Publications in Plasmas and Polymers
2001
Sonnenfeld A, Tun T, Zajíčková L., Kozlov A, Wagner H, Behnke J, Hippler R,Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison,
Plasmas and Polymers Vol. 6 (2001) 237-266