A Barranco, A Jimenez, F Frutos, F Cotrino, F Yubero, JP Espinos, AR Gonzalez-Elipe

Proc: Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD.

ICSD `01: PROCEEDINGS OF THE 2001 IEEE 7TH INTERNATIONAL CONFERENCE ON SOLID DIELECTRICS (2001) pp.303-306

Published by IEEE

Cited articles

1. Zajíčková L., Janča J., Peřina V.,
   Characterization of Silicon Oxide Thin Films Deposited by Plasma Enhanced Chemical Vapour Deposition from Octamethylcyclotetrasiloxane/Oxygen Feeds,
   Thin Solid Films 338 (1999) 49–59