering technique,
    Journal of Physics D 42 (2009) 165407
  9. Zhao F., Li H., Ji L., Mo Y., Quan W., Wang Y., Chen J., Zhou H.,
    Effects of duty cycle and water immersion on the composition and friction performance of diamond-like carbon films prepared by the pulsed-DC plasma technique,
    Thin Solid Films 519 (2011) 2043-2048
  10. Rismani E., Sinha S., Yang H., Bhatia C.,
    Effect of pretreatment of Si interlayer by energetic C+ ions on the improved nanotribological properties of magnetic head overcoat,
    Journal of Applied Physics 111 (2012) 0000
  11. Zhao F., Li H., Ji L., Wang Y., Mo Y., Quan W., Kong Q., Wang Y., Chen J., Zhou H.,
    Microstructure and mechanical properties of graphitic a-C:H:Si films,
    Surface and Coatings Technology 206 (2012) 3467-3471
  12. Rismani E., Samad M., Sinha S., Yeo R., Yang H., Bhatia C.,
    Ultrathin Si/C graded layer to improve tribological properties of Co magnetic films,
    Applied Physics Letters 101 (2012) 00000


72. Franta D., Zajíčková L., Ohlídal I., Janča J.,
Optical characterization of diamond-like carbon films,
Vacuum 61 (2001) 279–283 (3× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Influence of overlayers on determination of the optical constants of ZnSe thin films,
    Journal of Applied Physics 92 (2002) 1873–1880
  2. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  3. Tremsin A., Siegmund O.,
    UV photoemission efficiency of polycrystalline CVD diamond films,
    Diamond and Related Materials 14 (2005) 48–53


71. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
Determination of thicknesses and spectral dependences of refractive indices of non-absorbing and weakly absorbing thin films using the wavelengths related to extrema in spectral reflectances,
Vacuum 61 (2001) 285–289

2000

70. Franta D., Ohlídal I.,
Analysis of thin films by optical multi-sample methods,
Acta Physica Slovaca 50 (2000) 411–421 (15× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  2. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Influence of overlayers on determination of the optical constants of ZnSe thin films,
    Journal of Applied Physics 92 (2002) 1873–1880
  3. Ohlídal M., Ohlídal I., Franta D., Králík T., Jákl M., Eliáš M.,
    Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
    Surface and Interface Analysis 34 (2002) 660–663
  4. Easwarakhanthan T., Pigeat P.,
    Error propagation in fixed-point ellipsometric inversions,
    Measurement Science and Technology 14 (2003) 516–522
  5. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  6. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  7. Ishikawa H., Zhang B., Asano K., Egawa T., Jimbo T.,
    Characterization of GaInN light-emitting diodes with distributed Bragg reflector grown on Si,
    Journal of Crystal Growth 272 (2004) 322–326
  8. Ishikawa H., Asano K., Zhang B., Egawa T., Jimbo T.,
    Improved characteristics of GaN-based light-emitting diodes by distributed Bragg reflector grown on Si,
    Physica Status Solidi A 201 (2004) 2653–2657
  9. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  10. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  11. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  12. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
    Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 38 (2006) 842–846
  13. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  14. Das N., Ghosh P., Mitra M., Chattopadhyay K.,
    Effect of film thickness on the energy band gap of nanocrystalline CdS thin films analyzed by spectroscopic ellipsometry,
    Physica E 42 (2010) 2097–2102
  15. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


69. Ohlídal I., Franta D.,
Matrix formalism for imperfect thin films,
Acta Physica Slovaca 50 (2000) 489–500 (18× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
    Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 32 (2001) 91–94
  2. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
    Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
    Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878
  3. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Optical characterization of chalcogenide thin films,
    Applied Surface Science 175–176 (2001) 555–561
  4. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  5. Postava K., Yamaguchi T., Kantor R.,
    Matrix description of coherent and incoherent light reflection and transmission by anisotropic multilayer structures,
    Applied Optics 41 (2002) 2521–2531
  6. Goncharenko A.,
    Generalizations of the Bruggeman equation and a concept of shape-distributed particle composites,
    Physical Review E 68 (2003) 041108
  7. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  8. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  9. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx,
    Diamond and Related Materials 12 (2003) 1532–1538
  10. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  11. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 393–398
  12. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  13. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  14. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  15. Ku J., Vidu R., Stroeve P.,
    Mechanism of Film Growth of Tellurium by Electrochemical Deposition in the Presence and Absence of Cadmium Ions,
    Journal of Physical Chemistry B 109 (2005) 21779–21787
  16. Valtr M., Ohlídal I., Franta D.,
    Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
    Czechoslovak Journal of Physics 56 (2006) B1103–B1109
  17. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192
  18. Franta D., Ohlídal I.,
    Proc.: Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
    Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212


68. Eliáš M., Zajíčková L., Buršíková V., Janča J.,
Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge,
Czechoslovak Journal of Physics 50 (2000) 453–456

67. Eliáš M., Zajíčková L., Buršíková V., Janča J., Lorenc M.,
Deposition of Nanocomposite CNx/SiO2 Films in Inductively Coupled RF Discharge,
Diamond and Related Materials 9 (2000) 552–555 (4× cited)

Cited in

  1. Ohlídal M., Ohlídal I., Franta D., Králík T., Jákl M., Eliáš M.,
    Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
    Surface and Interface Analysis 34 (2002) 660–663
  2. Ohlídal M., Ohlídal I., Klapetek P., Jákl M., Čudek V., Eliáš M.,
    New method for the complete optical analysis of thin films nonuniform in optical parameters,
    Japanese Journal of Applied Physics 42 (2003) 4760–4763
  3. Wang R., Li X., Li H., Wang Q., Wang H., Wang W., Kang J., Chang Y., Lei Z.,
    Highly stable and effective Pt/carbon nitride (CN(x)) modified SiO(2) electrocatalyst for oxygen reduction reaction,
    International Journal of Hydrogen Energy 36 (2011) 5775-5781
  4. Ohlídal I., Ohlídal M., Klapetek P., Čudek V., Jákl M.,
    Proc.: Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry,
    WAVE-OPTICAL SYSTEMS ENGINEERING II (2003) 260-271


66. Franta D., Ohlídal I., Klapetek P.,
Analysis of slightly rough thin films by optical methods and AFM,
Mikrochimica Acta 132 (2000) 443–447 (30× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Matrix formalism for imperfect thin films,
    Acta Physica Slovaca 50 (2000) 489–500
  2. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
    Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 32 (2001) 91–94
  3. Postava K., Sueki H., Aoyama M., Yamaguchi T., Murakami K., Igasaki Y.,
    Doping effects on optical properties of epitaxial ZnO layers determined by spectroscopic ellipsometry,
    Applied Surface Science 175 (2001) 543–548
  4. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
    Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
    Applied Optics 40 (2001) 5711–5717
  5. Postava K., Aoyama M., Yamaguchi T.,
    Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 175 (2001) 270–275
  6. Postava K., Yamaguchi T.,
    Optical functions of low-k materials for interlayer dielectrics,
    Journal of Applied Physics 89 (2001) 2189–2193
  7. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  8. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  9. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Influence of overlayers on determination of the optical constants of ZnSe thin films,
    Journal of Applied Physics 92 (2002) 1873–1880
  10. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  11. Klapetek P., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Atomic force microscopy characterization of ZnTe epitaxial films,
    Acta Physica Slovaca 53 (2003) 223–230
  12. Klapetek P., Ohlídal I., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Atomic force microscopy characterization of ZnTe epitaxial thin films,
    Japanese Journal of Applied Physics 42 (2003) 4706–4709
  13. Klapetek P., Ohlídal I., Navrátil K.,
    Atomic force microscopy analysis of statistical roughness of GaAs surfaces originated by thermal oxidation,
    Microchimica Acta 147 (2004) 175–180
  14. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  15. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  16. Klapetek P., Ohlídal I., Montaigne-Ramil A., Bonanni A., Sitter H.,
    Atomic force microscopy analysis of morphology of the upper boundaries of GaN thin films prepared by MOCVD,
    Vacuum 80 (2005) 53–57
  17. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  18. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  19. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
    Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 38 (2006) 842–846
  20. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  21. Ohlídal I., Nečas D.,
    Influence of shadowing on ellipsometric quantities of randomly rough surfaces and thin films,
    Journal of Modern Optics 55 (2008) 1077–1099
  22. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  23. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697
  24. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091

  25. Fibrinogen and cellular adherability on differently treated titanium as implants,
    Central European Journal of Physics 10 (2012) 232-238
  26. Manakhov A., Michlíček M., Nečas D., Polčák J., Makhneva E., Eliáš M., Zajíčková L.,
    Carboxyl-rich coatings deposited by atmospheric plasma co-polymerization of maleic anhydride and acetylene,
    Surface and Coatings Technology 295 (2016) 37-45
  27. Zajíčková L., Jelínek P., Obrusník A., Vodák J., Nečas D.,
    Plasma Enhanced CVD of Functional Coatings in Ar/Maleic Anhydride/C2H2 Homogeneous Dielectric Barrier Discharges at Atmospheric Pressure,
    Plasma Phys. Control. Fusion 59 (2017) 034003
  28. Manakhov A., Michlíček M., Felten A., Pireaux J., Nečas D., Zajíčková L.,
    XPS depth profiling of derivatized amine and anhydride plasma polymers: Evidence of limitations of the derivatization approach,
    Applied Surface Science 394 (2017) 578-585
  29. Franta D., Nečas D., Ohlídal I., Jankuj J.,
    Proc.: Wide spectral range characterization of antireflective coatings and their optimization,
    Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V (2015) 96280F
  30. Franta D., Nečas D., Ohlídal I., Giglia A.,
    Proc.: Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range,
    Photonics Europe 2016: Optical Micro- and Nanometrology VI (2016) 989014


65. Franta D., Ohlídal I.,
Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
Surface and Interface Analysis 30 (2000) 574–579 (17× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
    Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 32 (2001) 91–94
  2. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Optical characterization of chalcogenide thin films,
    Applied Surface Science 175–176 (2001) 555–561
  3. Postava K., Aoyama M., Yamaguchi T.,
    Optical characterization of TiN/SiO2(1000 nm)/Si system by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 175 (2001) 270–275
  4. Postava K., Yamaguchi T.,
    Optical functions of low-k materials for interlayer dielectrics,
    Journal of Applied Physics 89 (2001) 2189–2193
  5. Postava K., Aoyama M., Yamaguchi T., Oda H.,
    Spectroellipsometric characterization of materials for multilayer coatings,
    Applied Surface Science 175 (2001) 276–280
  6. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  7. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  8. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Influence of overlayers on determination of the optical constants of ZnSe thin films,
    Journal of Applied Physics 92 (2002) 1873–1880
  9. Janicki V., Zorc H.,
    Refractive index profiling of CeO2 thin films using reverse engineering methods,
    Thin Solid Films 413 (2002) 198–202
  10. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
    Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 244 (2005) 431–434
  11. Lopez C., Suvorova N., Irene E., Suvorova A., Saunders M.,
    ZrO2 film interfaces with Si and SiO2,
    Journal of Applied Physics 98 (2005) 033506
  12. Yan L., Lopez C., Shrestha R., Irene E., Suvorova A., Saunders M.,
    Magnesium oxide as a candidate high-kappa gate dielectric,
    Applied Physics Letters 88 (2006) 142901
  13. Triyoso D., Hegde R., Schaeffer J., Gregory R., Wang X., Canonico M., Roan D., Hebert E., Kim K., Jiang J., Rai R., Kaushik V., Samavedam S., Rochat N.,
    Characteristics of atomic-layer-deposited thin HfxZr1-xO2 gate dielectrics,
    Journal of Vacuum Science and Technology B 25 (2007) 845–852
  14. Janicki V., Sancho-Parramon J., Stenzel O., Lappschies M., Goertz B., Rickers C., Polenzky C., Richter U.,
    Optical characterization of hybrid antireflective coatings using spectrophotometric and ellipsometric measurements,
    Applied Optics 46 (2007) 6084–6091
  15. Wang K., Morris M., Holmes J., Yu J., Xu R.,
    Thermally stable nanocrystallised mesoporous zirconia thin films,
    Microporous and Mesoporous Materials 117 (2009) 161–164
  16. Losurdo M.,
    Applications of ellipsometry in nanoscale science: Needs, status, achievements and future challenges,
    Thin Solid Films 519 (2011) 2575-2583
  17. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


64. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
Thin Solid Films 366 (2000) 43–50

63. Ohlídal I., Franta D.,
Ellipsometry of thin film systems,
Progress in Optics 41 (2000) 181-282 (44× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
    Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 32 (2001) 91–94
  2. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
    Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
    Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878
  3. Postava K., Sueki H., Aoyama M., Yamaguchi T., Murakami K., Igasaki Y.,
    Doping effects on optical properties of epitaxial ZnO layers determined by spectroscopic ellipsometry,
    Applied Surface Science 175 (2001) 543–548
  4. Franta D., Zajíčková L., Ohlídal I., Janča J.,
    Optical characterization of diamond-like carbon films,
    Vacuum 61 (2001) 279–283
  5. Sánchez-Soto L., Monzón J., Yonte T., Cariñena J.,
    Simple trace criterion for classification of multilayers,
    Optics Letters 26 (2001) 1400–1402
  6. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  7. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  8. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Influence of overlayers on determination of the optical constants of ZnSe thin films,
    Journal of Applied Physics 92 (2002) 1873–1880
  9. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  10. Yonte T., Monzón J., Sánchez-Soto L., Cariñena J., López-Lacasta C.,
    Understanding multilayers from a geometrical viewpoint,
    Journal of the Optical Society of America A 19 (2002) 603–609
  11. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  12. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  13. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx,
    Diamond and Related Materials 12 (2003) 1532–1538
  14. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
    Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
    Surface and Interface Analysis 36 (2004) 1203–1206
  15. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  16. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
    Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
    Chalcogenide Letters 1 (2004) 1–10
  17. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 393–398
  18. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  19. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  20. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  21. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602
  22. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
    Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
    Applied Surface Science 244 (2005) 338–342
  23. Franta D., Ohlídal I., Petrýdes D.,
    Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
    Vacuum 80 (2005) 159–162
  24. Franta D., Negulescu B., Thomas L., Dahoo P., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
    Optical properties of NiO thin films prepared by pulsed laser deposition technique,
    Applied Surface Science 244 (2005) 426–430
  25. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
    Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 244 (2005) 431–434
  26. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
    Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
    Journal of Non-Crystalline Solids 352 (2006) 5633–5641
  27. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  28. Valtr M., Ohlídal I., Franta D.,
    Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
    Czechoslovak Journal of Physics 56 (2006) B1103–B1109
  29. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  30. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803
  31. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  32. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
    Optical characterization of ultrananocrystalline diamond films,
    Diamond and Related Materials 17 (2008) 1278–1282
  33. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  34. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402
  35. Valtr M., Klapetek P., Buršíková V., Ohlídal I., Franta D.,
    Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge,
    Chemické listy 102 (2008) s1529–s1532
  36. Ohlídal I., Nečas D., Franta D., Buršíková V.,
    Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
    Diamond and Related Materials 18 (2009) 364–367
  37. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  38. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
    Diamond and Related Materials 19 (2010) 114–122
  39. Franta D., Nečas D., Ohlídal I.,
    Anisotropy-enhanced depolarization on transparent film/substrate system,
    Thin Solid Films 519 (2011) 2637-2640
  40. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
    Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
    Thin Solid Films 519 (2011) 2874-2876
  41. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244
  42. Franta D., Nečas D., Zajíčková L.,
    Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
    Thin Solid Films 534 (2013) 432-441
  43. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192
  44. Franta D., Ohlídal I.,
    Proc.: Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
    Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212


1999

62. Zajíčková L., Buršíková V., Franta D.,
The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films,
Czechoslovak Journal of Physics 49 (1999) 1213–1228 (20× cited)

Cited in

  1. Franta D., Zajíčková L., Ohlídal I., Janča J.,
    Optical characterization of diamond-like carbon films,
    Vacuum 61 (2001) 279–283
  2. Buršíková V., Sládek P., Sťahel P., Zajíčková L.,
    Improvement of the Efficiency of the Silicon Solar Cells by Silicon Incorporated Diamond-Like Carbon Antireflective Coatings,
    Journal of Non-Crystalline Solids 299 (2002) 1147–1151
  3. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  4. Buršíková V., Navrátil V., Zajíčková L., Janča J.,
    Temperature Dependence of Mechanical Properties of DLC/Si Protective Coatings Prepared by PECVD,
    Materials Science and Engineering A 324 (2002) 251–254
  5. Zajíčková L., Buršíková V., Peřina V., Macková A., Janča J.,
    Correlation Between SiOx Content and Properties of DLC : SiOx Films Prepared by PECVD,
    Surface and Coatings Technology 174 (2003) 281–285
  6. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
    New dispersion model of the optical constants of the DLC films,
    Acta Physica Slovaca 53 (2003) 373–384
  7. Zajíčková L., Rudakowski S., Becker H., Meyer D., Valtr M., Wiesemann K.,
    Study of plasma polymerization from acetylene in pulsed r.f. discharges,
    Thin Solid Films 425 (2003) 72-84
  8. Rašková Z., Brandejs K., Vaněk J., Krčma F.,
    Plasma diagnostics during deposition processes of silane based thin films,
    Czechoslovak Journal of Physics 54 (2004) C1036–C1041
  9. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
    Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
    Diamond and Related Materials 14 (2005) 1795–1798
  10. Šedo O., Alberti M., Janča J., Havel J.,
    Laser desorption–ionization time of flight mass spectrometry of various carbon materials,
    Carbon 44 (2006) 840–847
  11. Valtr M., Ohlídal I., Franta D.,
    Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
    Czechoslovak Journal of Physics 56 (2006) B1103–B1109
  12. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
    Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
    Diamond and Related Materials 16 (2007) 1331–1335
  13. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
    Deposition of protective coatings in RF organosilicon discharges,
    Plasma Sources Science and Technology 16 (2007) S123–S132
  14. Brzobohatý O., Buršíková V., Nečas D., Valtr M., Trunec D.,
    Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation,
    Journal of Physics D 41 (2008) 035213
  15. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  16. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Buršíková V.,
    Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
    Diamond and Related Materials 18 (2009) 384–387
  17. Ohlídal I., Nečas D., Franta D., Buršíková V.,
    Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
    Diamond and Related Materials 18 (2009) 364–367
  18. Franta D., Nečas D., Zajíčková L., Buršíková V.,
    Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
    Diamond and Related Materials 18 (2009) 413–418
  19. Nečas D., Vodák J., Ohlídal I., Ohlídal M., Majumdar A., Zajíčková L.,
    Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry,
    Applied Surface Science 350 (2015) 149-155
  20. Prysiazhnyi V., Slavíček P., Mikmekova E., Klíma M.,
    Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil,
    Plasma Science & Technology 18 (2016) 430-437


61. Klíma M., Slavíček P., Zajíčková L., Janča J., Kuzmin S., Sulovský P.,
Plasma-Liquid Technologies for Treatment of Archaeological Artifacts,
Czechoslovak Journal of Physics 49 (1999) 321–328 (4× cited)

Cited in

  1. Šíra M., Klíma M., Janča J., Kapicka V., Capoun M.,
    HF-plasma pencil in liquids,
    Czechoslovak Journal of Physics 50 (2000) 415-418
  2. Janča J., Zajíčková L., Klíma M., Slavíček P.,
    Diagnostics and Application of the High Frequency Plasma Pencil,
    Plasma Chem. Plasma Process. 21 (2001) 565–579
  3. Slavíček P., Brablec A., Kapicka V., Klíma M., Šíra M.,
    Longitudinal emission diagnostics of plasma channel in rf barrier torch discharge,
    Acta Physica Slovaca 55 (2005) 573-576
  4. Novosad L., Hrdlička A., Slavíček P., Otruba V., Kanicky V.,
    Plasma pencil as an excitation source for atomic emission spectrometry,
    Journal of Analytical Atomic Spectrometry 27 (2012) 305-309


60. Ohlídal I., Vižďa F.,
Optical quantities of multilayer systems with correlated randomly rough boundaries,
Journal of Modern Optics 46 (1999) 2043–2062 (1× cited)

Cited in

  1. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602


59. Ohlídal M., Unčovský M., Ohlídal I., Franta D.,
Determination of the basic parameters characterizing the roughness of metal surfaces by laser light scattering,
Journal of Modern Optics 46 (1999) 279–293 (2× cited)

Cited in

  1. Tian G., Lu R.,
    Hybrid vision system for online measurement of surface roughness,
    Journal of the Optical Society of America A 23 (2006) 3072–3079
  2. Lu R., Tian G.,
    On-line measurement of surface roughness by laser light scattering,
    Measurement Science and Technology 17 (2006) 1496–1502


58. Janča J., Klíma M., Slavíček P., Zajíčková L.,
HF Plasma Pencil - New Source for Plasma Surface Processing,
Surface and Coatings Technology 116 (1999) 547–551 (17× cited)

Cited in

  1. Stepan M., Semerad M., Kanicky V., Otruba V.,
    Preliminary investigations of high-frequency atmospheric-pressure plasma jet for atomic emission spectrometry,
    Collection of Czechoslovak Chemical Communications 66 (2001) 1348-1358
  2. Tendero C., Tixier C., Tristant P., Desmaison J., Leprince P.,
    Atmospheric pressure plasmas: A review,
    Spectrochimica Acta Part B 61 (2006) 2-30
  3. Laroussi M., Akan T.,
    Arc-free atmospheric pressure cold plasma jets: A review,
    Plasma Processes and Polymers 4 (2007) 777-788
  4. Stoffels E.,
    “Tissue Processing” with Atmospheric Plasmas,
    Contribution to Plasma Physics 47 (2007) 40-48
  5. Shi J., Zhong F., Zhang J., Liu D., Kong M.,
    A hypersonic plasma bullet train traveling in an atmospheric dielectric-barrier discharge jet,
    Physics of Plasmas 15 (2008) 000
  6. Schaefer J., Foest R., Ohl A., Weltmann K.,
    Miniaturized non-thermal atmospheric pressure plasma jet-characterization of self-organized regimes,
    Plasma Phys. Control. Fusion 51 (2009) 000
  7. Herbert P., O\'Neill L., Jaroszynska-Wolinska J.,
    Soft Plasma Polymerization of Gas State Precursors from an Atmospheric Pressure Corona Plasma Discharge,
    Chemistry of Materials 21 (2009) 4401-4407
  8. Zhang X., Huang J., Liu X., Peng L., Guo L., Lv G., Chen W., Feng K., Yang S.,
    Treatment of Streptococcus mutans bacteria by a plasma needle,
    Journal of Applied Physics 105 (2009) 000
  9. Schaefer J., Sigeneger F., Foest R., Loffhagen D., Weltmann K.,
    On plasma parameters of a self-organized plasma jet at atmospheric pressure,
    European Physical Journal D 60 (2010) 531-538
  10. Chen L., Zhao P., Shu X., Shen J., Meng Y.,
    On the mechanism of atmospheric pressure plasma plume,
    Physics of Plasmas 17 (2010) 000
  11. Hrycak B., Jasinski M., Mizeraczyk J.,
    Spectroscopic investigations of microwave microplasmas in various gases at atmospheric pressure,
    European Physical Journal D 60 (2010) 609-619
  12. Cho G., Lim H., Kim J., Jin D., Kwon G., Choi E., Uhm H.,
    Cold Plasma Jets Made of a Syringe Needle Covered With a Glass Tube,
    IEEE Transactions on Plasma Science 39 (2011) 1234-1238
  13. Skacelova D., Slavíček P.,
    Characterization of Plasma Pencil Pulsed Discharge,
    IEEE Transactions on Plasma Science 40 (2012) 2920-2924
  14. Cho G., Kim J., Kang H., Kim Y., Kwon G., Uhm H.,
    Electrical potential measurement in plasma columns of atmospheric plasma jets,
    Journal of Applied Physics 112 (2012) 0000
  15. Novosad L., Hrdlička A., Slavíček P., Otruba V., Kanicky V.,
    Plasma pencil as an excitation source for atomic emission spectrometry,
    Journal of Analytical Atomic Spectrometry 27 (2012) 305-309
  16. Schaefer J., Foest R., Sigeneger F., Loffhagen D., Weltmann K., Martens U., Hippler R.,
    Study of thin Film Formation From Silicon-Containing Precursors Produced by an RF Non-Thermal Plasma Jet at Atmospheric Pressure,
    Contribution to Plasma Physics 52 (2012) 872-880
  17. Schafer J., Quade A., Foest R., Ohl A., Weltmann K.,
    Proc.: CHEMICAL CONSTITUTIONS AND TEMPERATURE STABILITY OF SIO(x) PLASMA POLYMER FILMS CREATED BY AN ATMOSPHERIC PRESSURE PLASMA JET (APPJ),
    4TH INTERNATIONAL CONGRESS ON COLD ATMOSPHERIC PRESSURE PLASMAS: SOURCES AND APPLICATIONS, PROCEEDINGS (2009) 114-117


57. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Surface and Interface Analysis 28 (1999) 240–244 (19× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P.,
    Analysis of slightly rough thin films by optical methods and AFM,
    Mikrochimica Acta 132 (2000) 443–447
  2. Franta D., Ohlídal I.,
    Analysis of thin films by optical multi-sample methods,
    Acta Physica Slovaca 50 (2000) 411–421
  3. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  4. Ohlídal I., Franta D.,
    Matrix formalism for imperfect thin films,
    Acta Physica Slovaca 50 (2000) 489–500
  5. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
    Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 32 (2001) 91–94
  6. Franta D., Zajíčková L., Ohlídal I., Janča J.,
    Optical characterization of diamond-like carbon films,
    Vacuum 61 (2001) 279–283
  7. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
    Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
    Applied Optics 40 (2001) 5711–5717
  8. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  9. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  10. Ohlídal M., Ohlídal I., Franta D., Králík T., Jákl M., Eliáš M.,
    Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
    Surface and Interface Analysis 34 (2002) 660–663
  11. Ohlídal M., Ohlídal I., Klapetek P., Jákl M., Čudek V., Eliáš M.,
    New method for the complete optical analysis of thin films nonuniform in optical parameters,
    Japanese Journal of Applied Physics 42 (2003) 4760–4763
  12. Henrie J., Parsons E., Hawkins A., Schultz S.,
    Spectrum sampling reflectometer,
    Surface and Interface Analysis 37 (2005) 568–572
  13. Singha A., Ghosh A., Roy A., Ray N.,
    Quantitative analysis of hydrogenated diamondlike carbon films by visible Raman spectroscopy,
    Journal of Applied Physics 100 (2006) 044910
  14. Janicki V., Sancho-Parramon J., Stenzel O., Lappschies M., Goertz B., Rickers C., Polenzky C., Richter U.,
    Optical characterization of hybrid antireflective coatings using spectrophotometric and ellipsometric measurements,
    Applied Optics 46 (2007) 6084–6091
  15. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Buršíková V.,
    Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
    Diamond and Related Materials 18 (2009) 384–387
  16. Zaleta-Alejandre E., Meza-Rocha A., Rivera-Alvarez Z., Sandoval I., Araiza J., Aguilar-Frutis M., Falcony C.,
    Optical Characteristics of Silica Coatings Deposited by Ozone Assisted Spray Pyrolysis Technique,
    ECS Journal of Solid State Science and Technology 2 (2013) N145-N148
  17. Likhachev D.,
    Characterization of complex inter-layer dielectric stack by spectroscopic ellipsometry: A simple method to reduce parameters correlations,
    Thin Solid Films 550 (2014) 305-311
  18. Ohlídal I., Franta D., Nečas D.,
    Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
    Thin Solid Films 571 (2014) 695-700
  19. Ohlídal I., Ohlídal M., Klapetek P., Čudek V., Jákl M.,
    Proc.: Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry,
    Proceedings of Wave-Optical Systems Engineering II, SPIE (2003) 260-271


56. Zajíčková L., Janča J., Peřina V.,
Characterization of Silicon Oxide Thin Films Deposited by Plasma Enhanced Chemical Vapour Deposition from Octamethylcyclotetrasiloxane/Oxygen Feeds,
Thin Solid Films 338 (1999) 49–59 (18× cited)

Cited in

  1. Barranco A., Yubero F., Cotrino J., Espinos J., Benitez J., Rojas T., Allain J., Girardeau T., Reviere J., Gonzalez-Elipe A.,
    Low temperature synthesis of dense SiO2 thin films by ion beam induced chemical vapor deposition,
    Thin Solid Films 396 (2001) 9-15
  2. Ward L., Schofield W., Badyal J., Goodwin A., Merlin P.,
    Atmospheric pressure glow discharge deposition of polysiloxane and SiOx films,
    Langmuir 19 (2003) 2110-2114
  3. Qi Y., Xiao Z., Mantei T.,
    Comparison of silicon dioxide layers grown from three polymethylsiloxane precursors in a high-density oxygen plasma,
    Journal of Vacuum Science and Technology A 21 (2003) 1064-1068
  4. Toivola Y., Thurn J., Cook R., Cibuzar G., Roberts K.,
    Influence of deposition conditions on mechanical properties of low-pressure chemical vapor deposited low-stress silicon nitride films,
    Journal of Applied Physics 94 (2003) 6915-6922
  5. Barranco A., Cotrino J., Yubero F., Girardeau T., Camelio S., Clerc C., Gonzalez-Elipe A.,
    Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)(3)Cl precursor and mixtures Ar/O-2 as plasma gas,
    Journal of Vacuum Science and Technology A 21 (2003) 900-905
  6. Ford A., Tepper T., Ross C.,
    Reactive pulsed laser deposition of silica and doped silica thin films,
    Thin Solid Films 437 (2003) 211-216
  7. Chen J., Davidson J.,
    A global model of chemical vapor deposition of silicon dioxide by direct-current corona discharges in dry air containing octamethylcyclotetrasiloxane vapor,
    Plasma Chem. Plasma Process. 24 (2004) 511-535
  8. Chen J., Davidson J.,
    Chemical vapor deposition of silicon dioxide by direct-current corona discharges in dry air containing octamethylcyclotetrasiloxane vapor: Measurement of the deposition rate,
    Plasma Chem. Plasma Process. 24 (2004) 169-188
  9. Mahajan A., Patil L., Bange J., Gautam D.,
    Growth of SiO2 films by TEOS-PECVD system for microelectronics applications,
    Surface and Coatings Technology 183 (2004) 295-300
  10. Xiao Z., Mantei T.,
    Plasma-assisted growth of bilayer silicon-containing coatings for hardness and corrosion resistance,
    Journal of Vacuum Science and Technology A 22 (2004) 1124-1128
  11. Ross A., Gleason K.,
    Effects of condensation reactions on the structural, mechanical, and electrical properties of plasma-deposited organosilicon thin films from octamethylcyclotetrasiloxane,
    Journal of Applied Physics 97 (2005) 000
  12. Mahajan A., Patil L., Bange J., Gautam D.,
    TEOS-PECVD system for high growth rate deposition of SiO2 films,
    Vacuum 79 (2005) 194–202
  13. Hoex B., Peeters F., Creatore M., Blauw M., Kessels W., van de Sanden M.,
    High-rate plasma-deposited SiO2 films for surface passivation of crystalline silicon,
    Journal of Vacuum Science and Technology A 24 (2006) 1823-1830
  14. Yu D., Lu Y., Xu N., Sun J., Ying Z., Wu J.,
    Preparation of alpha-Al2O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing,
    Journal of Vacuum Science and Technology A 26 (2008) 380-384
  15. Baragetti S., Lusvarghi L., Bolelli G., Tordini F.,
    Fatigue behaviour of 2011-T6 aluminium alloy coated with PVD WC/C, PA-CVD DLC and PE-CVD SiO(x) coatings,
    Surface and Coatings Technology 203 (2009) 3078-3087
  16. Wu C., Liao R., Lai L., Jeng M., Liu D.,
    Organosilicon/silicon oxide gas barrier structure encapsulated flexible plastic substrate by using plasma-enhanced chemical vapor deposition,
    Surface and Coatings Technology 206 (2012) 4685-4691
  17. Barranco A., Jimenez A., Frutos F., Cotrino F., Yubero F., Espinos J., Gonzalez-Elipe A.,
    Proc.: Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD.,
    ICSD `01: PROCEEDINGS OF THE 2001 IEEE 7TH INTERNATIONAL CONFERENCE ON SOLID DIELECTRICS (2001) 303-306
  18. Liu D., Liao Y., Wu C., Juang F., Lee C.,
    Proc.: A silicon oxide hard coating deposited on flexible substrate by TMS - PECVD system,
    PROGRESS ON ADVANCED MANUFACTURE FOR MICRO/NANO TECHNOLOGY 2005, PT 1 AND 2 (2006) 439-444


55. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 343–344 (1999) 295–298 (6× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Matrix formalism for imperfect thin films,
    Acta Physica Slovaca 50 (2000) 489–500
  2. Brunner R., Pincik E., Mikula M., Zahora J.,
    Reflectance spectrometry of TiO2 optical coatings on c-Si: The real data based simulation,
    Acta Physica Slovaca 51 (2000) 17-26
  3. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
    Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
    Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878
  4. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Optical characterization of chalcogenide thin films,
    Applied Surface Science 175–176 (2001) 555–561
  5. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  6. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467


1998

54. Pavelka R., Hlávka J., Ohlídal I., Sitter H.,
Optical parameter analysis of thin absorbing films measured by the photovoltage method,
Acta Physica Polonica A 94 (1998) 468–472 (1× cited)

Cited in

  1. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
    Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
    Thin Solid Films 366 (2000) 43–50


53. Franta D., Ohlídal I., Munzar D.,
Parameterisation of the model of dispersion dependences of solid state optical constants,
Acta Physica Slovaca 48 (1998) 451–458 (10× cited)

Cited in

  1. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
    Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 343–344 (1999) 295–298
  2. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
    Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
    Surface and Interface Analysis 28 (1999) 240–244
  3. Franta D., Ohlídal I.,
    Analysis of thin films by optical multi-sample methods,
    Acta Physica Slovaca 50 (2000) 411–421
  4. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
    Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
    Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878
  5. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Optical characterization of chalcogenide thin films,
    Applied Surface Science 175–176 (2001) 555–561
  6. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  7. Bianchi R., Balogh D., Tinani M., Faria R., Irene E.,
    Ellipsometry study of the photo-oxidation of poly[(2-methoxy–5-hexyloxy)-p-phenylenevinylene],
    Journal of Polymer Science B 42 (2004) 1033–1041
  8. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  9. Franta D., Čermák M., Vohánka J., Ohlídal I.,
    Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
    Thin Solid Films 631 (2017) 12-22
  10. Foldyna M., Postava K., Bouchala J., Pistora J., Yamaguchi T.,
    Proc.: Model dielectric function of amorphous materials including Urbach tail,
    MICROWAVE AND OPTICAL TECHNOLOGY 2003 (2003) 301-305


52. Ohlídal I., Franta D.,
Ellipsometry of Thin Films,
Acta Physica Slovaca 48 (1998) 459–468 (2× cited)

Cited in

  1. Postava K., Sueki H., Aoyama M., Yamaguchi T., Ino C., Igasaki Y., Horie M.,
    Spectroscopic ellipsometry of epitaxial ZnO layer on sapphire substrate,
    Journal of Applied Physics 87 (2000) 7820–7824
  2. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467


51. Franta D., Ohlídal I.,
Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
Journal of Modern Optics 45 (1998) 903–934 (53× cited)

Cited in

  1. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
    Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 343–344 (1999) 295–298
  2. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
    Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
    Surface and Interface Analysis 28 (1999) 240–244
  3. Franta D., Ohlídal I., Klapetek P.,
    Analysis of slightly rough thin films by optical methods and AFM,
    Mikrochimica Acta 132 (2000) 443–447
  4. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  5. Madrigal-Melcher J., Azucena-Coyotecatl H., Silva-Castillo A., Perez-Rodriguez F.,
    Light scattering from slightly rough semiconductor surfaces near exciton resonance,
    Physical Review B 61 (2000) 15993–16005
  6. Ohlídal I., Franta D.,
    Matrix formalism for imperfect thin films,
    Acta Physica Slovaca 50 (2000) 489–500
  7. Postava K., Sueki H., Aoyama M., Yamaguchi T., Ino C., Igasaki Y., Horie M.,
    Spectroscopic ellipsometry of epitaxial ZnO layer on sapphire substrate,
    Journal of Applied Physics 87 (2000) 7820–7824
  8. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
    Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 32 (2001) 91–94
  9. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Optical characterization of chalcogenide thin films,
    Applied Surface Science 175–176 (2001) 555–561
  10. Zajíčková L., Veltruská K., Tsud N., Franta D.,
    XPS and ellipsometric study of DLC/silicon Interface,
    Vacuum 61 (2001) 269–273
  11. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  12. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Influence of overlayers on determination of the optical constants of ZnSe thin films,
    Journal of Applied Physics 92 (2002) 1873–1880
  13. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117
  14. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  15. Sirtori V., Magagnin L., Saglia E., Cavallotti P.,
    Calculation model of rough gold optical constants,
    Surface Science 554 (2004) 119–124
  16. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
    Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
    Surface and Interface Analysis 36 (2004) 1203–1206
  17. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  18. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  19. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  20. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  21. Antoš R., Mistrík J., Yamaguchi T., Višňovský Š., Demokritov S., Hillebrands B.,
    Evaluation of the quality of Permalloy gratings by diffracted magneto-optical spectroscopy,
    Optics Express 13 (2005) 4651–4656
  22. Belyaeva A., Bardamid A., Davis J., Haasz A., Konovalov V., Kudlenko A., Poon M., Slatin K., Voitsenya V.,
    Hydrogen ion bombardment damage in stainless steel mirrors,
    Journal of Nuclear Materials 345 (2005) 101-108
  23. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
    Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
    Applied Surface Science 244 (2005) 338–342
  24. Franta D., Ohlídal I., Petrýdes D.,
    Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
    Vacuum 80 (2005) 159–162
  25. Polikreti K., Othonos A., Christofides C.,
    Optical characterization of varnish films by spectroscopic ellipsometry for application in artwork conservation,
    Applied Spectroscopy 59 (2005) 94–99
  26. Franta D., Negulescu B., Thomas L., Dahoo P., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
    Optical properties of NiO thin films prepared by pulsed laser deposition technique,
    Applied Surface Science 244 (2005) 426–430
  27. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
    Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
    Applied Surface Science 244 (2005) 431–434
  28. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
    Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
    Surface and Interface Analysis 38 (2006) 842–846
  29. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  30. Polikreti K., Christofides C.,
    Spectroscopic ellipsometry as a tool for the optical characterization and ageing studies of varnishes used in Post-Byzantine icon reconstructions,
    Journal of Cultural Heritage 7 (2006) 30-36
  31. Mykhaylyk T., Dmitruk N., Evans S., Hamley I., Henderson J.,
    Comparative characterisation by atomic force microscopy and ellipsometry of soft and solid thin films,
    Surface and Interface Analysis 39 (2007) 575–581
  32. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  33. Berginc G., Bourrely C.,
    The small-slope approximation method applied to a three-dimensional slab with rough boundaries,
    Progress in Electromagnetics Research 73 (2007) 131–211
  34. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803
  35. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  36. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  37. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402
  38. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  39. Yanguas-Gil A., Sperling B., Abelson J.,
    Theory of light scattering from self-affine surfaces: Relationship between surface morphology and effective medium roughness,
    Physical Review B 84 (2011) 085402
  40. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
    Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
    Thin Solid Films 541 (2013) 12-16
  41. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
    Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
    Thin Solid Films 539 (2013) 233-244
  42. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
    Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
    Surface and Interface Analysis 45 (2013) 1188-1192
  43. Nečas D., Ohlídal I.,
    Consolidated series for efficient calculation of the reflection and transmission in rough multilayers,
    Optics Express 22 (2014) 4499-4515
  44. Ohlídal I., Franta D., Nečas D.,
    Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
    Thin Solid Films 571 (2014) 695-700
  45. Nečas D., Ohlídal I., Franta D., Ohlídal M., Čudek V., Vodák J.,
    Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films,
    Applied Optics 53 (2014) 5606-5614
  46. Colombo A., Gherardi F., Goidanich S., Delaney J., de la Rie E., Ubaldi M., Toniolo L., Simonutti R.,
    Highly transparent poly(2-ethyl-2-oxazoline)-TiO2 nanocomposite coatings for the conservation of matte painted artworks,
    RSC Advances 5 (2015) 84879-84888
  47. Nečas D., Vodák J., Ohlídal I., Ohlídal M., Majumdar A., Zajíčková L.,
    Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry,
    Applied Surface Science 350 (2015) 149-155
  48. Fodor B., Kozma P., Burger S., Fried M., Petrik P.,
    Effective medium approximation of ellipsometric response from random surface roughness simulated by finite-element method,
    Thin Solid Films 617 (2016) 20-24
  49. Qiu J., Ran D., Liu Y., Liu L.,
    Investigation of ellipsometric parameters of 2D microrough surfaces by FDTD,
    Applied Optics 55 (2016) 5423-5431
  50. Nečas D., Ohlídal I., Franta D., Ohlídal M., Vodák J.,
    Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry,
    Journal of Optics 18 (2016) 015401
  51. Ohlídal I., Ohlídal M., Franta D., Tykal M.,
    Proc.: Comparison of optical and non-optical methods for measuring surface roughness,
    Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467
  52. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Stifter H.,
    Proc.: Optical characterization of ZnSe thin films,
    Proceedings of 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE (2003) 831-832
  53. Antos R., Veis M., Liskova E., Aoyama M., Hamrle J., Kimura T., Gustafik P., Horie M., Mistrik J., Yamaguchi T.,
    Proc.: Optical metrology of patterned magnetic structures: deep versus shallow gratings,
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIX, PTS 1-3 (2005) 1050-1059


50. Ohlídal I., Franta D., Hora J., Navrátil K., Weber J., Janda P.,
Analysis of thin films with slightly rough boundaries,
Mikrochimica Acta 15 (1998) 177–180 (1× cited)

Cited in

  1. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
    Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
    Thin Solid Films 519 (2011) 2694-2697


49. Franta D., Ohlídal I.,
Statistical properties of the near-field speckle patterns of thin films with slightly rough boundaries,
Optics Communications 147 (1998) 349–358 (4× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  2. Ohlídal I., Franta D.,
    Matrix formalism for imperfect thin films,
    Acta Physica Slovaca 50 (2000) 489–500
  3. Berginc G., Bourrely C.,
    The small-slope approximation method applied to a three-dimensional slab with rough boundaries,
    Progress in Electromagnetics Research 73 (2007) 131–211
  4. Badalyan N., Kiiko V., Kislov V., Kozov A.,
    Remote laser speckle interferometry: A speckle pattern formation model,
    Quantum Electronics 38 (2008) 477–481


48. Zajíčková L., Buršíková V., Janča J.,
Protection Coatings for Polycarbonates Based on PECVD from Organosilicon Feeds,
Vacuum 50 (1998) 19–21 (20× cited)

Cited in

  1. Shenton M., Stevens G.,
    Investigating the effect of the thermal component of atmospheric plasmas on commodity polymers,
    Thermochimica Acta 332 (1999) 151-160
  2. Zajíčková L., Buršíková V., Peřina V., Macková A., Subedi D., Janča J.,
    Plasma Modification of Polycarbonates,
    Surface and Coatings Technology 142 (2001) 449–454
  3. Damasceno J., Camargo S., Cremona M.,
    Deposition and evaluation of DLC-Si protective coatings for polycarbonate materials,
    Thin Solid Films 420 (2002) 195-199
  4. Damasceno J., Camargo S., Cremona M.,
    Optical and mechanical properties of DLC-Si coatings on polycarbonate,
    Thin Solid Films 433 (2003) 199-204
  5. Li H., Sharma R., Zhang Y., Tay A., Kang E., Neoh K.,
    Surface modification of polyimide films via plasma-enhanced chemical vapor deposition of thin silica and nitride films,
    Langmuir 19 (2003) 6845-6850
  6. Martin-Palma R., Conde A., Gago R., Simancas J., Garcia-Diego I., Egio A., Martinez-Duart J., Fernandez-Hidalgo P.,
    Structural and chemical characterization of functional SiOxCy : H coatings for polymeric lenses,
    Journal of Vacuum Science & Technology B 22 (2004) 2402-2408
  7. Hegemann D., Oehr C., Fischer A.,
    Design of functional coatings,
    Journal of Vacuum Science and Technology A 23 (2005) 5-11
  8. Schulz U.,
    Review of modern techniques to generate antireflective properties on thermoplastic polymers,
    Applied Optics 45 (2006) 1608-1618
  9. Araya M., Yuji T., Watanabe T., Kashihara J., Sumida Y.,
    Application to cleaning of waste plastic surfaces using atmospheric non-thermal plasma jets,
    Thin Solid Films 515 (2007) 4301-4307
  10. Schulz U., Lau K., Kaiser N.,
    Antireflection coating with UV-protective properties for polycarbonate,
    Applied Optics 47 (2008) C83-C87
  11. Srivatsa K., Bera M., Basu A., Bhattacharya T.,
    Antireflection coatings on plastics deposited by plasma polymerization process,
    Bulletin of Materials Science 31 (2008) 673-680
  12. Fabbri P., Messori M., Toselli M., Veronesi P., Rocha J., Pilati F.,
    Enhancing the Scratch Resistance of Polycarbonate With Poly(Ethylene Oxide)-Silica Hybrid Coatings,
    Advances in Polymer Technology 27 (2008) 117-126
  13. Karkari S., Daniels S., McCraith B., Gandhiraman R.,
    Influence of ion bombardment on the surface functionalization of plasma deposited coatings,
    Surface and Coatings Technology 203 (2009) 3521-3526
  14. Kahraman M., Bayramoglu G., Boztoprak Y., Gungor A., Kayaman-Apohan N.,
    Synthesis of fluorinated/methacrylated epoxy based oligomers and investigation of its performance in the UV curable hybrid coatings,
    Progress in organic coatings 66 (2009) 52-58
  15. Fanelli F., Lovascio S., d\'Agostino R., Arefi-Khonsari F., Fracassi F.,
    Ar/HMDSO/O(2) Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products,
    Plasma Processes and Polymers 7 (2010) 535-543
  16. Huang C., Wu S., Chang Y.,
    Synthesis of Organosilicon Film on Polycarbonate by Means of Low-Temperature Atmospheric-Pressure Plasma Jet,
    IEEE Transactions on Plasma Science 38 (2010) 1101-1105
  17. Kim Y., Kim G.,
    Oxygen plasma treatment of SiO(x)C(y)(-H) films polymerized by atmospheric pressure dielectric barrier discharge using hexamethylcyclrotrisiloxane,
    Thin Solid Films 519 (2011) 6750-6754
  18. Fanelli F., Lovascio S., d\'Agostino R., Fracassi F.,
    Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors,
    Plasma Processes and Polymers 9 (2012) 1132-1143
  19. G G., hiraman R., Gubala V., O\'Mahony C., Cummins T., Raj J., Eltayeb A., Doyle C., James B., Daniels S., Williams D.,
    PECVD coatings for functionalization of point-of-care biosensor surfaces,
    Vacuum 86 (2012) 547-555
  20. G G., hiraman R., Gubala V., O\'Mahony C., Cummins T., Raj J., Eltayeb A., Doyle C., James B., Daniels S., Williams D.,
    PECVD coatings for functionalization of point-of-care biosensor surfaces,
    Vacuum 86 (2012) 547-555


1996

47. Hlávka J., Ohlídal I., Vižďa F., Sitter H.,
New technique of measurement of optical parameters of thin films,
Thin Solid Films 279 (1996) 209–212 (1× cited)

Cited in

  1. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
    Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
    Thin Solid Films 366 (2000) 43–50


46. Zajíčková L., Ohlídal I., Janča J.,
Plasma-Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses,
Thin Solid Films 280 (1996) 26–36 (10× cited)

Cited in

  1. Zajíčková L., Buršíková V., Janča J.,
    Protection Coatings for Polycarbonates Based on PECVD from Organosilicon Feeds,
    Vacuum 50 (1998) 19–21
  2. Zajíčková L., Janča J., Peřina V.,
    Characterization of Silicon Oxide Thin Films Deposited by Plasma Enhanced Chemical Vapour Deposition from Octamethylcyclotetrasiloxane/Oxygen Feeds,
    Thin Solid Films 338 (1999) 49–59
  3. Zajíčková L., Buršíková V., Franta D.,
    The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films,
    Czechoslovak Journal of Physics 49 (1999) 1213–1228
  4. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  5. Vallee C., Goullet A., Granier A., van der Lee A., Durand J., Marliere C.,
    Inorganic to organic crossover in thin films deposited from O2/TEOS plasmas,
    Journal of Non-Crystalline Solids 272 (2000) 163–173
  6. Martinů L., Poltras D.,
    Plasma deposition of optical films and coatings: A review,
    Journal of Vacuum Science and Technology A 18 (2000) 2619–2645
  7. Mahajan A., Patil L., Gautam D.,
    Influence of process parameters on the properties of TEOS-PECVD-grown SiO2 films,
    Surface and Coatings Technology 188 (2004) 314–318
  8. Mahajan A., Patil L., Bange J., Gautam D.,
    TEOS-PECVD system for high growth rate deposition of SiO2 films,
    Vacuum 79 (2005) 194–202
  9. Brzobohatý O., Buršíková V., Nečas D., Valtr M., Trunec D.,
    Influence of substrate material on plasma in deposition/sputtering reactor: experiment and computer simulation,
    Journal of Physics D 41 (2008) 035213
  10. Tuan D., Jeon B.,
    Electron Collision Cross Sections for the Tetraethoxysilane Molecule and Electron Transport Coefficients in Tetraethoxysilane-O-2 and Tetraethoxysilane-Ar Mixtures,
    Journal of Polymer Science B 81 (2012) 0000


1995

45. Ohlídal I., Vižďa F., Ohlídal M.,
Optical analysis by means of spectroscopic reflectometry of single and double layers with correlated randomly rough boundaries,
Optical Engineering 34 (1995) 1761–1768 (10× cited)

Cited in

  1. Ohlídal I., Franta D., Hora J., Navrátil K., Weber J., Janda P.,
    Analysis of thin films with slightly rough boundaries,
    Mikrochimica Acta 15 (1998) 177–180
  2. Franta D., Ohlídal I.,
    Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
    Journal of Modern Optics 45 (1998) 903–934
  3. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  4. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
    Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
    Thin Solid Films 366 (2000) 43–50
  5. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
    Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
    Surface and Interface Analysis 36 (2004) 1203–1206
  6. Ohlídal I., Franta D., Klapetek P.,
    Combination of optical methods and atomic force microscopy at characterization of thin film systems,
    Acta Physica Slovaca 55 (2005) 271–294
  7. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602
  8. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  9. Valtr M., Ohlídal I., Franta D.,
    Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
    Czechoslovak Journal of Physics 56 (2006) B1103–B1109
  10. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803


44. Ohlídal M., Ohlídal I., Druckmüller M., Franta D.,
A method of shearing interferometry for determining the statistical quantities of randomly rough surfaces of solids,
Pure and Applied Optics 4 (1995) 599–616

1994

43. Ohlídal I., Navrátil K., Ohlídal M., Druckmüller M.,
Characterization of the basic statistical properties of very rough surfaces of transparent solids by immersion shearing interferometry,
Applied Optics 33 (1994) 7838–7845 (1× cited)

Cited in

  1. Ohlídal I., Ohlídal M., Franta D., Tykal M.,
    Proc.: Comparison of optical and non-optical methods for measuring surface roughness,
    Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467


1993

42. Ohlídal I.,
Approximate formulas for the reflectance, transmittance, and scattering losses of nonabsorbing multilayer systems with randomly rough boundaries,
Journal of the Optical Society of America A 10 (1993) 158–171 (1× cited)

Cited in

  1. Franta D., Ohlídal I.,
    Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
    Journal of Modern Optics 45 (1998) 903–934


41. Holý V., Kuběna J., Ohlídal I., Lischka K., Plotz W.,
X-ray reflection from rough layered systems,
Physical Review B 47 (1993) 15896–15903 (20× cited)

Cited in

  1. Vainer Y., Pestov A., Prokhorov K., Salashchenko N., Fraerman A., Chernov V., Chkhalo N.,
    Analysis of cross-correlation of interface roughness in multilayer structures with ultrashort periods,
    Journal of Experimental and Theoretical Physics 103 (2006) 346–353
  2. Fukuto M., Gang O., Alvine K., Pershan P.,
    Capillary wave fluctuations and intrinsic widths of coupled fluid-fluid interfaces: An x-ray scattering study of a wetting film on bulk liquid,
    Physical Review E 74 (2006) 031607
  3. Busch P., Rauscher M., Smilgies D., Posselt D., Papadakis C.,
    Grazing-incidence small-angle X-ray scattering from thin polymer films with lamellar structures-the scattering cross section in the distorted-wave Born approximation,
    Journal of Applied Crystallography 39 (2006) 433–442
  4. Eriksson F., Ghafoor N., Schäfers F., Gullikson E., Birch J.,
    Interface engineering of short-period Ni/V multilayer X-ray mirrors,
    Thin Solid Films 500 (2006) 84–95
  5. Froemsdorf A., Capek R., Roth S.,
    m-GISAXS experiment and simulation of a highly ordered model monolayer of PMMA-beads,
    Journal of Physical Chemistry B 110 (2006) 15166–15171
  6. An Y., Zhang H., Dai B., Mai Z., Cai J., Wu Z.,
    Mechanisms of Ag as a surfactant in giant magnetoresistance multilayer growth and thermal stability,
    Journal of Applied Physics 100 (2006) 023516
  7. Hu X., Jiang Z., Narayanan S., Jiao X., Sandy A., Sinha S., Lurio L., Lal J.,
    Observation of a low-viscosity interface between immiscible polymer layers,
    Physical Review E 74 (2006) 010602
  8. Tate M., Urade V., Kowalski J., Wei T., Hamilton B., Eggiman B., Hillhouse H.,
    Simulation and interpretation of 2D diffraction patterns from self-assembled nanostructured films at arbitrary angles of incidence: From grazing incidence (above the critical angle) to transmission perpendicular to the substrate,
    Journal of Physical Chemistry B 110 (2006) 9882–9892
  9. Suzuki T., Omote K., Ito Y., Hirosawa I., Nakata Y., Sugiura I., Shimizu N., Nakamura T.,
    Small angle X-ray scattering measurements of porous low-k films using synchrotron radiation,
    Thin Solid Films 515 (2006) 2410–2414
  10. Tanaka S., Tate M., Nishiyama N., Ueyama K., Hillhouse H.,
    Structure of mesoporous silica thin films prepared by contacting PEO106-PPO70-PEO106 films with vaporized TEOS,
    Chemistry of Materials 18 (2006) 5461–5466
  11. An Y., Dai B., Zhang H., Mai Z., Cai J., Wu Z.,
    The interfacial structure and degradation mechanism of the GMR effect in Co90Fe10/Cu and Ni70Co30/Cu magnetic multilayers,
    Journal of Physics D 39 (2006) 1711–1717
  12. Feygenson M., Kentzinger E., Ziegenhagen N., Ruecker U., Goerigk G., Wang Y., Bruekel T.,
    Contrast variation by anomalous X-ray scattering applied to investigation of the interface morphology in a giant magnetoresistance Fe/Cr/Fe trilayer,
    Journal of Applied Crystallography 40 (2007) 532–538
  13. Xu Y., Wang Z., Wang B., Wang H., Wu W., Zhang S., Zhang Z., Wang F., Qin S., Chen L.,
    Determination of tungsten layer profiles in bilayer structures using X-ray reflectivity method,
    Chinese Physics Letters 24 (2007) 366–369
  14. Tate M., Hillhouse H.,
    General method for simulation of 2D GISAXS intensities for any nanostructured film using discrete Fourier transforms,
    Journal of Physical Chemistry C 111 (2007) 7645–7654
  15. Lazzari R., Leroy F., Renaud G.,
    Grazing-incidence small-angle x-ray scattering from dense packing of islands on surfaces: Development of distorted wave Born approximation and correlation between particle sizes and spacing,
    Physical Review B 76 (2007) 125411
  16. Lenormand P., Lecomte A., Laberty-Robert C., Ansart F., Boulle A.,
    Microstructural characterisation by X-ray scattering of perovskite-type La0.8Sr0.2MnO3±δ thin films prepared by a dip-coating process,
    Journal of Materials Science 42 (2007) 4581–4590
  17. Reitinger R., Sepiol B., Vogl G., Pfau B.,
    Morphology of Fe/MgO(001) ultrathin films,
    Journal of Applied Physics 102 (2007) 034310
  18. Fodchuk I., Balovsyak S.,
    New possibilities for determination of solids surface parameters by X-ray reflectivity,
    Physica Status Solidi A 204 (2007) 1543–1554
  19. Nascimento V., Passamani E., Biondo A., Nunes V., Saitovitch E.,
    Properties of the roughness in NiFe/FeMn exchange-biased system,
    Applied Surface Science 253 (2007) 6248–6254
  20. Lecomte A., Bamiere F., Coste S., Thomas P., Champarnaud-Mesjard J.,
    Sol–gel processing of TeO2 thin films from citric acid stabilised tellurium isopropoxide precursor,
    Journal of the European Ceramic Society 27 (2007) 1151–1158


1992

40. Musilová J., Ohlídal I.,
Influence of defects of thin films on determining their thickness by the method based on white light interference,
Journal of Physics D 25 (1992) 1131–1138

39. Strelec P., Ohlídal I., Schmidt E.,
Colour properties of detuned alternating multilayer systems,
Journal of Physics D 25 (1992) 297–302

38. Holý V., Kuběna J., Ohlídal I., Ploog K.,
The diffuse X-ray scattering in real periodical superlattices,
Superlattices and Microstructures 12 (1992) 25–35

1991

37. Ohlídal I., Líbezný M.,
Ellipsometric analysis of gallium arsenide surfaces,
Surface and Interface Analysis 17 (1991) 171–176 (3× cited)

Cited in

  1. Franta D., Ohlídal I.,
    Analysis of thin films by optical multi-sample methods,
    Acta Physica Slovaca 50 (2000) 411–421
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  3. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117


1990

36. Ohlídal I., Schmidt E., Líbezný M.,
Complete unambiguous optical characterization of double layers consisting of two strongly absorbing thin films by combined reflection and transmission ellipsometry,
Applied Optics 29 (1990) 593–598 (1× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


35. Musilová J., Ohlídal I.,
Possibilities and limitations of the film thickness determination method based on white light interference,
Journal of Physics D 23 (1990) 1227–1238

34. Ohlídal I., Líbezný M.,
Immersion ellipsometry of semiconductor surfaces,
Surface and Interface Analysis 16 (1990) 46–53 (2× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of Thin Films,
    Acta Physica Slovaca 48 (1998) 459–468
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


33. Ponížil P., Ohlídal I., Janča J.,
Optical properties of diamond-like carbon films,
Thin Solid Films 190 (1990) 65–72

1989

32. Ohlídal I.,
Reflectance of multilayer systems with randomly rough boundaries,
Optics Communications 71 (1989) 323–326

31. Ohlídal I., Schmidt E., Líbezný M., Tvarožek V., Novotný I.,
Ellipsometric analysis of thin NiCr films,
Thin Solid Films 169 (1989) 213–222 (1× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


1988

30. Ohlídal I., Lukeš F.,
Analysis of semiconductor surfaces with very thin native oxide layers by combined immersion and multiple angle of incidence ellipsometry,
Applied Surface Science 35 (1988) 259–273 (2× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of Thin Films,
    Acta Physica Slovaca 48 (1998) 459–468
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


29. Ohlídal I.,
General Formulae for the Optical Characterization of Single Layers with Spectroscopic Reflectometry,
Journal of Modern Optics 35 (1988) 1373–1381 (1× cited)

Cited in

  1. Franta D., Ohlídal I.,
    Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
    Surface and Interface Analysis 30 (2000) 574–579


28. Ohlídal I.,
Immersion spectroscopic reflectometry of multilayer systems. I. Theory,
Journal of the Optical Society of America A 5 (1988) 459–464

27. Ohlídal I.,
Immersion spectroscopic reflectometry of multilayer systems. II. Experimental results,
Journal of the Optical Society of America A 5 (1988) 465–470

26. Ohlídal I., Navrátil K.,
Simple method of spectroscopic reflectometry for the complete optical analysis of weakly absorbing thin films: Application to silicon films,
Thin Solid Films 156 (1988) 181–189 (1× cited)

Cited in

  1. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
    Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 343–344 (1999) 295–298


25. Ohlídal I.,
Optical analysis of inhomogeneous weakly absorbing thin films by spectroscopic reflectometry: Application to carbon films,
Thin Solid Films 162 (1988) 101–109 (2× cited)

Cited in

  1. Zajíčková L., Buršíková V., Franta D.,
    The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films,
    Czechoslovak Journal of Physics 49 (1999) 1213–1228
  2. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
    Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
    Applied Optics 40 (2001) 5711–5717


1987

24. Ohlídal I., Navrátil K.,
Complete optical analysis of a non-absorbing thin film on an absorbing substrate by a new method of immersion spectroscopic reflectometry,
Thin Solid Films 148 (1987) 17–27 (1× cited)

Cited in

  1. Ohlídal I., Ohlídal M., Franta D., Tykal M.,
    Proc.: Comparison of optical and non-optical methods for measuring surface roughness,
    Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467


1986

23. Paneva A., Ohlídal I.,
Multiple angle of incidence ellipsometric analysis of non-absorbing two-layer and three-layer systems,
Thin Solid Films 145 (1986) 23–37 (1× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


1985

22. Ohlídal I., Navrátil K.,
Analysis of the basic statistical properties of randomly rough curved surfaces by shearing interferometry,
Applied Optics 24 (1985) 2690–2695 (1× cited)

Cited in

  1. Ohlídal I., Ohlídal M., Franta D., Tykal M.,
    Proc.: Comparison of optical and non-optical methods for measuring surface roughness,
    Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467


21. Ohlídal I.,
Influence of Surface Roughness on Radiation from Parabolic Mirror Collimators with Cylindrical Symmetry in the Fraunhofer Region,
Optica Acta 32 (1985) 27–37

20. Ohlídal I., Navrátil K., Musilová J.,
A new method for the complete optical analysis of weakly absorbing thin films: Application to polycrystalline silicon films,
Thin Solid Films 127 (1985) 191–203

1984

19. Ohlídal I., Lukeš F.,
Optical analysis of absorbing double layers by combined reflection and transmission ellipsometry,
Thin Solid Films 115 (1984) 269–282 (1× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


1982

18. Ohlídal I., Navrátil K., Schmidt E.,
Simple Method for the Complete Optical Analysis of Very Thick and Weakly Absorbing Films,
Applied Physics A 29 (1982) 157–162

1981

17. Ohlídal I., Lukeš F.,
Optical analysis of thin gold films by combined reflection and transmission ellipsometry,
Thin Solid Films 85 (1981) 181–190 (1× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


1980

16. Ohlídal I.,
Expression for the reflectance of randomly rough surfaces derived with the Fresnel approximation,
Applied Optics 19 (1980) 1804–1811

15. Ohlídal I., Navrátil K.,
Optical analysis of non-absorbing double layers by means of immersion reflectometry I: Liquid immersion method,
Thin Solid Films 67 (1980) 245–251

14. Ohlídal I., Navrátil K.,
Optical analysis of non-absorbing double layers by means of immersion reflectometry II: Solid state immersion method,
Thin Solid Films 71 (1980) 91–102

13. Ohlídal I., Navrátil K.,
Determination of the optical parameters and packing density of non-absorbing columnar thin films by means of immersion reflectometry: Application to LiF thin films,
Thin Solid Films 74 (1980) 51–58 (1× cited)

Cited in

  1. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
    Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
    Applied Optics 40 (2001) 5711–5717


1979

12. Navrátil K., Ohlídal I., Lukeš F.,
The physical structure of the interface between single-crystal GaAs and its oxide film,
Thin Solid Films 56 (1979) 163–171 (2× cited)

Cited in

  1. Ohlídal I., Franta D., Hora J., Navrátil K., Weber J., Janda P.,
    Analysis of thin films with slightly rough boundaries,
    Mikrochimica Acta 15 (1998) 177–180
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


11. Ohlídal I., Navrátil K., Lukeš F.,
The optical analysis of non-absorbing thin films with randomly rough boundaries by means of immersion spectrophotometry,
Thin Solid Films 57 (1979) 179–184

1977

10. Navrátil K., Ohlídal I., Lukeš F.,
A model of oxide film originating at thermal oxidation of GaAs,
Czechoslovak Journal of Physics 27 (1977) 672–681

9. Ohlídal I., Navrátil K.,
Method for determining the refractive index and thickness of a non-absorbing thin film with randomly rough boundaries,
Thin Solid Films 44 (1977) 313–321

1976

8. Ohlídal M., Ohlídal I., Lukeš F.,
Ellipsometric studies of polished silicon surfaces,
Surface Science 55 (1976) 467–476

7. Ohlídal I., Navrátil K.,
Influence of the properties of thin films on the determination of the relative reflectance of a randomly rough surface,
Thin Solid Films 31 (1976) 223–234

1974

6. Ohlídal I., Lukeš F., Navrátil K.,
Rough silicon surfaces studied by optical methods,
Surface Science 45 (1974) 91–116 (5× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P.,
    Analysis of slightly rough thin films by optical methods and AFM,
    Mikrochimica Acta 132 (2000) 443–447
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  3. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
    Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
    Thin Solid Films 366 (2000) 43–50
  4. Franta D., Ohlídal I., Nečas D.,
    Optical quantities of rough films calculated by Rayleigh-Rice theory,
    Physica Status Solidi C 5 (2008) 1395–1398
  5. Ohlídal I., Nečas D., Franta D.,
    Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
    Physica Status Solidi C 5 (2008) 1399–1402


1973

5. Ohlídal I., Lukeš F.,
Calculation of the Ellipsometric Parameters Characterizing a Randomly Rough Surface by Means of The Stratton-Chu-Silver Integral,
Optics Communications 7 (1973) 76–79 (1× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282


1972

4. Ohlídal I., Lukeš F.,
Ellipsometric Parameters of Rough Surfaces and of a System Substrate-Thin Film with Rough Boundaries,
Optica Acta 19 (1972) 817–843 (5× cited)

Cited in

  1. Franta D., Ohlídal I., Klapetek P.,
    Analysis of slightly rough thin films by optical methods and AFM,
    Mikrochimica Acta 132 (2000) 443–447
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  3. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
  4. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774
  5. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803


3. Ohlídal I., Lukeš F.,
Ellipsometric parameters of randomly rough surfaces,
Optics Communications 5(5) (1972) 323-326 (2× cited)

Cited in

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  2. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774


1971

2. Ohlídal I., Navrátil K., Lukeš F.,
Reflection of Light by a System of Nonabsorbing Isotropic Film-Nonabsorbing Isotropic Substrate with Randomly Rough Boundaries,
Journal of the Optical Society of America 61 (1971) 1630–1639 (8× cited)

Cited in

  1. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
    Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 343–344 (1999) 295–298
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  3. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
    Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
    Thin Solid Films 366 (2000) 43–50
  4. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
    Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
    Applied Optics 40 (2001) 5711–5717
  5. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical constants of ZnTe and ZnSe epitaxial thin films,
    Acta Physica Slovaca 53 (2003) 95–104
  6. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical properties of ZnTe films prepared by molecular beam epitaxy,
    Thin Solid Films 468 (2004) 193–202
  7. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
    Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
    Journal of Modern Optics 52 (2005) 583–602
  8. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774


1. Ohlídal I., Navrátil K., Lukeš F.,
Reflection of light on a system of non-absorbing isotropic film - non-absorbing isotropic substrate with rough boundaries,
Optics Communications 3 (1971) 40–44 (1× cited)

Cited in

  1. Franta D., Ohlídal I.,
    Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
    Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774


Articles in journals without impact factor

2009

18. Ohlídal M., Ohlídal I., Nečas D., Klapetek P.,
Complete Optical Characterization of Non-Uniform SiOx Thin Films Using Imaging Spectroscopic Reflectometry,
e-Journal of Surface Science and Nanotechnology 7 (2009) 409–412

17. Nečas D., Zajíčková L., Franta D., Sťahel P., Mikulík P., Meduňa M., Valtr M.,
Optical characterization of ultra-thin iron and iron oxide films,
e-Journal of Surface Science and Nanotechnology 7 (2009) 486–490

16. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Modeling of dielectric response of GexSbyTez (GST) materials,
Physica Status Solidi C 6 (2009) S59–S62 (2× cited)

Cited in

  1. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  2. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
    Optical characterization of HfO2 thin films,
    Thin Solid Films 519 (2011) 6085-6091


2008

15. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
Optical characterization of non-stoichiometric silicon nitride films,
Physica Status Solidi C 5 (2008) 1320–1323

14. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
Physica Status Solidi C 5 (2008) 1324–1327 (4× cited)

Cited in

  1. Orava J., Wagner T., Sik J., Prikryl J., Frumar M., Benes L.,
    Optical properties and phase change transition in Ge(2)Sb(2)Te(5) flash evaporated thin films studied by temperature dependent spectroscopic ellipsometry,
    Journal of Applied Physics 104 (2008) 043523
  2. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898
  3. Němec P., Moréac A., Nazabal V., Pavlišta M., Přikryl J., Frumar M.,
    Ge-Sb-Te thin films deposited by pulsed laser: An ellipsometry and Raman scattering spectroscopy study,
    Journal of Applied Physics 106 (2009) 103509
  4. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62


13. Franta D., Ohlídal I., Nečas D.,
Optical quantities of rough films calculated by Rayleigh-Rice theory,
Physica Status Solidi C 5 (2008) 1395–1398 (2× cited)

Cited in

  1. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803
  2. Nečas D., Klapetek P.,
    One-dimensional autocorrelation and power spectrum density functions of irregular regions,
    Ultramicroscopy 124 (2013) 13-19


12. Ohlídal I., Nečas D., Franta D.,
Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
Physica Status Solidi C 5 (2008) 1399–1402

2007

11. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Sobota J., Klapetek P., Bláhová O., Peřina V.,
Deposition and characterisation of nanostructured silicon-oxide containing diamond-like carbon coatings,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 491–495

10. Valtr M., Klapetek P., Ohlídal I., Franta D.,
UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624

2005

9. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
Měření mechanického napětí v tenkých vrstvách pomocí kombinované optické metody,
Jemná mechanika a optika 50 (2005) 72–75

2004

8. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
Chalcogenide Letters 1 (2004) 1–10 (18× cited)

Cited in

  1. Balan V., Vigreux C., Pradel A.,
    Chalcogenide thin films deposited by radio-frequency sputtering,
    Journal of Optoelectronics and Advanced Materials 6 (2004) 875–882
  2. Popescu M.,
    Disordered chalcogenide optoelectronic materials: Phenomena and applications,
    Journal of Optoelectronics and Advanced Materials 7 (2005) 2189–2210
  3. Sopinskyy M., Shepeliavyi P., Stronski A., Venger E.,
    Ellipsometry and AFM study of post-deposition transformations in vacuum-evaporated As–S-Se films,
    Journal of Optoelectronics and Advanced Materials 7 (2005) 2255–2266
  4. Zamfira S., Popescu M., Sava F.,
    Fullerene and nanotubes based on arsenic networks. A modelling study,
    Journal of Optoelectronics and Advanced Materials 7 (2005) 2029–2034
  5. Iovu M., Ciorba V., Colomeico E., Iovu M., Nastase A., Prisacari A., Popescu M., Shpotyuk O.,
    Optical photoinduced phenomena and holographic recording in amorphous As–Se thin films,
    Journal of Optoelectronics and Advanced Materials 7 (2005) 2333–2339
  6. Sava F., Lőrinczi A., Popescu M., Socol G., Axente E., Mihăilescu I., Nistor M.,
    Amorphous SnSe2 films,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 1367–1371
  7. Wang R., Madden S., Zha C., Rode A., Luther-Davies B.,
    Annealing induced phase transformations in amorphous As2S3 films,
    Journal of Applied Physics 100 (2006) 063524
  8. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
    Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
    Journal of Non-Crystalline Solids 352 (2006) 5633–5641
  9. Savastru D., Miclos S., Savastru R.,
    Infrared chalcogenide microlenses,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 1165–1172
  10. Savastru D., Miclos S., Savastru R.,
    Infrared chalcogenide microlenses,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 1165–1172
  11. Popescu M., Leonovici M.,
    Paracrystallinity or randomness: a challenge for noncrystalline structure,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 1831–1837
  12. Iovu M., Syrbu N., Tver'Yanovich Y., Adriaenssens G.,
    Photoluminescence of Ga0.017Ge0.25As0.083S0.65 glasses doped with rare-earth ions,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 1341–1344
  13. Popescu M.,
    Self-organization in amorphous semiconductors and chalcogenide glasses,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 2164–2168
  14. Georgescu G., Sava F.,
    Structure of bulk glassy As2Se3 and As2S3,
    Journal of Optoelectronics and Advanced Materials 8 (2006) 1801–1805
  15. Strbac G., Skuban F., Lukic S., Strbac D.,
    Influence of antimony on thermal stability of bulk chalcogenides from SbxAs37-xS48I15 system,
    Journal of Optoelectronics and Advanced Materials 9 (2007) 1690–1693
  16. Popescu M., Sava F., Lőrinczi A., Socol G., Mihăilescu I., Tomescu A., Simion C.,
    Structure, properties and gas sensing effect of SnSe2 films prepared by pulsed laser deposition method,
    Journal of Non-Crystalline Solids 353 (2007) 1865–1869
  17. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
    Optical characterization of non-stoichiometric silicon nitride films,
    Physica Status Solidi C 5 (2008) 1320–1323
  18. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
    Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
    Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898


2003

7. Ohlídal I., Klapetek P., Franta D.,
Aplikace mikroskopie atomové síly při analýze tenkých vrstev ZnSe a ZnTe,
Československý časopis pro fyziku 53 (2003) 97–100

2002

6. Klapetek P., Ohlídal I., Franta D.,
Applications of atomic force microscopy for thin film boundary measurements,
Jemná mechanika a optika 47 (2002) 195–199

2001

5. Klapetek P., Ohlídal I., Franta D.,
Měření základních statistických veličin náhodné povrchové drsnosti pomocí mikroskopie atomové síly,
Československý časopis pro fyziku 51 (2001) 16–21

4. Klapetek P., Ohlídal I., Franta D.,
Vliv diskrétní Fourierovy transformace na zpracování AFM dat,
Československý časopis pro fyziku 51 (2001) 49–51

3. Sonnenfeld A., Tun T., Zajíčková L., Kozlov A., Wagner H., Behnke J., Hippler R.,
Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison,
Plasmas and Polymers 6 (2001) 237-266

1999

2. Ohlídal I., Franta D., Klapetek P., Vičar M.,
Relationship between AFM and optical measurements at analyzing surface roughness,
Jemná mechanika a optika 44 (1999) 307–311

1998

1. Ohlídal I., Ohlídal M., Franta D., Tykal M., Pražák D., Michálek A.,
Srovnání výsledků měření drsnosti povrchu dosažených vybranými optickými metodami a metodou profilometrickou,
Jemná mechanika a optika 43 (1998) 130–136

Proceedings available from ISI Web of Science

2016

10. Franta D., Nečas D., Ohlídal I., Giglia A.,
Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range,
Photonics Europe 2016: Optical Micro- and Nanometrology VI , Photonics Europe 2016: Optical Micro- and Nanometrology VI, Brussels, Belgium 3 - 7 April 2016 (2016) 989014

2015

9. Ohlídal M., Ohlídal I., Nečas D., Vodák J., Franta D., Nádaský P., Vižďa F.,
Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280R

8. Franta D., Nečas D., Ohlídal I., Jankuj J.,
Wide spectral range characterization of antireflective coatings and their optimization,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280F

7. Nečas D., Ohlídal I., Vodák J., Ohlídal M., Franta D.,
Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280C

6. Franta D., Nečas D., Ohlídal I., Giglia A.,
Dispersion model for optical thin films applicable in wide spectral range,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96281U

2011

5. David B., Pizurova N., Schneeweiss O., Santava E., Jašek O., Kudrle V.,
alpha-Fe nanopowder synthesised in low-pressure microwave plasma and studied by Mossbauer spectroscopy,
JOINT EUROPEAN MAGNETIC SYMPOSIA (JEMS) (2011) 384

2010

4. Muresan M., Zajíčková L., Buršíková V., Franta D., Nečas D.,
Preparation and Characterization of DLC:N Films,
NANOCON 2010, 2ND INTERNATIONAL CONFERENCE , 2nd NANOCON International Conference, Olomouc, Czech Republic, 12-14 October 2010 (2010) 434-440

3. Schneeweiss O., David B., Jašek O., Zajíčková L., Vondracek M., Zboril R., Maslan M.,
Mossbauer Effect Study of Iron Thin Films on Si/SiO(x) Substrate and Iron Phases at Deposited Carbon Nanotubes,
MOSSBAUER SPECTROSCOPY IN MATERIALS SCIENCE - 2010 (2010) 90-95

2009

2. Hubálek J., Prášek J., Prášek J., Húska D., Hruška D., Prášek J., Húska D., Adamek M., Jašek O., Adam V., Jašek O., Trnková L., Adam V., Horna A., Trnková L., Kizek R., Horna A., Kizek R.,
Modification of Working Electrode Surface with Carbon Nanotubes as an Electrochemical Sensor for Estimation of Melting Points of DNA,
PROCEEDINGS OF THE EUROSENSORS XXIII CONFERENCE (2009) 1011-1014

1. Zajíčková L., Jašek O., Synek P., Eliáš M., Kudrle V., Kadlečíková M., Breza J., Hanzlíková R.,
SYNTHESIS OF CARBON NANOTUBES IN MW PLASMA TORCH WITH DIFFERENT METHODS OF CATALYST LAYER PREPARATION AND THEIR APPLICATIONS,
NANOCON 2009, CONFERENCE PROCEEDINGS (2009) 149-155

Proceedings not available from ISI Web of Science

2014

48. Hnilica J., Kudrle V., Jašek O.,
Electrode-less plasma jet synthesis of core-shell iron/iron oxide nanoparticles,
Frontiers in Material and Life Sciences , Nanocon 2013 (2014) 6

2010

47. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,
Mossbauer Effect Study of Iron Thin Films on Si/SiO(x) Substrate and Iron Phases at Deposited Carbon Nanotubes,
MOSSBAUER SPECTROSCOPY IN MATERIALS SCIENCE - 2010 (2010) 90-95

46. Sládek P., Buršíková V., Sťahel P.,
Structural and defect changes of hydrogenated SiGe films due to annealing up to 600 degrees C,
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 7 NO 3-4 (2010) 820-823

45. Buršík J., Sopousek J., Zalesak J., Buršíková V.,
ANALYTICAL ELECTRON MICROSCOPY OF LEAD-FREE NANOPOWDER SOLDERS,
NANOCON 2010, 2ND INTERNATIONAL CONFERENCE (2010) 336-339

2009

44. Ohlídal M., Ohlídal I., Klapetek P., Nečas D.,
PRECISE MEASUREMENT OF THICKNESS DISTRIBUTION OF NONUNIFORM THIN FILMS BY IMAGING SPECTROSCOPIC REFLECTOMETRY,
XIX IMEKO WORLD CONGRESS: FUNDAMENTAL AND APPLIED METROLOGY, PROCEEDINGS (2009) 100-105

43. Franta D., Nečas D., Frumar M.,
Modeling of dielectric response of Ge(x)Sb(y)Te(z) (GST) materials,
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 1 (2009) S59-S62

42. Vižďa F., Ohlídal I., Hrubý V.,
Influence of Cross-Correlation of Rough Boundaries on Reflectance of Thin Films on GaAs and Si Substrates,
Physics of Semiconductors , 29th International Conference on Physics of Semiconductors, Rio de Janeiro, Brazil, July 27 - August 1, 2008 (2009) 19-20

2008

41. Buršíková V., Peřina V., Sobota J., Klapetek P., Dvořák P., Buršík J., Franta D.,
Deposition of Nanostructured Diamond-Like Carbon Films in Dual Frequency Capacitive Discharge,
Proceedings of 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases (2008)

40. Zajíčková L., Kučerová Z., Franta D., Buršíková V., Peřina V., Macková A.,
Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane,
Proceedings of Organic/Inorganic Hybrid Materials, MRS (2008) 159-164

2007

39. Kučerová Z., Zajíčková L., Eliáš M., Jašek O., Matějková J., Buršík J.,
Treatment of Catalytic Iron Layer for Carbon Nanotube Growth in Microwave Plasma Torch,
Proceedings of 16th Symposium on Applicaction of Plasma Processes (2007) 209-210

38. Šmíd R., Zajíčková L., Granier A.,
Comparison of Planar and Cylindrical Langmuir Probe Measurements in Low Pressure RF Helicon Reactor,
Proceedings of 16th Symposium on Applicaction of Plasma Processes (2007) 259-260

37. Šíra M., Buršíková V., Franta D., Trunec D.,
Deposition and analysis of thin films produced in atmospheric pressure glow discharge,
Proceedings of XXVIII International Conference on Phenomena in Ionized Gases (2007) 713-716

36. Klapetek P., Buršíková V., Valtr M.,
Scanning probe microscopy analysis of delaminated thin films,
PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY (2007) 576-581

2006

35. Buršíková V., Ray N., Bláhová O., Jašek O., Frgala Z., Zajíčková L., Franta D., Buršík J., Klapetek P.,
Study of Mechnical Properties of Diamon-like Carbon and Nanocomposite Diamond Coatings Prepared by Several Different Deposition Techniques,
Proceedings of International Workshop on the Application of Nanocrystalline Diamond and Diamond Like Carbon Materials (2006) 27-37

34. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,
Silicon-oxide Containing Diamond-like Carbon Coatings Prepared Using Plasma Enhanced Chemical Vapor Deposition,
Proceedings of International Workshop on the Application of Nanocrystalline Diamond and Diamond Like Carbon Materials (2006) 311-315

33. Franta D., Nečas D., Zajíčková L., Buršíková V.,
Modeling of DLC Optical Properties Based on Parameterization of Density of States,
Proceedings of International Workshop on the Application of Nanocrystalline Diamond and Diamond Like Carbon Materials (2006) 39-50

32. Ficek R., Vrba R., Kim B., Goodnick S., Milicic S., Kučerová Z., Zajíčková L., Eliáš M.,
Carbon nanotubes synthesized by plasma enhanced CVD: Preparation for measurements of their electrical properties for application in pressure sensor,
2006 International Symposium on Communications and Information Technologies,Vols 1-3 (2006) 42-45

2005

31. Zajíčková L., Wagner N., Cordill M., Heberlein J., Peřina V., Macková A., Gerberich W.,
Thermal Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Based Hard Coatings,
Proceedings of 15th Symposium on Application of Plasma Processes and 3rd EU–Japan Joint Symposium on Plasma Processing (2005) 265-266

30. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
Optical measurement of mechanical stresses in diamond-like carbon films,
Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728

29. Ohlídal M., Čudek V., Ohlídal I., Klapetek P.,
Optical characterization of non-uniform thin films using imaging spectrophotometry,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 596329

28. Franta D., Ohlídal I.,
Characterization of optical thin films exhibiting defects,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 59632H

27. Ohlídal I., Franta D., Klapetek P.,
Měření nanodrsnosti pomocí optických metod a mikroskopie atomové síly,
Proceedings of Kvalita a GPS 2005 (2005) 131-139

26. Ohlídal I., Franta D., Klapetek P.,
Ellipsometry in characterization of thin films,
Proceedings of Solar Renewable Energy News (2005) 81-111

25. Wagner N., Cordill M., Zajíčková L., Gerberich W., Heberlein J.,
Thermal plasma chemical vapor deposition of superhard nanostructured Si-C-N coatings,
Thin Films Stresses and Mechanical Properties XI (2005) 69-74

24. Jašek O., Eliáš M., Bublan M., Kudrle V., Zajíčková L., Matějková J., Rek A., Buršík J.,
Plasma Enhanced CVD of Carbon Nanotubes in Atmospheric Pressure Microwave Torch,
Proceedings of 15th Symposium on Application of Plasma Processes and 3rd EU–Japan Joint Symposium on Plasma Processing (2005) 187-188

23. Kučerová Z., Buršíková V., Peřina V., Franta D., Zajíčková L., Čech J., Franclová J.,
Influence of the Temperature on Properties of Plasma Polymerized Organosilicon Coatings,
Proceedings of 15th Symposium on Application of Plasma Processes and 3rd EU–Japan Joint Symposium on Plasma Processing (2005) 197-198

22. Zajíčková L., Ptasinska S., Cingel M., Matejčík Š.,
Study of Electron Impact Ionization and Electron Attachment to HMDSO,
Proceedings of 15th Symposium on Application of Plasma Processes and 3rd EU–Japan Joint Symposium on Plasma Processing (2005) 263-264

2004

21. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147 (2× cited)

2003

20. Ohlídal I., Ohlídal M., Klapetek P., Čudek V., Jákl M.,
Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry,
WAVE-OPTICAL SYSTEMS ENGINEERING II (2003) 260-271

19. Eliáš M., Janča J., Žíla J., Brožek V.,
Optical Diagnostics of ICP Discharge During Synthesis of Tungsten Carbide,
Proceedings of 14th Symposium on Application of Plasma Processes , 14th Symposium on Application of Plasma Processes (2003) 116-117

18. Zajíčková L., Buršíková V., Deepak P., Veltruská K., Janča J.,
Study of Plasma Treatment of Polycarbonate Substrate and Its Effect on Film Deposition,
Proceedings of 14th Symposium on Application of Plasma Processes , 14th Symposium on Application of Plasma Processes (2003) 136-139

17. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Stifter H.,
Optical characterization of ZnSe thin films,
Proceedings of 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE , 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE (2003) 831-832

16. Ohlídal I., Ohlídal M., Klapetek P., Čudek V., Jákl M.,
Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry,
Proceedings of Wave-Optical Systems Engineering II, SPIE (2003) 260-271

2001

15. Franta D., Ohlídal I.,
Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212 (1× cited)

14. Franta D., Buršíková V., Zajíčková L.,
Optical characterization of DLC:Si films prepared by PECVD,
Proceedings of 13th Symposium on Application of Plasma Processes , 13th Symposium on Application of Plasma Processes (2001) 87-88

13. Klapetek P., Franta D., Ohlídal I.,
Study of Thin Film Defects by Atomic Force Microscopy,
Proceedings of 5th Seminar on Quantitative Microscopy, PTB-Bericht , 5th Seminar on Quantitative Microscopy, PTB-Bericht (2001) 107-117

2000

12. Ohlídal I., Franta D., Klapetek P.,
Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films,
Proceedings of 4th Seminar on Quantitative Microscopy, PTB-Bericht , 4th Seminar on Quantitative Microscopy, PTB-Bericht (2000) 124-131

1999

11. Ohlídal I., Ohlídal M., Franta D., Tykal M.,
Comparison of optical and non-optical methods for measuring surface roughness,
Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467

10. Franta D., Zajíčková L.,
Characterisation of DLC Films Prepared by PECVD,
Proceedings of 12th Symposium on Application of Plasma Processes , 2th Symposium on Application of Plasma Processes (1999) 158–159

9. Janča J., Klíma M., Slavíček P., Zajíčková L.,
On the hollow electrode HF plasma pencil,
Proceedings of 24th International Conference on Phenomena in Ionized Gases , 24th International Conference on Phenomena in Ionized Gases (1999) 177-178

8. Zajíčková L., Eliáš M., Buršíková V., Janča J., Lorenz M.,
Deposition of CNx films in inductively coupled RF discharge,
Proceedings of 24th International Conference on Phenomena in Ionized Gases , 24th International Conference on Phenomena in Ionized Gases (1999) 41-42

7. Klíma M., Janča J., Slavíček P., Kuzmin S., Vaculík R., Zajíčková L.,
DC, AC and HF plasma pencil - New possibilities for plasma surface and liquid treatment at atmospheric pressure,
Proceedings of 5th International Thermal Plasma Processing Conference , 5th International Thermal Plasma Processing Conference (1999) 487–492

1998

6. Ohlídal I., Ohlídal M., Franta D., Vičar M., Klapetek P.,
Comparison of AFM and optical methods at measuring nanometric surface roughness,
Proceedings of 3th Seminar on Quantitative Microscopy , 3th Seminar on Quantitative Microscopy (1998) 123–129

1997

5. Ohlídal I., Franta D., Rezek B., Ohlídal M.,
Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Proceedings of 7th European Conference on Applications of Surface and Interface Analysis , 7th European Conference on Applications of Surface and Interface Analysis (1997) 1051–1054

1996

4. Franta D., Ohlídal I., Hora J., Navrátil K.,
Spektroskopická elipsometrie slabě drsných povrchů,
Proceedings of 12. konference českých a slovenských fyziků , Proceedings of 12. konference českých a slovenských fyziků (1996) 482-485

3. Ohlídal I., Franta D., Hora J.,
Spectroscopic Ellipsometry of Slightly Rough Surfaces Covered by Layers,
Proceedings of 6th European Conference on Applications of Surface and Interface Analysis , 6th European Conference on Applications of Surface and Interface Analysis (1996) 823-826

2. Ohlídal M., Ohlídal I., Franta D., Michálek A.,
Method of shearing interferometry for characterizing non-gaussian randomly rough surfaces,
Proceedings of Specification, Production, and Testing of Optical Components and Systems , Specification, Production, and Testing of Optical Components and Systems (1996) 442–451

1995

1. Ohlídal M., Ohlídal I., Druckmüller M., Franta D.,
Interferometry of Randomly Rough Surfaces,
Proceedings of Photonics '95 , Proceedings of Photonics '95 (1995) 109-111