Jan Sentek, Zenobia Rzanek-Boroch, Marcin Brykala, Krzysztof Schmidt-Szalowski

DEPOSITION OF GAS - TIGHT COATINGS ON PLASTIC FILMS BY PULSED DIELECTRIC-BARRIER DISCHARGES

Chemické listy 102 (2008) S1502-S1505

Organosilicon coatings deposition from tetraethoxysilane (TEOS) was conducted in pulsed dielectric barrier discharges (PDBD) for packaging polyethylene (PE) films tightening. A laboratory reactor was tested with a rotating cylindrical internal electrode bearing the PE film and with the cylindrical glass body being a dielectric barrier. The oxygen permeability of the films was examined after plasma treatment with different gases: (i) He, (ii) TEOS + He, (iii) TEOS + He + 5 % O-2, (iv) TEOS + He + 10 % O-2. For the film surface topography observations, atomic force microscopy (AFM) was used. The coating composition was examined by X-ray photoelectron spectroscopy (XPS). It was found that under PDBD conditions both the treatment in helium plasma and the coating deposition from different TEOS+carrier-gas mixtures reduce the oxygen permeability of PE films.

Cited Articles

1. Zajíčková L., Buršíková V., Kučerová Z., Franclová J., Sťahel P., Peřina V., Macková A.,
   Organosilicon Thin Films Deposited by Plasma Enhanced CVD: Thermal Changes of Chemical Structure and Mechanical Properties,
   Journal of Physics and Chemistry of Solids 68 (2007) 1255–1259