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Ivan Ohlídal, Karel Navrátil, Jana Musilová

A new method for the complete optical analysis of weakly absorbing thin films: Application to polycrystalline silicon films

Thin Solid Films 127 (1985) 191–203

A new method for determining the thickness and spectral dependences of the two optical constants characterizing a weakly absorbing thin film which together with a non-absorbing thin film form a double layer on an absorbing substrate is described in this paper. The spectral dependences of the reflectance corresponding to various thicknesses of the non-absorbing thin film are used to determine the optical parameters in the framework of this method. The method is also utilized for the complete optical analysis of polycrystalline silicon thin films in double layers employed in microelectronics applications.

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