Publications in Plasma Sources Science and Technology
2022
Polášková K., Nečas D., Dostál L, Klíma M, Fiala P, Zajíčková L.,Self-organization phenomena in cold atmospheric pressure plasma slit jet,
Plasma Sources Science and Technology Vol. 31 (2022) 125014
2020
Donkó Z, Zajíčková L., Sugimoto S, Harumningtyas A, Hamaguchi S,Modeling Characterisation of a Bipolar Pulsed Discharge,
Plasma Sources Science and Technology Vol. 29 (2020) 104001
Michlíček M., Hamaguchi S, Zajíčková L.,
Molecular dynamics simulation of amine groups formation during plasma processing of polystyrene surfaces,
Plasma Sources Science and Technology Vol. 29 10 (2020) 105020
2019
Mokhtar Hefny M, Nečas D., Zajíčková L., Benedikt J,The transport and surface reactivity of O atoms during the atmospheric plasma etching of hydrogenated amorphous carbon films,
Plasma Sources Science and Technology Vol. 28 (2019) 035010
2016
Sobota A, Guaitella O, Sretenović G, Krstić I, Kovačević V, Obrusník A., Nguyen Y, Zajíčková L., Obradovic B, Kuraica M,Electric field measurements in a kHz-driven He jet—the influence of the gas flow speed,
Plasma Sources Science and Technology Vol. 25 6 (2016) 065026
Obrusník A., Synek P., Hübner S, van der Mullen J, Zajíčková L., Nijdam S,
Coherent and incoherent Thomson scattering on an argon/hydrogen microwave plasma torch with transient behaviour,
Plasma Sources Science and Technology Vol. 25 5 (2016) 055018
Voráč J, Potočňáková L, Synek P., Hnilica J, Kudrle V,
Gas mixing enhanced by power modulations in atmospheric pressure microwave plasma jet,
Plasma Sources Science and Technology Vol. 25 2 (2016) 025018
2015
Synek P., Obrusník A., Zajíčková L., Hübner S, Nijdam S,On the interplay of gas dynamics and the electromagnetic field in an atmospheric Ar/H2 microwave plasma torch,
Plasma Sources Science and Technology Vol. 24 (2015) 025030
2014
Voráč J, Obrusník A., Procházka V, Dvořák P, Talába M,Spatially resolved measurement of hydroxyl radical (OH) concentration in an argon RF plasma jet by planar laser-induced fluorescence,
Plasma Sources Science and Technology Vol. 23 2 (2014) 025011
2007
Zajíčková L., Buršíková V., Kučerová Z, Franta D., Dvořák P, Šmíd R, Peřina V, Macková A,Deposition of protective coatings in RF organosilicon discharges,
Plasma Sources Science and Technology Vol. 16 (2007) S123–S132