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Publications of Ivan Ohlídal

Journal articles with impact factor: 2017, 2016, 2015, 2014, 2013, 2011, 2009, 2008, 2007, 2006, 2005, 2004, 2003, 2002, 2001, 2000, 1999, 1998, 1996, 1995, 1994, 1993, 1992, 1991, 1990, 1989, 1988, 1987, 1986, 1985, 1984, 1982, 1981, 1980, 1979, 1977, 1976, 1974, 1973, 1972, 1971
Journal articles without impact factor: 2009, 2008, 2007, 2005, 2004, 2003, 2002, 2001, 1999, 1998

Conference proceedings available from ISI Web of Science: 2016, 2015
Conference proceedings not available from ISI Web of Science: 2009, 2005, 2004, 2003, 2001, 2000, 1999, 1998, 1997, 1996, 1995

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Articles in journals with impact factor

2017

145. Ohlídal I., Franta D., Nečas D.,
Ellipsometric and reflectometric characterization of thin films exhibiting thickness non-uniformity and boundary roughness,
Applied Surface Science 421 (2017) 687-696

144. Franta D., Nečas D., Giglia A., Franta P., Ohlídal I.,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to magnesium fluoride,
Applied Surface Science 421 (2017) 424-429

143. Vodák J., Nečas D., Ohlídal M., Ohlídal I.,
Determination of local thickness values of non-uniform thin films by imaging spectroscopic reflectometer with enhanced spatial resolution,
Measurement Science and Technology 28 (2017) 025205

142. Franta D., Kotilainen M., Krumpolec R., Ohlídal I.,
Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry,
Applied Surface Science 421 (2017) 420-423

141. Franta D., Dubroka A., Wang C., Giglia A., Vohánka J., Franta P., Ohlídal I.,
Temperature-dependent dispersion model of float zone crystalline silicon,
Applied Surface Science 421 (2017) 405-419

140. Franta D., Čermák M., Vohánka J., Ohlídal I.,
Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
Thin Solid Films 631 (2017) 12-22

139. Ohlídal I., Vohánka J., Čermák M., Franta D.,
Optical characterization of randomly microrough surfaces covered with very thin overlayers using effective medium approximation and Rayleigh-Rice theory,
Applied Surface Science 419 (2017) 942-956

2016

138. Nečas D., Ohlídal I., Franta D., Ohlídal M., Vodák J.,
Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry,
Journal of Optics 18 (2016) 015401

137. Siefke T., Kroker S., Pfeiffer K., Puffky O., Dietrich K., Franta D., Ohlídal I., Szeghalmi A., Kley E., Tünnermann A.,
Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range,
Advanced Optical Materials 4 (2016) 1780-1786

2015

136. Nečas D., Vodák J., Ohlídal I., Ohlídal M., Majumdar A., Zajíčková L.,
Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry,
Applied Surface Science 350 (2015) 149-155

135. Franta D., Nečas D., Ohlídal I.,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia,
Applied Optics 54 (2015) 9108-9119 (1× cited)

2014

134. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Broadening of dielectric response and sum rule conservation,
Thin Solid Films 571 (2014) 496-501

133. Nečas D., Ohlídal I., Franta D., Čudek V., Ohlídal M., Vodák J., Sládková L., Zajíčková L., Eliáš M., Vižďa F.,
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry,
Thin Solid Films 571 (2014) 573-578

132. Nečas D., Ohlídal I.,
Consolidated series for efficient calculation of the reflection and transmission in rough multilayers,
Optics Express 22(4) (2014) 4499-4515

131. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen,
Thin Solid Films 571 (2014) 490-495

130. Ohlídal I., Franta D., Nečas D.,
Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
Thin Solid Films 571 (2014) 695-700

129. Nečas D., Ohlídal I., Franta D., Ohlídal M., Čudek V., Vodák J.,
Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films,
Applied Optics 53 (2014) 5606-5614

128. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Dispersion model of two-phonon absorption: application to c-Si,
Optical Materials Express 4 (2014) 1641-1656

2013

127. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
Thin Solid Films 539 (2013) 233-244 (1× cited)

126. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
Thin Solid Films 541 (2013) 12-16

125. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
Surface and Interface Analysis 45 (2013) 1188-1192

2011

124. Franta D., Nečas D., Ohlídal I.,
Anisotropy-enhanced depolarization on transparent film/substrate system,
Thin Solid Films 519 (2011) 2637-2640

123. Nečas D., Franta D., Buršíková V., Ohlídal I.,
Ellipsometric characterisation of thin films non-uniform in thickness,
Thin Solid Films 519 (2011) 2715-2717 (1× cited)

122. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
Thin Solid Films 519 (2011) 2874-2876 (1× cited)

121. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
Optical characterization of HfO2 thin films,
Thin Solid Films 519 (2011) 6085-6091 (1× cited)

120. Nečas D., Ohlídal I., Franta D.,
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
Journal of Optics 13(8) (2011) 085705 (2× cited)

119. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Majumdar A.,
Measurement of the thickness distribution and optical constants of non-uniform thin films ,
Measurement Science and Technology 22(8) (2011) 085104

2009

118. Ohlídal I., Nečas D., Franta D., Buršíková V.,
Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
Diamond and Related Materials 18 (2009) 364–367 (5× cited)

117. Ohlídal M., Ohlídal I., Klapetek P., Nečas D., Buršíková V.,
Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
Diamond and Related Materials 18 (2009) 384–387

116. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898 (1× cited)

115. Nečas D., Ohlídal I., Franta D.,
The reflectance of non-uniform thin films,
Journal of Optics A: Pure and Applied Optics 11 (2009) 045202 (6× cited)

2008

114. Ohlídal I., Nečas D., Buršíková V., Franta D., Ohlídal M.,
Optical characterization of diamond-like carbon thin films non-uniform in thickness using spectroscopic reflectometry,
Diamond and Related Materials 17 (2008) 709–712 (1× cited)

113. Valtr M., Klapetek P., Buršíková V., Ohlídal I., Franta D.,
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge,
Chemické listy 102 (2008) s1529–s1532

112. Ohlídal I., Nečas D.,
Influence of shadowing on ellipsometric quantities of randomly rough surfaces and thin films,
Journal of Modern Optics 55 (2008) 1077–1099

111. Franta D., Ohlídal I., Nečas D.,
Influence of cross-correlation effects on the optical quantities of rough films,
Optics Express 16 (2008) 7789–7803 (6× cited)

2007

110. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,
Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
Diamond and Related Materials 16 (2007) 1331–1335 (6× cited)

109. Klapetek P., Ohlídal I., Buršík J.,
Atomic force microscopy studies of cross-sections of columnar thin films,
Measurement Science and Technology 18 (2007) 528–531

2006

108. Valtr M., Ohlídal I., Franta D.,
Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
Czechoslovak Journal of Physics 56 (2006) B1103–B1109

107. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
Journal of Non-Crystalline Solids 352 (2006) 5633–5641 (4× cited)

106. Franta D., Ohlídal I.,
Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774 (13× cited)

105. Klapetek P., Ohlídal I., Buršík J.,
Applications of scanning thermal microscopy in the analysis of the geometry of patterned structures,
Surface and Interface Analysis 38 (2006) 383–387

104. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 38 (2006) 842–846 (1× cited)

2005

103. Ohlídal I., Franta D., Klapetek P.,
Combination of optical methods and atomic force microscopy at characterization of thin film systems,
Acta Physica Slovaca 55 (2005) 271–294 (1× cited)

102. Klapetek P., Ohlídal I.,
Applications of the wavelet transform in AFM data analysis,
Acta Physica Slovaca 55 (2005) 295–303

101. Antoš R., Ohlídal I., Franta D., Klapetek P., Mistrík J., Yamaguchi T., Višňovský Š.,
Spectroscopic ellipsometry of sinusoidal surface-relief gratings,
Applied Surface Science 244 (2005) 221–224 (2× cited)

100. Antoš R., Ohlídal I., Mistrík J., Murakami K., Yamaguchi T., Pištora J., Horie M., Višňovský Š.,
Spectroscopic ellipsometry on lamellar gratings,
Applied Surface Science 244 (2005) 225–229 (1× cited)

99. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
Applied Surface Science 244 (2005) 338–342 (3× cited)

98. Franta D., Negulescu B., Thomas L., Dahoo P., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
Optical properties of NiO thin films prepared by pulsed laser deposition technique,
Applied Surface Science 244 (2005) 426–430 (19× cited)

97. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
Applied Surface Science 244 (2005) 431–434 (10× cited)

96. Mistrík J., Ohlídal I., Antoš R., Aoyama M., Yamaguchi T.,
Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films,
Applied Surface Science 244 (2005) 51–54 (1× cited)

95. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
Diamond and Related Materials 14 (2005) 1795–1798 (10× cited)

94. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Páleníková K.,
Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
Diamond and Related Materials 14 (2005) 1835–1838 (5× cited)

93. Antoš R., Pištora J., Ohlídal I., Postava K., Mistrík J., Yamaguchi T., Višňovský Š., Horie M.,
Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate,
Journal of Applied Physics 97 (2005) 053107

92. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
Journal of Modern Optics 52 (2005) 583–602 (1× cited)

91. Franta D., Ohlídal I.,
Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
Optics Communications 248 (2005) 459–467 (31× cited)

90. Franta D., Ohlídal I., Petrýdes D.,
Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
Vacuum 80 (2005) 159–162 (12× cited)

89. Klapetek P., Ohlídal I., Montaigne-Ramil A., Bonanni A., Sitter H.,
Atomic force microscopy analysis of morphology of the upper boundaries of GaN thin films prepared by MOCVD,
Vacuum 80 (2005) 53–57 (2× cited)

2004

88. Klapetek P., Ohlídal I., Navrátil K.,
Atomic force microscopy analysis of statistical roughness of GaAs surfaces originated by thermal oxidation,
Microchimica Acta 147 (2004) 175–180 (5× cited)

87. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
Surface and Interface Analysis 36 (2004) 1203–1206 (3× cited)

86. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 393–398 (20× cited)

85. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 399–403 (12× cited)

84. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical properties of ZnTe films prepared by molecular beam epitaxy,
Thin Solid Films 468 (2004) 193–202 (11× cited)

83. Klapetek P., Ohlídal I., Bílek J.,
Influence of the atomic force microscope tip on the multifractal analysis of rough surfaces,
Ultramicroscopy 102 (2004) 51–59 (1× cited)

2003

82. Klapetek P., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Atomic force microscopy characterization of ZnTe epitaxial films,
Acta Physica Slovaca 53 (2003) 223–230 (5× cited)

81. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
New dispersion model of the optical constants of the DLC films,
Acta Physica Slovaca 53 (2003) 373–384 (13× cited)

80. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical constants of ZnTe and ZnSe epitaxial thin films,
Acta Physica Slovaca 53 (2003) 95–104 (2× cited)

79. Franta D., Ohlídal I., Frumar M., Jedelský J.,
Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
Applied Surface Science 212–213 (2003) 116–121 (23× cited)

78. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx,
Diamond and Related Materials 12 (2003) 1532–1538 (16× cited)

77. Klapetek P., Ohlídal I., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Atomic force microscopy characterization of ZnTe epitaxial thin films,
Japanese Journal of Applied Physics 42 (2003) 4706–4709 (1× cited)

76. Ohlídal M., Ohlídal I., Klapetek P., Jákl M., Čudek V., Eliáš M.,
New method for the complete optical analysis of thin films nonuniform in optical parameters,
Japanese Journal of Applied Physics 42 (2003) 4760–4763 (1× cited)

75. Klapetek P., Ohlídal I.,
Theoretical analysis of the atomic force microscopy characterization of columnar thin films,
Ultramicroscopy 94 (2003) 19–29 (9× cited)

2002

74. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
Diamond and Related Materials 11 (2002) 105–117 (21× cited)

73. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Influence of overlayers on determination of the optical constants of ZnSe thin films,
Journal of Applied Physics 92 (2002) 1873–1880 (7× cited)

72. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
Surface and Interface Analysis 33 (2002) 559–564 (2× cited)

71. Ohlídal M., Ohlídal I., Franta D., Králík T., Jákl M., Eliáš M.,
Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
Surface and Interface Analysis 34 (2002) 660–663 (2× cited)

70. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
Surface and Interface Analysis 34 (2002) 759–762 (11× cited)

2001

69. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
Applied Optics 40 (2001) 5711–5717 (4× cited)

68. Franta D., Ohlídal I., Frumar M., Jedelský J.,
Optical characterization of chalcogenide thin films,
Applied Surface Science 175–176 (2001) 555–561 (15× cited)

67. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878 (4× cited)

66. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 32 (2001) 91–94 (3× cited)

65. Franta D., Zajíčková L., Ohlídal I., Janča J.,
Optical characterization of diamond-like carbon films,
Vacuum 61 (2001) 279–283 (3× cited)

64. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
Determination of thicknesses and spectral dependences of refractive indices of non-absorbing and weakly absorbing thin films using the wavelengths related to extrema in spectral reflectances,
Vacuum 61 (2001) 285–289

2000

63. Franta D., Ohlídal I.,
Analysis of thin films by optical multi-sample methods,
Acta Physica Slovaca 50 (2000) 411–421 (15× cited)

62. Ohlídal I., Franta D.,
Matrix formalism for imperfect thin films,
Acta Physica Slovaca 50 (2000) 489–500 (18× cited)

61. Franta D., Ohlídal I., Klapetek P.,
Analysis of slightly rough thin films by optical methods and AFM,
Mikrochimica Acta 132 (2000) 443–447 (30× cited)

60. Franta D., Ohlídal I.,
Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
Surface and Interface Analysis 30 (2000) 574–579 (17× cited)

59. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
Thin Solid Films 366 (2000) 43–50

58. Ohlídal I., Franta D.,
Ellipsometry of thin film systems,
Progress in Optics 41 (2000) 181-282 (44× cited)

1999

57. Ohlídal I., Vižďa F.,
Optical quantities of multilayer systems with correlated randomly rough boundaries,
Journal of Modern Optics 46 (1999) 2043–2062 (1× cited)

56. Ohlídal M., Unčovský M., Ohlídal I., Franta D.,
Determination of the basic parameters characterizing the roughness of metal surfaces by laser light scattering,
Journal of Modern Optics 46 (1999) 279–293 (2× cited)

55. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Surface and Interface Analysis 28 (1999) 240–244 (19× cited)

54. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 343–344 (1999) 295–298 (6× cited)

1998

53. Pavelka R., Hlávka J., Ohlídal I., Sitter H.,
Optical parameter analysis of thin absorbing films measured by the photovoltage method,
Acta Physica Polonica A 94 (1998) 468–472 (1× cited)

52. Franta D., Ohlídal I., Munzar D.,
Parameterisation of the model of dispersion dependences of solid state optical constants,
Acta Physica Slovaca 48 (1998) 451–458 (10× cited)

51. Ohlídal I., Franta D.,
Ellipsometry of Thin Films,
Acta Physica Slovaca 48 (1998) 459–468 (2× cited)

50. Franta D., Ohlídal I.,
Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
Journal of Modern Optics 45 (1998) 903–934 (53× cited)

49. Ohlídal I., Franta D., Hora J., Navrátil K., Weber J., Janda P.,
Analysis of thin films with slightly rough boundaries,
Mikrochimica Acta 15 (1998) 177–180 (1× cited)

48. Franta D., Ohlídal I.,
Statistical properties of the near-field speckle patterns of thin films with slightly rough boundaries,
Optics Communications 147 (1998) 349–358 (4× cited)

1996

47. Hlávka J., Ohlídal I., Vižďa F., Sitter H.,
New technique of measurement of optical parameters of thin films,
Thin Solid Films 279 (1996) 209–212 (1× cited)

46. Zajíčková L., Ohlídal I., Janča J.,
Plasma-Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses,
Thin Solid Films 280 (1996) 26–36 (10× cited)

1995

45. Ohlídal I., Vižďa F., Ohlídal M.,
Optical analysis by means of spectroscopic reflectometry of single and double layers with correlated randomly rough boundaries,
Optical Engineering 34 (1995) 1761–1768 (10× cited)

44. Ohlídal M., Ohlídal I., Druckmüller M., Franta D.,
A method of shearing interferometry for determining the statistical quantities of randomly rough surfaces of solids,
Pure and Applied Optics 4 (1995) 599–616

1994

43. Ohlídal I., Navrátil K., Ohlídal M., Druckmüller M.,
Characterization of the basic statistical properties of very rough surfaces of transparent solids by immersion shearing interferometry,
Applied Optics 33 (1994) 7838–7845 (1× cited)

1993

42. Ohlídal I.,
Approximate formulas for the reflectance, transmittance, and scattering losses of nonabsorbing multilayer systems with randomly rough boundaries,
Journal of the Optical Society of America A 10 (1993) 158–171 (1× cited)

41. Holý V., Kuběna J., Ohlídal I., Lischka K., Plotz W.,
X-ray reflection from rough layered systems,
Physical Review B 47 (1993) 15896–15903 (20× cited)

1992

40. Musilová J., Ohlídal I.,
Influence of defects of thin films on determining their thickness by the method based on white light interference,
Journal of Physics D 25 (1992) 1131–1138

39. Strelec P., Ohlídal I., Schmidt E.,
Colour properties of detuned alternating multilayer systems,
Journal of Physics D 25 (1992) 297–302

38. Holý V., Kuběna J., Ohlídal I., Ploog K.,
The diffuse X-ray scattering in real periodical superlattices,
Superlattices and Microstructures 12 (1992) 25–35

1991

37. Ohlídal I., Líbezný M.,
Ellipsometric analysis of gallium arsenide surfaces,
Surface and Interface Analysis 17 (1991) 171–176 (3× cited)

1990

36. Ohlídal I., Schmidt E., Líbezný M.,
Complete unambiguous optical characterization of double layers consisting of two strongly absorbing thin films by combined reflection and transmission ellipsometry,
Applied Optics 29 (1990) 593–598 (1× cited)

35. Musilová J., Ohlídal I.,
Possibilities and limitations of the film thickness determination method based on white light interference,
Journal of Physics D 23 (1990) 1227–1238

34. Ohlídal I., Líbezný M.,
Immersion ellipsometry of semiconductor surfaces,
Surface and Interface Analysis 16 (1990) 46–53 (2× cited)

33. Ponížil P., Ohlídal I., Janča J.,
Optical properties of diamond-like carbon films,
Thin Solid Films 190 (1990) 65–72

1989

32. Ohlídal I.,
Reflectance of multilayer systems with randomly rough boundaries,
Optics Communications 71 (1989) 323–326

31. Ohlídal I., Schmidt E., Líbezný M., Tvarožek V., Novotný I.,
Ellipsometric analysis of thin NiCr films,
Thin Solid Films 169 (1989) 213–222 (1× cited)

1988

30. Ohlídal I., Lukeš F.,
Analysis of semiconductor surfaces with very thin native oxide layers by combined immersion and multiple angle of incidence ellipsometry,
Applied Surface Science 35 (1988) 259–273 (2× cited)

29. Ohlídal I.,
General Formulae for the Optical Characterization of Single Layers with Spectroscopic Reflectometry,
Journal of Modern Optics 35 (1988) 1373–1381 (1× cited)

28. Ohlídal I.,
Immersion spectroscopic reflectometry of multilayer systems. I. Theory,
Journal of the Optical Society of America A 5 (1988) 459–464

27. Ohlídal I.,
Immersion spectroscopic reflectometry of multilayer systems. II. Experimental results,
Journal of the Optical Society of America A 5 (1988) 465–470

26. Ohlídal I., Navrátil K.,
Simple method of spectroscopic reflectometry for the complete optical analysis of weakly absorbing thin films: Application to silicon films,
Thin Solid Films 156 (1988) 181–189 (1× cited)

25. Ohlídal I.,
Optical analysis of inhomogeneous weakly absorbing thin films by spectroscopic reflectometry: Application to carbon films,
Thin Solid Films 162 (1988) 101–109 (2× cited)

1987

24. Ohlídal I., Navrátil K.,
Complete optical analysis of a non-absorbing thin film on an absorbing substrate by a new method of immersion spectroscopic reflectometry,
Thin Solid Films 148 (1987) 17–27 (1× cited)

1986

23. Paneva A., Ohlídal I.,
Multiple angle of incidence ellipsometric analysis of non-absorbing two-layer and three-layer systems,
Thin Solid Films 145 (1986) 23–37 (1× cited)

1985

22. Ohlídal I., Navrátil K.,
Analysis of the basic statistical properties of randomly rough curved surfaces by shearing interferometry,
Applied Optics 24 (1985) 2690–2695 (1× cited)

21. Ohlídal I.,
Influence of Surface Roughness on Radiation from Parabolic Mirror Collimators with Cylindrical Symmetry in the Fraunhofer Region,
Optica Acta 32 (1985) 27–37

20. Ohlídal I., Navrátil K., Musilová J.,
A new method for the complete optical analysis of weakly absorbing thin films: Application to polycrystalline silicon films,
Thin Solid Films 127 (1985) 191–203

1984

19. Ohlídal I., Lukeš F.,
Optical analysis of absorbing double layers by combined reflection and transmission ellipsometry,
Thin Solid Films 115 (1984) 269–282 (1× cited)

1982

18. Ohlídal I., Navrátil K., Schmidt E.,
Simple Method for the Complete Optical Analysis of Very Thick and Weakly Absorbing Films,
Applied Physics A 29 (1982) 157–162

1981

17. Ohlídal I., Lukeš F.,
Optical analysis of thin gold films by combined reflection and transmission ellipsometry,
Thin Solid Films 85 (1981) 181–190 (1× cited)

1980

16. Ohlídal I.,
Expression for the reflectance of randomly rough surfaces derived with the Fresnel approximation,
Applied Optics 19 (1980) 1804–1811

15. Ohlídal I., Navrátil K.,
Optical analysis of non-absorbing double layers by means of immersion reflectometry I: Liquid immersion method,
Thin Solid Films 67 (1980) 245–251

14. Ohlídal I., Navrátil K.,
Optical analysis of non-absorbing double layers by means of immersion reflectometry II: Solid state immersion method,
Thin Solid Films 71 (1980) 91–102

13. Ohlídal I., Navrátil K.,
Determination of the optical parameters and packing density of non-absorbing columnar thin films by means of immersion reflectometry: Application to LiF thin films,
Thin Solid Films 74 (1980) 51–58 (1× cited)

1979

12. Navrátil K., Ohlídal I., Lukeš F.,
The physical structure of the interface between single-crystal GaAs and its oxide film,
Thin Solid Films 56 (1979) 163–171 (2× cited)

11. Ohlídal I., Navrátil K., Lukeš F.,
The optical analysis of non-absorbing thin films with randomly rough boundaries by means of immersion spectrophotometry,
Thin Solid Films 57 (1979) 179–184

1977

10. Navrátil K., Ohlídal I., Lukeš F.,
A model of oxide film originating at thermal oxidation of GaAs,
Czechoslovak Journal of Physics 27 (1977) 672–681

9. Ohlídal I., Navrátil K.,
Method for determining the refractive index and thickness of a non-absorbing thin film with randomly rough boundaries,
Thin Solid Films 44 (1977) 313–321

1976

8. Ohlídal M., Ohlídal I., Lukeš F.,
Ellipsometric studies of polished silicon surfaces,
Surface Science 55 (1976) 467–476

7. Ohlídal I., Navrátil K.,
Influence of the properties of thin films on the determination of the relative reflectance of a randomly rough surface,
Thin Solid Films 31 (1976) 223–234

1974

6. Ohlídal I., Lukeš F., Navrátil K.,
Rough silicon surfaces studied by optical methods,
Surface Science 45 (1974) 91–116 (5× cited)

1973

5. Ohlídal I., Lukeš F.,
Calculation of the Ellipsometric Parameters Characterizing a Randomly Rough Surface by Means of The Stratton-Chu-Silver Integral,
Optics Communications 7 (1973) 76–79 (1× cited)

1972

4. Ohlídal I., Lukeš F.,
Ellipsometric Parameters of Rough Surfaces and of a System Substrate-Thin Film with Rough Boundaries,
Optica Acta 19 (1972) 817–843 (5× cited)

3. Ohlídal I., Lukeš F.,
Ellipsometric parameters of randomly rough surfaces,
Optics Communications 5(5) (1972) 323-326 (2× cited)

1971

2. Ohlídal I., Navrátil K., Lukeš F.,
Reflection of Light by a System of Nonabsorbing Isotropic Film-Nonabsorbing Isotropic Substrate with Randomly Rough Boundaries,
Journal of the Optical Society of America 61 (1971) 1630–1639 (8× cited)

1. Ohlídal I., Navrátil K., Lukeš F.,
Reflection of light on a system of non-absorbing isotropic film - non-absorbing isotropic substrate with rough boundaries,
Optics Communications 3 (1971) 40–44 (1× cited)

Articles in journals without impact factor

2009

15. Ohlídal M., Ohlídal I., Nečas D., Klapetek P.,
Complete Optical Characterization of Non-Uniform SiOx Thin Films Using Imaging Spectroscopic Reflectometry,
e-Journal of Surface Science and Nanotechnology 7 (2009) 409–412

14. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Modeling of dielectric response of GexSbyTez (GST) materials,
Physica Status Solidi C 6 (2009) S59–S62 (2× cited)

2008

13. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
Optical characterization of non-stoichiometric silicon nitride films,
Physica Status Solidi C 5 (2008) 1320–1323

12. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
Physica Status Solidi C 5 (2008) 1324–1327 (4× cited)

11. Franta D., Ohlídal I., Nečas D.,
Optical quantities of rough films calculated by Rayleigh-Rice theory,
Physica Status Solidi C 5 (2008) 1395–1398 (2× cited)

10. Ohlídal I., Nečas D., Franta D.,
Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
Physica Status Solidi C 5 (2008) 1399–1402

2007

9. Valtr M., Klapetek P., Ohlídal I., Franta D.,
UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624

2005

8. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
Měření mechanického napětí v tenkých vrstvách pomocí kombinované optické metody,
Jemná mechanika a optika 50 (2005) 72–75

2004

7. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
Chalcogenide Letters 1 (2004) 1–10 (18× cited)

2003

6. Ohlídal I., Klapetek P., Franta D.,
Aplikace mikroskopie atomové síly při analýze tenkých vrstev ZnSe a ZnTe,
Československý časopis pro fyziku 53 (2003) 97–100

2002

5. Klapetek P., Ohlídal I., Franta D.,
Applications of atomic force microscopy for thin film boundary measurements,
Jemná mechanika a optika 47 (2002) 195–199

2001

4. Klapetek P., Ohlídal I., Franta D.,
Měření základních statistických veličin náhodné povrchové drsnosti pomocí mikroskopie atomové síly,
Československý časopis pro fyziku 51 (2001) 16–21

3. Klapetek P., Ohlídal I., Franta D.,
Vliv diskrétní Fourierovy transformace na zpracování AFM dat,
Československý časopis pro fyziku 51 (2001) 49–51

1999

2. Ohlídal I., Franta D., Klapetek P., Vičar M.,
Relationship between AFM and optical measurements at analyzing surface roughness,
Jemná mechanika a optika 44 (1999) 307–311

1998

1. Ohlídal I., Ohlídal M., Franta D., Tykal M., Pražák D., Michálek A.,
Srovnání výsledků měření drsnosti povrchu dosažených vybranými optickými metodami a metodou profilometrickou,
Jemná mechanika a optika 43 (1998) 130–136

Proceedings available from ISI Web of Science

2016

5. Franta D., Nečas D., Ohlídal I., Giglia A.,
Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range,
Photonics Europe 2016: Optical Micro- and Nanometrology VI , Photonics Europe 2016: Optical Micro- and Nanometrology VI, Brussels, Belgium 3 - 7 April 2016 (2016) 989014

2015

4. Ohlídal M., Ohlídal I., Nečas D., Vodák J., Franta D., Nádaský P., Vižďa F.,
Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280R

3. Franta D., Nečas D., Ohlídal I., Jankuj J.,
Wide spectral range characterization of antireflective coatings and their optimization,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280F

2. Nečas D., Ohlídal I., Vodák J., Ohlídal M., Franta D.,
Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280C

1. Franta D., Nečas D., Ohlídal I., Giglia A.,
Dispersion model for optical thin films applicable in wide spectral range,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96281U

Proceedings not available from ISI Web of Science

2009

21. Ohlídal M., Ohlídal I., Klapetek P., Nečas D.,
PRECISE MEASUREMENT OF THICKNESS DISTRIBUTION OF NONUNIFORM THIN FILMS BY IMAGING SPECTROSCOPIC REFLECTOMETRY,
XIX IMEKO WORLD CONGRESS: FUNDAMENTAL AND APPLIED METROLOGY, PROCEEDINGS (2009) 100-105

20. Vižďa F., Ohlídal I., Hrubý V.,
Influence of Cross-Correlation of Rough Boundaries on Reflectance of Thin Films on GaAs and Si Substrates,
Physics of Semiconductors , 29th International Conference on Physics of Semiconductors, Rio de Janeiro, Brazil, July 27 - August 1, 2008 (2009) 19-20

2005

19. Franta D., Ohlídal I.,
Characterization of optical thin films exhibiting defects,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 59632H

18. Ohlídal I., Franta D., Klapetek P.,
Měření nanodrsnosti pomocí optických metod a mikroskopie atomové síly,
Proceedings of Kvalita a GPS 2005 (2005) 131-139

17. Ohlídal I., Franta D., Klapetek P.,
Ellipsometry in characterization of thin films,
Proceedings of Solar Renewable Energy News (2005) 81-111

16. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
Optical measurement of mechanical stresses in diamond-like carbon films,
Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728

15. Ohlídal M., Čudek V., Ohlídal I., Klapetek P.,
Optical characterization of non-uniform thin films using imaging spectrophotometry,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 596329

2004

14. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,
Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147 (2× cited)

2003

13. Ohlídal I., Ohlídal M., Klapetek P., Čudek V., Jákl M.,
Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry,
WAVE-OPTICAL SYSTEMS ENGINEERING II (2003) 260-271

12. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Stifter H.,
Optical characterization of ZnSe thin films,
Proceedings of 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE , 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE (2003) 831-832

11. Ohlídal I., Ohlídal M., Klapetek P., Čudek V., Jákl M.,
Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry,
Proceedings of Wave-Optical Systems Engineering II, SPIE (2003) 260-271

2001

10. Franta D., Ohlídal I.,
Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212 (1× cited)

9. Klapetek P., Franta D., Ohlídal I.,
Study of Thin Film Defects by Atomic Force Microscopy,
Proceedings of 5th Seminar on Quantitative Microscopy, PTB-Bericht , 5th Seminar on Quantitative Microscopy, PTB-Bericht (2001) 107-117

2000

8. Ohlídal I., Franta D., Klapetek P.,
Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films,
Proceedings of 4th Seminar on Quantitative Microscopy, PTB-Bericht , 4th Seminar on Quantitative Microscopy, PTB-Bericht (2000) 124-131

1999

7. Ohlídal I., Ohlídal M., Franta D., Tykal M.,
Comparison of optical and non-optical methods for measuring surface roughness,
Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467

1998

6. Ohlídal I., Ohlídal M., Franta D., Vičar M., Klapetek P.,
Comparison of AFM and optical methods at measuring nanometric surface roughness,
Proceedings of 3th Seminar on Quantitative Microscopy , 3th Seminar on Quantitative Microscopy (1998) 123–129

1997

5. Ohlídal I., Franta D., Rezek B., Ohlídal M.,
Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Proceedings of 7th European Conference on Applications of Surface and Interface Analysis , 7th European Conference on Applications of Surface and Interface Analysis (1997) 1051–1054

1996

4. Franta D., Ohlídal I., Hora J., Navrátil K.,
Spektroskopická elipsometrie slabě drsných povrchů,
Proceedings of 12. konference českých a slovenských fyziků , Proceedings of 12. konference českých a slovenských fyziků (1996) 482-485

3. Ohlídal I., Franta D., Hora J.,
Spectroscopic Ellipsometry of Slightly Rough Surfaces Covered by Layers,
Proceedings of 6th European Conference on Applications of Surface and Interface Analysis , 6th European Conference on Applications of Surface and Interface Analysis (1996) 823-826

2. Ohlídal M., Ohlídal I., Franta D., Michálek A.,
Method of shearing interferometry for characterizing non-gaussian randomly rough surfaces,
Proceedings of Specification, Production, and Testing of Optical Components and Systems , Specification, Production, and Testing of Optical Components and Systems (1996) 442–451

1995

1. Ohlídal M., Ohlídal I., Druckmüller M., Franta D.,
Interferometry of Randomly Rough Surfaces,
Proceedings of Photonics '95 , Proceedings of Photonics '95 (1995) 109-111