Publications of Ivan Ohlídal
Journal articles with impact factor: 2024, 2023, 2021, 2020, 2019, 2018, 2017, 2016, 2015, 2014, 2013, 2011, 2009, 2008, 2007, 2006, 2005, 2004, 2003, 2002, 2001, 2000, 1999, 1998, 1996, 1995, 1994, 1993, 1992, 1991, 1990, 1989, 1988, 1987, 1986, 1985, 1984, 1982, 1981, 1980, 1979, 1977, 1976, 1974, 1973, 1972, 1971
Journal articles without impact factor: 2009, 2008, 2007, 2005, 2004, 2003, 2002, 2001, 1999, 1998
Conference proceedings available from ISI Web of Science: 2016, 2015
Conference proceedings not available from ISI Web of Science: 2009, 2005, 2004, 2003, 2001, 2000, 1999, 1998, 1997, 1996, 1995
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Articles in journals with impact factor
2024
165. D. Franta, B. Hroncová, J. Dvořák, J. Vohánka, P. Franta, I. Ohlídal, V. Pekař, D. Skoda,Wide spectral range optical characterization of niobium pentoxide (Nb2O5) films by universal dispersion model,
Optical Materials 157 (2024) 116133
2023
164. D. Franta, J. Vohánka, J. Dvořák, P. Franta, I. Ohlídal, P. Klapetek, J. Březina, D. Skoda,Optical Characterization of Gadolinium Fluoride Films Using Universal Dispersion Model,
Coatings 13(2) (2023) 218
2021
163. I. Ohlídal, J. Vohánka, M. Čermák,Optics of Inhomogeneous Thin Films with Defects: Application to Optical Characterization,
Coatings 11(22) (2021) 31
2020
162. I. Ohlídal, J. Vohánka, V. Buršíková, D. Franta, M. Čermák,Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers,
Optics Express 28 (2020) 160-174
161. J. Vohánka, D. Franta, M. Čermák, V. Homola, V. Buršíková, I. Ohlídal,
Ellipsometric characterization of highly non-uniform thin films with the shape of thickness non-uniformity modeled by polynomials,
Optics Express 28 (2020) 5492-5506
160. M. Čermák, J. Vohánka, D. Franta, I. Ohlídal,
Optical quantities of a multilayer system with randomly rough boundaries and uniaxial anisotropic media calculated using the Rayleigh–Rice theory and Yeh matrix formalism,
Physica Scripta 95 (2020) 095503
159. J. Vohánka, Š. Šustek, V. Buršíková, V. Šklíbová, V. Šulc, V. Homola, D. Franta, M. Čermák, M. Ohlídal, I. Ohlídal,
Determining shape of thickness non-uniformity using variable-angle spectroscopic ellipsometry,
Applied Surface Science 534 (2020) 147625
158. I. Ohlídal, J. Vohánka, V. Buršíková, V. Šulc, Š. Šustek, M. Ohlídal,
Ellipsometric characterization of inhomogeneous thin films with complicated thickness non-uniformity: application to inhomogeneous polymer-like thin films,
Optics Express 28 (2020) 36796-36811
2019
157. D. Franta, J. Vohánka, M. Čermák, P. Franta, I. Ohlídal,Temperature dependent dispersion models applicable in solid state physics,
Journal Of Electrical Engineering 70 (2019) 1-15
156. I. Ohlídal, J. Vohánka, D. Franta, M. Čermák, J. Ženíšek, P. Vasina,
Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films,
Journal Of Electrical Engineering 70 (2019) 16-26
155. J. Vohánka, M. Čermák, D. Franta, I. Ohlídal,
Efficient method to calculate the optical quantities of multi-layer systems with randomly rough boundaries using the Rayleigh–Rice theory,
Physica Scripta 94 (2019) 045502
154. J. Vohánka, I. Ohlídal, M. Ohlídal, Š. Šustek, M. Čermák, V. Šulc, P. Vasina, J. Ženíšek, D. Franta,
Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects,
Coatings 9(7) (2019) 416
153. D. Franta, J. Vohánka, M. Bránecký, P. Franta, M. Čermák, I. Ohlídal, V. Čech,
Optical Properties of the Crystalline Silicon Wafers Described Using the Universal Dispersion Model,
Journal of Vacuum Science & Technology B 37 (2019) 062907
152. I. Ohlídal, J. Vohánka, M. Čermák, D. Franta,
Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers,
Surface Topography: Metrology and Properties 7(4) (2019) 045004
151. I. Ohlídal, J. Vohánka, V. Buršíková, J. Ženíšek, P. Vasina, M. Čermák, D. Franta,
Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model,
Journal of Vacuum Science & Technology B 37(6) (2019) 062921
150. I. Ohlídal, J. Vohánka, J. Mistrík, M. Čermák, F. Vižďa, D. Franta,
Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model,
Thin Solid Films 692 (2019) 137189
2018
149. D. Franta, P. Franta, J. Vohánka, M. Čermák, I. Ohlídal,Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region,
Journal of Applied Physics 123 (2018) 185707
148. M. Čermák, J. Vohánka, I. Ohlídal, D. Franta,
Optical quantities of multi-layer systems with randomly rough boundaries calculated using the exact approach of the Rayleigh–Rice theory,
Journal of Modern Optics 65(14) (2018) 1720-1736
147. I. Ohlídal, J. Vohánka, J. Mistrík, M. Čermák, D. Franta,
Different theoretical approaches at optical characterization of randomly rough silicon surfaces covered with native oxide layers,
Surface and Interface Analysis 50 (2018) 1230-1233
146. J. Vohánka, I. Ohlídal, J. Ženíšek, P. Vasina, M. Čermák, D. Franta,
Use of the Richardson extrapolation in optics of inhomogeneous layers: application to optical characterization,
Surface and Interface Analysis 50(7) (2018) 757-765
2017
145. I. Ohlídal, D. Franta, D. Nečas,Ellipsometric and reflectometric characterization of thin films exhibiting thickness non-uniformity and boundary roughness,
Applied Surface Science 421 (2017) 687-696
144. D. Franta, D. Nečas, A. Giglia, P. Franta, I. Ohlídal,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to magnesium fluoride,
Applied Surface Science 421 (2017) 424-429
143. J. Vodák, D. Nečas, M. Ohlídal, I. Ohlídal,
Determination of local thickness values of non-uniform thin films by imaging spectroscopic reflectometer with enhanced spatial resolution,
Measurement Science and Technology 28 (2017) 025205
142. D. Franta, M. Kotilainen, R. Krumpolec, I. Ohlídal,
Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry,
Applied Surface Science 421 (2017) 420-423
141. D. Franta, A. Dubroka, C. Wang, A. Giglia, J. Vohánka, P. Franta, I. Ohlídal,
Temperature-dependent dispersion model of float zone crystalline silicon,
Applied Surface Science 421 (2017) 405-419
140. D. Franta, M. Čermák, J. Vohánka, I. Ohlídal,
Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
Thin Solid Films 631 (2017) 12-22
139. I. Ohlídal, J. Vohánka, M. Čermák, D. Franta,
Optical characterization of randomly microrough surfaces covered with very thin overlayers using effective medium approximation and Rayleigh-Rice theory,
Applied Surface Science 419 (2017) 942-956
2016
138. D. Nečas, I. Ohlídal, D. Franta, M. Ohlídal, J. Vodák,Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry,
Journal of Optics 18 (2016) 015401
137. T. Siefke, S. Kroker, K. Pfeiffer, O. Puffky, K. Dietrich, D. Franta, I. Ohlídal, A. Szeghalmi, E. Kley, A. Tünnermann,
Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range,
Advanced Optical Materials 4 (2016) 1780-1786
2015
136. D. Nečas, J. Vodák, I. Ohlídal, M. Ohlídal, A. Majumdar, L. Zajíčková,Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry,
Applied Surface Science 350 (2015) 149-155
135. D. Franta, D. Nečas, I. Ohlídal,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia,
Applied Optics 54 (2015) 9108-9119 (1× cited)
2014
134. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal,Broadening of dielectric response and sum rule conservation,
Thin Solid Films 571 (2014) 496-501
133. D. Nečas, I. Ohlídal, D. Franta, V. Čudek, M. Ohlídal, J. Vodák, L. Sládková, L. Zajíčková, M. Eliáš, F. Vižďa,
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry,
Thin Solid Films 571 (2014) 573-578
132. D. Nečas, I. Ohlídal,
Consolidated series for efficient calculation of the reflection and transmission in rough multilayers,
Optics Express 22(4) (2014) 4499-4515
131. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal,
Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen,
Thin Solid Films 571 (2014) 490-495
130. I. Ohlídal, D. Franta, D. Nečas,
Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
Thin Solid Films 571 (2014) 695-700
129. D. Nečas, I. Ohlídal, D. Franta, M. Ohlídal, V. Čudek, J. Vodák,
Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films,
Applied Optics 53 (2014) 5606-5614
128. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal,
Dispersion model of two-phonon absorption: application to c-Si,
Optical Materials Express 4 (2014) 1641-1656
2013
127. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, J. Stuchlík, D. Chvostová,Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
Thin Solid Films 539 (2013) 233-244 (1× cited)
126. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, J. Stuchlík,
Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
Thin Solid Films 541 (2013) 12-16
125. D. Nečas, D. Franta, I. Ohlídal, A. Poruba, P. Wostrý,
Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
Surface and Interface Analysis 45 (2013) 1188-1192
2011
124. D. Franta, D. Nečas, I. Ohlídal,Anisotropy-enhanced depolarization on transparent film/substrate system,
Thin Solid Films 519 (2011) 2637-2640
123. D. Nečas, D. Franta, V. Buršíková, I. Ohlídal,
Ellipsometric characterisation of thin films non-uniform in thickness,
Thin Solid Films 519 (2011) 2715-2717 (1× cited)
122. I. Ohlídal, M. Ohlídal, D. Nečas, D. Franta, V. Buršíková,
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
Thin Solid Films 519 (2011) 2874-2876 (1× cited)
121. D. Franta, I. Ohlídal, D. Nečas, F. Vižďa, O. Caha, M. Hasoň, P. Pokorný,
Optical characterization of HfO2 thin films,
Thin Solid Films 519 (2011) 6085-6091 (1× cited)
120. D. Nečas, I. Ohlídal, D. Franta,
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
Journal of Optics 13(8) (2011) 085705 (2× cited)
119. M. Ohlídal, I. Ohlídal, P. Klapetek, D. Nečas, A. Majumdar,
Measurement of the thickness distribution and optical constants of non-uniform thin films ,
Measurement Science and Technology 22(8) (2011) 085104
2009
118. I. Ohlídal, D. Nečas, D. Franta, V. Buršíková,Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
Diamond and Related Materials 18 (2009) 364–367 (5× cited)
117. M. Ohlídal, I. Ohlídal, P. Klapetek, D. Nečas, V. Buršíková,
Application of spectroscopic imaging reflectometry to analysis of area non-uniformity in diamond-like carbon films,
Diamond and Related Materials 18 (2009) 384–387
116. D. Franta, D. Nečas, I. Ohlídal, M. Hrdlička, M. Pavlišta, M. Frumar, M. Ohlídal,
Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
Journal of Optoelectronics and Advanced Materials 11 (2009) 1891–1898 (1× cited)
115. D. Nečas, I. Ohlídal, D. Franta,
The reflectance of non-uniform thin films,
Journal of Optics A: Pure and Applied Optics 11 (2009) 045202 (6× cited)
2008
114. I. Ohlídal, D. Nečas, V. Buršíková, D. Franta, M. Ohlídal,Optical characterization of diamond-like carbon thin films non-uniform in thickness using spectroscopic reflectometry,
Diamond and Related Materials 17 (2008) 709–712 (1× cited)
113. M. Valtr, P. Klapetek, V. Buršíková, I. Ohlídal, D. Franta,
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge,
Chemické listy 102 (2008) s1529–s1532
112. I. Ohlídal, D. Nečas,
Influence of shadowing on ellipsometric quantities of randomly rough surfaces and thin films,
Journal of Modern Optics 55 (2008) 1077–1099
111. D. Franta, I. Ohlídal, D. Nečas,
Influence of cross-correlation effects on the optical quantities of rough films,
Optics Express 16 (2008) 7789–7803 (6× cited)
2007
110. D. Franta, V. Buršíková, I. Ohlídal, P. Sťahel, M. Ohlídal, D. Nečas,Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
Diamond and Related Materials 16 (2007) 1331–1335 (6× cited)
109. P. Klapetek, I. Ohlídal, J. Buršík,
Atomic force microscopy studies of cross-sections of columnar thin films,
Measurement Science and Technology 18 (2007) 528–531
2006
108. M. Valtr, I. Ohlídal, D. Franta,Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
Czechoslovak Journal of Physics 56 (2006) B1103–B1109
107. I. Ohlídal, D. Franta, M. Šiler, F. Vižďa, M. Frumar, J. Jedelský, J. Omasta,
Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
Journal of Non-Crystalline Solids 352 (2006) 5633–5641 (4× cited)
106. D. Franta, I. Ohlídal,
Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
Journal of Optics A: Pure and Applied Optics 8 (2006) 763–774 (13× cited)
105. P. Klapetek, I. Ohlídal, J. Buršík,
Applications of scanning thermal microscopy in the analysis of the geometry of patterned structures,
Surface and Interface Analysis 38 (2006) 383–387
104. D. Franta, I. Ohlídal, P. Klapetek, R. Nepustilová, S. Bajer,
Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 38 (2006) 842–846 (1× cited)
2005
103. I. Ohlídal, D. Franta, P. Klapetek,Combination of optical methods and atomic force microscopy at characterization of thin film systems,
Acta Physica Slovaca 55 (2005) 271–294 (1× cited)
102. P. Klapetek, I. Ohlídal,
Applications of the wavelet transform in AFM data analysis,
Acta Physica Slovaca 55 (2005) 295–303
101. R. Antoš, I. Ohlídal, D. Franta, P. Klapetek, J. Mistrík, T. Yamaguchi, Š. Višňovský,
Spectroscopic ellipsometry of sinusoidal surface-relief gratings,
Applied Surface Science 244 (2005) 221–224 (2× cited)
100. R. Antoš, I. Ohlídal, J. Mistrík, K. Murakami, T. Yamaguchi, J. Pištora, M. Horie, Š. Višňovský,
Spectroscopic ellipsometry on lamellar gratings,
Applied Surface Science 244 (2005) 225–229 (1× cited)
99. D. Franta, I. Ohlídal, J. Mistrík, T. Yamaguchi, G. Hu, N. Dai,
Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
Applied Surface Science 244 (2005) 338–342 (3× cited)
98. D. Franta, B. Negulescu, L. Thomas, P. Dahoo, M. Guyot, I. Ohlídal, J. Mistrík, T. Yamaguchi,
Optical properties of NiO thin films prepared by pulsed laser deposition technique,
Applied Surface Science 244 (2005) 426–430 (19× cited)
97. J. Mistrík, T. Yamaguchi, D. Franta, I. Ohlídal, G. Hu, N. Dai,
Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
Applied Surface Science 244 (2005) 431–434 (10× cited)
96. J. Mistrík, I. Ohlídal, R. Antoš, M. Aoyama, T. Yamaguchi,
Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films,
Applied Surface Science 244 (2005) 51–54 (1× cited)
95. D. Franta, V. Buršíková, I. Ohlídal, L. Zajíčková, P. Sťahel,
Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
Diamond and Related Materials 14 (2005) 1795–1798 (10× cited)
94. I. Ohlídal, M. Ohlídal, D. Franta, V. Čudek, V. Buršíková, P. Klapetek, K. Páleníková,
Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
Diamond and Related Materials 14 (2005) 1835–1838 (5× cited)
93. R. Antoš, J. Pištora, I. Ohlídal, K. Postava, J. Mistrík, T. Yamaguchi, Š. Višňovský, M. Horie,
Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate,
Journal of Applied Physics 97 (2005) 053107
92. M. Šiler, I. Ohlídal, D. Franta, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Sitter,
Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
Journal of Modern Optics 52 (2005) 583–602 (1× cited)
91. D. Franta, I. Ohlídal,
Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
Optics Communications 248 (2005) 459–467 (31× cited)
90. D. Franta, I. Ohlídal, D. Petrýdes,
Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
Vacuum 80 (2005) 159–162 (12× cited)
89. P. Klapetek, I. Ohlídal, A. Montaigne-Ramil, A. Bonanni, H. Sitter,
Atomic force microscopy analysis of morphology of the upper boundaries of GaN thin films prepared by MOCVD,
Vacuum 80 (2005) 53–57 (2× cited)
2004
88. P. Klapetek, I. Ohlídal, K. Navrátil,Atomic force microscopy analysis of statistical roughness of GaAs surfaces originated by thermal oxidation,
Microchimica Acta 147 (2004) 175–180 (5× cited)
87. D. Franta, I. Ohlídal, P. Klapetek, M. Ohlídal,
Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
Surface and Interface Analysis 36 (2004) 1203–1206 (3× cited)
86. D. Franta, I. Ohlídal, V. Buršíková, L. Zajíčková,
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 393–398 (20× cited)
85. D. Franta, I. Ohlídal, P. Klapetek, P. Roca i Cabarrocas,
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 399–403 (12× cited)
84. D. Franta, I. Ohlídal, P. Klapetek, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Sitter,
Optical properties of ZnTe films prepared by molecular beam epitaxy,
Thin Solid Films 468 (2004) 193–202 (11× cited)
83. P. Klapetek, I. Ohlídal, J. Bílek,
Influence of the atomic force microscope tip on the multifractal analysis of rough surfaces,
Ultramicroscopy 102 (2004) 51–59 (1× cited)
2003
82. P. Klapetek, I. Ohlídal, D. Franta, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Sitter,Atomic force microscopy characterization of ZnTe epitaxial films,
Acta Physica Slovaca 53 (2003) 223–230 (5× cited)
81. D. Franta, L. Zajíčková, V. Buršíková, I. Ohlídal,
New dispersion model of the optical constants of the DLC films,
Acta Physica Slovaca 53 (2003) 373–384 (13× cited)
80. D. Franta, I. Ohlídal, P. Klapetek, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Sitter,
Optical constants of ZnTe and ZnSe epitaxial thin films,
Acta Physica Slovaca 53 (2003) 95–104 (2× cited)
79. D. Franta, I. Ohlídal, M. Frumar, J. Jedelský,
Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
Applied Surface Science 212–213 (2003) 116–121 (23× cited)
78. D. Franta, I. Ohlídal, V. Buršíková, L. Zajíčková,
Optical properties of diamond-like carbon films containing SiOx,
Diamond and Related Materials 12 (2003) 1532–1538 (16× cited)
77. P. Klapetek, I. Ohlídal, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Sitter,
Atomic force microscopy characterization of ZnTe epitaxial thin films,
Japanese Journal of Applied Physics 42 (2003) 4706–4709 (1× cited)
76. M. Ohlídal, I. Ohlídal, P. Klapetek, M. Jákl, V. Čudek, M. Eliáš,
New method for the complete optical analysis of thin films nonuniform in optical parameters,
Japanese Journal of Applied Physics 42 (2003) 4760–4763 (1× cited)
75. P. Klapetek, I. Ohlídal,
Theoretical analysis of the atomic force microscopy characterization of columnar thin films,
Ultramicroscopy 94 (2003) 19–29 (9× cited)
2002
74. D. Franta, L. Zajíčková, I. Ohlídal, J. Janča, K. Veltruská,Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
Diamond and Related Materials 11 (2002) 105–117 (21× cited)
73. D. Franta, I. Ohlídal, P. Klapetek, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Sitter,
Influence of overlayers on determination of the optical constants of ZnSe thin films,
Journal of Applied Physics 92 (2002) 1873–1880 (7× cited)
72. P. Klapetek, I. Ohlídal, D. Franta, P. Pokorný,
Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
Surface and Interface Analysis 33 (2002) 559–564 (2× cited)
71. M. Ohlídal, I. Ohlídal, D. Franta, T. Králík, M. Jákl, M. Eliáš,
Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
Surface and Interface Analysis 34 (2002) 660–663 (2× cited)
70. D. Franta, I. Ohlídal, P. Klapetek, P. Pokorný,
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
Surface and Interface Analysis 34 (2002) 759–762 (11× cited)
2001
69. I. Ohlídal, D. Franta, M. Ohlídal, K. Navrátil,Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
Applied Optics 40 (2001) 5711–5717 (4× cited)
68. D. Franta, I. Ohlídal, M. Frumar, J. Jedelský,
Optical characterization of chalcogenide thin films,
Applied Surface Science 175–176 (2001) 555–561 (15× cited)
67. I. Ohlídal, D. Franta, M. Frumar, J. Jedelský, K. Navrátil,
Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
Journal of Optoelectronics and Advanced Materials 3 (2001) 873–878 (4× cited)
66. D. Franta, I. Ohlídal, P. Klapetek, P. Pokorný, M. Ohlídal,
Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
Surface and Interface Analysis 32 (2001) 91–94 (3× cited)
65. D. Franta, L. Zajíčková, I. Ohlídal, J. Janča,
Optical characterization of diamond-like carbon films,
Vacuum 61 (2001) 279–283 (3× cited)
64. I. Ohlídal, D. Franta, M. Ohlídal, K. Navrátil,
Determination of thicknesses and spectral dependences of refractive indices of non-absorbing and weakly absorbing thin films using the wavelengths related to extrema in spectral reflectances,
Vacuum 61 (2001) 285–289
2000
63. D. Franta, I. Ohlídal,Analysis of thin films by optical multi-sample methods,
Acta Physica Slovaca 50 (2000) 411–421 (15× cited)
62. I. Ohlídal, D. Franta,
Matrix formalism for imperfect thin films,
Acta Physica Slovaca 50 (2000) 489–500 (18× cited)
61. D. Franta, I. Ohlídal, P. Klapetek,
Analysis of slightly rough thin films by optical methods and AFM,
Mikrochimica Acta 132 (2000) 443–447 (30× cited)
60. D. Franta, I. Ohlídal,
Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
Surface and Interface Analysis 30 (2000) 574–579 (17× cited)
59. R. Pavelka, I. Ohlídal, J. Hlávka, D. Franta, H. Sitter,
Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
Thin Solid Films 366 (2000) 43–50
58. I. Ohlídal, D. Franta,
Ellipsometry of thin film systems,
Progress in Optics 41 (2000) 181-282 (44× cited)
1999
57. I. Ohlídal, F. Vižďa,Optical quantities of multilayer systems with correlated randomly rough boundaries,
Journal of Modern Optics 46 (1999) 2043–2062 (1× cited)
56. M. Ohlídal, M. Unčovský, I. Ohlídal, D. Franta,
Determination of the basic parameters characterizing the roughness of metal surfaces by laser light scattering,
Journal of Modern Optics 46 (1999) 279–293 (2× cited)
55. I. Ohlídal, D. Franta, E. Pinčík, M. Ohlídal,
Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Surface and Interface Analysis 28 (1999) 240–244 (19× cited)
54. D. Franta, I. Ohlídal, D. Munzar, J. Hora, K. Navrátil, C. Manfredotti, F. Fizzotti, E. Vittone,
Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 343–344 (1999) 295–298 (6× cited)
1998
53. R. Pavelka, J. Hlávka, I. Ohlídal, H. Sitter,Optical parameter analysis of thin absorbing films measured by the photovoltage method,
Acta Physica Polonica A 94 (1998) 468–472 (1× cited)
52. D. Franta, I. Ohlídal, D. Munzar,
Parameterisation of the model of dispersion dependences of solid state optical constants,
Acta Physica Slovaca 48 (1998) 451–458 (10× cited)
51. I. Ohlídal, D. Franta,
Ellipsometry of Thin Films,
Acta Physica Slovaca 48 (1998) 459–468 (2× cited)
50. D. Franta, I. Ohlídal,
Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
Journal of Modern Optics 45 (1998) 903–934 (53× cited)
49. I. Ohlídal, D. Franta, J. Hora, K. Navrátil, J. Weber, P. Janda,
Analysis of thin films with slightly rough boundaries,
Mikrochimica Acta 15 (1998) 177–180 (1× cited)
48. D. Franta, I. Ohlídal,
Statistical properties of the near-field speckle patterns of thin films with slightly rough boundaries,
Optics Communications 147 (1998) 349–358 (4× cited)
1996
47. J. Hlávka, I. Ohlídal, F. Vižďa, H. Sitter,New technique of measurement of optical parameters of thin films,
Thin Solid Films 279 (1996) 209–212 (1× cited)
46. L. Zajíčková, I. Ohlídal, J. Janča,
Plasma-Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses,
Thin Solid Films 280 (1996) 26–36 (10× cited)
1995
45. I. Ohlídal, F. Vižďa, M. Ohlídal,Optical analysis by means of spectroscopic reflectometry of single and double layers with correlated randomly rough boundaries,
Optical Engineering 34 (1995) 1761–1768 (10× cited)
44. M. Ohlídal, I. Ohlídal, M. Druckmüller, D. Franta,
A method of shearing interferometry for determining the statistical quantities of randomly rough surfaces of solids,
Pure and Applied Optics 4 (1995) 599–616
1994
43. I. Ohlídal, K. Navrátil, M. Ohlídal, M. Druckmüller,Characterization of the basic statistical properties of very rough surfaces of transparent solids by immersion shearing interferometry,
Applied Optics 33 (1994) 7838–7845 (1× cited)
1993
42. I. Ohlídal,Approximate formulas for the reflectance, transmittance, and scattering losses of nonabsorbing multilayer systems with randomly rough boundaries,
Journal of the Optical Society of America A 10 (1993) 158–171 (1× cited)
41. V. Holý, J. Kuběna, I. Ohlídal, K. Lischka, W. Plotz,
X-ray reflection from rough layered systems,
Physical Review B 47 (1993) 15896–15903 (20× cited)
1992
40. J. Musilová, I. Ohlídal,Influence of defects of thin films on determining their thickness by the method based on white light interference,
Journal of Physics D 25 (1992) 1131–1138
39. P. Strelec, I. Ohlídal, E. Schmidt,
Colour properties of detuned alternating multilayer systems,
Journal of Physics D 25 (1992) 297–302
38. V. Holý, J. Kuběna, I. Ohlídal, K. Ploog,
The diffuse X-ray scattering in real periodical superlattices,
Superlattices and Microstructures 12 (1992) 25–35
1991
37. I. Ohlídal, M. Líbezný,Ellipsometric analysis of gallium arsenide surfaces,
Surface and Interface Analysis 17 (1991) 171–176 (3× cited)
1990
36. I. Ohlídal, E. Schmidt, M. Líbezný,Complete unambiguous optical characterization of double layers consisting of two strongly absorbing thin films by combined reflection and transmission ellipsometry,
Applied Optics 29 (1990) 593–598 (1× cited)
35. J. Musilová, I. Ohlídal,
Possibilities and limitations of the film thickness determination method based on white light interference,
Journal of Physics D 23 (1990) 1227–1238
34. I. Ohlídal, M. Líbezný,
Immersion ellipsometry of semiconductor surfaces,
Surface and Interface Analysis 16 (1990) 46–53 (2× cited)
33. P. Ponížil, I. Ohlídal, J. Janča,
Optical properties of diamond-like carbon films,
Thin Solid Films 190 (1990) 65–72
1989
32. I. Ohlídal,Reflectance of multilayer systems with randomly rough boundaries,
Optics Communications 71 (1989) 323–326
31. I. Ohlídal, E. Schmidt, M. Líbezný, V. Tvarožek, I. Novotný,
Ellipsometric analysis of thin NiCr films,
Thin Solid Films 169 (1989) 213–222 (1× cited)
1988
30. I. Ohlídal, F. Lukeš,Analysis of semiconductor surfaces with very thin native oxide layers by combined immersion and multiple angle of incidence ellipsometry,
Applied Surface Science 35 (1988) 259–273 (2× cited)
29. I. Ohlídal,
General Formulae for the Optical Characterization of Single Layers with Spectroscopic Reflectometry,
Journal of Modern Optics 35 (1988) 1373–1381 (1× cited)
28. I. Ohlídal,
Immersion spectroscopic reflectometry of multilayer systems. I. Theory,
Journal of the Optical Society of America A 5 (1988) 459–464
27. I. Ohlídal,
Immersion spectroscopic reflectometry of multilayer systems. II. Experimental results,
Journal of the Optical Society of America A 5 (1988) 465–470
26. I. Ohlídal, K. Navrátil,
Simple method of spectroscopic reflectometry for the complete optical analysis of weakly absorbing thin films: Application to silicon films,
Thin Solid Films 156 (1988) 181–189 (1× cited)
25. I. Ohlídal,
Optical analysis of inhomogeneous weakly absorbing thin films by spectroscopic reflectometry: Application to carbon films,
Thin Solid Films 162 (1988) 101–109 (2× cited)
1987
24. I. Ohlídal, K. Navrátil,Complete optical analysis of a non-absorbing thin film on an absorbing substrate by a new method of immersion spectroscopic reflectometry,
Thin Solid Films 148 (1987) 17–27 (1× cited)
1986
23. A. Paneva, I. Ohlídal,Multiple angle of incidence ellipsometric analysis of non-absorbing two-layer and three-layer systems,
Thin Solid Films 145 (1986) 23–37 (1× cited)
1985
22. I. Ohlídal, K. Navrátil,Analysis of the basic statistical properties of randomly rough curved surfaces by shearing interferometry,
Applied Optics 24 (1985) 2690–2695 (1× cited)
21. I. Ohlídal,
Influence of Surface Roughness on Radiation from Parabolic Mirror Collimators with Cylindrical Symmetry in the Fraunhofer Region,
Optica Acta 32 (1985) 27–37
20. I. Ohlídal, K. Navrátil, J. Musilová,
A new method for the complete optical analysis of weakly absorbing thin films: Application to polycrystalline silicon films,
Thin Solid Films 127 (1985) 191–203
1984
19. I. Ohlídal, F. Lukeš,Optical analysis of absorbing double layers by combined reflection and transmission ellipsometry,
Thin Solid Films 115 (1984) 269–282 (1× cited)
1982
18. I. Ohlídal, K. Navrátil, E. Schmidt,Simple Method for the Complete Optical Analysis of Very Thick and Weakly Absorbing Films,
Applied Physics A 29 (1982) 157–162
1981
17. I. Ohlídal, F. Lukeš,Optical analysis of thin gold films by combined reflection and transmission ellipsometry,
Thin Solid Films 85 (1981) 181–190 (1× cited)
1980
16. I. Ohlídal,Expression for the reflectance of randomly rough surfaces derived with the Fresnel approximation,
Applied Optics 19 (1980) 1804–1811
15. I. Ohlídal, K. Navrátil,
Optical analysis of non-absorbing double layers by means of immersion reflectometry I: Liquid immersion method,
Thin Solid Films 67 (1980) 245–251
14. I. Ohlídal, K. Navrátil,
Optical analysis of non-absorbing double layers by means of immersion reflectometry II: Solid state immersion method,
Thin Solid Films 71 (1980) 91–102
13. I. Ohlídal, K. Navrátil,
Determination of the optical parameters and packing density of non-absorbing columnar thin films by means of immersion reflectometry: Application to LiF thin films,
Thin Solid Films 74 (1980) 51–58 (1× cited)
1979
12. K. Navrátil, I. Ohlídal, F. Lukeš,The physical structure of the interface between single-crystal GaAs and its oxide film,
Thin Solid Films 56 (1979) 163–171 (2× cited)
11. I. Ohlídal, K. Navrátil, F. Lukeš,
The optical analysis of non-absorbing thin films with randomly rough boundaries by means of immersion spectrophotometry,
Thin Solid Films 57 (1979) 179–184
1977
10. K. Navrátil, I. Ohlídal, F. Lukeš,A model of oxide film originating at thermal oxidation of GaAs,
Czechoslovak Journal of Physics 27 (1977) 672–681
9. I. Ohlídal, K. Navrátil,
Method for determining the refractive index and thickness of a non-absorbing thin film with randomly rough boundaries,
Thin Solid Films 44 (1977) 313–321
1976
8. M. Ohlídal, I. Ohlídal, F. Lukeš,Ellipsometric studies of polished silicon surfaces,
Surface Science 55 (1976) 467–476
7. I. Ohlídal, K. Navrátil,
Influence of the properties of thin films on the determination of the relative reflectance of a randomly rough surface,
Thin Solid Films 31 (1976) 223–234
1974
6. I. Ohlídal, F. Lukeš, K. Navrátil,Rough silicon surfaces studied by optical methods,
Surface Science 45 (1974) 91–116 (5× cited)
1973
5. I. Ohlídal, F. Lukeš,Calculation of the Ellipsometric Parameters Characterizing a Randomly Rough Surface by Means of The Stratton-Chu-Silver Integral,
Optics Communications 7 (1973) 76–79 (1× cited)
1972
4. I. Ohlídal, F. Lukeš,Ellipsometric Parameters of Rough Surfaces and of a System Substrate-Thin Film with Rough Boundaries,
Optica Acta 19 (1972) 817–843 (5× cited)
3. I. Ohlídal, F. Lukeš,
Ellipsometric parameters of randomly rough surfaces,
Optics Communications 5(5) (1972) 323-326 (2× cited)
1971
2. I. Ohlídal, K. Navrátil, F. Lukeš,Reflection of Light by a System of Nonabsorbing Isotropic Film-Nonabsorbing Isotropic Substrate with Randomly Rough Boundaries,
Journal of the Optical Society of America 61 (1971) 1630–1639 (8× cited)
1. I. Ohlídal, K. Navrátil, F. Lukeš,
Reflection of light on a system of non-absorbing isotropic film - non-absorbing isotropic substrate with rough boundaries,
Optics Communications 3 (1971) 40–44 (1× cited)
Articles in journals without impact factor
2009
15. M. Ohlídal, I. Ohlídal, D. Nečas, P. Klapetek,Complete Optical Characterization of Non-Uniform SiOx Thin Films Using Imaging Spectroscopic Reflectometry,
e-Journal of Surface Science and Nanotechnology 7 (2009) 409–412
14. D. Franta, I. Ohlídal, V. Buršíková, L. Zajíčková,
Modeling of dielectric response of GexSbyTez (GST) materials,
Physica Status Solidi C 6 (2009) S59–S62 (2× cited)
2008
13. D. Nečas, V. Peřina, D. Franta, I. Ohlídal, J. Zemek,Optical characterization of non-stoichiometric silicon nitride films,
Physica Status Solidi C 5 (2008) 1320–1323
12. D. Franta, M. Hrdlička, D. Nečas, M. Frumar, I. Ohlídal, M. Pavlišta,
Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
Physica Status Solidi C 5 (2008) 1324–1327 (4× cited)
11. D. Franta, I. Ohlídal, D. Nečas,
Optical quantities of rough films calculated by Rayleigh-Rice theory,
Physica Status Solidi C 5 (2008) 1395–1398 (2× cited)
10. I. Ohlídal, D. Nečas, D. Franta,
Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
Physica Status Solidi C 5 (2008) 1399–1402
2007
9. M. Valtr, P. Klapetek, I. Ohlídal, D. Franta,UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624
2005
8. I. Ohlídal, M. Ohlídal, D. Franta, V. Čudek, V. Buršíková, M. Šiler,Měření mechanického napětí v tenkých vrstvách pomocí kombinované optické metody,
Jemná mechanika a optika 50 (2005) 72–75
2004
7. I. Ohlídal, D. Franta, M. Frumar, J. Jedelský, J. Omasta,Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
Chalcogenide Letters 1 (2004) 1–10 (18× cited)
2003
6. I. Ohlídal, P. Klapetek, D. Franta,Aplikace mikroskopie atomové síly při analýze tenkých vrstev ZnSe a ZnTe,
Československý časopis pro fyziku 53 (2003) 97–100
2002
5. P. Klapetek, I. Ohlídal, D. Franta,Applications of atomic force microscopy for thin film boundary measurements,
Jemná mechanika a optika 47 (2002) 195–199
2001
4. P. Klapetek, I. Ohlídal, D. Franta,Měření základních statistických veličin náhodné povrchové drsnosti pomocí mikroskopie atomové síly,
Československý časopis pro fyziku 51 (2001) 16–21
3. P. Klapetek, I. Ohlídal, D. Franta,
Vliv diskrétní Fourierovy transformace na zpracování AFM dat,
Československý časopis pro fyziku 51 (2001) 49–51
1999
2. I. Ohlídal, D. Franta, P. Klapetek, M. Vičar,Relationship between AFM and optical measurements at analyzing surface roughness,
Jemná mechanika a optika 44 (1999) 307–311
1998
1. I. Ohlídal, M. Ohlídal, D. Franta, M. Tykal, D. Pražák, A. Michálek,Srovnání výsledků měření drsnosti povrchu dosažených vybranými optickými metodami a metodou profilometrickou,
Jemná mechanika a optika 43 (1998) 130–136
Proceedings available from ISI Web of Science
2016
5. D. Franta, D. Nečas, I. Ohlídal, A. Giglia,Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range,
Photonics Europe 2016: Optical Micro- and Nanometrology VI , Photonics Europe 2016: Optical Micro- and Nanometrology VI, Brussels, Belgium 3 - 7 April 2016 (2016) 989014
2015
4. D. Nečas, I. Ohlídal, J. Vodák, M. Ohlídal, D. Franta,Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280C
3. D. Franta, D. Nečas, I. Ohlídal, A. Giglia,
Dispersion model for optical thin films applicable in wide spectral range,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96281U
2. M. Ohlídal, I. Ohlídal, D. Nečas, J. Vodák, D. Franta, P. Nádaský, F. Vižďa,
Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280R
1. D. Franta, D. Nečas, I. Ohlídal, J. Jankuj,
Wide spectral range characterization of antireflective coatings and their optimization,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280F
Proceedings not available from ISI Web of Science
2009
21. M. Ohlídal, I. Ohlídal, P. Klapetek, D. Nečas,PRECISE MEASUREMENT OF THICKNESS DISTRIBUTION OF NONUNIFORM THIN FILMS BY IMAGING SPECTROSCOPIC REFLECTOMETRY,
XIX IMEKO WORLD CONGRESS: FUNDAMENTAL AND APPLIED METROLOGY, PROCEEDINGS (2009) 100-105
20. F. Vižďa, I. Ohlídal, V. Hrubý,
Influence of Cross-Correlation of Rough Boundaries on Reflectance of Thin Films on GaAs and Si Substrates,
Physics of Semiconductors , 29th International Conference on Physics of Semiconductors, Rio de Janeiro, Brazil, July 27 - August 1, 2008 (2009) 19-20
2005
19. I. Ohlídal, M. Ohlídal, D. Franta, V. Čudek, V. Buršíková, P. Klapetek, M. Jákl,Optical measurement of mechanical stresses in diamond-like carbon films,
Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728
18. M. Ohlídal, V. Čudek, I. Ohlídal, P. Klapetek,
Optical characterization of non-uniform thin films using imaging spectrophotometry,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 596329
17. D. Franta, I. Ohlídal,
Characterization of optical thin films exhibiting defects,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 59632H
16. I. Ohlídal, D. Franta, P. Klapetek,
Měření nanodrsnosti pomocí optických metod a mikroskopie atomové síly,
Proceedings of Kvalita a GPS 2005 (2005) 131-139
15. I. Ohlídal, D. Franta, P. Klapetek,
Ellipsometry in characterization of thin films,
Proceedings of Solar Renewable Energy News (2005) 81-111
2004
14. I. Ohlídal, M. Ohlídal, D. Franta, V. Čudek, V. Buršíková, M. Šiler,Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147 (2× cited)
2003
13. D. Franta, I. Ohlídal, P. Klapetek, A. Montaigne-Ramil, A. Bonanni, D. Stifter, H. Stifter,Optical characterization of ZnSe thin films,
Proceedings of 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE , 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE (2003) 831-832
12. I. Ohlídal, M. Ohlídal, P. Klapetek, V. Čudek, M. Jákl,
Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry,
Proceedings of Wave-Optical Systems Engineering II, SPIE (2003) 260-271
11. I. Ohlídal, M. Ohlídal, P. Klapetek, V. Čudek, M. Jákl,
Characterization of thin films non-uniform in optical parameters by spectroscopic digital reflectometry,
WAVE-OPTICAL SYSTEMS ENGINEERING II (2003) 260-271
2001
10. D. Franta, I. Ohlídal,Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212 (1× cited)
9. P. Klapetek, D. Franta, I. Ohlídal,
Study of Thin Film Defects by Atomic Force Microscopy,
Proceedings of 5th Seminar on Quantitative Microscopy, PTB-Bericht , 5th Seminar on Quantitative Microscopy, PTB-Bericht (2001) 107-117
2000
8. I. Ohlídal, D. Franta, P. Klapetek,Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films,
Proceedings of 4th Seminar on Quantitative Microscopy, PTB-Bericht , 4th Seminar on Quantitative Microscopy, PTB-Bericht (2000) 124-131
1999
7. I. Ohlídal, M. Ohlídal, D. Franta, M. Tykal,Comparison of optical and non-optical methods for measuring surface roughness,
Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467
1998
6. I. Ohlídal, M. Ohlídal, D. Franta, M. Vičar, P. Klapetek,Comparison of AFM and optical methods at measuring nanometric surface roughness,
Proceedings of 3th Seminar on Quantitative Microscopy , 3th Seminar on Quantitative Microscopy (1998) 123–129
1997
5. I. Ohlídal, D. Franta, B. Rezek, M. Ohlídal,Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Proceedings of 7th European Conference on Applications of Surface and Interface Analysis , 7th European Conference on Applications of Surface and Interface Analysis (1997) 1051–1054
1996
4. D. Franta, I. Ohlídal, J. Hora, K. Navrátil,Spektroskopická elipsometrie slabě drsných povrchů,
Proceedings of 12. konference českých a slovenských fyziků , Proceedings of 12. konference českých a slovenských fyziků (1996) 482-485
3. I. Ohlídal, D. Franta, J. Hora,
Spectroscopic Ellipsometry of Slightly Rough Surfaces Covered by Layers,
Proceedings of 6th European Conference on Applications of Surface and Interface Analysis , 6th European Conference on Applications of Surface and Interface Analysis (1996) 823-826
2. M. Ohlídal, I. Ohlídal, D. Franta, A. Michálek,
Method of shearing interferometry for characterizing non-gaussian randomly rough surfaces,
Proceedings of Specification, Production, and Testing of Optical Components and Systems , Specification, Production, and Testing of Optical Components and Systems (1996) 442–451
1995
1. M. Ohlídal, I. Ohlídal, M. Druckmüller, D. Franta,Interferometry of Randomly Rough Surfaces,
Proceedings of Photonics '95 , Proceedings of Photonics '95 (1995) 109-111