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Ivan Ohlídal, Daniel Franta

Ellipsometry of Thin Films

Acta Physica Slovaca 48 (1998) 459–468

In this paper a brief review of ellipsometric methods is presented for analyzing thin films. Examples of using these methods will be introduced as well. By means of results obtained using the ellipsometric methods introduced their practical meaning will be illustrated. It will be shown that the ellipsometric method can be utilized for analyzing single layers and multilayer systems in it successful way.

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You can also contact one of the authors: ohlidal@physics.muni.cz, franta@physics.muni.cz

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Cited Articles

  1. Ohlídal I., Líbezný M.,
    Immersion ellipsometry of semiconductor surfaces,
    Surface and Interface Analysis 16 (1990) 46–53
  2. Ohlídal I., Lukeš F.,
    Analysis of semiconductor surfaces with very thin native oxide layers by combined immersion and multiple angle of incidence ellipsometry,
    Applied Surface Science 35 (1988) 259–273