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Lenka Zajíčková, Petr Jelínek, Adam Obrusník, Jiří Vodák, David Nečas

Plasma Enhanced CVD of Functional Coatings in Ar/Maleic Anhydride/C2H2 Homogeneous Dielectric Barrier Discharges at Atmospheric Pressure

Plasma Phys. Control. Fusion 59 (2017) 034003

In this contribution, we focus on general problems of plasma enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at the atmospheric pressure is advection-driven a special attention is paid to the gas dynamics simulations, the gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two reasons (i) suppression of filaments in DBD and (ii) improved film cross-linking keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated in the deposited films leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with the respect to gas flow and the deposition time on the topography of the deposited films.

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DOI: 10.1088/1361-6587/aa52e7

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  1. Franta D., Ohlídal I., Klapetek P.,
    Analysis of slightly rough thin films by optical methods and AFM,
    Mikrochimica Acta 132 (2000) 443–447