D. S. da Silva, A. D. S. Cortes, Jr. Oliveira, E. F. Motta, G. A. Viana, P. R. Mei, F. C. Marques

Application of amorphous carbon based materials as antireflective coatings on crystalline silicon solar cells

Journal of Applied Physics 110 (2011) 000

We report on the investigation of the potential application of different forms of amorphous carbon (a-C and a-C:H) as an antireflective coating for crystalline silicon solar cells. Polymeric-like carbon (PLC) and hydrogenated diamond-like carbon films were deposited by plasma enhanced chemical vapor deposition. Tetrahedral amorphous carbon (ta-C) was deposited by the filtered cathodic vacuum arc technique. Those three different amorphous carbon structures were individually applied as single antireflective coatings on conventional (polished and texturized) p-n junction crystalline silicon solar cells. Due to their optical properties, good results were also obtained for double-layer antireflective coatings based on PLC or ta-C films combined with different materials. The results are compared with a conventional tin dioxide (SnO(2)) single-layer antireflective coating and zinc sulfide/magnesium fluoride (ZnS/MgF(2)) double-layer antireflective coatings. An increase of 23.7% in the short-circuit current density, J(sc), was obtained using PLC as an antireflective coating and 31.7% was achieved using a double-layer of PLC with a layer of magnesium fluoride (MgF(2)). An additional increase of 10.8% was obtained in texturized silicon, representing a total increase (texturization + double-layer) of about 40% in the short-circuit current density. The potential use of these materials are critically addressed considering their refractive index, optical bandgap, absorption coefficient, hardness, chemical inertness, and mechanical stability. (C) 2011 American Institute of Physics. {[}doi:10.1063/1.3622515]

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