Nicolas D. Boscher, Patrick Choquet, David Duday, Stephane Verdier

Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge

Plasma Processes and Polymers 7 (2010) 163-171

Atmospheric pressure dielectric barrier discharge deposition of organosilicon thin films on aluminium foils was investigated for different electrical excitations. The plasma reactor was fed with nitrogen and hexamethyldisiloxane as film precursor. Scanning electron microscopy observations and secondary ion mass spectrometry associated with X-ray photoelectron spectroscopy showed how the modulation of the electrical excitation can affect the morphology and the chemistry of the coatings. The corrosion behaviour of the films obtained was characterised by means of electrochemical techniques. Relationships between the electrical excitation and the electrochemical properties of the films are reported and these results have been correlated with the morphology and chemistry modifications of the films.

This article may also be available to you online

Cited Articles

1. Bousquet A., Buršíková V., Goullet A., Djouadi A., Zajíčková L., Granier A.,
   Comparison of Structure and Mechanical Properties of SiO2-Like Films Deposited in O-2/HMDSO Pulsed and Continuous Plasmas,
   Surface and Coatings Technology 200 (2006) 6517–6521
2. Trunec D., Navrátil Z., Sťahel P., Zajíčková L., Buršíková V.,
   Deposition of Thin Organosilicon Polymer Films in Atmospheric Pressure Glow Discharge,
   Journal of Physics D 37 (2004) 2112–2120