Lenka Zajíčková, N. J. Wagner, M. J. Cordill, J. V. R. Heberlein, Vratislav Peřina, Alena Macková, W. W. Gerberich
Proc: Thermal Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Based Hard Coatings
Proceedings of 15th Symposium on Application of Plasma Processes and 3rd EU–Japan Joint Symposium on Plasma Processing (2005) pp.265-266
Published by Comenius University, Slovak Academy of Science and Union of Slovak Matematicians and Physicists, Bratislava, Slovakia
Film based on silicon nitride with hardness up to 31 GPa were deposited in a triple torch plasma reactor. The hard films required substrate temperatures above 1000 °C and exhibited a presence of both, α- and β-Si3N4 crystallites.
You may also contact one of the authors: lenkaz@physics.muni.cz