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Vilma Buršíková, Olga Bláhová, Monika Karásková, Lenka Zajíčková, Ondřej Jašek, Daniel Franta, Petr Klapetek, Jiří Buršík

Mechanical properties of ultrananocrystalline thin films deposited using dual frequency discharges

Chemické listy 105 (2011) S98-S101

The present paper describes the deposition of nanostructured diamond films with low surface roughness, high hardness and fracture toughness by microwave PECVD in the ASTeX type reactor from mixture of methane and hydrogen. Films were deposited on a mirror polished (111) oriented n-doped silicon substrate. The film exhibited relatively low roughness, the root mean square (RMS) of heights ranged from 20 to 9.1 nm, depending on the deposition conditions. The hardness was found to be in the range from 22 to 65 GPa and the elastic modulus ranged from 220 to 375 GPa, depending on the film structure.

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Cited Articles

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    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467
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