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Publications in Chinese Journal of Chemical Physics

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2011

Khalaj Z, Ghoranneviss M, Nasirilaheghi S, Ghorannevis Z, Hatakeyama R,
Growth of Nano Crystalline Diamond on Silicon Substrate Using Different Etching Gases by HFCVD,
Chinese Journal of Chemical Physics Vol. 23 6 (2011) 689-692


RG Plasma Technologies, CEITEC BUT | Department of Physical Electronics, FSci MU