Marek Eliáš, Pavel Souček, Petr Vasina

INFLUENCE OF N-2 AND CH4 ON DEPOSITON RATE OF BORON BASED THIN FILMS PREPARED BY MAGNETRON SPUTTERING

Chemické listy 102 (2008) S1506-S1509

The goal of this paper is to present preliminary results concerning properties and deposition rates of thin films prepared by hybrid PVD-PECVD process. In this hybrid deposition process a gaseous hydrocarbon is used as a source of carbon instead of its conventional sputtering from the magnetron target. The influence of the reactive gas admixture on the deposition rate of growing films is investigated. Comparative study using two different gases - nitrogen and methane - is performed. Both gases are added also simultaneously. Interesting findings on carbon incorporation into the growing thin film are obtained from FTIR spectroscopy of the deposits. Moreover, from trends in the deposition rate, some statements concerning behavior of the hybrid PVD-PECVD process are derived.

You can also contact one of the authors: mareke@physics.muni.cz

Cited Articles

1. Franta D., Nečas D., Zajíčková L.,
   Models of dielectric response in disordered solids,
   Optics Express 15 (2007) 16230–16244