Jan Hlávka, Ivan Ohlídal, František Vižďa, Helmut Sitter
New technique of measurement of optical parameters of thin films
Thin Solid Films 279 (1996) 209–212
A new technique of measurement of the optical parameters of a thin film deposited on a semiconductor substrate, making use of the substrate photovoltage, is presented. The principle of the method is explained and an evaluation of the experimental data is given as a verification of the technique.
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Citing Articles
- Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
Thin Solid Films 366 (2000) 43–50