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Daniel Franta, Ivan Ohlídal, David Nečas, František Vižďa, Ondřej Caha, Martin Hasoň, Pavel Pokorný

Optical characterization of HfO2 thin films

Thin Solid Films 519 (2011) 6085-6091

Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 °C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO2 films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states (PJDOS) model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.

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Cited Articles

  1. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Modeling of dielectric response of GexSbyTez (GST) materials,
    Physica Status Solidi C 6 (2009) S59–S62
  2. Ohlídal I., Nečas D., Franta D., Buršíková V.,
    Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
    Diamond and Related Materials 18 (2009) 364–367
  3. Nečas D., Ohlídal I., Franta D.,
    The reflectance of non-uniform thin films,
    Journal of Optics A: Pure and Applied Optics 11 (2009) 045202
  4. Franta D., Ohlídal I., Nečas D.,
    Influence of cross-correlation effects on the optical quantities of rough films,
    Optics Express 16 (2008) 7789–7803
  5. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,
    Optical characterization of ultrananocrystalline diamond films,
    Diamond and Related Materials 17 (2008) 1278–1282
  6. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  7. Franta D., Negulescu B., Thomas L., Dahoo P. R., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
    Optical properties of NiO thin films prepared by pulsed laser deposition technique,
    Applied Surface Science 244 (2005) 426–430
  8. Klapetek P., Ohlídal I., Navrátil K.,
    Atomic force microscopy analysis of statistical roughness of GaAs surfaces originated by thermal oxidation,
    Microchimica Acta 147 (2004) 175–180
  9. Klapetek P., Ohlídal I.,
    Theoretical analysis of the atomic force microscopy characterization of columnar thin films,
    Ultramicroscopy 94 (2003) 19–29
  10. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
    Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
    Surface and Interface Analysis 34 (2002) 759–762
  11. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
    Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
    Surface and Interface Analysis 33 (2002) 559–564
  12. Franta D., Ohlídal I.,
    Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
    Surface and Interface Analysis 30 (2000) 574–579
  13. Franta D., Ohlídal I., Klapetek P.,
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    Mikrochimica Acta 132 (2000) 443–447
  14. Franta D., Ohlídal I.,
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