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Daniel Franta, Ivan Ohlídal, Petr Klapetek, Pavel Pokorný, Miloslav Ohlídal

Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy

Surface and Interface Analysis 32 (2001) 91–94

In this paper results concerning the complete optical analysis of inhomogeneous ZrO2-films are introduced. The optical analysis of these films is carried out using the combined optical method based on interpreting experimental data corresponding to variable angle of incidence spectroscopic ellipsometry (VASE) and near-normal incidence spectroscopic reflectometry (NNSR). The model of the ZrO2-films used for the interpretation of the experimental data achieved using the combined method exhibits the continuous refractive index profile. It is shown that this model is satisfactory for treating the experimental data. Further, it is shown that all the parameters characterizing the model mentioned can be determined with a hight accuracy. By means of atomic force microscopy (AFM) it is found that the upper boundaries of the inhomogeneous ZrO2-films are slightly rough. The values of the basic statistical quantities characterizing this boundary roughness are evaluated using the treatment of AFM data. The optical inhomogeneity of the ZrO2-films studied is explained by the existence of the columnar structure of these films.

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Cited Articles

  1. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  2. Ohlídal I., Franta D.,
    Matrix formalism for imperfect thin films,
    Acta Physica Slovaca 50 (2000) 489–500
  3. Franta D., Ohlídal I.,
    Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
    Surface and Interface Analysis 30 (2000) 574–579
  4. Franta D., Ohlídal I., Klapetek P.,
    Analysis of slightly rough thin films by optical methods and AFM,
    Mikrochimica Acta 132 (2000) 443–447
  5. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
    Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
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  6. Franta D., Ohlídal I.,
    Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
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