Main page | Journal list | Log-in

Ivan Ohlídal, Miloslav Ohlídal, David Nečas, Daniel Franta, Vilma Buršíková

Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry

Thin Solid Films 519 (2011) 2874-2876

The combined opticalmethod enabling us to performthe complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods with using the dispersion model based on parametrisation of density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHzthin films.

Download PDF (418 kB)

This article may also be available to you online

You can also contact one of the authors:,,,

Citing Articles

  1. Nečas D., Ohlídal I., Franta D.,
    Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
    Journal of Optics 13 (2011) 085705

Cited Articles

  1. Ohlídal I., Nečas D., Franta D., Buršíková V.,
    Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
    Diamond and Related Materials 18 (2009) 364–367
  2. Nečas D., Ohlídal I., Franta D.,
    The reflectance of non-uniform thin films,
    Journal of Optics A: Pure and Applied Optics 11 (2009) 045202
  3. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  4. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282