Milan Ohlídal, Ivan Ohlídal, František Lukeš
Ellipsometric studies of polished silicon surfaces
Surface Science 55 (1976) 467–476
The optical constants of mechanically polished silicon surfaces were determined at λ = 546.1 nm applying the least squares method to the ellipsometric parameters ψ and Δ studied as functions of angle of incidence in the interval <70°, 80°>. These optical constants differ considerably from those of Si single crystal. For all polished samples studied the indices of refraction spread over the interval <4.11, 5.43> and the indices of absorption spread over the interval <0.05, 1.90>. Possible physical models of the thin surface layer of Si which was damaged during the mechanical polishing are qualitatively discussed.
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