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Lenka Zajíčková, Deepak Prasad Subedi, Vilma Buršíková, Kateřina Veltruská

Study of Argon Plasma Treatment of Polycarbonate Substrate and its Effect on Film Deposition

Acta Physica Slovaca 53 (2003) 489–504

Results of polycarbonate plasma treatment in argon r.f. glow discharges as concern the chemical structure and surface free energy are presented. The oxygen-to-carbon ratio increased after the treatment indicating an increase of oxygen containing functional groups on the polycarbonate surface. Small amount of silicon as a result of previous depositions of organosilicon thin films in the same reactor and small amount of nitrogen coming probably from an exposure of the reactive surface to the atmosphere were found on the surface. The surface free energy increased after the treatment from the original value of 35 mJ/m(2) to 63-74 mJ/m(2). Effect of treatment time, gas flow rate, pressure and aging on the surface free energy was studied too. In order to study an improvement of adhesion between the polycarbonate and an additional coatings the organosilicon thin films were deposited on the untreated and plasma treated polycarbonate. The interfacial fracture resistance of such a system was qualitatively tested by "cross-hatch peel test". The initiation and propagation stage of the fracture were studied by depth sensing indentation method followed by an observation of the samples with an optical microscope.

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