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Publications in Thin Solid Films

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Physical Review B
Spectrochimica Acta Part B: Atomic Spectroscopy
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Thin Solid Films
Journal of the Optical Society of America A
Advanced Materials Research
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Optics Letters


SUB

Zajíčková L., Nečas D.,
Test submitted article,
Thin Solid Films Vol. 152509905 (SUB) SUB

2017

Zajíčková L., Tessier P, Chirita V, Kelires P,
Preface 2016 EMRS Spring Meeting, Symposium EE: Carbon, or Nitrogen-Containing Nanostructured Thin Films,
Thin Solid Films Vol. 630 (2017) 1

Franta D., Čermák M., Vohánka J., Ohlídal I.,
Dispersion models describing interband electronic transitions combining Tauc's law and Lorentz model,
Thin Solid Films Vol. 631 (2017) 12-22

Schäfer J, Fricke K, Mika F, Pokorná Z, Zajíčková L., Foest R,
Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure,
Thin Solid Films Vol. 630 (2017) 71-78

2016

Fodor B, Kozma P, Burger S, Fried M, Petrik P,
Effective medium approximation of ellipsometric response from random surface roughness simulated by finite-element method,
Thin Solid Films Vol. 617 (2016) 20-24

2015

Manakhov A., Nečas D., Čechal J, Pavliňák D, Eliáš M., Zajíčková L.,
Deposition of stable amine coating onto polycaprolactone nanofibers by low pressure cyclopropylamine plasma polymerization,
Thin Solid Films Vol. 581 (2015) 7-13

2014

Ohlídal I., Franta D., Nečas D.,
Improved combination of scalar diffraction theory and Rayleigh-Rice theory and its application to spectroscopic ellipsometry of randomly rough surfaces,
Thin Solid Films Vol. 571 (2014) 695-700

Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen,
Thin Solid Films Vol. 571 (2014) 490-495

Nečas D., Ohlídal I., Franta D., Čudek V, Ohlídal M, Vodák J, Sládková L, Zajíčková L., Eliáš M., Vižďa F,
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry,
Thin Solid Films Vol. 571 (2014) 573-578

Franta D., Nečas D., Zajíčková L., Ohlídal I.,
Broadening of dielectric response and sum rule conservation,
Thin Solid Films Vol. 571 (2014) 496-501

2013

Zajíčková L., Eliáš M., Buršíková V., Studýnková Z, Mazánková V, Michlíček M., Houdková J,
Low Pressure Plasmachemical Processing of Multi-Walled Carbon Nanotubes for the Production of Polyurethane Composite Films with Improved Mechanical Properties,
Thin Solid Films Vol. 538 (2013) 7-15

Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J,
Advanced modeling for optical characterization of amorphous hydrogenated silicon films,
Thin Solid Films Vol. 541 (2013) 12-16

Franta D., Nečas D., Zajíčková L., Ohlídal I., Stuchlík J, Chvostová D,
Application of sum rule to the dispersion model of hydrogenated amorphous silicon,
Thin Solid Films Vol. 539 (2013) 233-244

Franta D., Nečas D., Zajíčková L.,
Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models,
Thin Solid Films Vol. 534 (2013) 432-441

2011

Ohlídal I., Ohlídal M, Nečas D., Franta D., Buršíková V.,
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry,
Thin Solid Films Vol. 519 (2011) 2874-2876

Nečas D., Franta D., Buršíková V., Ohlídal I.,
Ellipsometric characterisation of thin films non-uniform in thickness,
Thin Solid Films Vol. 519 (2011) 2715-2717

Choudhury A, Barve S, Chutia J, Kakati H, Pal A, Jagannath J, Mithal N, Kishore R, Pandey M, Patil D,
Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process,
Thin Solid Films Vol. 519 22 (2011) 7864-7870

Li F, Zhang S, Kong J, Zhang Y, Zhang W,
Multilayer DLC coatings via alternating bias during magnetron sputtering,
Thin Solid Films Vol. 519 15 (2011) 4910-4916

Tamuleviciene A, Meškinis , Kopustinskas V, Tamulevičius S,
Multilayer amorphous hydrogenated carbon (a-C:H) and SiOx doped a-C:H films for optical applications,
Thin Solid Films Vol. 519 12, Sp. Iss. SI (2011) 4004-4007

Patsalas P,
Optical properties of amorphous carbons and their applications and perspectives in photonics,
Thin Solid Films Vol. 519 (2011) 3990-3996

Lohner T, Csíkvári P, Khánh N, Dávid S, Horváth Z, Petrik , Hárs G,
Spectroellipsometric and ion beam analytical investigation of nanocrystalline diamond layers ,
Thin Solid Films Vol. 519 9 (2011) 2806-2810

Franta D., Nečas D., Ohlídal I.,
Anisotropy-enhanced depolarization on transparent film/substrate system,
Thin Solid Films Vol. 519 (2011) 2637-2640

Bereznai M, Budai J, Hanyecz I, Kopniczky , Veres , Koós M, Toth Z,
Ellipsometric study of nanostructured carbon films deposited by pulsed laser deposition,
Thin Solid Films Vol. 519 9 (2011) 2989-2993

Franta D., Nečas D., Zajíčková L., Buršíková V., Cobet C,
Combination of synchrotron ellipsometry and table-top optical measurements for determination of band structure of DLC films,
Thin Solid Films Vol. 519 (2011) 2694-2697

Wormeester H, Everts , Poelsema B,
Plasmon resonance shift during grazing incidence ion sputtering on Ag(001),
Thin Solid Films Vol. 519 9 (2011) 2664-2667

Zhao F, Li H, Ji L, Mo Y, Quan W, Wang Y, Chen J, Zhou H,
Effects of duty cycle and water immersion on the composition and friction performance of diamond-like carbon films prepared by the pulsed-DC plasma technique,
Thin Solid Films Vol. 519 6 (2011) 2043-2048

Franta D., Ohlídal I., Nečas D., Vižďa F, Caha O, Hasoň M, Pokorný P,
Optical characterization of HfO2 thin films,
Thin Solid Films Vol. 519 (2011) 6085-6091

Zajíčková L., Franta D., Nečas D., Buršíková V., Muresan M, Peřina V, Cobet C,
Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture,
Thin Solid Films Vol. 519 (2011) 4299-4308

2010

Rangel E, de Souza E, de Moraes F, Marins N, Schreiner W, Cruz N,
Development of amorphous carbon protective coatings on poly(vinyl)chloride,
Thin Solid Films Vol. 518 10 (2010) 2750-2756

2007

Meškinis , Tamulevičius S, Kopustinskas V, Andrulevicius A, Guobienë A, Guldaitis R, Liutviniene I,
Hydrophobic properties of the ion beam deposited DLC films containing SiOx,
Thin Solid Films Vol. 515 19 (2007) 7615-7618

2004

Franta D., Ohlídal I., Klapetek P, Montaigne-Ramil A, Bonanni A, Stifter D, Sitter H,
Optical properties of ZnTe films prepared by molecular beam epitaxy,
Thin Solid Films Vol. 468 (2004) 193–202

Franta D., Ohlídal I., Klapetek P, Roca i Cabarrocas P,
Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films Vol. 455–456 (2004) 399–403

Franta D., Ohlídal I., Buršíková V., Zajíčková L.,
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films Vol. 455–456 (2004) 393–398

2003

Zajíčková L., Rudakowski S, Becker H, Meyer D, Valtr M, Wiesemann K,
Study of Plasma Polymerization from Acetylene in Pulsed RF Discharges,
Thin Solid Films Vol. 425 (2003) 72–84

2000

Pavelka R, Ohlídal I., Hlávka J, Franta D., Sitter H,
Optical characterization of thin films with randomly rough boundaries using the photovoltage method,
Thin Solid Films Vol. 366 (2000) 43–50

1999

Franta D., Ohlídal I., Munzar D, Hora J, Navrátil K, Manfredotti C, Fizzotti F, Vittone E,
Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry,
Thin Solid Films Vol. 343–344 (1999) 295–298

Zajíčková L., Janča J, Peřina V,
Characterization of Silicon Oxide Thin Films Deposited by Plasma Enhanced Chemical Vapour Deposition from Octamethylcyclotetrasiloxane/Oxygen Feeds,
Thin Solid Films Vol. 338 (1999) 49–59

1996

Zajíčková L., Ohlídal I., Janča J,
Plasma-Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses,
Thin Solid Films Vol. 280 (1996) 26–36

Hlávka J, Ohlídal I., Vižďa F, Sitter H,
New technique of measurement of optical parameters of thin films,
Thin Solid Films Vol. 279 (1996) 209–212

1990

Ponížil P, Ohlídal I., Janča J,
Optical properties of diamond-like carbon films,
Thin Solid Films Vol. 190 (1990) 65–72

1989

Ohlídal I., Schmidt E, Líbezný M, Tvarožek V, Novotný I,
Ellipsometric analysis of thin NiCr films,
Thin Solid Films Vol. 169 (1989) 213–222

1988

Ohlídal I.,
Optical analysis of inhomogeneous weakly absorbing thin films by spectroscopic reflectometry: Application to carbon films,
Thin Solid Films Vol. 162 (1988) 101–109

Ohlídal I., Navrátil K,
Simple method of spectroscopic reflectometry for the complete optical analysis of weakly absorbing thin films: Application to silicon films,
Thin Solid Films Vol. 156 (1988) 181–189

1987

Ohlídal I., Navrátil K,
Complete optical analysis of a non-absorbing thin film on an absorbing substrate by a new method of immersion spectroscopic reflectometry,
Thin Solid Films Vol. 148 (1987) 17–27

1986

Paneva A, Ohlídal I.,
Multiple angle of incidence ellipsometric analysis of non-absorbing two-layer and three-layer systems,
Thin Solid Films Vol. 145 (1986) 23–37

1985

Ohlídal I., Navrátil K, Musilová J,
A new method for the complete optical analysis of weakly absorbing thin films: Application to polycrystalline silicon films,
Thin Solid Films Vol. 127 (1985) 191–203

1984

Ohlídal I., Lukeš F,
Optical analysis of absorbing double layers by combined reflection and transmission ellipsometry,
Thin Solid Films Vol. 115 (1984) 269–282

1981

Ohlídal I., Lukeš F,
Optical analysis of thin gold films by combined reflection and transmission ellipsometry,
Thin Solid Films Vol. 85 (1981) 181–190

1980

Ohlídal I., Navrátil K,
Determination of the optical parameters and packing density of non-absorbing columnar thin films by means of immersion reflectometry: Application to LiF thin films,
Thin Solid Films Vol. 74 (1980) 51–58

Ohlídal I., Navrátil K,
Optical analysis of non-absorbing double layers by means of immersion reflectometry II: Solid state immersion method,
Thin Solid Films Vol. 71 (1980) 91–102

Ohlídal I., Navrátil K,
Optical analysis of non-absorbing double layers by means of immersion reflectometry I: Liquid immersion method,
Thin Solid Films Vol. 67 (1980) 245–251

1979

Ohlídal I., Navrátil K, Lukeš F,
The optical analysis of non-absorbing thin films with randomly rough boundaries by means of immersion spectrophotometry,
Thin Solid Films Vol. 57 (1979) 179–184

Navrátil K, Ohlídal I., Lukeš F,
The physical structure of the interface between single-crystal GaAs and its oxide film,
Thin Solid Films Vol. 56 (1979) 163–171

1977

Ohlídal I., Navrátil K,
Method for determining the refractive index and thickness of a non-absorbing thin film with randomly rough boundaries,
Thin Solid Films Vol. 44 (1977) 313–321

1976

Ohlídal I., Navrátil K,
Influence of the properties of thin films on the determination of the relative reflectance of a randomly rough surface,
Thin Solid Films Vol. 31 (1976) 223–234