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Jan Janča, Miloš Klíma, Pavel Slavíček, Lenka Zajíčková

HF Plasma Pencil - New Source for Plasma Surface Processing

Surface and Coatings Technology 116 (1999) 547–551

The high-frequency plasma pencil is a source of a highly active environment (electrons, ions, reactive radicals, excited atoms and molecules), which can be generated at atmospheric, reduced or increased pressure, preserving a broad control of performance. As an active medium flowing through the plasma jet a gas, a liquid as well as a mixture of dispersed particles (powders) can be used. The plasma jet can be controlled like hand-operated tools. Several technological applications have already been used (restoration of archeological glass artifacts, fullerene production, fragmentation of molecules for microelectrophoresis, plasma polymerization in liquids, various plasma surface treatments, etc.).

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