Daniel Franta, Ivan Ohlídal, Petr Klapetek, Miloslav Ohlídal
Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy
Surface and Interface Analysis 36 (2004) 1203–1206
In this paper results of optical and atomic force microscopy characterization of oxide thin films prepared by thermal oxidation of GaAs single crystal wafers at temperature of 500°C in air are presented. The optical characterization is performed using multi-sample modification of the method based on combining variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. It is shown that the films exhibit the rough lower boundaries and refractive index profile inhomogeneities. The spectral dependences of the refractive index and extinction coefficient of these films are presented within the wide spectral region, i.e. 210–900 nm. The values of the thicknesses and roughness parameters characterizing the oxide films are introduced as well.
This article may also be available to you online
You can also contact one of the authors: franta@physics.muni.cz, ohlidal@physics.muni.cz
Citing Articles
- Ohlídal I., Franta D., Klapetek P.,
Combination of optical methods and atomic force microscopy at characterization of thin film systems,
Acta Physica Slovaca 55 (2005) 271–294 - Franta D., Ohlídal I.,
Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
Optics Communications 248 (2005) 459–467 - Ohlídal I., Nečas D., Franta D.,
Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
Physica Status Solidi C 5 (2008) 1399–1402
Cited Articles
-
Franta D., Ohlídal I., Frumar M., Jedelský J.,
Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
Applied Surface Science 212–213 (2003) 116–121 -
Franta D., Ohlídal I., Klapetek P., Pokorný P.,
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
Surface and Interface Analysis 34 (2002) 759–762 -
Ohlídal I., Franta D.,
Ellipsometry of thin film systems,
Progress in Optics 41 (2000) 181-282 -
Franta D., Ohlídal I.,
Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
Journal of Modern Optics 45 (1998) 903–934 -
Ohlídal I., Vižďa F., Ohlídal M.,
Optical analysis by means of spectroscopic reflectometry of single and double layers with correlated randomly rough boundaries,
Optical Engineering 34 (1995) 1761–1768 - Franta D., Ohlídal I.,
Proc: Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE, 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212