Daniel Franta, David Nečas, Lenka Zajíčková, Ivan Ohlídal, Jiří Stuchlík
Advanced modeling for optical characterization of amorphous hydrogenated silicon films
Thin Solid Films 541 (2013) 12-16
Amorphous hydrogenated silicon (a-Si:H) films deposited on glass and crystalline silicon substrates are analyzed using a multi-sample method combining ellipsometry and spectrophotometry in spectral range 0.046-8.9 eV, utilizing an analytical dispersion model based on parametrization of joint density of states and application of sum rule. This model includes all absorption processes from phonon absorption to core electron excitations. It is shown that if films deposited on both substrates are characterized together it is possible to study both phonon absorption and weak absorption processes below the band gap, i.e. the Urbach tail and absorption on localized states.
DOI: 10.1016/j.tsf.2013.04.129
You can also contact one of the authors: franta@physics.muni.cz, yeti@physics.muni.cz, lenkaz@physics.muni.cz, ohlidal@physics.muni.cz
Cited Articles
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Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
Thin Solid Films 539 (2013) 233-244 -
Franta D., Nečas D., Zajíčková L.,
Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
Thin Solid Films 534 (2013) 432-441 -
Nečas D., Ohlídal I., Franta D.,
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
Journal of Optics 13 (2011) 085705 -
Nečas D., Ohlídal I., Franta D.,
The reflectance of non-uniform thin films,
Journal of Optics A: Pure and Applied Optics 11 (2009) 045202 -
Franta D., Ohlídal I., Nečas D.,
Influence of cross-correlation effects on the optical quantities of rough films,
Optics Express 16 (2008) 7789–7803 -
Franta D., Ohlídal I.,
Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
Journal of Modern Optics 45 (1998) 903–934