Zuzana Rašková, K. Brandejs, J. Vaněk, Franišek Krčma

Plasma diagnostics during deposition processes of silane based thin films

Czechoslovak Journal of Physics 54 (2004) C1036–C1041

Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as wen as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers Were Used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH₄+H₂ gas mixture was added to hexamethyldisiloxane. We observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment, exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified.

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