Publications of Daniel Franta
Journal articles with impact factor: 2025, 2024, 2023, 2021, 2020, 2019, 2018, 2017, 2016, 2015, 2014, 2013, 2012, 2011, 2010, 2009, 2008, 2007, 2006, 2005, 2004, 2003, 2002, 2001, 2000, 1999, 1998, 1995
Journal articles without impact factor: 2018, 2009, 2008, 2007, 2005, 2004, 2003, 2002, 2001, 1999, 1998
Conference proceedings available from ISI Web of Science: 2016, 2015, 2010
Conference proceedings not available from ISI Web of Science: 2009, 2008, 2007, 2006, 2005, 2004, 2003, 2001, 2000, 1999, 1998, 1997, 1996, 1995
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Articles in journals with impact factor
2025
125. Franta D., Muresan M., Ondračka P., Hroncová B., Vižďa F.,Wide spectral range optical characterization of terbium gallium garnet (TGG) single crystal by universal dispersion model,
Opt. Laser Technol. 181 (2025) 111916
2024
124. Franta D., Hroncová B., Dvořák J., Vohánka J., Franta P., Ohlídal I., Pekař V., Skoda D.,Wide spectral range optical characterization of niobium pentoxide (Nb2O5) films by universal dispersion model,
Opt. Mater. 157 (2024) 116133
2023
123. Franta D., Vohánka J., Dvořák J., Franta P., Ohlídal I., Klapetek P., Březina J., Skoda D.,Optical Characterization of Gadolinium Fluoride Films Using Universal Dispersion Model,
Coatings 13(2) (2023) 218
122. Franta D., Vohánka J., Hroncová B.,
Dispersion models exhibiting natural optical activity: theory of dielectric response of isotropic systems,
J. Opt. Soc. Am. B 40 (2023) 2928-2941
121. Hroncová B., Franta D., Dvořák J., Pavliňák D.,
Dispersion models exhibiting natural optical activity: application to tartaric acid solutions,
J. Opt. Soc. Am. B 40 (2023) 3209-3220
2021
120. Franta D., Vohánka J.,Constitutive equations describing optical activity in theory of dispersion,
J. Opt. Soc. Am. B 38 (2021) 553-561
119. Franta D., Muresan M.,
Wide spectral range optical characterization of yttrium aluminum garnet (YAG) single crystal by universal dispersion model,
Opt. Mater. Express 11 (2021) 3930-3945
2020
118. Ohlídal I., Vohánka J., Buršíková V., Franta D., Čermák M.,Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers,
Opt. Express 28 (2020) 160-174
117. Franta D.,
Symmetry of Linear Dielectric Response Tensors: Dispersion Models Fulfilling Three Fundamental Conditions,
J. Appl. Phys. 127 (2020) 223101
116. Vohánka J., Franta D., Čermák M., Homola V., Buršíková V., Ohlídal I.,
Ellipsometric characterization of highly non-uniform thin films with the shape of thickness non-uniformity modeled by polynomials,
Opt. Express 28 (2020) 5492-5506
115. Čermák M., Vohánka J., Franta D., Ohlídal I.,
Optical quantities of a multilayer system with randomly rough boundaries and uniaxial anisotropic media calculated using the Rayleigh–Rice theory and Yeh matrix formalism,
Phys. Scr. 95 (2020) 095503
114. Vohánka J., Šustek Š., Buršíková V., Šklíbová V., Šulc V., Homola V., Franta D., Čermák M., Ohlídal M., Ohlídal I.,
Determining shape of thickness non-uniformity using variable-angle spectroscopic ellipsometry,
Appl. Surf. Sci. 534 (2020) 147625
2019
113. Franta D., Vohánka J., Čermák M., Franta P., Ohlídal I.,Temperature dependent dispersion models applicable in solid state physics,
J. Electr. Eng. 70 (2019) 1-15
112. Ohlídal I., Vohánka J., Franta D., Čermák M., Ženíšek J., Vasina P.,
Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films,
J. Electr. Eng. 70 (2019) 16-26
111. Vohánka J., Čermák M., Franta D., Ohlídal I.,
Efficient method to calculate the optical quantities of multi-layer systems with randomly rough boundaries using the Rayleigh–Rice theory,
Phys. Scr. 94 (2019) 045502
110. Vohánka J., Ohlídal I., Ohlídal M., Šustek Š., Čermák M., Šulc V., Vasina P., Ženíšek J., Franta D.,
Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects,
Coatings 9(7) (2019) 416
109. Franta D., Vohánka J., Bránecký M., Franta P., Čermák M., Ohlídal I., Čech V.,
Optical Properties of the Crystalline Silicon Wafers Described Using the Universal Dispersion Model,
J. Vac. Sci. Technol. B 37 (2019) 062907
108. Vohánka J., Nečas D., Franta D.,
Evaluation of the Dawson function and its antiderivative needed for the Gaussian broadening of piecewise polynomial functions,
J. Vac. Sci. Technol. B 37 (2019) 062909
107. Ohlídal I., Vohánka J., Čermák M., Franta D.,
Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers,
Surf. Topogr.-Metrol. Prop. 7(4) (2019) 045004
106. Ohlídal I., Vohánka J., Buršíková V., Ženíšek J., Vasina P., Čermák M., Franta D.,
Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model,
J. Vac. Sci. Technol. B 37(6) (2019) 062921
105. Ohlídal I., Vohánka J., Mistrík J., Čermák M., Vižďa F., Franta D.,
Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model,
Thin Solid Films 692 (2019) 137189
2018
104. Kobayashi E., Boccard M., Jeangros Q., Rodkey N., Vresilovic D., Hessler-Wyser A., Döbeli M., Franta D., De Wolf S., Morales-Masis M., Ballif C.,Amorphous gallium oxide grown by low-temperature PECVD,
J. Vac. Sci. Technol. A 36 (2018) 021518
103. Franta D., Franta P., Vohánka J., Čermák M., Ohlídal I.,
Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region,
J. Appl. Phys. 123 (2018) 185707
102. Čermák M., Vohánka J., Ohlídal I., Franta D.,
Optical quantities of multi-layer systems with randomly rough boundaries calculated using the exact approach of the Rayleigh–Rice theory,
J. Mod. Opt. 65(14) (2018) 1720-1736
101. Ohlídal I., Vohánka J., Mistrík J., Čermák M., Franta D.,
Different theoretical approaches at optical characterization of randomly rough silicon surfaces covered with native oxide layers,
Surf. Interface Anal. 50 (2018) 1230-1233
100. Vohánka J., Ohlídal I., Ženíšek J., Vasina P., Čermák M., Franta D.,
Use of the Richardson extrapolation in optics of inhomogeneous layers: application to optical characterization,
Surf. Interface Anal. 50(7) (2018) 757-765
99. Holovský J., Remeš Z., Poruba A., Franta D., Conrad ., Abelová L., Bušek D.,
Measurement of doping profiles by a contactless method of IR reflectance under grazing incidence,
R. Sci. Inst. 89 (2018) 063114
2017
98. Ohlídal I., Franta D., Nečas D.,Ellipsometric and reflectometric characterization of thin films exhibiting thickness non-uniformity and boundary roughness,
Appl. Surf. Sci. 421 (2017) 687-696
97. Franta D., Nečas D., Giglia A., Franta P., Ohlídal I.,
Universal dispersion model for characterization of optical thin films over wide spectral range: Application to magnesium fluoride,
Appl. Surf. Sci. 421 (2017) 424-429
96. Franta D., Kotilainen M., Krumpolec R., Ohlídal I.,
Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry,
Appl. Surf. Sci. 421 (2017) 420-423
95. Franta D., Dubroka A., Wang C., Giglia A., Vohánka J., Franta P., Ohlídal I.,
Temperature-dependent dispersion model of float zone crystalline silicon,
Appl. Surf. Sci. 421 (2017) 405-419
94. Kotilainen M., Krumpolec R., Franta D., Souček P., Homola T., Cameron D., Vuoristo P.,
Hafnium oxide thin films as a barrier against copper diffusion in solar absorbers,
Sol. Energy Mater. Sol. Cells 166 (2017) 140-146
93. Franta D., Čermák M., Vohánka J., Ohlídal I.,
Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
Thin Solid Films 631 (2017) 12-22
92. Ohlídal I., Vohánka J., Čermák M., Franta D.,
Optical characterization of randomly microrough surfaces covered with very thin overlayers using effective medium approximation and Rayleigh-Rice theory,
Appl. Surf. Sci. 419 (2017) 942-956
2016
91. Nečas D., Ohlídal I., Franta D., Ohlídal M., Vodák J.,Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry,
J. Opt. 18 (2016) 015401
90. Siefke T., Kroker S., Pfeiffer K., Puffky O., Dietrich K., Franta D., Ohlídal I., Szeghalmi A., Kley E., Tünnermann A.,
Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range,
Adv. Opt. Mater. 4 (2016) 1780-1786
2015
89. Franta D., Nečas D., Ohlídal I.,Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia,
Appl. Opt. 54 (2015) 9108-9119 (1× cited)
2014
88. Franta D., Nečas D., Zajíčková L., Ohlídal I.,Broadening of dielectric response and sum rule conservation,
Thin Solid Films 571 (2014) 496-501
87. Nečas D., Ohlídal I., Franta D., Čudek V., Ohlídal M., Vodák J., Sládková L., Zajíčková L., Eliáš M., Vižďa F.,
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry,
Thin Solid Films 571 (2014) 573-578
86. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen,
Thin Solid Films 571 (2014) 490-495
85. Ohlídal I., Franta D., Nečas D.,
Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
Thin Solid Films 571 (2014) 695-700
84. Nečas D., Ohlídal I., Franta D., Ohlídal M., Čudek V., Vodák J.,
Measurement of thickness distribution, optical constants and roughness parameters of rough non-uniform ZnSe thin films,
Appl. Opt. 53 (2014) 5606-5614
83. Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Dispersion model of two-phonon absorption: application to c-Si,
Opt. Mater. Express 4 (2014) 1641-1656
2013
82. Franta D., Nečas D., Zajíčková L.,Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
Thin Solid Films 534 (2013) 432-441 (2× cited)
81. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J., Chvostová D.,
Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
Thin Solid Films 539 (2013) 233-244 (1× cited)
80. Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J.,
Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
Thin Solid Films 541 (2013) 12-16
79. Nečas D., Franta D., Ohlídal I., Poruba A., Wostrý P.,
Ellipsometric characterization of inhomogeneous non-stoichiometric silicon nitride films,
Surf. Interface Anal. 45 (2013) 1188-1192
2012
78. Mocanu V., Stoica A., Kelar L., Franta D., Buršíková V., Mikšová R., Peřina V.,Multifunctional transparent protective coatings on polycarbonates prepared using PECVD,
Chemické listy 106 (2012) S1460-S1464
2011
77. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
Thin Solid Films 519 (2011) 2694-2697 (2× cited)
76. Franta D., Nečas D., Ohlídal I.,
Anisotropy-enhanced depolarization on transparent film/substrate system,
Thin Solid Films 519 (2011) 2637-2640
75. Ohlídal I., Ohlídal M., Nečas D., Franta D., Buršíková V.,
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
Thin Solid Films 519 (2011) 2874-2876 (1× cited)
74. Nečas D., Franta D., Buršíková V., Ohlídal I.,
Ellipsometric characterisation of thin films non-uniform in thickness,
Thin Solid Films 519 (2011) 2715-2717 (1× cited)
73. Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M., Peřina V., Cobet C.,
Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
Thin Solid Films 519 (2011) 4299-4308 (2× cited)
72. Franta D., Ohlídal I., Nečas D., Vižďa F., Caha O., Hasoň M., Pokorný P.,
Optical characterization of HfO2 thin films,
Thin Solid Films 519 (2011) 6085-6091 (1× cited)
71. Nečas D., Ohlídal I., Franta D.,
Variable-angle spectroscopic ellipsometry of considerably non-uniform thin films,
J. Opt. 13(8) (2011) 085705 (2× cited)
70. Buršíková V., Bláhová O., Karásková M., Zajíčková L., Jašek O., Franta D., Klapetek P., Buršík J.,
Mechanical properties of ultrananocrystalline thin films deposited using dual frequency discharges,
Chemické listy 105(2, SI) (2011) S98-S101
2010
69. Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C.,Band structure of diamond-like carbon films assessed from optical measurements in wide spectral range,
Diam. Relat. Mat. 19 (2010) 114–122 (9× cited)
68. Trunec D., Zajíčková L., Buršíková V., Studnička F., Sťahel P., Prysiazhnyi V., Peřina V., Houdková J., Navrátil Z., Franta D.,
Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge,
J. Phys. D-Appl. Phys. 43 (2010) 225403 (7× cited)
67. Karásková M., Zajíčková L., Buršíková V., Franta D., Nečas D., Bláhová O., Šperka J.,
Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges,
Surf. Coat. Technol. 204 (2010) 1997–2001 (1× cited)
2009
66. Ohlídal I., Nečas D., Franta D., Buršíková V.,Characterization of non-uniform diamond-like carbon films by spectroscopic ellipsometry,
Diam. Relat. Mat. 18 (2009) 364–367 (5× cited)
65. Franta D., Nečas D., Zajíčková L., Buršíková V.,
Limitations and possible improvements of DLC dielectric response model based on parameterization of density of states,
Diam. Relat. Mat. 18 (2009) 413–418 (4× cited)
64. Franta D., Nečas D., Ohlídal I., Hrdlička M., Pavlišta M., Frumar M., Ohlídal M.,
Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
J. Optoelectron. Adv. Mater. 11 (2009) 1891–1898 (1× cited)
63. Nečas D., Ohlídal I., Franta D.,
The reflectance of non-uniform thin films,
J. Opt. A: Pure Appl. Opt. 11 (2009) 045202 (6× cited)
2008
62. Franta D., Zajíčková L., Karásková M., Jašek O., Nečas D., Klapetek P., Valtr M.,Optical characterization of ultrananocrystalline diamond films,
Diam. Relat. Mat. 17 (2008) 1278–1282 (11× cited)
61. Franta D., Buršíková V., Nečas D., Zajíčková L.,
Modeling of optical constants of diamond-like carbon,
Diam. Relat. Mat. 17 (2008) 705–708 (9× cited)
60. Ohlídal I., Nečas D., Buršíková V., Franta D., Ohlídal M.,
Optical characterization of diamond-like carbon thin films non-uniform in thickness using spectroscopic reflectometry,
Diam. Relat. Mat. 17 (2008) 709–712 (1× cited)
59. Valtr M., Klapetek P., Buršíková V., Ohlídal I., Franta D.,
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge,
Chemické listy 102 (2008) s1529–s1532
58. Franta D., Ohlídal I., Nečas D.,
Influence of cross-correlation effects on the optical quantities of rough films,
Opt. Express 16 (2008) 7789–7803 (6× cited)
2007
57. Franta D., Buršíková V., Ohlídal I., Sťahel P., Ohlídal M., Nečas D.,Correlation of thermal stability of the mechanical and optical properties of diamond-like carbon films,
Diam. Relat. Mat. 16 (2007) 1331–1335 (6× cited)
56. Franta D., Nečas D., Zajíčková L.,
Models of dielectric response in disordered solids,
Opt. Express 15 (2007) 16230–16244 (30× cited)
55. Zajíčková L., Buršíková V., Franta D., Bousquet A., Granier A., Goullet A., Buršík J.,
Comparative study of films deposited from HMDSO/O2 in continuous wave and pulsed rf discharges,
Plasma Process. Polym. 4 (2007) S287–S293 (3× cited)
54. Zajíčková L., Buršíková V., Kučerová Z., Franta D., Dvořák P., Šmíd R., Peřina V., Macková A.,
Deposition of protective coatings in RF organosilicon discharges,
Plasma Sources Sci. Technol. 16 (2007) S123–S132 (20× cited)
2006
53. Valtr M., Ohlídal I., Franta D.,Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry,
Czech. J. Phys. 56 (2006) B1103–B1109
52. Frgala Z., Jašek O., Karásková M., Zajíčková L., Buršíková V., Franta D., Matějková J., Rek A., Klapetek P., Buršík J.,
Microwave PECVD of nanocrystalline diamond with RF induced bias nucleation,
Czech. J. Phys. 56 (2006) B1218–B1223 (3× cited)
51. Šíra M., Trunec D., Sťahel P., Buršíková V., Franta D.,
Deposition of organic polymers at higher substrate temperatures in atmospheric pressure glow discharge,
Czech. J. Phys. 56 (2006) B1377–B1382
50. Ohlídal I., Franta D., Šiler M., Vižďa F., Frumar M., Jedelský J., Omasta J.,
Comparison of dispersion models in the optical characterization of As–S chalcogenide thin films,
J. Non-Cryst. Solids 352 (2006) 5633–5641 (4× cited)
49. Franta D., Ohlídal I.,
Influence of lateral dimensions of the irregularities on the optical quantities of rough surfaces,
J. Opt. A: Pure Appl. Opt. 8 (2006) 763–774 (13× cited)
48. Franta D., Ohlídal I., Klapetek P., Nepustilová R., Bajer S.,
Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy,
Surf. Interface Anal. 38 (2006) 842–846 (1× cited)
2005
47. Ohlídal I., Franta D., Klapetek P.,Combination of optical methods and atomic force microscopy at characterization of thin film systems,
Acta Phys. Slovaca 55 (2005) 271–294 (1× cited)
46. Antoš R., Ohlídal I., Franta D., Klapetek P., Mistrík J., Yamaguchi T., Višňovský Š.,
Spectroscopic ellipsometry of sinusoidal surface-relief gratings,
Appl. Surf. Sci. 244 (2005) 221–224 (2× cited)
45. Franta D., Ohlídal I., Mistrík J., Yamaguchi T., Hu G., Dai N.,
Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions,
Appl. Surf. Sci. 244 (2005) 338–342 (3× cited)
44. Franta D., Negulescu B., Thomas L., Dahoo P., Guyot M., Ohlídal I., Mistrík J., Yamaguchi T.,
Optical properties of NiO thin films prepared by pulsed laser deposition technique,
Appl. Surf. Sci. 244 (2005) 426–430 (19× cited)
43. Mistrík J., Yamaguchi T., Franta D., Ohlídal I., Hu G., Dai N.,
Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry,
Appl. Surf. Sci. 244 (2005) 431–434 (10× cited)
42. Franta D., Buršíková V., Ohlídal I., Zajíčková L., Sťahel P.,
Thermal stability of the optical properties of plasma deposited diamond-like carbon thin films,
Diam. Relat. Mat. 14 (2005) 1795–1798 (10× cited)
41. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Páleníková K.,
Influence of technological conditions on mechanical stresses inside diamond-like carbon films,
Diam. Relat. Mat. 14 (2005) 1835–1838 (5× cited)
40. Šiler M., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical characterization of double layers containing epitaxial ZnSe and ZnTe films,
J. Mod. Opt. 52 (2005) 583–602 (1× cited)
39. Franta D., Ohlídal I.,
Comparison of effective medium approximation and Rayleigh–Rice theory concerning ellipsometric characterization of rough surfaces,
Opt. Commun. 248 (2005) 459–467 (31× cited)
38. Franta D., Ohlídal I., Petrýdes D.,
Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry,
Vacuum 80 (2005) 159–162 (12× cited)
2004
37. Franta D., Ohlídal I., Klapetek P., Ohlídal M.,Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy,
Surf. Interface Anal. 36 (2004) 1203–1206 (3× cited)
36. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 393–398 (20× cited)
35. Franta D., Ohlídal I., Klapetek P., Roca i Cabarrocas P.,
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 455–456 (2004) 399–403 (12× cited)
34. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical properties of ZnTe films prepared by molecular beam epitaxy,
Thin Solid Films 468 (2004) 193–202 (11× cited)
2003
33. Klapetek P., Ohlídal I., Franta D., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,Atomic force microscopy characterization of ZnTe epitaxial films,
Acta Phys. Slovaca 53 (2003) 223–230 (5× cited)
32. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Optical constants of ZnTe and ZnSe epitaxial thin films,
Acta Phys. Slovaca 53 (2003) 95–104 (2× cited)
31. Franta D., Ohlídal I., Frumar M., Jedelský J.,
Expression of the optical constants of chalcogenide thin films using the new parameterization dispersion model,
Appl. Surf. Sci. 212–213 (2003) 116–121 (23× cited)
30. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx,
Diam. Relat. Mat. 12 (2003) 1532–1538 (16× cited)
29. Franta D., Zajíčková L., Buršíková V., Ohlídal I.,
New dispersion model of the optical constants of the DLC films,
Acta Phys. Slovaca 53 (2003) 373–384 (13× cited)
2002
28. Franta D., Zajíčková L., Ohlídal I., Janča J., Veltruská K.,Optical characterization of diamond like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry,
Diam. Relat. Mat. 11 (2002) 105–117 (21× cited)
27. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Sitter H.,
Influence of overlayers on determination of the optical constants of ZnSe thin films,
J. Appl. Phys. 92 (2002) 1873–1880 (7× cited)
26. Klapetek P., Ohlídal I., Franta D., Pokorný P.,
Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method,
Surf. Interface Anal. 33 (2002) 559–564 (2× cited)
25. Ohlídal M., Ohlídal I., Franta D., Králík T., Jákl M., Eliáš M.,
Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method,
Surf. Interface Anal. 34 (2002) 660–663 (2× cited)
24. Franta D., Ohlídal I., Klapetek P., Pokorný P.,
Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods,
Surf. Interface Anal. 34 (2002) 759–762 (11× cited)
2001
23. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances,
Appl. Opt. 40 (2001) 5711–5717 (4× cited)
22. Franta D., Ohlídal I., Frumar M., Jedelský J.,
Optical characterization of chalcogenide thin films,
Appl. Surf. Sci. 175–176 (2001) 555–561 (15× cited)
21. Ohlídal I., Franta D., Frumar M., Jedelský J., Navrátil K.,
Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
J. Optoelectron. Adv. Mater. 3 (2001) 873–878 (4× cited)
20. Franta D., Ohlídal I., Klapetek P., Pokorný P., Ohlídal M.,
Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy,
Surf. Interface Anal. 32 (2001) 91–94 (3× cited)
19. Zajíčková L., Veltruská K., Tsud N., Franta D.,
XPS and ellipsometric study of DLC/silicon Interface,
Vacuum 61 (2001) 269–273 (12× cited)
18. Franta D., Zajíčková L., Ohlídal I., Janča J.,
Optical characterization of diamond-like carbon films,
Vacuum 61 (2001) 279–283 (3× cited)
17. Ohlídal I., Franta D., Ohlídal M., Navrátil K.,
Determination of thicknesses and spectral dependences of refractive indices of non-absorbing and weakly absorbing thin films using the wavelengths related to extrema in spectral reflectances,
Vacuum 61 (2001) 285–289
2000
16. Franta D., Ohlídal I.,Analysis of thin films by optical multi-sample methods,
Acta Phys. Slovaca 50 (2000) 411–421 (15× cited)
15. Ohlídal I., Franta D.,
Matrix formalism for imperfect thin films,
Acta Phys. Slovaca 50 (2000) 489–500 (18× cited)
14. Franta D., Ohlídal I., Klapetek P.,
Analysis of slightly rough thin films by optical methods and AFM,
Mikrochim. Acta 132 (2000) 443–447 (30× cited)
13. Franta D., Ohlídal I.,
Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry,
Surf. Interface Anal. 30 (2000) 574–579 (17× cited)
12. Pavelka R., Ohlídal I., Hlávka J., Franta D., Sitter H.,
Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
Thin Solid Films 366 (2000) 43–50
11. Ohlídal I., Franta D.,
Ellipsometry of thin film systems,
Prog. Opt. 41 (2000) 181-282 (44× cited)
1999
10. Zajíčková L., Buršíková V., Franta D.,The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films,
Czech. J. Phys. 49 (1999) 1213–1228 (20× cited)
9. Ohlídal M., Unčovský M., Ohlídal I., Franta D.,
Determination of the basic parameters characterizing the roughness of metal surfaces by laser light scattering,
J. Mod. Opt. 46 (1999) 279–293 (2× cited)
8. Ohlídal I., Franta D., Pinčík E., Ohlídal M.,
Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Surf. Interface Anal. 28 (1999) 240–244 (19× cited)
7. Franta D., Ohlídal I., Munzar D., Hora J., Navrátil K., Manfredotti C., Fizzotti F., Vittone E.,
Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films 343–344 (1999) 295–298 (6× cited)
1998
6. Franta D., Ohlídal I., Munzar D.,Parameterisation of the model of dispersion dependences of solid state optical constants,
Acta Phys. Slovaca 48 (1998) 451–458 (10× cited)
5. Ohlídal I., Franta D.,
Ellipsometry of Thin Films,
Acta Phys. Slovaca 48 (1998) 459–468 (2× cited)
4. Franta D., Ohlídal I.,
Ellipsometric parameters and reflectances of thin films with slightly rough boundaries,
J. Mod. Opt. 45 (1998) 903–934 (53× cited)
3. Ohlídal I., Franta D., Hora J., Navrátil K., Weber J., Janda P.,
Analysis of thin films with slightly rough boundaries,
Mikrochim. Acta 15 (1998) 177–180 (1× cited)
2. Franta D., Ohlídal I.,
Statistical properties of the near-field speckle patterns of thin films with slightly rough boundaries,
Opt. Commun. 147 (1998) 349–358 (4× cited)
1995
1. Ohlídal M., Ohlídal I., Druckmüller M., Franta D.,A method of shearing interferometry for determining the statistical quantities of randomly rough surfaces of solids,
Pure Appl. Opt. 4 (1995) 599–616
Articles in journals without impact factor
2018
17. Franta D., Vohánka J., Čermák M.,Universal Dispersion Model for Characterization of Thin Films Over Wide Spectral Range: in Optical Characterization of Thin Solid Films,
Springer Series in Surface Sciences 64 (2018) 31-82
2009
16. Nečas D., Zajíčková L., Franta D., Sťahel P., Mikulík P., Meduňa M., Valtr M.,Optical characterization of ultra-thin iron and iron oxide films,
e-Journal of Surface Science and Nanotechnology 7 (2009) 486–490
15. Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Modeling of dielectric response of GexSbyTez (GST) materials,
Physica Status Solidi C 6 (2009) S59–S62 (2× cited)
2008
14. Nečas D., Peřina V., Franta D., Ohlídal I., Zemek J.,Optical characterization of non-stoichiometric silicon nitride films,
Physica Status Solidi C 5 (2008) 1320–1323
13. Franta D., Hrdlička M., Nečas D., Frumar M., Ohlídal I., Pavlišta M.,
Optical characterization of phase changing Ge2Sb2Te5 chalcogenide films,
Physica Status Solidi C 5 (2008) 1324–1327 (4× cited)
12. Franta D., Ohlídal I., Nečas D.,
Optical quantities of rough films calculated by Rayleigh-Rice theory,
Physica Status Solidi C 5 (2008) 1395–1398 (2× cited)
11. Ohlídal I., Nečas D., Franta D.,
Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies,
Physica Status Solidi C 5 (2008) 1399–1402
2007
10. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Sobota J., Klapetek P., Bláhová O., Peřina V.,Deposition and characterisation of nanostructured silicon-oxide containing diamond-like carbon coatings,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 491–495
9. Valtr M., Klapetek P., Ohlídal I., Franta D.,
UV light enhanced oxidation of a-C:H thin film in air. A study of thickness reduction,
Optoelectronics and Advanced Materials - Rapid Communications 1 (2007) 620–624
2005
8. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,Měření mechanického napětí v tenkých vrstvách pomocí kombinované optické metody,
Jemná mechanika a optika 50 (2005) 72–75
2004
7. Ohlídal I., Franta D., Frumar M., Jedelský J., Omasta J.,Influence of composition, exposure and thermal annealing on optical properties of As–S chalcogenide thin films,
Chalcogenide Letters 1 (2004) 1–10 (18× cited)
2003
6. Ohlídal I., Klapetek P., Franta D.,Aplikace mikroskopie atomové síly při analýze tenkých vrstev ZnSe a ZnTe,
Československý časopis pro fyziku 53 (2003) 97–100
2002
5. Klapetek P., Ohlídal I., Franta D.,Applications of atomic force microscopy for thin film boundary measurements,
Jemná mechanika a optika 47 (2002) 195–199
2001
4. Klapetek P., Ohlídal I., Franta D.,Měření základních statistických veličin náhodné povrchové drsnosti pomocí mikroskopie atomové síly,
Československý časopis pro fyziku 51 (2001) 16–21
3. Klapetek P., Ohlídal I., Franta D.,
Vliv diskrétní Fourierovy transformace na zpracování AFM dat,
Československý časopis pro fyziku 51 (2001) 49–51
1999
2. Ohlídal I., Franta D., Klapetek P., Vičar M.,Relationship between AFM and optical measurements at analyzing surface roughness,
Jemná mechanika a optika 44 (1999) 307–311
1998
1. Ohlídal I., Ohlídal M., Franta D., Tykal M., Pražák D., Michálek A.,Srovnání výsledků měření drsnosti povrchu dosažených vybranými optickými metodami a metodou profilometrickou,
Jemná mechanika a optika 43 (1998) 130–136
Proceedings available from ISI Web of Science
2016
6. Franta D., Nečas D., Ohlídal I., Giglia A.,Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range,
Photonics Europe 2016: Optical Micro- and Nanometrology VI , Photonics Europe 2016: Optical Micro- and Nanometrology VI, Brussels, Belgium 3 - 7 April 2016 (2016) 989014
2015
5. Ohlídal M., Ohlídal I., Nečas D., Vodák J., Franta D., Nádaský P., Vižďa F.,Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280R
4. Franta D., Nečas D., Ohlídal I., Jankuj J.,
Wide spectral range characterization of antireflective coatings and their optimization,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280F
3. Nečas D., Ohlídal I., Vodák J., Ohlídal M., Franta D.,
Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96280C
2. Franta D., Nečas D., Ohlídal I., Giglia A.,
Dispersion model for optical thin films applicable in wide spectral range,
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V , Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, Jena, Germany, September 7-10, 2015 (2015) 96281U
2010
1. Muresan M., Zajíčková L., Buršíková V., Franta D., Nečas D.,Preparation and Characterization of DLC:N Films,
NANOCON 2010, 2ND INTERNATIONAL CONFERENCE , 2nd NANOCON International Conference, Olomouc, Czech Republic, 12-14 October 2010 (2010) 434-440
Proceedings not available from ISI Web of Science
27. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,Mossbauer Effect Study of Iron Thin Films on Si/SiO(x) Substrate and Iron Phases at Deposited Carbon Nanotubes,
MOSSBAUER SPECTROSCOPY IN MATERIALS SCIENCE - 2010 (2010) 90-95
2009
26. Franta D., Nečas D., Frumar M.,Modeling of dielectric response of Ge(x)Sb(y)Te(z) (GST) materials,
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 1 (2009) S59-S62
2008
25. Buršíková V., Peřina V., Sobota J., Klapetek P., Dvořák P., Buršík J., Franta D.,Deposition of Nanostructured Diamond-Like Carbon Films in Dual Frequency Capacitive Discharge,
Proceedings of 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases (2008)
24. Zajíčková L., Kučerová Z., Franta D., Buršíková V., Peřina V., Macková A.,
Composition and functional properties of organosilicon plasma polymers from hexamethyldisiloxane and octamethylcyclotetrasiloxane,
Proceedings of Organic/Inorganic Hybrid Materials, MRS (2008) 159-164
2007
23. Šíra M., Buršíková V., Franta D., Trunec D.,Deposition and analysis of thin films produced in atmospheric pressure glow discharge,
Proceedings of XXVIII International Conference on Phenomena in Ionized Gases (2007) 713-716
2006
22. Buršíková V., Ray N., Bláhová O., Jašek O., Frgala Z., Zajíčková L., Franta D., Buršík J., Klapetek P.,Study of Mechnical Properties of Diamon-like Carbon and Nanocomposite Diamond Coatings Prepared by Several Different Deposition Techniques,
Proceedings of International Workshop on the Application of Nanocrystalline Diamond and Diamond Like Carbon Materials (2006) 27-37
21. Buršíková V., Dvořák P., Zajíčková L., Franta D., Janča J., Buršík J., Bláhová O., Peřina V., Klapetek P.,
Silicon-oxide Containing Diamond-like Carbon Coatings Prepared Using Plasma Enhanced Chemical Vapor Deposition,
Proceedings of International Workshop on the Application of Nanocrystalline Diamond and Diamond Like Carbon Materials (2006) 311-315
20. Franta D., Nečas D., Zajíčková L., Buršíková V.,
Modeling of DLC Optical Properties Based on Parameterization of Density of States,
Proceedings of International Workshop on the Application of Nanocrystalline Diamond and Diamond Like Carbon Materials (2006) 39-50
2005
19. Kučerová Z., Buršíková V., Peřina V., Franta D., Zajíčková L., Čech J., Franclová J.,Influence of the Temperature on Properties of Plasma Polymerized Organosilicon Coatings,
Proceedings of 15th Symposium on Application of Plasma Processes and 3rd EU–Japan Joint Symposium on Plasma Processing (2005) 197-198
18. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Klapetek P., Jákl M.,
Optical measurement of mechanical stresses in diamond-like carbon films,
Proceedings of 8-th International Symposium on Laser Metrology, SPIE (2005) 717-728
17. Franta D., Ohlídal I.,
Characterization of optical thin films exhibiting defects,
Proceedings of Advances in Optical Thin Films II, SPIE (2005) 59632H
16. Ohlídal I., Franta D., Klapetek P.,
Měření nanodrsnosti pomocí optických metod a mikroskopie atomové síly,
Proceedings of Kvalita a GPS 2005 (2005) 131-139
15. Ohlídal I., Franta D., Klapetek P.,
Ellipsometry in characterization of thin films,
Proceedings of Solar Renewable Energy News (2005) 81-111
2004
14. Ohlídal I., Ohlídal M., Franta D., Čudek V., Buršíková V., Šiler M.,Mechanical stresses studied by optical methods in diamond-like carbon films containing Si and O,
Proceedings of Advances in Thin Film Coatings for Optical Applications, SPIE (2004) 139-147 (2× cited)
2003
13. Franta D., Ohlídal I., Klapetek P., Montaigne-Ramil A., Bonanni A., Stifter D., Stifter H.,Optical characterization of ZnSe thin films,
Proceedings of 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE , 19th Congress of the International Commission for Optics: Optics for the Quality of Life, SPIE (2003) 831-832
2001
12. Franta D., Ohlídal I.,Calculation of the optical quantities characterizing inhomogeneous thin film using a new mathematical procedure based on the matrix formalism and Drude approximation,
Proceedings of 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 12th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (2001) 207-212 (1× cited)
11. Franta D., Buršíková V., Zajíčková L.,
Optical characterization of DLC:Si films prepared by PECVD,
Proceedings of 13th Symposium on Application of Plasma Processes , 13th Symposium on Application of Plasma Processes (2001) 87-88
10. Klapetek P., Franta D., Ohlídal I.,
Study of Thin Film Defects by Atomic Force Microscopy,
Proceedings of 5th Seminar on Quantitative Microscopy, PTB-Bericht , 5th Seminar on Quantitative Microscopy, PTB-Bericht (2001) 107-117
2000
9. Ohlídal I., Franta D., Klapetek P.,Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films,
Proceedings of 4th Seminar on Quantitative Microscopy, PTB-Bericht , 4th Seminar on Quantitative Microscopy, PTB-Bericht (2000) 124-131
1999
8. Ohlídal I., Ohlídal M., Franta D., Tykal M.,Comparison of optical and non-optical methods for measuring surface roughness,
Proceedings of 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE , 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, SPIE (1999) 456–467
7. Franta D., Zajíčková L.,
Characterisation of DLC Films Prepared by PECVD,
Proceedings of 12th Symposium on Application of Plasma Processes , 2th Symposium on Application of Plasma Processes (1999) 158–159
1998
6. Ohlídal I., Ohlídal M., Franta D., Vičar M., Klapetek P.,Comparison of AFM and optical methods at measuring nanometric surface roughness,
Proceedings of 3th Seminar on Quantitative Microscopy , 3th Seminar on Quantitative Microscopy (1998) 123–129
1997
5. Ohlídal I., Franta D., Rezek B., Ohlídal M.,Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy,
Proceedings of 7th European Conference on Applications of Surface and Interface Analysis , 7th European Conference on Applications of Surface and Interface Analysis (1997) 1051–1054
1996
4. Franta D., Ohlídal I., Hora J., Navrátil K.,Spektroskopická elipsometrie slabě drsných povrchů,
Proceedings of 12. konference českých a slovenských fyziků , Proceedings of 12. konference českých a slovenských fyziků (1996) 482-485
3. Ohlídal I., Franta D., Hora J.,
Spectroscopic Ellipsometry of Slightly Rough Surfaces Covered by Layers,
Proceedings of 6th European Conference on Applications of Surface and Interface Analysis , 6th European Conference on Applications of Surface and Interface Analysis (1996) 823-826
2. Ohlídal M., Ohlídal I., Franta D., Michálek A.,
Method of shearing interferometry for characterizing non-gaussian randomly rough surfaces,
Proceedings of Specification, Production, and Testing of Optical Components and Systems , Specification, Production, and Testing of Optical Components and Systems (1996) 442–451
1995
1. Ohlídal M., Ohlídal I., Druckmüller M., Franta D.,Interferometry of Randomly Rough Surfaces,
Proceedings of Photonics '95 , Proceedings of Photonics '95 (1995) 109-111