Ivan Ohlídal, Miloslav Ohlídal, Petr Klapetek, Vladimír Čudek, Miloš Jákl

Proc: Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry

WAVE-OPTICAL SYSTEMS ENGINEERING II (2003) pp.260-271

Published by SPIE-INT SOC OPTICAL ENGINEERING

In this paper, a new optical method for characterizing nonuniform thin films is employed. For applying this method the special experimental arrangement containing CCD camera as a detector is used. Using this experimental arrangement the spectral dependences of the local reflectances are obtained. After treating these experimental data the distributions of the values of the local thicknesses and local refractive index along a large areas of the substrates of the nonuniform films are found. Moreover, it is shown that this method can be used to determine strong nonuniformities in both the optical parameters. The method is illustrated through the optical characterization of a nonuniform ZnSe epitaxial thin film deposited onto gallium arsenide single-crystal substrate and nonuniform film formed by the mixture of CNx and SiOy deposited onto silicon single-crystal substrate.

You may also contact one of the authors: ohlidal@physics.muni.cz

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