Main page | Journal list | Log-in

Ivan Ohlídal, Miroslav Ohlídal, Petr Klapetek, Vladimír Čudek, Miloš Jákl

Proc: Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry

Proceedings of Wave-Optical Systems Engineering II, SPIE (2003) pp.260-271

Published by SPIE - The International Society for Optical Engineering, Bellingham, Washington, USA

In this paper, a new optical method for characterizing nonuniform thin films is employed. For applying this method the special experimental arrangement containing CCD camera as a detector is used. Using this experimental arrangement the spectral dependencies of the local reflectances are obtained. After treating these experimental data of the distributions of the values of the local thicknesses and local refractive index along a large areas of the substrates of the nonuniform films are found. Moreover, it is shown that this method can be used to determine strong nonuniformities in both the optical parameters. The method is illustrated through the optical characterization of a nonuniform ZnSe epitaxial thin film deposited onto gallium arsenide single-crystal substrate and nonuniform film formed by the mixture of CNx and SiOy deposited onto silicon single-crystal substrate.

You may also contact one of the authors:

Cited articles

  1. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
    Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
    Surface and Interface Analysis 28 (1999) 240–244