Daniel Franta, Ivan Ohlídal, Miloslav Frumar, Jaroslav Jedelský
Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model
Applied Surface Science 212–213 (2003) 116–121
In this paper a new dispersion model of the optical constants of amorphous solids enabling us to perform an efficient parameterization of the spectral dependences of the optical constants of chalcogenide thin films will be presented. This dispersion model is based on mathematical modeling the density of electronic states (DOS) corresponding to both the valence and conduction bands. The imaginary part of the dielectric function is then calculated by the numerical convolution of the DOS. The real part of the dielectric function is calculated using the corresponding Kramers-Kronig relation in a suitable numerical way. Moreover, the existence of the transitions between the localized states inside the band gap and the extended states inside both the valence and conduction bands is also taken into account using the corresponding convolutions. Thus, the dispersion model presented includes the absorption corresponding to the Urbach and Tauc regions. Then the dispersion model described allows to interpret spectroellipsometric and spectrophotometric data measured for the chalcogenide thin films within the wide spectral region (200–900 nm).
This article may also be available to you online
You can also contact one of the authors: franta@physics.muni.cz, ohlidal@physics.muni.cz
Citing Articles
- Franta D., Ohlídal I., Klapetek P., Ohlídal M.,
Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
Surface and Interface Analysis 36 (2004) 1203–1206 - Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 399–403 - Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,
Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
Chalcogenide Letters 1 (2004) 1–10 - Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 393–398 - Tanemura S., Miao L., Koide S., Mori Y., Jin P., Terai A., Nabatova-Gabain N.,
Optical properties of metal and semiconductor SmS thin films fabricated by rf/dc dual magnetron sputtering,
Applied Surface Science 238 (2004) 360–366 - Ohlídal I., Franta D., Klapetek P.,
Combination of optical methods and atomic force microscopy at characterization of thin film systems,
Acta Physica Slovaca 55 (2005) 271–294 - Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 38 (2006) 842–846 - Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
Journal of Non-Crystalline Solids 352 (2006) 5633–5641 - Valtr M., Ohlídal I., Franta D.,
Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
Czechoslovak Journal of Physics 56 (2006) B1103–B1109 - Zajíčková L., Buršíková V., Franta D., Bousquet A., Granier A., Goullet A., Buršík J.,
Comparative study of films deposited from HMDSO/O2 in continuous wave and pulsed rf discharges,
Plasma Processes and Polymers 4 (2007) S287–S293 - Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
Deposition of protective coatings in RF organosilicon discharges,
Plasma Sources Science and Technology 16 (2007) S123–S132 - Franta D., Nečas D., Zajíčková L.,
Models of dielectric response in disordered solids,
Optics Express 15 (2007) 16230–16244 - Valtr M., Klapetek P., Ohlídal I., Franta D.,
UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624 - Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,
Optical characterization of non-stoichiometric silicon nitride films,
Physica Status Solidi C 5 (2008) 1320–1323 - Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
Physica Status Solidi C 5 (2008) 1324–1327 - Franta D., Ohlídal I., Nečas D.,
Optical quantities of rough films calculated by Rayleigh-Rice theory,
Physica Status Solidi C 5 (2008) 1395–1398 - Ohlídal I., Nečas D., Franta D., Buršíková V.,
Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
Diamond and Related Materials 18 (2009) 364–367 - Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898 - Franta D., Nečas D., Zajíčková L., Buršíková V.,
Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
Diamond and Related Materials 18 (2009) 413–418 - Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Modeling of dielectric response of GexSbyTez (GST) materials,
Physica Status Solidi C 6 (2009) S59–S62 - Nečas D., Ohlídal I., Franta D.,
The reflectance of non-uniform thin films,
Journal of Optics A: Pure and Applied Optics 11 (2009) 045202 - Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,
Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
Diamond and Related Materials 19 (2010) 114–122 - Zajíčková L., Kučerová Z., Franta D., Buršíková V., Peřina V., Macková A.,
Proc: Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane,
Proceedings of Organic/Inorganic Hybrid Materials, MRS (2008) 159-164
Cited Articles
-
Franta D., Ohlídal I., Frumar M., Jedelský J.,
Optical characterization of chalcogenide thin films,
Applied Surface Science 175–176 (2001) 555–561