Ivan Ohlídal, Karel Navrátil
Complete optical analysis of a non-absorbing thin film on an absorbing substrate by a new method of immersion spectroscopic reflectometry
Thin Solid Films 148 (1987) 17–27
A new method for determining the thickness and the spectral dependence of the refractive index characterizing a non-absorbing thin film placed on an absorbing substrate is described in this paper. Within this method two spectral dependences of the reflectance corresponding to the system immersed into two different non- absorbing ambients are employed. The main advantage of the method is that the values of the thickness and the refractive index can be determined by means of explicit formulae. The second important advantage is the fact that non-absorbing thin films with relatively small thicknesses can be analysed. The method is applied to amorphous SiO2 thin films placed on silicon single-crystal wafers.
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