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Zuzana Kučerová, Vilma Buršíková, Lenka Zajíčková, Jana Franclová, Vratislav Peřina

Thermal Stability of SiOxCyHz Films Prepared by PECVD

Chemické listy 99 (2005) 465–467

Annealing experiments carried out on a plasma ploymerized organosilicon coatings revealed certain changes in film structure and composition. These changes include mainly water and hydrogen desorption, which lead to removal of SiH and SiOH bonds from the films and to the significant increase in silicon-oxygen bonds. These results were obtained by RBS/ERDA analysis, FTIR spectroscopy and TDS analysis. Annealed films were determined by various characterization methods (optical properties by the means of spectroscopic ellipsometry, mechanical properties by depth sensing indentation test) in order to find how the film properties are influenced by the thermally effected structural changes.

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