Publications in Journal of Vacuum Science and Technology A

2023

Harumningtyas A, Ito T, Isobe M, Zajíčková L., Hamaguchi S,
Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition (PECVD) with hydrocarbon and amino radicals,
Journal of Vacuum Science and Technology A Vol. 41 (2023) 063007

2018

Kobayashi E, Boccard M, Jeangros Q, Rodkey N, Vresilovic D, Hessler-Wyser A, Döbeli M, Franta D., De Wolf S, Morales-Masis M, Ballif C,
Amorphous gallium oxide grown by low-temperature PECVD,
Journal of Vacuum Science and Technology A Vol. 36 (2018) 021518