Jan Schäfer, Katja Fricke, Filip Mika, Zuzana Pokorná, Lenka Zajíčková, Rüdiger Foest
Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure
Thin Solid Films 630 (2017) 71-78
The present study introduces a process for the synthesis of functional films onto substrates directly from the liq- uid phase. The reported method is based on the initialization of the synthesis by means of an atmospheric pres- sure plasma jet operating with argon above a thin liquid film of the starting material. The process is demonstrated by the formation of a thin, solid SiO x film from siloxane-based liquid precursors. Changes in the chemical prop- erties of the precursor were studied in-situ during the polymerization process on the diamond crystal by using Fourier transform infrared spectroscopy The elemental composition of the SiO x C y films was analyzed by X-ray photoelectron spectroscopy (XPS). Furthermore, XPS was applied to study the effect of post-annealing processes on the composition of the films. The obtained deposits exhibit a low concentration of carbon groups. The amount of hydroxyl groups and interstitial water can be reduced significantly by post-process annealing of the films.
DOI: 10.1016/j.tsf.2016.09.022
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