Main page | Journal list | Log-in

Miloslav Ohlídal, Ivan Ohlídal, Daniel Franta, Tomáš Králík, Miloš Jákl, Marek Eliáš

Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method

Surface and Interface Analysis 34 (2002) 660–663

An original method enabling us to characterize the non-uniformity of thin-film thickness is described. This method employs the interpretation of data obtained by multiple-wavelength reflectometry (MWR). Within this MWR method the values of the reflectance are measured for several wavelengths in many points lying along the area of the film. The spectral dependence of the refractive index of the material forming the film is determined using variable-angle spectroscopic ellipsometry (VASE). The MWR method is then used to evaluate the values of the thickness along the area of the non-uniform film under investigation. Within the experimental set-up employed for applying the MWR method, a multi-wavelength laser is used as a light source. A CCD camera equipped with a zoom objective is utilized as a detector. A suitable beamsplitter allows to measure the values of the relative reflectance of the film against a reference sample with known reflectance. By using the set-up employed it is possible to characterize the thin-film spreading over large areas of substrates.

Download PDF (135 kB)

This article may also be available to you online

You can also contact one of the authors:,,

Citing Articles

  1. Henrie J., Parsons E., Hawkins A. R., Schultz S. M.,
    Spectrum sampling reflectometer,
    Surface and Interface Analysis 37 (2005) 568–572
  2. Valtr M., Klapetek P., Ohlídal I., Franta D.,
    UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
    Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624

Cited Articles

  1. Eliáš M., Zajíčková L., Buršíková V., Janča J., Lorenc M.,
    Deposition of Nanocomposite CNx/SiO2 Films in Inductively Coupled RF Discharge,
    Diamond and Related Materials 9 (2000) 552–555
  2. Franta D., Ohlídal I.,
    Analysis of thin films by optical multi-sample methods,
    Acta Physica Slovaca 50 (2000) 411–421
  3. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
    Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
    Surface and Interface Analysis 28 (1999) 240–244