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Ivan Ohlídal, Milan Líbezný

Ellipsometric analysis of gallium arsenide surfaces

Surface and Interface Analysis 17 (1991) 171–176

In this paper the methods of immersion ellipsometry and multiple angle of incidence ellipsometry are used for analyzing gallium arsenide single crystals covered with very thin oxide layers growing under normal laboratory conditions. The values of all the optical parameters of the system mentioned, i.e. the values of the refractive index and the extinction coefficient of gallium arsenide and the refractive index and the thickness of the native oxide layer, can be determined with good accuracy if the experimental data corresponding to several samples of this system are interpreted together. The thicknesses of the native oxide layers corresponding to these samples analysed together must be mutually different. The method is applied at a wavelength of 632.8nm.

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Citing Articles

  1. Franta D., Ohlídal I.,
    Analysis of thin films by optical multi-sample methods,
    Acta Physica Slovaca 50 (2000) 411–421
  2. Ohlídal I., Franta D.,
    Ellipsometry of thin film systems,
    Progress in Optics 41 (2000) 181-282
  3. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,
    Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
    Diamond and Related Materials 11 (2002) 105–117