Miroslav Valtr, Petr Klapetek, Ivan Ohlídal, Daniel Franta
UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624
This paper deals with the study of thickness reduction of an amorphous hydrocarbon (a-C:H) thin film under UV light irradiation. It is shown that when the thickness of the thin film is above 14 nm, a linear dependence in thickness decrease can be observed. The reduction velocity is in this region 10.1 nm/h. If the values of thickness of the thin film are below approximately 14 nm, the reduction velocity decreases subsequently. Area reflectance measurement consisting in taking reflectance spectra in many points lying along the area of the sample is used to create a map with thickness distribution along this area. This method is very sensitive to small thickness variations. A damage can be clearly observed by this technique which was done by a long-lasting ellipsometrical measurement to the sample having approximately 11 nm at the maxima.
You can also contact one of the authors: ohlidal@physics.muni.cz, franta@physics.muni.cz
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Improvement of the Efficiency of the Silicon Solar Cells by Silicon Incorporated Diamond-Like Carbon Antireflective Coatings,
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