David Nečas, Vladimír Čudek, Jiří Vodák, Miloslav Ohlídal, Petr Klapetek, Jan Benedikt, Katja Rügner, Lenka Zajíčková
Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry
Measurement Science and Technology 25 (2014) 115201
The construction of a normal-incidence imaging spectrophotometer for mapping of thin film properties is described. It is based on an on-axis reflective imaging system, utilising a telescope-like arrangement. A charge-coupled device camera is used as the detector, permitting measurements in the spectral range 275-1100 nm with resolution of 37 µm. The performance of the instrument demonstrated by optical characterisation of highly non-uniform thin films deposited from hexamethyldisiloxane on silicon substrates by a single capillary plasma jet at atmospheric pressure. The imaging spectrophotometry is used as a self-sufficient technique for the determination of both the film optical constants and maps of local thickness. The thickness maps are compared with the results of conventional thickness profile characterisation methods, profilometry and atomic force microscopy, and the differences and errors are discussed.
This article may also be available to you online