Publications in Journal of Optoelectronics and Advanced Materials
2009
Franta D., Nečas D., Ohlídal I., Hrdlička M, Pavlišta M, Frumar M, Ohlídal M,Combined method of spectroscopic ellipsometry and photometry as an efficient tool for the optical characterisation of chalcogenide thin films,
Journal of Optoelectronics and Advanced Materials Vol. 11 (2009) 1891–1898
2008
Sťahel P, Buršíková V., Buršík J, Čech J, Janča J, Cernak M,Hydrophylisation of non-woven polypropylene textiles using atmospheric pressure surface barrier discharge,
Journal of Optoelectronics and Advanced Materials Vol. 10 1 (2008) 213-218
Buršíková V., Sobota J, Fort T, Grossman J, Stoica A., Buršík J, Klapetek P, Peřina V,
Optimisation of mechanical properties of plasma deposited graded multilayer diamond-like carbon coatings,
Journal of Optoelectronics and Advanced Materials Vol. 10 12 (2008) 3229-3232
2007
Vladoiu R, Ciupina V, Surdu-Bob C, Lungu C, Janik J, Skalny J, Buršíková V., Buršík J, Musa G,Properties of the carbon thin films deposited by thermionic vacuum arc,
Journal of Optoelectronics and Advanced Materials Vol. 9 4 (2007) 862-866
Vladoiu R, Lungu C, Mustata I, Buršíková V., Buršík J,
Characterization by nanoindentation and Scanning Electron Microscopy of the spin valves structures prepared by Thermionic Vacuum Arc (TVA) method,
Journal of Optoelectronics and Advanced Materials Vol. 9 4 (2007) 1087-1090
2006
Vladoiu R, Ciupina V, Lungu C, Buršíková V., Musa G,Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization,
Journal of Optoelectronics and Advanced Materials Vol. 8 1 (2006) 71-73
2004
Ohlídal I., Franta D., Frumar M, Jedelský J, Omasta J,Influence of Composition, Exposure and Thermal Annealing on Optical Properties of As–S Chalcogenide Thin Films,
Journal of Optoelectronics and Advanced Materials Vol. 6 (2004) 139–148
2001
Ohlídal I., Franta D., Frumar M, Jedelský J, Navrátil K,Complete optical analysis of amorphous As–S chalcogenide thin films by the combined spectrophotometric method,
Journal of Optoelectronics and Advanced Materials Vol. 3 (2001) 873–878