Takashi Suzuki, Kazuhiko Omote, Yoshiyasu Ito, Ichiro Hirosawa, Yoshihiro Nakata, Iwao Sugiura, Noriyoshi Shimizu, Tomoji Nakamura
Small angle X-ray scattering measurements of porous low-k films using synchrotron radiation
Thin Solid Films 515 (2006) 2410–2414
Synchrotron radiation has been employed to analyze the difference in three representative kinds of spin on glass (SOG) films systematically based on a small angle X-ray scattering (SAXS) technique. The amount of scattering by pores in a SOG film of organic non-template type was found to be extremely smaller than that in low-k films of a template type. The pore size in the organic non-template type SOG film was estimated to be smaller than that of the template type low-k films. A position annihilation lifetime spectroscopy was also applied to confirm the SAXS results. It was found that the consideration of properties of specific low-k films and a scanning strategy in SAXS measurements were important for evaluating the pores of low-k films.
Cited Articles
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