Main page | Journal list | Log-in

Giacomo Badano, Xavier Baudry, Philippe Ballet, Philippe Duvaut, Alain Million, Eric Micoud, Sabeur Kaismoune, Paul Fougeres, Sophie Mibord, Pierre Tran-Van, Arnaud Etcheberry

Anisotropic surface roughness in molecular-beam epitaxy CdTe (211)B/Ge(211)

Journal of Electrinic Materials 37 (2008) 1369–1375

We characterize the surface of molecular-beam epitaxy (MBE)-grown CdTe(211)B/Ge(211) by atomic-force microscopy (AFM), optical interference microscopy, and generalized ellipsometry (GE). We find that, for substrate temperatures above 300 °C, the surface is rough and hazy; the AFM root-mean-square roughness is of the order of 150 Å. It appears from GE that the optical response is anisotropic, the principal axes of anisotropy being along the [(1) over bar 11] and [0 (1) over bar1] directions. For a substrate temperature of approximately 300 °C, the surface is smooth and mirror-like and the AFM roughness is as low as 45 Å. The sample is still anisotropic, even though the magnitude of the cross-polarized reflection coefficients are very small in this case. It appears that the anisotropy originates from the surface roughness, not the bulk.

Download PDF (441 kB)

Cited Articles

  1. Franta D., Ohlídal I.,
    Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
    Optics Communications 248 (2005) 459–467