Ivan Ohlídal, E. Schmidt, M. Líbezný, V. Tvarožek, I. Novotný
Ellipsometric analysis of thin NiCr films
Thin Solid Films 169 (1989) 213–222
A method known as combined reflection and transmission ellipsometry was used to obtain the values of all the optical parameters characterizing thin NiCr films deposited by the r.f. sputtering method onto glass plates. The NiCr films were covered by thin Al2O3 films to protect them against the formation of native oxide layers on their top surfaces. The ellipsometric parameters were measured at a wavelength of 632.8 nm.
This article may also be available to you online
You can also contact one of the authors: ohlidal@physics.muni.cz
Citing Articles
- Ohlídal I., Franta D.,
Ellipsometry of thin film systems,
Progress in Optics 41 (2000) 181-282