J. Schafer, A. Quade, Ruediger Foest, A. Ohl, Klaus-Dieter Weltmann

Proc: CHEMICAL CONSTITUTIONS AND TEMPERATURE STABILITY OF SIO(x) PLASMA POLYMER FILMS CREATED BY AN ATMOSPHERIC PRESSURE PLASMA JET (APPJ)

4TH INTERNATIONAL CONGRESS ON COLD ATMOSPHERIC PRESSURE PLASMAS: SOURCES AND APPLICATIONS, PROCEEDINGS (2009) pp.114-117

Published by UNIVERSITEIT GENT

The present work is focused on an ex situ surface analysis of Si Ox films produced locally with a miniaturized, non-thermal atmospheric pressure plasma jet under stationary treatment conditions. The gas mixture consists of Ar with small additions of the silicon-organic compound octamethylcyclotetrasiloxane (OMCTS). The resulting circular deposition spot exhibits a chemically homogenous radial dependence in central area with a SiO(2) rich constitution. The chemical constitution of the film measured over the temperature range between 70 degrees C and 320 degrees C with X-ray Photoelectron Spectroscopy (XPS) shows only minor changes thus demonstrating that the films remain relatively stable after exposure to high temperatures.

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