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Lenka Zajíčková, Vilma Buršíková, Jan Janča

Protection Coatings for Polycarbonates Based on PECVD from Organosilicon Feeds

Vacuum 50 (1998) 19–21

We deposited protective films by plasma enhanced chemical vapour deposition (13.56 MHz) on polycarbonate and silicon substrates from tetraethoxysiloxan or hexamethydisiloxan mixed with oxygen and argon. The thickness and optical parameters of the films were calculated from the measured reflectance in the visible. The film growth rate changed from 2 to 50 nm/min. In most of the deposition conditions used, the films were nonabsorbing in the visible. The Vickers microhardness of the system film-polycarbonate was measured in the load range 5-1000 mN. The calculated film hardness was from 500-1000 HV. Three factors were essential for higher film hardness in addition to a higher deposition rate: the ratio of the monomer flow rate to the oxygen one was higher than ten, slightly elevated substrate temperature to about 70 degrees C and negative bias from - 200 V.

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