Nicolas D. Boscher, Patrick Choquet, David Duday, Stephane Verdier

Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour

Surface and Coatings Technology 205 (2010) 2438-2448

Atmospheric pressure dielectric barrier discharge (AP-DBD) deposition of organosilicon thin films on aluminium foils was investigated over a range of discharge parameters. Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), Fourier Transform Infrared Spectroscopy (FTIR) and X-ray Photoelectron Spectroscopy (XPS) analyses showed how variations of the plasma gas composition and deposition conditions affect the composition, structure and morphology of the films. The corrosion behaviour of the films was characterised by electrochemical techniques. Relationships between the deposition parameters, film chemistry and electrochemical properties of these films are reported. (C) 2010 Elsevier B.V. All rights reserved.

This article may also be available to you online

Cited Articles

1. Bousquet A., Buršíková V., Goullet A., Djouadi A., Zajíčková L., Granier A.,
   Comparison of Structure and Mechanical Properties of SiO2-Like Films Deposited in O-2/HMDSO Pulsed and Continuous Plasmas,
   Surface and Coatings Technology 200 (2006) 6517–6521
2. Bousquet A., Buršíková V., Goullet A., Djouadi A., Zajíčková L., Granier A.,
   Comparison of Structure and Mechanical Properties of SiO2-Like Films Deposited in O-2/HMDSO Pulsed and Continuous Plasmas,
   Surface and Coatings Technology 200 (2006) 6517–6521
3. Trunec D., Navrátil Z., Sťahel P., Zajíčková L., Buršíková V.,
   Deposition of Thin Organosilicon Polymer Films in Atmospheric Pressure Glow Discharge,
   Journal of Physics D 37 (2004) 2112–2120