Main page | Journal list | Log-in

Christian Sarra-Bournet, Nicolas Gherardi, Herve Glenat, Gaetan Laroche, Francoise Massines

Effect of C(2)H(4)/N(2) Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)

Plasma Chem. Plasma Process. 30 (2010) 213-239

The goal of this study was to investigate the properties and growth mechanisms of nitrogen-containing carbon-based coatings obtained with an atmospheric pressure dielectric barrier discharge in an N(2)-C(2)H(4) atmosphere. Radically different chemical compositions were observed depending on C(2)H(4)/N(2) ratio. With a low C(2)H(4) concentration (< 400 ppm) as a function of the residence time in the discharge, two different growth mechanisms were observed consisting of a highly nitrogenated coating (N/C > 0.8) and low hydrogen content. At the short residence time, growth was due to mobile small radicals that procured a smooth yet soluble coating, while at the longer residence time, diffusion-limited aggregation of high sticking N-containing radicals produced a cauliflower-like structure. With a high C(2)H(4) concentration (a parts per thousand yen2,000 ppm), a polymer-like coating with relatively lower nitrogen content (N/C similar to 0.2) was observed with a cauliflower morphology for the entire coating. Nanoindentation measurements revealed very different physical properties in the two types of coatings.

This article may also be available to you online

Cited Articles

  1. Trunec D., Navrátil Z., Sťahel P., Zajíčková L., Buršíková V.,
    Deposition of Thin Organosilicon Polymer Films in Atmospheric Pressure Glow Discharge,
    Journal of Physics D 37 (2004) 2112–2120