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Daniel Franta, Ivan Ohlídal, Vilma Buršíková, Lenka Zajíčková

Modeling of dielectric response of GexSbyTez (GST) materials

Physica Status Solidi C 6 (2009) S59–S62

The models of dielectric response of disordered solids based on parametrization of density of states (PDOS) and parametrization of joint density of states (PJDOS) are discussed in detail for interband and intraband transitions. These models are compared with classical models, i.e. Lorentz, Tauc-Lorentz and Drude.

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You can also contact one of the authors: franta@physics.muni.cz, ohlidal@physics.muni.cz, vilmab@physics.muni.cz, lenkaz@physics.muni.cz

Citing Articles

  1. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
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  2. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
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Cited Articles

  1. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
    Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
    Physica Status Solidi C 5 (2008) 1324–1327
  2. Franta D., Buršíková V., Nečas D., Zajíčková L.,
    Modeling of optical constants of diamond-like carbon,
    Diamond and Related Materials 17 (2008) 705–708
  3. Franta D., Nečas D., Zajíčková L.,
    Models of dielectric response in disordered solids,
    Optics Express 15 (2007) 16230–16244
  4. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
    Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
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  5. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
    Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
    Thin Solid Films 455–456 (2004) 399–403
  6. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
    Optical properties of diamond-like carbon films containing SiOx,
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  7. Franta D., Ohlídal I., Frumar M., Jedelský J.,
    Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
    Applied Surface Science 212–213 (2003) 116–121